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    • 3. 发明专利
    • VACUUM VESSEL AND ITS PRODUCTION
    • JPH11165057A
    • 1999-06-22
    • JP36748997
    • 1997-12-04
    • AM TECHNOLOGY KK
    • SUZUKI NOBUYUKI
    • B65D25/20B01J3/00B22D19/00B65D81/20F25D1/02
    • PROBLEM TO BE SOLVED: To obtain a vacuum vessel large in the overall coefficient of heat transfer and capable of accurately performing temp. control by forming a tubular flow passage capable of passing a cooling or heating medium on a cylindrical part of the vacuum vessel formed cylindrical or bottomed vessel like. SOLUTION: The vacuum vessel 1 suitably used for an etching device, a sputtering device or the like for producing a semiconductor, a liquid crystal or a solar cell is formed by using aluminum, magnesium or the alloy and a pipe 2, through which a fluid for temp. control is passed, is disposed in the vacuum vessel 1 so as to be cast-in. As a result, the generation of mold cavity in the surroundings of the pipe 2 is eliminated to increase the overall coefficient of heat transfer to the inside of the vacuum vessel 1. As the material for the pipe 1, one of copper, iron, an aluminum alloy, titanium, stainless, a nickel alloy and the like is used. And a porous body made of a ceramic can be arranged on the circumferential part of the vacuum vessel 1.