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1. 发明专利

JP2012127856A Pattern test device and pattern test method 审中-公开
标题翻译：模式测试设备和模式测试方法
公开(公告)号：JP2012127856A
公开(公告)日：2012-07-05
申请号：JP2010280584
申请日：2010-12-16
申请人： Nuflare Technology Inc , 株式会社ニューフレアテクノロジー
发明人： HASHIMOTO HIDEAKI , HIRONO MASATOSHI , HIRANO RYOICHI , OGAWA TSUTOMU , TAKEDA MASAYA , KIKUIRI NOBUTAKA
IPC分类号： G01N21/956
摘要： PROBLEM TO BE SOLVED: To provide a pattern test device for detecting a defect and determining the kind of defect to be detected.SOLUTION: The pattern test device includes: a light source; a reflection illumination light system which includes a test light generation part for generating a first test light and a second test light different in polarization state and irradiates the first test light and the second test light to the same surface of a sample; an image-formation optical system for forming images of the first test light and the second test light radiated to the sample as a first image and a second image respectively; an optical expansion system for expanding the first image and the second image; an image sensor for picking up images of the first image and the second image which are expanded by the optical expansion system; a storage part for storing a first test image to be an image of the first image, and a second test image to be an image of the second image, picked up by the image sensor; a detection part for comparing the first test image stored to the storage part with a first reference image and comparing the second test image with a second reference image to detect a defect; and a determination part for determining the kind of defect of the defect.
摘要翻译：要解决的问题：提供一种用于检测缺陷并确定要检测的缺陷的种类的图案测试装置。解决方案：图案测试装置包括：光源; 反射照明光系统，其包括用于产生第一测试光的测试光产生部分和偏振态不同的第二测试光，并将第一测试光和第二测试光照射到样品的相同表面; 图像形成光学系统，用于分别形成作为第一图像和第二图像的第一测试光和照射到样本的第二测试光的图像; 用于扩展第一图像和第二图像的光学扩展系统; 用于拾取由所述光学扩展系统扩展的所述第一图像和所述第二图像的图像的图像传感器; 用于存储作为第一图像的图像的第一测试图像的存储部分和由图像传感器拾取的作为第二图像的图像的第二测试图像; 用于将存储在存储部分的第一测试图像与第一参考图像进行比较并将第二测试图像与第二参考图像进行比较以检测缺陷的检测部件; 以及确定部件，用于确定缺陷的缺陷的种类。版权所有（C）2012，JPO＆INPIT

2. 发明专利

JP2012078164A Pattern inspection device 审中-公开
标题翻译：图案检查装置
公开(公告)号：JP2012078164A
公开(公告)日：2012-04-19
申请号：JP2010222430
申请日：2010-09-30
申请人： Nuflare Technology Inc , Toshiba Corp , 株式会社ニューフレアテクノロジー , 株式会社東芝
发明人： OGAWA TSUTOMU , HIRONO MASATOSHI , NISHISAKA TAKESHI , HIRANO RYOICHI , ISOMURA IKUNAO , MATSUKI KAZUTO , OZAKI FUMIO
IPC分类号： G01B11/30 , G01B11/02 , G01N21/956 , G03F1/84 , H01L21/027
CPC分类号： G01N21/956
摘要： PROBLEM TO BE SOLVED: To provide a pattern inspection device capable of efficiently inspecting even an inspection sample having a step between a pattern region and a non-pattern region.SOLUTION: This pattern inspection device includes: an inspection area storage section for storing an inspection area that is specified in the pattern region; a pattern surface height detecting section for detecting a pattern surface height signal with respect to a pattern surface height measuring position on the inspection sample; an autofocus mechanism focusing to the inspection sample using the pattern surface height signal detected by the pattern surface height detecting section; a determination section for determining whether the pattern surface height measuring position is within the inspection area; and an autofocus mechanism control section adapted to actuate the autofocus mechanism when the determination section determines that the pattern surface height measuring position is within the inspection area, and to stop the autofocus mechanism when the determination section determines that the pattern surface height measuring position is not within the inspection area.
摘要翻译：要解决的问题：提供一种能够有效地检查具有图案区域和非图案区域之间的台阶的检查样本的图案检查装置。解决方案：该图案检查装置包括：检查区域存储部，用于存储在图案区域中指定的检查区域; 图案表面高度检测部，用于相对于检查样本上的图案表面高度测量位置检测图案表面高度信号; 使用由图案表面高度检测部检测到的图案表面高度信号来聚焦于检查样本的自动聚焦机构; 确定部，用于确定图案表面高度测量位置是否在检查区域内; 以及自动对焦机构控制部，所述自动对焦机构控制部在所述判定部判断为所述图案表面高度测量位置在所述检查区域内时，使所述自动聚焦机构动作，并且当所述判定部判断出所述图案表面高度测量位置不在所述检查区域内时停止所述自动聚焦机构在检查区内。版权所有（C）2012，JPO＆INPIT

3. 发明专利

JP2012068321A Mask defect inspection device and mask defect inspection method 审中-公开
标题翻译：掩蔽缺陷检查装置和掩蔽缺陷检查方法
公开(公告)号：JP2012068321A
公开(公告)日：2012-04-05
申请号：JP2010211298
申请日：2010-09-21
申请人： Nuflare Technology Inc , 株式会社ニューフレアテクノロジー
发明人： HIRONO MASATOSHI , OGAWA TSUTOMU , HIRANO RYOICHI , ISOMURA IKUNAO
IPC分类号： G03F1/84 , G01B11/30 , G01N21/956
摘要： PROBLEM TO BE SOLVED: To provide a mask defect inspection device and a mask defect inspection method using the device, allowing efficient inspection even when a mask has a level difference between a pattern region and a non-pattern region on its surface.SOLUTION: The mask defect inspection device and the mask defect inspection method using the device include a focus adjustment mechanism for adjusting focus to the mask surface, a first and a second focus detection parts for detecting focuses respectively on a first portion and a second portion across an inspection visual field in the inspection visual field scanning direction in taking in a pattern image, a determination part for determining in which region, the pattern region or the non-pattern region, the first portion and the second portion are positioned, and a focus adjustment method instruction part for instructing a focus adjustment method to the focus adjustment mechanism based on the determination result of the determination part.
摘要翻译：要解决的问题：为了提供使用该装置的掩模缺陷检查装置和掩模缺陷检查方法，即使当掩模在其表面上的图案区域和非图案区域之间具有水平差时，也允许有效的检查。解决方案：使用该装置的掩模缺陷检查装置和掩模缺陷检查方法包括用于将焦点调整到掩模表面的聚焦调节机构，用于分别在第一部分和第二部分上检测焦点的第一和第二焦点检测部分检测视野扫描方向上的检查视野的第二部分，用于确定在哪个区域中图案区域或非图案区域，第一部分和第二部分被定位的确定部分，以及焦点调整方法指示部分，用于基于确定部分的确定结果向焦点调节机构指示焦点调整方法。版权所有（C）2012，JPO＆INPIT

4. 发明专利

JP2012059984A Mask inspection device and exposure mask manufacturing device 审中-公开
标题翻译：掩模检测装置和曝光掩模制造设备
公开(公告)号：JP2012059984A
公开(公告)日：2012-03-22
申请号：JP2010202832
申请日：2010-09-10
申请人： Nuflare Technology Inc , 株式会社ニューフレアテクノロジー
发明人： HIRANO RYOICHI , KIKUIRI NOBUTAKA
IPC分类号： H01L21/027 , G01N21/956 , G03F1/22
摘要： PROBLEM TO BE SOLVED: To provide a mask inspection device capable of detecting phase defect at the stage of mask blank that is a stage before depositing a absorber pattern.SOLUTION: A mask inspection device 100 includes: an illumination optical system that illuminates illumination light on the surface of mask blank in which a multilayer film for reflecting extreme ultraviolet (EUV) light is formed; sensors 105 and 305 that images an image of the same location as a location to which the light is reflected from the surface of the mask blank at a location in which defocus is performed with a different defocus mount; and a determination part 176 that determines the presence or absence of defect of the mask blank using first and second optical images at the same location on the mask blank surface imaged with the different defocus amount.
摘要翻译：要解决的问题：提供一种能够检测在沉积吸收体图案之前的阶段的掩模坯料阶段的相位缺陷的掩模检查装置。掩模检查装置100包括照明光学系统，其照射掩模坯料的表面上的照明光，其中形成用于反射极紫外（EUV）光的多层膜; 传感器105和305，其在与不同的散焦支架进行散焦的位置处成像从掩模坯料的表面反射光的相同位置的图像; 以及确定部176，其使用以不同散焦量成像的掩模坯料表面上的相同位置处的第一和第二光学图像来确定掩模毛坯的缺陷的存在或不存在。版权所有（C）2012，JPO＆INPIT

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