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    • 10. 发明专利
    • Gas purifying apparatus and method
    • 气体净化装置和方法
    • JP2010088963A
    • 2010-04-22
    • JP2008258542
    • 2008-10-03
    • Kureha Engineering Co Ltd株式会社クレハエンジニアリング
    • HIRUTA KAZUOWATANABE YUKIOSATO KATSUSHISAKAGUCHI MASAYAOYAMA HIROKI
    • B01D53/44B01D53/08B01D53/81
    • B01D53/08B01D2257/704B01D2257/708
    • PROBLEM TO BE SOLVED: To provide a gas purifying apparatus and a method for successfully regenerating an adsorbent by suppressing condensation of chemical substances on a surface of the adsorbent lowering by the gravity and stabilizing the fluidization of the adsorbent.
      SOLUTION: The gas purifying apparatus 1 includes an adsorbing part A bringing gas G containing chemical substances into contact with the adsorbent K to adsorb the chemical substances into the adsorbent K, a separation part D separating the chemical substances from the adsorbent K by bringing non-condensable gas Ga into countercurrent contact with the adsorbent K lowering through the adsorbing part A while forming a moving bed, wherein an adsorbent body temperature control part C is provided between the adsorbing part A and separation part D, for keeping the lowering adsorbent K at a temperature of from the dew point of the non-condensable gas Ga containing the chemical substances having passed through the separation part D to dew point +50°C.
      COPYRIGHT: (C)2010,JPO&INPIT
    • 要解决的问题:提供一种气体净化装置和通过抑制吸附剂表面上的化学物质的冷凝而成功地再生吸附剂的方法,其通过重力降低并稳定吸附剂的流化。 解决方案:气体净化装置1包括吸附部分A,使含有化学物质的气体G与吸附剂K接触以将化学物质吸附到吸附剂K中;分离部分D将化学物质与吸附剂K分离, 使不可冷凝气体Ga与吸附剂A同时形成移动床而与吸附剂K进行逆流接触,其中吸附体温度控制部C设置在吸附部A和分离部D之间,用于保持降低吸附剂 K在从含有通过分离部D的化学物质的不可冷凝气体Ga的露点到露点+ 50℃的温度下进行。 版权所有(C)2010,JPO&INPIT