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1. 发明专利

JP2007260867A Multilayered structure 审中-公开
标题翻译：多层结构
公开(公告)号：JP2007260867A
公开(公告)日：2007-10-11
申请号：JP2006091393
申请日：2006-03-29
申请人： Nagoya Institute Of Technology , Toyota Central Res & Dev Lab Inc , Toyota Motor Corp , トヨタ自動車株式会社 , 国立大学法人名古屋工業大学 , 株式会社豊田中央研究所
发明人： MURAI TATEYA , TANAKA SHUNICHIRO , FUNABASHI HIROBUMI , MURATA KANAE , MAKINO TAKEHIKO
IPC分类号： B82B1/00 , B32B9/00 , C01F5/00 , H01J1/30 , H01L37/00
摘要： PROBLEM TO BE SOLVED: To provide a multilayered structure for electron emission reducing a work function over a conventional limit by restraining development of deliquescence of alkali metal without requiring a special material such as a carbon nanotube. SOLUTION: This multilayered structure 1 is furnished with an alkali metal layer 3 of at least one atomic layer constituted by substituting a metal atom on a surface by an alkali metal atom on the surface of a metallic oxide substrate 2 or constituted by bearing the alkali metal atom on the surface. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于电子发射的多层结构，其通过抑制碱金属的潮解的发展而不需要诸如碳纳米管的特殊材料来减少常规极限的功函数。解决方案：该多层结构1具有至少一个原子层的碱金属层3，该金属层3由金属氧化物基板2的表面上的碱金属原子的表面上的金属原子取代或由轴承表面上的碱金属原子。版权所有（C）2008，JPO＆INPIT

2. 发明专利

JP2006083757A Engine cylinder and handling method for internal wall of engine cylinder 审中-公开
标题翻译：发动机缸体内部发动机和处理方法
公开(公告)号：JP2006083757A
公开(公告)日：2006-03-30
申请号：JP2004269004
申请日：2004-09-15
申请人： Nagoya Institute Of Technology , 国立大学法人名古屋工業大学
发明人： TANAKA SHUNICHIRO , AOYANAGI KENJI , HIKOSAKA MASAO
IPC分类号： F02F1/00 , F16J10/04
摘要： PROBLEM TO BE SOLVED: To provide an engine cylinder capable of effectively suppressing occurrence of a section where compression residual stress is markedly reduced on an internal wall by vertical movement of a piston for many hours to prevent wear of the internal wall advantageously.
SOLUTION: Compression residual stress is given to a surface layer part of the internal wall by making it different partially in the engine cylinder casted by Al-Si alloy.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种发动机气缸，其能够有效地抑制通过活塞的垂直运动使内壁上的压缩残余应力显着降低的部分的发生，以有效地防止内壁的磨损。解决方案：通过在Al-Si合金铸造的发动机气缸中使其部分不同，使内壁的表层部分产生压缩残余应力。版权所有（C）2006，JPO＆NCIPI

3. 发明专利

JP2005228933A Multilayer structure 审中-公开
标题翻译：多层结构
公开(公告)号：JP2005228933A
公开(公告)日：2005-08-25
申请号：JP2004036549
申请日：2004-02-13
申请人： Nagoya Institute Of Technology , Toyota Central Res & Dev Lab Inc , Toyota Motor Corp , トヨタ自動車株式会社 , 国立大学法人名古屋工業大学 , 株式会社豊田中央研究所
发明人： TANAKA SHUNICHIRO , MAKINO TAKEHIKO , KITA TAKUSHI , MURATA KANAE
IPC分类号： H01J1/30 , H01J1/304 , H01L37/00
摘要： PROBLEM TO BE SOLVED: To provide a multilayer structure for emitting electrons, in which the work function is reduced beyond the conventional limit. SOLUTION: The multilayer structure has a surface layer comprising at least 2 atom layers of Sn on a metal substrate, where the work function is 1eV or smaller. The metal substrate is preferably made of a metal belonging to Group 1b in the periodic table of elements or its alloy. Cu is preferable the Group 1b metal. The surface layer is preferably formed on the plane (111) of the metal substrate, made of Cu or a Cu alloy. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种发射电子的多层结构，其中功函数降低到常规极限以上。解决方案：多层结构具有在金属基板上包含至少2个Sn原子层的表面层，其中功函数为1eV或更小。金属基材优选由元素周期表中的第1b族金属或其合金制成。 Cu优选为第1b族金属。表面层优选形成在金属基板的由Cu或Cu合金制成的平面（111）上。版权所有（C）2005，JPO＆NCIPI

4. 发明专利

JP2006255869A Nano thin film composite structure and manufacturing method thereof 审中-公开
标题翻译：纳米薄膜复合结构及其制造方法
公开(公告)号：JP2006255869A
公开(公告)日：2006-09-28
申请号：JP2005080646
申请日：2005-03-18
申请人： Nagoya Institute Of Technology , 国立大学法人名古屋工業大学
发明人： TANAKA SHUNICHIRO , MIWA HIROTAKA , TAKIOTO ATSUSHI
IPC分类号： B82B1/00 , B82B3/00
摘要： PROBLEM TO BE SOLVED: To provide a nano thin film composite structure formed on a substrate by ultrafine particles, having a new structure not obtained in the past.
SOLUTION: In the state where masks formed of target material provided with predetermined slits are disposed at a distance ranging from 10 μm to 1 mm, high energy beams are radiated to the inner walls of the slits in the mask from the oblique direction, thereby separating the ultrafine particles formed of component atoms or component molecules of the mask. The separated ultrafine particles are caused to adhere to a part outside of parts corresponding to the slits of the mask in the substrate, thereby forming a nano thin film part, and simultaneously caused to adhere to the parts corresponding to the slits of the mask in the substrate, thereby forming an accumulated film part mainly composed of ultrafine particles larger than the ultrafine particles forming the nano thin film part and having a larger thickness than the nano thin film part. Thus, an intended nano thin film composite structure is obtained.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供通过超细颗粒在基板上形成的纳米薄膜复合结构，具有过去未获得的新结构。解决方案：在设置有预定狭缝的目标材料形成的掩模设置在10μm至1mm的距离的状态下，高能束从倾斜方向辐射到掩模中的狭缝的内壁从而分离由成分原子或掩模的成分分子形成的超微粒子。使分离的超细颗粒粘附到与基板中的掩模的狭缝相对应的部分的外部的部分，从而形成纳米薄膜部分，并同时使其粘附到与掩模的狭缝相对应的部分从而形成主要由超过形成纳米薄膜部分的超微粒子的超微粒子构成并且具有比纳米薄膜部分更大的厚度的聚集膜部分。因此，获得了预期的纳米薄膜复合结构。版权所有（C）2006，JPO＆NCIPI

5. 发明专利

JP2006142394A Nano composite structure and its manufacturing method 有权
标题翻译：纳米复合结构及其制造方法
公开(公告)号：JP2006142394A
公开(公告)日：2006-06-08
申请号：JP2004331718
申请日：2004-11-16
申请人： Nagoya Institute Of Technology , 国立大学法人名古屋工業大学
发明人： TANAKA SHUNICHIRO , MIKI YOSHIKI
IPC分类号： B82B1/00 , B82B3/00
摘要： PROBLEM TO BE SOLVED: To provide a nano composite structure having a new structure expected for application to various uses.
SOLUTION: Second particulates consisting of constituent atoms or constituent molecules leaving from a target material are made exist on a substrate in a form of linking each other or a form of a nanometer film by irradiation of a target material placed on the substrate with a high-energy beam. After that, the simple substance of a first particulates or the aggregate consisting of a plurality of them is arranged on the group of the second particulates and the target material is irradiated with the high-energy beam again. By this process, the nano composite structure is obtained which is covered with a surface skin layer in a form of the second particulates smaller than the first particulates linking each other or in a form of a nanometer film constituted of the second particulates.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供具有预期用于各种用途的新结构的纳米复合结构。解决方案：由构成原子或从靶材料构成的成分分子组成的第二颗粒通过照射放置在基板上的靶材料而以彼此相互连接或形成纳米膜的形式存在于基板上，高能束。之后，将第一粒子的简单物质或由多个粒子组成的骨料排列在第二粒子群上，再次用高能束照射靶物质。通过该方法，获得纳米复合结构，其被第二颗粒形式的表面表层覆盖，第二颗粒小于彼此连接的第一颗粒或由第二颗粒构成的纳米膜的形式。版权所有（C）2006，JPO＆NCIPI

6. 发明专利

JP2005228935A Multilayer structure 审中-公开
标题翻译：多层结构
公开(公告)号：JP2005228935A
公开(公告)日：2005-08-25
申请号：JP2004036597
申请日：2004-02-13
申请人： Nagoya Institute Of Technology , Toyota Central Res & Dev Lab Inc , Toyota Motor Corp , トヨタ自動車株式会社 , 国立大学法人名古屋工業大学 , 株式会社豊田中央研究所
发明人： TANAKA SHUNICHIRO , MAKINO TAKEHIKO , KITA TAKUSHI , MURATA KANAE
IPC分类号： H01J1/304 , H01L37/00
摘要： PROBLEM TO BE SOLVED: To provide a multilayer structure for emitting electrons, in which the work function is reduced beyond the conventional limit. SOLUTION: The multilayer structure has an intermediate layer comprising at least one atom layer of an element selected from among a group of B, C, O, N, and Sn and a surface layer comprising one atom layer or two atom layers of Li or Na on the intermediate layer on a metal substrate, and the work function is 1eV or smaller. The intermediate layer preferably has a crystal structure made of B or Sn, or a random constituted of B, C, O, N, or Sn. The metal substrate is preferably made of a metal belonging to the Group 1b in the periodic table of elements or its alloy. Cu is preferable as the Group 1b metal. The intermediate layer is preferably formed on the plane (111) of the metal substrate of Cu or a Cu alloy. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种发射电子的多层结构，其中功函数降低到常规极限以上。解决方案：多层结构具有包含至少一个选自B，C，O，N和Sn的元素的原子层的中间层和包含一个原子层或两个原子层的表面层 Li或Na在金属基板上的中间层上，功函数为1eV以下。中间层优选具有由B或Sn制成的晶体结构，或由B，C，O，N或Sn构成的无规构成。金属基材优选由元素周期表中的第1b族金属或其合金制成。作为第1b族金属，优选Cu。中间层优选形成在Cu或Cu合金的金属基板的平面（111）上。版权所有（C）2005，JPO＆NCIPI

7. 发明专利

JP2007214196A Multilayer structure and its manufacturing method 审中-公开
标题翻译：多层结构及其制造方法
公开(公告)号：JP2007214196A
公开(公告)日：2007-08-23
申请号：JP2006029896
申请日：2006-02-07
申请人： Nagoya Institute Of Technology , Tohoku Univ , 国立大学法人名古屋工業大学 , 国立大学法人東北大学
发明人： TANAKA SHUNICHIRO , MAKINO TAKEHIKO , TAKIOTO ATSUSHI , AKAHORI MITSURU
IPC分类号： H01L37/00
摘要： PROBLEM TO BE SOLVED: To provide a multilayer structure and its manufacturing method capable of stably manufacturing at simple process. SOLUTION: On a substrate 1, the multilayer structure comprises a surface layer 3 wherein at least one atom layer of alkaline metal atom is laminated via a buried layer 2 wherein at least one atom layer of alkaline metal atom on the substrate is substituted, and its work function ϕ is set at 3 eV or less. As an alkaline metal atom, Rb can be used, and as the metal substrate 1, Cu, Ni or those alloys can be applied. After forming an adhesive layer where the compound particles of alkaline metal atom is finely dispersed on the metal substrate 1, the multilayer structure can be manufactured by irradiating high energy beam at this adhesion layer. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供能够以简单的工艺稳定制造的多层结构及其制造方法。解决方案：在基板1上，多层结构包括表面层3，其中碱金属原子的至少一个原子层经由掩埋层2层压，其中基底上的至少一个碱金属原子原子层被取代，其功函数φ设定为3eV以下。作为碱金属原子，可以使用Rb，作为金属基材1，可以使用Cu，Ni或这些合金。在金属基板1上形成了碱金属原子的复合粒子微细分散的粘合剂层之后，可以通过在该粘合层照射高能量束来制造多层结构体。版权所有（C）2007，JPO＆INPIT

8. 发明专利

JP2006142393A Micro nano-pattern structure and its manufacturing method 审中-公开
标题翻译：微纳米结构及其制造方法
公开(公告)号：JP2006142393A
公开(公告)日：2006-06-08
申请号：JP2004331716
申请日：2004-11-16
申请人： Nagoya Institute Of Technology , 国立大学法人名古屋工業大学
发明人： TANAKA SHUNICHIRO , MIKI YOSHIKI
IPC分类号： B82B1/00 , B82B3/00
摘要： PROBLEM TO BE SOLVED: To provide a micro nano-pattern structure constituted by forming hyper-fine patterns which are continuous fine patterns constituted on a substrate in an unconventional new form.
SOLUTION: The hyper-fine patterns are formed on the substrate by irradiating a high-energy beam on the substrate while changing an irradiating position against the substrate in correspondence with a specified shape of the hyper-fine patterns under a state of arranging a plurality of copper fine particles on the substrate and having nitrogen molecules exist on surfaces of these copper fine particles or in the neighborhood of them.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：解决的问题：提供通过以非常规的新形式形成作为在基板上构成的连续精细图案的超细图案而构成的微纳米图案结构。解决方案：通过在衬底上照射高能量光束，同时在排列状态下对应于超微细图形的指定形状改变相对于衬底的照射位置，在衬底上形成超精细图案在这些铜微粒的表面或其附近，存在在基板上具有氮分子的多个铜微粒。版权所有（C）2006，JPO＆NCIPI

9. 发明专利

JP2006261070A Sample fixing fixture 审中-公开
标题翻译：样品固定装置
公开(公告)号：JP2006261070A
公开(公告)日：2006-09-28
申请号：JP2005080647
申请日：2005-03-18
申请人： Nagoya Institute Of Technology , 国立大学法人名古屋工業大学
发明人： TANAKA SHUNICHIRO , MIWA HIROTAKA
IPC分类号： H01J37/20 , G01N1/28 , H01J37/30
摘要： PROBLEM TO BE SOLVED: To provide a sample fixing fixture enabling the irradiation of an ion beam at an irradiation angle larger than the upper limit of an irradiation angle peculiar to an ion milling device.
SOLUTION: This sample fixing fixture is used in the ion milling device capable of irradiating the ion beam to a reference plane at a prescribed irradiation angle, and composed of a sample holding member to hold the sample to which the ion beam is irradiated, a pedestal fixed to a sample holding stand in the ion milling device, and a support member to support the sample holding member on the pedestal by connecting the sample holding member with the pedestal. The sample holding member is mounted to the pedestal by the support member in an inclined state with respect to the reference plane.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供能够以大于离子铣削装置特有的照射角度的上限的照射角照射离子束的样品固定夹具。解决方案：该样品固定夹具用于能够以规定的照射角将离子束照射到基准面的离子研磨装置，并由样品保持部件构成，以保持照射离子束的样品固定在离子研磨装置中的样品保持架的基座，以及通过将试样保持构件与基座连接而将试样保持构件支撑在基座上的支撑构件。样品保持构件通过支撑构件相对于参考平面以倾斜状态安装到基座。版权所有（C）2006，JPO＆NCIPI

10. 发明专利

JP2006255870A Micro/nano layered structure and manufacturing method thereof 审中-公开
标题翻译： MICRO / NANO层状结构及其制造方法
公开(公告)号：JP2006255870A
公开(公告)日：2006-09-28
申请号：JP2005080651
申请日：2005-03-18
申请人： Nagoya Institute Of Technology , 国立大学法人名古屋工業大学
发明人： TANAKA SHUNICHIRO , MIWA HIROTAKA
IPC分类号： B82B1/00 , B82B3/00 , G21K5/04 , G21K5/08
摘要： PROBLEM TO BE SOLVED: To provide a micro/nano layered structure formed of ultrafine particles on a substrate, having a new structure not obtained in the past.
SOLUTION: In the state where masks 4 formed of target material provided with predetermined slits are disposed at a distance ranging from 5 to 500 nm, high energy beams 8 are radiated to the inner walls 6a of the slits 6 in the mask from the oblique direction, thereby separating the ultrafine particles 10 formed of component atoms or component molecules of the mask. The separated ultrafine particles are caused to adhere to parts corresponding to the slits of the mask in the substrate, thereby obtaining the micro/nano layered structure 12 having a form of projecting toward the upside of the substrate.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供在基板上由超细颗粒形成的微/纳层状结构，具有过去未获得的新结构。解决方案：在设置有预定狭缝的目标材料形成的掩模4设置在5至500nm的距离的状态下，高能量束8被辐射到掩模中的狭缝6的内壁6a，倾斜方向，从而分离由成分原子形成的超微粒10或掩模的成分分子。使分离的超细颗粒粘附到与基板中的掩模的狭缝相对应的部分，从而获得具有向基板的上侧突出的形式的微/纳米层状结构12。版权所有（C）2006，JPO＆NCIPI

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