专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JP2007214196A Multilayer structure and its manufacturing method 审中-公开
标题翻译：多层结构及其制造方法
公开(公告)号：JP2007214196A
公开(公告)日：2007-08-23
申请号：JP2006029896
申请日：2006-02-07
申请人： Nagoya Institute Of Technology , Tohoku Univ , 国立大学法人名古屋工業大学 , 国立大学法人東北大学
发明人： TANAKA SHUNICHIRO , MAKINO TAKEHIKO , TAKIOTO ATSUSHI , AKAHORI MITSURU
IPC分类号： H01L37/00
摘要： PROBLEM TO BE SOLVED: To provide a multilayer structure and its manufacturing method capable of stably manufacturing at simple process. SOLUTION: On a substrate 1, the multilayer structure comprises a surface layer 3 wherein at least one atom layer of alkaline metal atom is laminated via a buried layer 2 wherein at least one atom layer of alkaline metal atom on the substrate is substituted, and its work function ϕ is set at 3 eV or less. As an alkaline metal atom, Rb can be used, and as the metal substrate 1, Cu, Ni or those alloys can be applied. After forming an adhesive layer where the compound particles of alkaline metal atom is finely dispersed on the metal substrate 1, the multilayer structure can be manufactured by irradiating high energy beam at this adhesion layer. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供能够以简单的工艺稳定制造的多层结构及其制造方法。解决方案：在基板1上，多层结构包括表面层3，其中碱金属原子的至少一个原子层经由掩埋层2层压，其中基底上的至少一个碱金属原子原子层被取代，其功函数φ设定为3eV以下。作为碱金属原子，可以使用Rb，作为金属基材1，可以使用Cu，Ni或这些合金。在金属基板1上形成了碱金属原子的复合粒子微细分散的粘合剂层之后，可以通过在该粘合层照射高能量束来制造多层结构体。版权所有（C）2007，JPO＆INPIT

2. 发明专利

JP2006255869A Nano thin film composite structure and manufacturing method thereof 审中-公开
标题翻译：纳米薄膜复合结构及其制造方法
公开(公告)号：JP2006255869A
公开(公告)日：2006-09-28
申请号：JP2005080646
申请日：2005-03-18
申请人： Nagoya Institute Of Technology , 国立大学法人名古屋工業大学
发明人： TANAKA SHUNICHIRO , MIWA HIROTAKA , TAKIOTO ATSUSHI
IPC分类号： B82B1/00 , B82B3/00
摘要： PROBLEM TO BE SOLVED: To provide a nano thin film composite structure formed on a substrate by ultrafine particles, having a new structure not obtained in the past.
SOLUTION: In the state where masks formed of target material provided with predetermined slits are disposed at a distance ranging from 10 μm to 1 mm, high energy beams are radiated to the inner walls of the slits in the mask from the oblique direction, thereby separating the ultrafine particles formed of component atoms or component molecules of the mask. The separated ultrafine particles are caused to adhere to a part outside of parts corresponding to the slits of the mask in the substrate, thereby forming a nano thin film part, and simultaneously caused to adhere to the parts corresponding to the slits of the mask in the substrate, thereby forming an accumulated film part mainly composed of ultrafine particles larger than the ultrafine particles forming the nano thin film part and having a larger thickness than the nano thin film part. Thus, an intended nano thin film composite structure is obtained.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供通过超细颗粒在基板上形成的纳米薄膜复合结构，具有过去未获得的新结构。解决方案：在设置有预定狭缝的目标材料形成的掩模设置在10μm至1mm的距离的状态下，高能束从倾斜方向辐射到掩模中的狭缝的内壁从而分离由成分原子或掩模的成分分子形成的超微粒子。使分离的超细颗粒粘附到与基板中的掩模的狭缝相对应的部分的外部的部分，从而形成纳米薄膜部分，并同时使其粘附到与掩模的狭缝相对应的部分从而形成主要由超过形成纳米薄膜部分的超微粒子的超微粒子构成并且具有比纳米薄膜部分更大的厚度的聚集膜部分。因此，获得了预期的纳米薄膜复合结构。版权所有（C）2006，JPO＆NCIPI

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式