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1. 发明专利

JP2008164632A Temperature compensating method, temperature compensating circuit using same, sensor, and water heater 审中-公开
标题翻译：温度补偿方法，使用温度补偿电路，传感器和水加热器
公开(公告)号：JP2008164632A
公开(公告)日：2008-07-17
申请号：JP2008057662
申请日：2008-03-07
申请人： Omron Corp , Tokyo Gas Co Ltd , オムロン株式会社 , 東京瓦斯株式会社
发明人： NAKAMURA KENICHI , KONDA NORIHIRO , KONDO MASATO , SHIGEOKA TAKUJI , EDA AKITO , NOZOE SATOSHI , BINGO HIDEYUKI , KINOSHITA MASAHIRO , SASAKI AKIRA
IPC分类号： G01F1/696 , G01F15/02 , G01P5/12
摘要： PROBLEM TO BE SOLVED: To make an appropriate temperature compensation even when the ambient temperature of a thermosensitive element and the ambient temperature of processing means (processing circuit) that performs a process for a temperature compensation of the thermosensitive element change independently of each other. SOLUTION: While making a temperature compensation of a thermosensitive element 1 in accordance with information on the temperature of a detection target, a temperature compensating method also makes a temperature compensation of processing means in accordance with information on the temperature thereof, the processing means performing a process for a temperature compensation of the thermosensitive element 1 and performing desired detection on the detection target, (the processing means including a differential amplifier 7, for example). The processing means preferably has thermosensitive elements R9 and R2 for adjusting the offset and/or gain of the processing means. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：即使当热敏元件的环境温度和执行用于热敏元件的温度补偿的处理的处理装置（处理电路）的环境温度独立于每一个而变化时也进行适当的温度补偿其他。解决方案：在根据关于检测对象的温度的信息进行热敏元件1的温度补偿的同时，温度补偿方法还根据关于其温度的信息对处理装置进行温度补偿，处理意味着执行用于热敏元件1的温度补偿的处理并且对检测对象进行期望的检测（例如，包括差分放大器7的处理装置）。处理装置优选地具有用于调节处理装置的偏移和/或增益的热敏元件R9和R2。版权所有（C）2008，JPO＆INPIT

2. 发明专利

JP2006078487A Guide path 有权
标题翻译：指导途径
公开(公告)号：JP2006078487A
公开(公告)日：2006-03-23
申请号：JP2005259192
申请日：2005-09-07
申请人： Omron Corp , Tokyo Gas Co Ltd , オムロン株式会社 , 東京瓦斯株式会社
发明人： NAKAMURA KENICHI , KONDA NORIHIRO , NOZOE SATOSHI , SASAKI AKIRA , KONDO MASATO , SHIGEOKA TAKUJI , EDA AKITO
IPC分类号： G01F1/00 , F23L1/00 , F23N5/18 , G01F1/684 , G01F15/12
摘要： PROBLEM TO BE SOLVED: To provide a guide path that eliminates pulsation in a sensor output even in a high flow rate region, while guiding a gas of an object to be measured to a sensor in a condition that waste materials such as dust and dirt are properly removed. SOLUTION: The guide path comprises narrow paths 31-35 for raising the flow speed of a gas and deposition chambers 21-25 forming hollow rectangular solids for depositing the waste materials in the gas. The outlets of the narrow paths 31-35 are opened by pulling either side of right and left sides of one side wall surface of the deposition chambers 21-25, and the gas outlets from the deposition chambers 21-25 are opened to side wall surfaces of far sides from the outlets of the narrow paths 31-35 from among side wall surfaces vertical to one side wall surface to which the outlets of the narrow paths 31-35 are opened, and therewith the opening position is set at a position sufficiently separated from a side wall surface facing one side wall surface forward than it. Thereby, the gas changes a flow direction thereof at an angle larger than 90 degrees from flowing in to flowing out and passes widely in the deposition chambers 21-25, and then a deposition place is spread and the deposition chambers 21-25 are efficiently utilized. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了提供即使在高流量区域也能够消除传感器输出中的脉动的引导路径，同时在诸如灰尘等废物的条件下将被测量物体的气体引导到传感器并正确清除污垢。解决方案：引导路径包括用于提高气体流速的窄通道31-35和形成中空矩形固体的沉积室21-25，用于将废料沉积在气体中。通过拉出沉积室21-25的一个侧壁表面的左右侧的任一侧来打开狭窄通道31-35的出口，并且来自沉积室21-25的气体出口被打开到侧壁表面从狭窄路径31-35的出口的远侧与垂直于窄路径31-35的出口的一个侧壁表面的侧壁表面中的开口位置被设置在足够分离的位置处从面向一侧壁表面的侧壁表面向前。由此，气体的流动方向以大于90度的角度流动而流出，并且在沉积室21-25中被广泛地流通，然后扩散沉积位置并且有效地利用沉积室21-25 。版权所有（C）2006，JPO＆NCIPI

3. 发明专利

JP2000131094A METHOD FOR COMPENSATING TEMPERATURE AND TEMPERATURE- COMPENSATING CIRCUIT USING IT, AND SENSOR AND HOT WATER- SUPPLYING APPARATUS 失效
公开(公告)号：JP2000131094A
公开(公告)日：2000-05-12
申请号：JP7843599
申请日：1999-03-23
申请人： TOKYO GAS CO LTD , GASTAR CORP , OMRON TATEISI ELECTRONICS CO
发明人： NAKAMURA KENICHI , KONDA NORIHIRO , KONDO MASATO , SHIGEOKA TAKUJI , EDA AKITO , NOZOE SATOSHI , BINGO HIDEYUKI , KINOSHITA MASAHIRO , SASAKI AKIRA
IPC分类号： G01P5/12 , G01D3/028 , G01F1/68 , G01F1/696 , G01F15/04 , G01P21/00
摘要： PROBLEM TO BE SOLVED: To easily and correctly compensate temperature by preventing the preliminarily adjusted offset value from deviating in adjusting gain and eliminating the need of repeatedly adjusting the offset value after adjusting the gain, or the like. SOLUTION: One of two heat-sensitive elements is used as a heat-sensitive element 1 for detection and the other is used as a heat-sensitive element 2 for temperature compensation. Conduction currents I1 and I2 (I1>I2) are supplied from constant current sources 3 and 4, thereby output voltages Vout 1, Vout 2 of the heat-sensitive elements 1, 2 are obtained. The output voltage Vout 3 of the heat-sensitive element 2 is offset adjusted to the Vout 1 by an offset adjustment circuit 5 at an ambient temperature T1. An adjusted output voltage Vout 4 is gain adjusted by a gain adjustment circuit 6 to agree with a Vout 1' at an ambient temperature T2.

4. 发明专利

JP2000274662A INDUCTION PATH 失效
公开(公告)号：JP2000274662A
公开(公告)日：2000-10-03
申请号：JP8229399
申请日：1999-03-25
申请人： TOKYO GAS CO LTD , OMRON TATEISI ELECTRONICS CO , GASTAR CORP
发明人： NAKAMURA KENICHI , KONDA NORIHIRO , NOZOE SATOSHI , SASAKI AKIRA , KONDO MASATO , SHIGEOKA TAKUJI , EDA AKITO
IPC分类号： F23L1/00
摘要： PROBLEM TO BE SOLVED: To provide an induction path which leads the gas being the target of measurement to a sensor in condition that needless substance such as rubbish, dust, etc., are removed properly, and also does not produce pulsation in sensor output even in a high flow rate region. SOLUTION: This induction path is equipped with narrow passages 31-35 for raising the flow velocity of gas, and sedimentation chambers 21-25 forming hollow rectangular parallelepipeds for settling the needless substance in gas. The outlet of the narrow passage is opened, being biased to either the right or the left of one sidewall of the sedimentation chamber, and the outlet for the gas from the sedimentation chamber is opened in the sidewall on the side farther from the outlet of the narrow passage out of the sidewall vertical to one sidewall where the outlet of the narrow passage is opened, and also the position of it opening is set in a position separated enough from the sidewall opposed to the previous one sidewall. Hereby, the gas passes in a wide range within the sedimentation chamber, changing its flow direction by 90 deg. until it gets out of the sedimentation chamber after its entry, so the place of sedimentation of needless substance is widened, and the sedimentation chamber is utilized effectively.

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