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    • 1. 发明专利
    • Diode, semiconductor device and mosfet
    • 二极管,半导体器件和MOSFET
    • JP2013051345A
    • 2013-03-14
    • JP2011189263
    • 2011-08-31
    • Toyota Central R&D Labs Inc株式会社豊田中央研究所Toyota Motor Corpトヨタ自動車株式会社
    • YAMASHITA YUUSUKEMACHIDA SATORUSUGIYAMA TAKAHIDESAITO JUN
    • H01L29/861H01L27/04H01L29/739H01L29/78H01L29/868
    • PROBLEM TO BE SOLVED: To disclose a technology of enabling reduction of a switching loss in a diode to be achieved by a structure that is not likely to cause variation in quality at the time of manufacturing.SOLUTION: A diode disclosed in the present specification comprises: a cathode electrode; a cathode region composed of a first conductivity type semiconductor; a drift region composed of a low-concentration first conductivity type semiconductor; an anode region composed of a second conductivity type semiconductor; and an anode electrode. The diode comprises: a barrier region formed between the drift region and the anode region, and composed of a first conductivity type semiconductor having a concentration higher than that of the drift region; and a hetero semiconductor region formed so as to electrically connect the barrier region and the anode electrode, and composed of a semiconductor having a band gap smaller than that of the barrier region. In the diode, the hetero semiconductor region and the barrier region form a hetero junction.
    • 要解决的问题:公开一种能够通过不可能在制造时质量变化的结构来实现二极管的开关损耗降低的技术。 解决方案:本说明书中公开的二极管包括:阴极电极; 由第一导电型半导体构成的阴极区域; 由低浓度第一导电型半导体构成的漂移区域; 由第二导电型半导体构成的阳极区域; 和阳极电极。 二极管包括:在漂移区和阳极区之间形成的阻挡区,由比漂移区的浓度高的第一导电型半导体构成; 以及异质半导体区域,其形成为电连接所述阻挡区域和所述阳极电极,并且由具有比所述阻挡区域的带隙小的带隙的半导体构成。 在二极管中,异质半导体区域和势垒区域形成异质结。 版权所有(C)2013,JPO&INPIT
    • 2. 发明专利
    • Semiconductor device
    • 半导体器件
    • JP2011165971A
    • 2011-08-25
    • JP2010028022
    • 2010-02-10
    • Toyota Central R&D Labs IncToyota Motor Corpトヨタ自動車株式会社株式会社豊田中央研究所
    • SUGIYAMA TAKAHIDEMACHIDA SATORUSAITO JUN
    • H01L29/739H01L29/78
    • PROBLEM TO BE SOLVED: To provide a semiconductor device which is suppressed with respect to reduction in the breakdown voltage. SOLUTION: The semiconductor device 100 includes a trench gate 30 and a dummy trench 24. The dummy trench 24 extends down to a position of a semiconductor layer 16, which is deeper than the trench gate 30. The semiconductor layer 16 has a body region 13, and a first semiconductor region 14, which is selectively provided on the body region 13 and is electrically connected to an emitter electrode 18. The body region 13 has a first body region 12, having a first depth D12 and a second body region 10 having a second depth D10 deeper than the first depth D12. The first body region 12 is brought into contact with the side of the trench gate 30. The second body region 10 is brought into contact with at least a part of the side of the dummy trench 24. The first semiconductor region 14 is brought into contact with the side of the trench gate 30. COPYRIGHT: (C)2011,JPO&INPIT
    • 要解决的问题:提供一种关于降低击穿电压而被抑制的半导体器件。 解决方案:半导体器件100包括沟槽栅极30和虚设沟槽24.虚拟沟槽24向下延伸到比沟槽栅极30深的半导体层16的位置。半导体层16具有 主体区域13和第一半导体区域14,其被选择性地设置在主体区域13上并且电连接到发射极电极18.主体区域13具有第一体区域12,具有第一深度D12和第二体 区域10具有比第一深度D12更深的第二深度D10。 第一体区12与沟槽栅30的一侧接触。第二体区10与虚设沟槽24的至少一部分接触。第一半导体区14接触 与沟槽门30的一侧。版权所有(C)2011,JPO&INPIT
    • 3. 发明专利
    • Diode
    • 二极管
    • JP2010092991A
    • 2010-04-22
    • JP2008259994
    • 2008-10-06
    • Toyota Central R&D Labs IncToyota Motor Corpトヨタ自動車株式会社株式会社豊田中央研究所
    • SUGIYAMA TAKAHIDEYAMASHITA YUUSUKEMISUMI TADASHI
    • H01L29/861H01L21/322H01L21/329
    • PROBLEM TO BE SOLVED: To provide a technique for suppressing oscillation of a current or a voltage between an anode and a cathode by suppressing generation of a surge between the anode and the cathode while reducing electric power loss during reverse recovery. SOLUTION: A diode 1 includes a cathode region 20 containing an n-type impurity in high concentration, a high-resistance region 40 containing an n-type impurity in low concentration and constantly along the thickness, and an anode region 50 containing a p-type impurity. The high resistance region 40 includes a first crystal defect region D1 having a peak of a defect amount nearby an interface S1 of the anode region 50 and a second crystal defect region D2 having a peak of a defect amount nearby a thickness-directional intermediate position M. COPYRIGHT: (C)2010,JPO&INPIT
    • 要解决的问题:通过抑制反向恢复期间的电力损失,通过抑制阳极和阴极之间的浪涌的产生来提供抑制阳极和阴极之间的电流或电压的振荡的技术。 解决方案:二极管1包括含有高浓度的n型杂质的阴极区域20,含有低浓度且不断沿着厚度的n型杂质的高电阻区域40和含有 p型杂质。 高电阻区域40包括在阳极区域50的界面S1附近具有缺陷量的峰值的第一晶体缺陷区域D1和具有厚度方向中间位置M附近的缺陷量峰值的第二晶体缺陷区域D2 。版权所有(C)2010,JPO&INPIT
    • 6. 发明专利
    • Carrier lifetime measuring method
    • 载体寿命测量方法
    • JP2008305859A
    • 2008-12-18
    • JP2007149599
    • 2007-06-05
    • Toyota Central R&D Labs IncToyota Motor Corpトヨタ自動車株式会社株式会社豊田中央研究所
    • SAITO MASANORISUGIYAMA TAKAHIDE
    • H01L21/66
    • PROBLEM TO BE SOLVED: To provide a technology for measuring the carrier lifetime of the local area of the surface of a semiconductor layer.
      SOLUTION: The measuring method comprises a step of bringing a pair of electrodes into contact with the surface of a semiconductor layer, a resistance value measuring step of repeatedly measuring a resistance between the pair of electrodes, an excitation light irradiation step of starting the irradiation of the surface of the semiconductor layer between the pair of electrodes at least with laser light 40 and stopping the irradiation in the middle of the resistance value measuring step, and a step of specifying the carrier lifetime of the semiconductor layer by measuring a time τ required for incerasing a resistance value measured at the excitation light irradiation stop timing to r1-(r1-r2)/e when a resistance value measured before start of irradiation with the laser light 40 is set to r1 and a resistance value measured in a period in which the resistance value which decreases and becomes stable after start of irradiation with the laser light 40 is set to r2.
      COPYRIGHT: (C)2009,JPO&INPIT
    • 要解决的问题:提供一种用于测量半导体层表面的局部区域的载流子寿命的技术。 解决方案:测量方法包括使一对电极与半导体层的表面接触的步骤,重复测量该对电极之间的电阻的电阻值测量步骤,启动的激发光照射步骤 至少用激光40照射一对电极之间的半导体层的表面,并且在电阻值测量步骤的中间停止照射,以及通过测量时间来确定半导体层的载流子寿命的步骤 当将激光40照射开始前测量的电阻值设定为r1时,激发光照射停止时刻测得的电阻值r1(r1-r2)/ e, 在激光40照射开始后降低并变得稳定的电阻值的周期被设定为r2。 版权所有(C)2009,JPO&INPIT
    • 7. 发明专利
    • Igbt
    • IGBT
    • JP2008218812A
    • 2008-09-18
    • JP2007055917
    • 2007-03-06
    • Toyota Central R&D Labs IncToyota Motor Corpトヨタ自動車株式会社株式会社豊田中央研究所
    • SUGIYAMA TAKAHIDEKAMEYAMA SATORU
    • H01L29/739H01L29/78
    • PROBLEM TO BE SOLVED: To provide an IGBT in which the switching time from a current on state to a current off state can be shortened by suppressing appearance of a negative resistance component under current on state. SOLUTION: A conductor region 16 penetrating a p-type collector layer 12 and intruding into an n-type base layer 10 is formed on the backside of an IGBT 100. The conductor region 16 is formed in a range not opposing a p-type body region 24. Appearance of a negative resistance component under current on state is thereby suppressed and residual carriers are discharged efficiently to a collector electrode 14 via the conductor region 16 at turning-off. COPYRIGHT: (C)2008,JPO&INPIT
    • 解决的问题:为了提供一种IGBT,其中通过在电流导通状态下抑制负电阻分量的外观,可以缩短从电流导通状态到断电状态的切换时间。 解决方案:在IGBT 100的背面形成有贯穿p型集电极层12并侵入n型基极层10的导体区域16.导体区域16形成在与p型集电极层12不相对的范围内 由此抑制导通状态下的负电阻成分的外观,并且在关断时通过导体区域16将残留载流子有效地排出到集电极14。 版权所有(C)2008,JPO&INPIT