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    • 3. 发明专利
    • VAPOR DEPOSITION METHOD
    • JPS6320455A
    • 1988-01-28
    • JP16374686
    • 1986-07-14
    • NIPPON KOKAN KK
    • TAKAHATA TOMIHISAMASUDA SHINKANAMORI KAZUO
    • C23C14/24C23C14/56
    • PURPOSE:To execute continuous vapor deposition without hindrances by providing plural crucibles contg. vapor deposition materials in a vapor deposition treatment chamber, preliminarily providing plural electron guns and changing over the electron guns to a continuously supplied belt-like material, thereby executing the vapor deposition. CONSTITUTION:The electron beam from the electron gun 3 is deflected by a deflecting magnetic field 7 to evaporate the vapor deposition material in the crucible 1 and to deposit said material by evaporation to the continuously fed belt-like material. The operation time of the electron gun 3 is counted during this time so as to exchange the electron gun when the integrated operation time attains the set time. On the other hand, the output of the electron gun is kept monitored at all times even within the set time and the electron gun is exchanged and the abnormality is displayed when the output drops below the prescribed set level. A gate valve 6 is opened to turn on the electron gun 4 and to start the vapor deposition from the crucible 2 via a deflecting magnetic field 8 when the operation time of the electron gun 3 attains the preset time. As a result, the electron gun is exchanged before the electron gun under use becomes unusable. The continuous vapor deposition treatment to the belt-like material S is thus executed without hindrances.
    • 10. 发明专利
    • DIFFERENTIAL EVACUATION TYPE VAPOR DEPOSITION TREATMENT CHAMBER
    • JPS6320453A
    • 1988-01-28
    • JP16374386
    • 1986-07-14
    • NIPPON KOKAN KK
    • TAKAHATA TOMIHISAMASUDA SHINKANAMORI KAZUOOKAWA SUSUMU
    • C23C14/24C23C14/56
    • PURPOSE:To provide the titled vapor deposition treatment chamber which can make effective sealing between a vapor deposition chamber and vapor deposition treatment chamber even if there is a fluctuation in the wall thickness of a steel strip by proving plural pieces of sealing rolls in rolling contact with a vapor deposition guide roll for the steel strip delineating the vapor deposition treatment chamber in the peripheral direction of said roll to holders by spring energization. CONSTITUTION:The holders 17 are retreated by cylinders 10 to allow the steel strip to pass through the device at the time when the steel strip S passes through the device. The holders 17 are advanced to prescribed positions after the pass-through of the steel strip S and the sealing rolls 16 are pressed to the steel strip S wound around the vapor deposition guide roll 11. The roll 16 moves by following up to the fluctuation of the wall thickness even if there is the fluctuation in the wall thickness of the steel strip at the time of the vapor deposition; therefore, the sealing between the vapor deposition chamber B and the treatment chamber 14 is executed without hindering the operation. Since the vapor flow from a vapor deposition material from a crucible 2 constitutes viscous flow particularly at the time of the high-speed vapor deposition, a so-called labyrinth effect is generated by plural pieces of the rolls 16 and the sealability is further improved.