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    • 4. 发明专利
    • Chip carrier and optical communication module
    • 芯片载体和光通信模块
    • JP2011103418A
    • 2011-05-26
    • JP2009258549
    • 2009-11-12
    • Opnext Japan Inc日本オプネクスト株式会社
    • NAKAMURA ATSUSHIYAMAUCHI TOSHIYA
    • H01S5/026
    • PROBLEM TO BE SOLVED: To reduce an electric crosstalk between wires connected to each of an optical modulator and a semiconductor laser.
      SOLUTION: A chip carrier 10 includes: a semiconductor laser unit 12 for emitting laser beams according to a drive current to be input; an optical modulator unit 14 for modulating the laser beams emitted by the semiconductor laser unit 12 according to a modulation signal to be input; a first wire 30 transmitting the drive current to the semiconductor laser unit 12; and a second wire 34 transmitting the modulation signal to the optical modulator unit 14. In the chip carrier, a smaller angle is not less than 60 degrees with respect to angles formed by crossing of directions of respective wires prescribed by positions of respective connection edges of the first and second wires 30, 34.
      COPYRIGHT: (C)2011,JPO&INPIT
    • 要解决的问题:减少连接到每个光调制器和半导体激光器的电线之间的电串扰。 解决方案:芯片载体10包括:半导体激光器单元12,用于根据要输入的驱动电流发射激光束; 光调制器单元14,用于根据要输入的调制信号调制由半导体激光单元12发射的激光束; 将驱动电流传送到半导体激光器单元12的第一线30; 以及将调制信号发送到光调制器单元14的第二线34.在芯片载体中,相对于通过将由各个连接边缘的位置规定的各个线的方向交叉而形成的角度,较小的角度不小于60度 第一和第二线30,34。版权所有(C)2011,JPO&INPIT
    • 5. 发明专利
    • Semiconductor device and method of manufacturing the same
    • 半导体器件及其制造方法
    • JP2011009456A
    • 2011-01-13
    • JP2009151332
    • 2009-06-25
    • Opnext Japan Inc日本オプネクスト株式会社
    • SAKUMA YASUSHIHAYAKAWA SHIGENORIWASHIMI SEIJIYAMAUCHI TOSHIYAONO SATOSHI
    • H01S5/223H01S5/042H01S5/227H01S5/323
    • PROBLEM TO BE SOLVED: To provide a semiconductor device having a structure such that a polyimide resin is arranged below a pad electrode to reduce a parasitic capacitance, thereby solving the following problem that an electrode step disappears in a step difference of a polyimide surface, and it becomes hard to reduce the parasitic capacitance through the increase of the step difference.SOLUTION: In a semiconductor optical device, a compound semiconductor layer is laminated which includes an etching stop layer 32 and an active layer 36 and is laminated on a semiconductor substrate 2. A ridge 20 and a lower part 42 on both sides of the ridge are formed by etching to the active layer 36. A part positioned under the pad electrode 14 among the lower parts 42 is etched to the etching stop layer 32, thereby forming a recess 46. The polyimide resin layer 22 has, below the pad electrode 14, a thickness formed by the depth of the lower part 42, the height of a terrace part 48 and the depth of the recess 46. The parasitic capacitance is reduced by increasing the depth of the recess 46.
    • 要解决的问题:提供一种半导体器件,其结构使得聚酰亚胺树脂布置在焊盘电极下方以减小寄生电容,从而解决了电极步骤在聚酰亚胺表面的阶差中消失的以下问题,以及 通过增加阶梯差,难以减小寄生电容。解决方案:在半导体光学器件中,层叠化合物半导体层,其包括蚀刻停止层32和有源层36,并层叠在半导体基板2上 通过蚀刻到有源层36上形成脊的两侧的脊部20和下部42。将位于下部部分42内的焊盘电极14下方的部分蚀刻到蚀刻停止层32,从而形成 凹部46.聚酰亚胺树脂层22在焊盘电极14的下方具有由下部42的深度,露台部48的高度和深度构成的厚度 e凹槽46.通过增加凹部46的深度来减小寄生电容。
    • 6. 发明专利
    • Process of fabricating electroabsorption optical modulator integrated laser device
    • 制造电子光学调制器集成激光器件的工艺
    • JP2010114158A
    • 2010-05-20
    • JP2008283578
    • 2008-11-04
    • Opnext Japan Inc日本オプネクスト株式会社
    • WASHIMI SEIJINAOE KAZUHIKOYAMAUCHI TOSHIYAOKAMOTO KAORUSAKUMA YASUSHIHAYAKAWA SHIGENORI
    • H01S5/026G02F1/017
    • PROBLEM TO BE SOLVED: To provide the process of fabricating an electroabsorption modulator integrated laser device which is able to attain predetermined long-haul transmission, in a predetermined high speed operation, by fabricating an electroabsorption modulator where undoped layers each having a thickness value that satisfies the conditions for the thickness value of undoped layers where each satisfying a predetermined transmission quality are laminated.
      SOLUTION: By having a plurality of electroabsorption modulators each having an undoped layer of different thickness fabricated, the band and the chirp characteristics are measured, and then the correlation diagram of these characteristics and the thickness of undoped layer is created, the dependence of these characteristics on the thickness is determined, and the conditions of thickness value are obtained.
      COPYRIGHT: (C)2010,JPO&INPIT
    • 要解决的问题:为了提供制造能够在预定的高速运行中达到预定的长距离传输的电吸收调制器集成激光装置的方法,通过制造电吸收调制器,其中各层具有厚度的未掺杂层 满足预定传输质量的未掺杂层的厚度值的条件的值。 解决方案:通过制备多个具有不同厚度的未掺杂层的电吸收调制器,测量带和啁啾特性,然后产生这些特性和未掺杂层的厚度的相关图,依赖性 确定这些特性的厚度,并获得厚度值的条件。 版权所有(C)2010,JPO&INPIT
    • 7. 发明专利
    • Electric field absorption type modulator
    • 电场吸收型调制器
    • JP2009222965A
    • 2009-10-01
    • JP2008067074
    • 2008-03-17
    • Opnext Japan Inc日本オプネクスト株式会社
    • WASHIMI SEIJINAOE KAZUHIKOSASADA NORIKOYAMAGUCHI YORIYOSHIYAMAUCHI TOSHIYA
    • G02F1/025
    • PROBLEM TO BE SOLVED: To provide an electric field absorption type modulator (EA modulator), having high heat radiation and an superior frequency characteristics.
      SOLUTION: This EA modulator 10 includes an optical waveguide layer 32, of which the optical absorption amount varies in response to applied electric field, and a p-side electrode 40 for applying the electric field to the optical waveguide layer 32. The p-side electrode 40 has a mesa part 42 which extends along the path of a light input into an input end 32a of the optical waveguide layer 32 and output from an output end 32b thereof; a PAD part 44 connected with an electrical signal line, and a band-like PAD connection part 46 for connecting the PAD part 44 to a partial area in an input end 32a side of the mesa part 42.
      COPYRIGHT: (C)2010,JPO&INPIT
    • 要解决的问题:提供具有高热辐射和优异的频率特性的电场吸收型调制器(EA调制器)。 解决方案:该EA调制器10包括光吸收量响应于所施加的电场而变化的光波导层32和用于向光波导层32施加电场的p侧电极40。 p侧电极40具有台阶部42,其沿着光输入的路径延伸到光波导层32的输入端32a,并从其输出端32b输出; 与电信号线连接的PAD部分44,以及用于将PAD部分44连接到台面部分42的输入端32a侧的部分区域的带状PAD连接部分46.权利要求(C) 2010年,JPO&INPIT