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1. 发明专利

JP2012078164A Pattern inspection device 审中-公开
标题翻译：图案检查装置
公开(公告)号：JP2012078164A
公开(公告)日：2012-04-19
申请号：JP2010222430
申请日：2010-09-30
申请人： Nuflare Technology Inc , Toshiba Corp , 株式会社ニューフレアテクノロジー , 株式会社東芝
发明人： OGAWA TSUTOMU , HIRONO MASATOSHI , NISHISAKA TAKESHI , HIRANO RYOICHI , ISOMURA IKUNAO , MATSUKI KAZUTO , OZAKI FUMIO
IPC分类号： G01B11/30 , G01B11/02 , G01N21/956 , G03F1/84 , H01L21/027
CPC分类号： G01N21/956
摘要： PROBLEM TO BE SOLVED: To provide a pattern inspection device capable of efficiently inspecting even an inspection sample having a step between a pattern region and a non-pattern region.SOLUTION: This pattern inspection device includes: an inspection area storage section for storing an inspection area that is specified in the pattern region; a pattern surface height detecting section for detecting a pattern surface height signal with respect to a pattern surface height measuring position on the inspection sample; an autofocus mechanism focusing to the inspection sample using the pattern surface height signal detected by the pattern surface height detecting section; a determination section for determining whether the pattern surface height measuring position is within the inspection area; and an autofocus mechanism control section adapted to actuate the autofocus mechanism when the determination section determines that the pattern surface height measuring position is within the inspection area, and to stop the autofocus mechanism when the determination section determines that the pattern surface height measuring position is not within the inspection area.
摘要翻译：要解决的问题：提供一种能够有效地检查具有图案区域和非图案区域之间的台阶的检查样本的图案检查装置。解决方案：该图案检查装置包括：检查区域存储部，用于存储在图案区域中指定的检查区域; 图案表面高度检测部，用于相对于检查样本上的图案表面高度测量位置检测图案表面高度信号; 使用由图案表面高度检测部检测到的图案表面高度信号来聚焦于检查样本的自动聚焦机构; 确定部，用于确定图案表面高度测量位置是否在检查区域内; 以及自动对焦机构控制部，所述自动对焦机构控制部在所述判定部判断为所述图案表面高度测量位置在所述检查区域内时，使所述自动聚焦机构动作，并且当所述判定部判断出所述图案表面高度测量位置不在所述检查区域内时停止所述自动聚焦机构在检查区内。版权所有（C）2012，JPO＆INPIT

2. 发明专利

JP2012127856A Pattern test device and pattern test method 审中-公开
标题翻译：模式测试设备和模式测试方法
公开(公告)号：JP2012127856A
公开(公告)日：2012-07-05
申请号：JP2010280584
申请日：2010-12-16
申请人： Nuflare Technology Inc , 株式会社ニューフレアテクノロジー
发明人： HASHIMOTO HIDEAKI , HIRONO MASATOSHI , HIRANO RYOICHI , OGAWA TSUTOMU , TAKEDA MASAYA , KIKUIRI NOBUTAKA
IPC分类号： G01N21/956
摘要： PROBLEM TO BE SOLVED: To provide a pattern test device for detecting a defect and determining the kind of defect to be detected.SOLUTION: The pattern test device includes: a light source; a reflection illumination light system which includes a test light generation part for generating a first test light and a second test light different in polarization state and irradiates the first test light and the second test light to the same surface of a sample; an image-formation optical system for forming images of the first test light and the second test light radiated to the sample as a first image and a second image respectively; an optical expansion system for expanding the first image and the second image; an image sensor for picking up images of the first image and the second image which are expanded by the optical expansion system; a storage part for storing a first test image to be an image of the first image, and a second test image to be an image of the second image, picked up by the image sensor; a detection part for comparing the first test image stored to the storage part with a first reference image and comparing the second test image with a second reference image to detect a defect; and a determination part for determining the kind of defect of the defect.
摘要翻译：要解决的问题：提供一种用于检测缺陷并确定要检测的缺陷的种类的图案测试装置。解决方案：图案测试装置包括：光源; 反射照明光系统，其包括用于产生第一测试光的测试光产生部分和偏振态不同的第二测试光，并将第一测试光和第二测试光照射到样品的相同表面; 图像形成光学系统，用于分别形成作为第一图像和第二图像的第一测试光和照射到样本的第二测试光的图像; 用于扩展第一图像和第二图像的光学扩展系统; 用于拾取由所述光学扩展系统扩展的所述第一图像和所述第二图像的图像的图像传感器; 用于存储作为第一图像的图像的第一测试图像的存储部分和由图像传感器拾取的作为第二图像的图像的第二测试图像; 用于将存储在存储部分的第一测试图像与第一参考图像进行比较并将第二测试图像与第二参考图像进行比较以检测缺陷的检测部件; 以及确定部件，用于确定缺陷的缺陷的种类。版权所有（C）2012，JPO＆INPIT

3. 发明专利

JP2012068321A Mask defect inspection device and mask defect inspection method 审中-公开
标题翻译：掩蔽缺陷检查装置和掩蔽缺陷检查方法
公开(公告)号：JP2012068321A
公开(公告)日：2012-04-05
申请号：JP2010211298
申请日：2010-09-21
申请人： Nuflare Technology Inc , 株式会社ニューフレアテクノロジー
发明人： HIRONO MASATOSHI , OGAWA TSUTOMU , HIRANO RYOICHI , ISOMURA IKUNAO
IPC分类号： G03F1/84 , G01B11/30 , G01N21/956
摘要： PROBLEM TO BE SOLVED: To provide a mask defect inspection device and a mask defect inspection method using the device, allowing efficient inspection even when a mask has a level difference between a pattern region and a non-pattern region on its surface.SOLUTION: The mask defect inspection device and the mask defect inspection method using the device include a focus adjustment mechanism for adjusting focus to the mask surface, a first and a second focus detection parts for detecting focuses respectively on a first portion and a second portion across an inspection visual field in the inspection visual field scanning direction in taking in a pattern image, a determination part for determining in which region, the pattern region or the non-pattern region, the first portion and the second portion are positioned, and a focus adjustment method instruction part for instructing a focus adjustment method to the focus adjustment mechanism based on the determination result of the determination part.
摘要翻译：要解决的问题：为了提供使用该装置的掩模缺陷检查装置和掩模缺陷检查方法，即使当掩模在其表面上的图案区域和非图案区域之间具有水平差时，也允许有效的检查。解决方案：使用该装置的掩模缺陷检查装置和掩模缺陷检查方法包括用于将焦点调整到掩模表面的聚焦调节机构，用于分别在第一部分和第二部分上检测焦点的第一和第二焦点检测部分检测视野扫描方向上的检查视野的第二部分，用于确定在哪个区域中图案区域或非图案区域，第一部分和第二部分被定位的确定部分，以及焦点调整方法指示部分，用于基于确定部分的确定结果向焦点调节机构指示焦点调整方法。版权所有（C）2012，JPO＆INPIT

4. 发明专利

JP2012059984A Mask inspection device and exposure mask manufacturing device 审中-公开
标题翻译：掩模检测装置和曝光掩模制造设备
公开(公告)号：JP2012059984A
公开(公告)日：2012-03-22
申请号：JP2010202832
申请日：2010-09-10
申请人： Nuflare Technology Inc , 株式会社ニューフレアテクノロジー
发明人： HIRANO RYOICHI , KIKUIRI NOBUTAKA
IPC分类号： H01L21/027 , G01N21/956 , G03F1/22
摘要： PROBLEM TO BE SOLVED: To provide a mask inspection device capable of detecting phase defect at the stage of mask blank that is a stage before depositing a absorber pattern.SOLUTION: A mask inspection device 100 includes: an illumination optical system that illuminates illumination light on the surface of mask blank in which a multilayer film for reflecting extreme ultraviolet (EUV) light is formed; sensors 105 and 305 that images an image of the same location as a location to which the light is reflected from the surface of the mask blank at a location in which defocus is performed with a different defocus mount; and a determination part 176 that determines the presence or absence of defect of the mask blank using first and second optical images at the same location on the mask blank surface imaged with the different defocus amount.
摘要翻译：要解决的问题：提供一种能够检测在沉积吸收体图案之前的阶段的掩模坯料阶段的相位缺陷的掩模检查装置。掩模检查装置100包括照明光学系统，其照射掩模坯料的表面上的照明光，其中形成用于反射极紫外（EUV）光的多层膜; 传感器105和305，其在与不同的散焦支架进行散焦的位置处成像从掩模坯料的表面反射光的相同位置的图像; 以及确定部176，其使用以不同散焦量成像的掩模坯料表面上的相同位置处的第一和第二光学图像来确定掩模毛坯的缺陷的存在或不存在。版权所有（C）2012，JPO＆INPIT

5. 发明专利

JP2012002670A Height detection device 有权
标题翻译：高度检测装置
公开(公告)号：JP2012002670A
公开(公告)日：2012-01-05
申请号：JP2010138006
申请日：2010-06-17
申请人： Nec Corp , Toshiba Corp , 日本電気株式会社 , 株式会社東芝
发明人： OGAWA TSUTOMU , HIRANO RYOICHI
IPC分类号： G01B11/02 , G02B7/28 , G03F1/84 , G03F7/20 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To reduce a detection error in a height inspection.SOLUTION: A detection device 100 includes: at least an illumination optical system 200 which has a light source 201 and illuminates the surface of an object 101 with light emitted from the light source; an objective lens 218 for illuminating the object 101 with illumination light from the illumination optical system 200, and condensing reflected light; an imaging optical system for imaging the reflected light passed through the objective lens 218; illumination slits 210 provided at points conjugate to the object 101 in the illumination optical system 200; a beam splitter 222 in the imaging optical system; a front detection slit 230 provided ahead of one imaging point out of the two divided light; a rear detection slit 240 provided behind the other imaging point; a plurality of front detection light quantity sensors 252 for receiving independently each of transmitted light passed through the front detection slit; and a plurality of rear detection light quantity sensors 254 for receiving independently each of transmitted light passed through the rear detection slit.
摘要翻译：要解决的问题：减少高度检查中的检测误差。检测装置100包括：至少一个照明光学系统200，其具有光源201并且利用从光源发出的光照射物体101的表面; 物镜218，用于利用来自照明光学系统200的照明光照射物体101，并且会聚反射光; 用于对穿过物镜218的反射光进行成像的成像光学系统; 设置在照明光学系统200中与物体101共轭的点处的照明狭缝210; 成像光学系统中的分束器222; 设置在两个划分的光之外的一个成像点之前的前检测狭缝230; 设置在另一成像点后面的后检测狭缝240; 多个前检测光量传感器252，用于独立地接收通过前检测狭缝的透射光; 以及多个后检测光量传感器254，用于独立地独立地接收通过后检测狭缝的透射光。版权所有（C）2012，JPO＆INPIT

6. 发明专利

JP2006133519A Mask blank substrate 有权
标题翻译：掩蔽空白基板
公开(公告)号：JP2006133519A
公开(公告)日：2006-05-25
申请号：JP2004322676
申请日：2004-11-05
申请人： Toshiba Corp , Toshiba Mach Co Ltd , 東芝機械株式会社 , 株式会社東芝
发明人： HIRANO RYOICHI , SAITO HIDEO , OGASAWARA MUNEHIRO
IPC分类号： C23C14/04 , G03F1/40 , G03F1/50 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To prevent charging and discharge breakdown of a resist accompanying irradiation of charged beam, and to improve pattern accuracy and production yield in exposure mask.
SOLUTION: A mask blank substrate has a conductive light-shielding body 12 that is opaque to exposure light for forming a pattern by a process including charge beam lithography, formed on one main surface of a substrate 11 transparent to exposure light, and the entire surface of the substrate 11 including four corners on the main surface is coated with a conductive material.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了防止伴随照射带电束的抗蚀剂的充电和放电击穿，并且提高曝光掩模中的图案精度和生产率。解决方案：掩模空白衬底具有导电遮光体12，其对于通过包括电荷束光刻的工艺形成图案的曝光光不透明，形成在对曝光光透明的基板11的一个主表面上，以及包括主表面上的四个角的基板11的整个表面涂覆有导电材料。版权所有（C）2006，JPO＆NCIPI

7. 发明专利

JP2017078782A マスク基板及びマスク基板の製造方法有权
公开(公告)号：JP2017078782A
公开(公告)日：2017-04-27
申请号：JP2015206762
申请日：2015-10-20
申请人：株式会社東芝 , Toshiba Corp
发明人： IIDA SUSUMU , HIRANO RYOICHI , WATANABE HIDEHIRO
IPC分类号： G03F1/24 , G03F7/20
摘要：【課題】適正なパターン検査を行うことが可能なマスク基板を提供する。【解決手段】実施形態に係るマスク基板は、基板10と、基板上に設けられた中間層20と、中間層上に設けられた反射膜30と、反射膜上に設けられたキャップ層40と、を備え、中間層は、キャップ層に含有される主要元素の原子量よりも小さい原子量を有する主要元素を含有する第1の層21と、第1の層と基板との間に設けられ且つ第1の層の導電率よりも高い導電率を有する第2の層22と、を含む。【選択図】図1

8. 发明专利

JP2011191717A Pattern inspection apparatus and pattern inspection method 有权
标题翻译：模式检查装置和模式检查方法
公开(公告)号：JP2011191717A
公开(公告)日：2011-09-29
申请号：JP2010060222
申请日：2010-03-17
申请人： Nec Corp , Toshiba Corp , 日本電気株式会社 , 株式会社東芝
发明人： ISOMURA IKUNAO , HIRANO RYOICHI , KIKUIRI NOBUTAKA
IPC分类号： G01N21/956 , G03F1/84 , H01L21/027 , H01L21/66
CPC分类号： G03F1/84 , G01N21/95607
摘要： PROBLEM TO BE SOLVED: To provide a pattern inspection device capable of performing high-accuracy inspection upon die-to-die inspection on an inspection object sample where a preliminarily distorted pattern is formed.
SOLUTION: The pattern inspection device 100 of one embodiment includes: an optical image acquiring unit 150 acquiring the optical image data of a target object on which a plurality of identical patterns with respective distortions are formed at given positions; a cut-out unit 72 to cut out the optical image data into a plurality of partial optical image data; a correction unit 74 correcting positions of the plurality of partial optical image data by using the distortion information from which distortion amounts of the patterns formed in the inspection sample can be acquired; and a comparing circuit 108 comparing the plurality of corrected partial optical image data with each other by each pixel.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够对形成预先变形的图案的检查对象样品进行模 - 模检验的高精度检查的图案检查装置。解决方案：一个实施例的图案检查装置100包括：光学图像获取单元150，获取在给定位置处形成有多个相同失真的相同图案的目标对象的光学图像数据; 切出单元72，用于将光学图像数据切割成多个部分光学图像数据; 校正单元74通过使用可以获取在检查样本中形成的图案的失真量的失真信息来校正多个部分光学图像数据的位置; 以及比较电路108，通过每个像素将多个校正的部分光学图像数据彼此进行比较。版权所有（C）2011，JPO＆INPIT

9. 发明专利

JP2006135094A Substrate detection apparatus 有权
标题翻译：基板检测装置
公开(公告)号：JP2006135094A
公开(公告)日：2006-05-25
申请号：JP2004322677
申请日：2004-11-05
申请人： Toshiba Corp , Toshiba Mach Co Ltd , 東芝機械株式会社 , 株式会社東芝
发明人： HIRANO RYOICHI , TANIYAMA MINORU , KOBAYASHI NOBORU
IPC分类号： H01L21/67 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a substrate detection apparatus capable of detecting whether a substrate exists at a specific location in a transfer path in a noncontact manner using a photoelectric sensor, and of minimizing heat generation to reduce the occurrence of errors in pattern drawing. SOLUTION: The substrate detection apparatus comprises a sensor 12 for detecting whether a substrate 11 exists at a specific location in a transfer path; a power supply unit 15 disposed adjacent to the sensor 12 for driving the sensor 12 periodically and at a shorter pulse than the period; a signal outputting unit 17 disposed adjacent to the sensor 12 for measuring the presence or absence of the substrate 11 from a detection signal of the sensor 12, in synchronization with the timing at which the power supply unit 15 drives the sensor 12 to hold the measured data; and a state display unit 14 for sending a substrate detection requirement to the signal outputting unit 17 to receive measured data held in the signal outputting unit 17 and display whether the substrate 11 exists. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种基板检测装置，其能够使用光电传感器以非接触方式检测基板是否存在于传送路径中的特定位置处，并且最小化发热以减少错误的发生图案绘图。解决方案：基板检测装置包括用于检测基板11是否存在于传送路径中的特定位置处的传感器12; 与传感器12相邻设置的电源单元15，用于周期性地以比该周期短的脉冲驱动传感器12; 与传感器12相邻设置的信号输出单元17，用于与电源单元15驱动传感器12保持测量的定时同步地从传感器12的检测信号测量基板11的存在或不存在数据; 以及用于向信号输出单元17发送基板检测要求以接收保持在信号输出单元17中的测量数据并显示是否存在基板11的状态显示单元14。版权所有（C）2006，JPO＆NCIPI

10. 发明专利

JP2005244048A Electrically-charged particle beam plotting device and method 审中-公开
标题翻译：电充电颗粒光束显示装置及方法
公开(公告)号：JP2005244048A
公开(公告)日：2005-09-08
申请号：JP2004053961
申请日：2004-02-27
申请人： Toshiba Corp , 株式会社東芝
发明人： AKENO MASANOBU , HIRANO RYOICHI , MITSUI SOICHIRO , TOJO TORU
IPC分类号： H01J37/20 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To realize a type of an electrically-charged particle beam plotting device where a substrate surface evaluating device is connected to a plotting device itself with the high detecting precision of foreign matters.
SOLUTION: This electrically-charged particle beam plotting device is provided with a plotting chamber 11, a preliminary chamber 41 equipped with a substrate supporting part 42 rotatable at each of almost 90 degrees or almost 180 degrees, a substrate surface evaluating chamber 49 in which the substrate is stored, a substrate surface evaluating device 19 equipped with a substrate surface evaluating part which evaluates the surface of the substrate by scanning the surface of the substrate by a laser beam while uni-directionally moving the substrate in the substrate surface evaluating chamber 49 and a conveyance robot 15 for moving the substrate between the plotting chamber 11 and the preliminary chamber 41, and between the preliminary chamber 41 and the evaluating chamber 49.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：为了实现一种具有高异物检测精度的基板表面评估装置与绘图装置本身连接的带电粒子束绘图装置。该带电粒子束绘图装置设置有绘图室11，预备室41，其配备有可在大约90度或几乎180度的每一个旋转的衬底支撑部分42，衬底表面评估室49 其中存储有基板的基板表面评估装置19，该基板表面评估装置19装备有基板表面评估部分，该基板表面评估部分通过在基板表面中的基板的单向移动的同时通过激光束扫描基板的表面来评估基板的表面，室49和用于在绘图室11和预备室41之间以及预备室41和评价室49之间移动衬底的输送机器人15.（C）2005，JPO＆NCIPI

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