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1. 发明专利

JP2001324816A PATTERN FORMING METHOD AND EXPOSURE DEVICE 失效
公开(公告)号：JP2001324816A
公开(公告)日：2001-11-22
申请号：JP2000143485
申请日：2000-05-16
申请人： NIKON CORP , SUGIMURA HIROYUKI , TAKAI OSAMU
发明人： SUGIMURA HIROYUKI , TAKAI OSAMU , NAKAGIRI NOBUYUKI
IPC分类号： G01N1/10 , B81C1/00 , C12M1/00 , C12N15/09 , G01N35/00 , G01N37/00 , G03F7/20
摘要： PROBLEM TO BE SOLVED: To provide a method capable of rapidly forming patterns without damaging organic molecules. SOLUTION: The vacuum UV light from an excimer lamp 1 transmits a quartz window 3a transparent to the vacuum UV light and arrives at a mask 5 through a cavity part A. Since the cavity part A is filled with nitrogen, the vacuum UV light is hardly absorbed and arrives at the mask 5. The light transmitted through the mask irradiates a substrate 6 on which an organic molecular film is formed and excites the oxygen in the air existing between the mask 5 and the substrate 6, thereby generating oxygen atom radicals. The oxygen atom radicals react with the carbon and hydrogen of the organic molecules of the substrate 6 and change these to CO2 and H2O. The organic monomolecular film 7 of the segment irradiated with the vacuum UV light in the manner described above is decomposed to gas which is then exhausted and therefore nothing remains after etching and there is no need for cleaning in later process steps.

2. 发明专利

JPH10282125A CANTILEVER, SCANNING PROBE MICROSCOPE USING THE CANTILEVER, AND SAMPLE OBSERVATION METHOD 失效
公开(公告)号：JPH10282125A
公开(公告)日：1998-10-23
申请号：JP10262197
申请日：1997-04-04
申请人： NIKON CORP
发明人： NAKAGIRI NOBUYUKI , SUGIMURA HIROYUKI
IPC分类号： G01B21/30 , G01N37/00 , G01Q10/04 , G01Q60/24 , G01Q60/28 , G01Q60/38
摘要： PROBLEM TO BE SOLVED: To accurately find the interaction between a probe and the surface of a sample to be observed correspondingly to the distance between the probe and the surface of the sample while the occurrence of jump-in is prevented without giving any restriction to the sample. SOLUTION: A cantilever 1 is provided with a lever section 1b carrying a coil layer. When a prescribed current is made to flow to the coil 5 from a current supplying section 6, an external magnetic field is generated near a probe 1a. A deflection control section 11 gives a control signal to the coil layer of the lever section 1b so that the deflecting amount of the section 1b may become zero based on a deflection detecting signal indicating the deflecting amount of the section 1b from a signal processing circuit 10. A scanner control section 7 separates a sample 3 from the probe 1a of the cantilever 1 after gradually bringing the sample 3 nearer to the probe 1a by giving a drive signal to a tube type scanner 4. During the course of this process, a data preparing section 12 successively fetches a drive signal given to a scanner control section 5 from the scanner control section 7 and the control signal given to the coil layer from the deflection control section 11 by correlating the signals with each other.

3. 发明专利

JPH10189601A MANUFACTURE OF MICROSTRUCTURE 失效
公开(公告)号：JPH10189601A
公开(公告)日：1998-07-21
申请号：JP34746996
申请日：1996-12-26
申请人： KAGAKU GIJUTSU SHINKO JIGYODAN , NIKON CORP
发明人： SUGIMURA HIROYUKI , NAKAGIRI NOBUYUKI
IPC分类号： G01N27/49 , G01N27/416 , H01L21/3205
摘要： PROBLEM TO BE SOLVED: To provide a method of manufacturing a microstructure without using a photolithography and moreover, simply. SOLUTION: First fine grains are arranged on the surface of a substrate 10 into hexagonal closest-packed structures and after films are formed on the substrate 10 using these first fine grains as masks, the first fine grains are removed from the upper part of the substrate 10, whereby first film patterns 13 of the form of the gaps between the hexagonal densest structures are formed. Then, second fine grains 14 are attracted in the patterns 13 and after films 105 are formed on the substrate 10 using the grains 14 as masks, the grains 14 are removed from the upper part of the substrate 10, whereby second film patterns of a form encircling the patterns 13 are formed.

4. 发明专利

JPH1048223A SCANNING PROBE MICROSCOPE 失效
公开(公告)号：JPH1048223A
公开(公告)日：1998-02-20
申请号：JP20838996
申请日：1996-08-07
申请人： NIKON CORP
发明人： YAMAMOTO TAKUMA , NAKAGIRI NOBUYUKI , SUGIMURA HIROYUKI
IPC分类号： G01B21/30 , G01N37/00 , G01Q30/08 , G01Q30/14 , G01Q30/20 , G01Q60/46 , G01Q90/00
摘要： PROBLEM TO BE SOLVED: To obtain information of capacitance at a sufficient strength without damaging a probe and the surface of a sample by detecting the capacitance between the probe and the sample and forming a liquid film at the forward end of the probe. SOLUTION: A controller 25 operates a drive mechanism 16 to shift the forward end of a tube 14 to the vicinity of a sample 5 and commands a steam supply 18 to feed steam. Consequently, steam being fed from the steam supply 18 is blown from the forward end of the tube 14 to the surface of the sample 5. A capacitance sensor 4 detects variation of capacitance between a probe 31 and the sample 5. A lock-in amplifier 12 detects the amplitude of a signal having frequency same as that of a sine wave being applied to the sample 5 among output signals from the capacitance sensor 4 using a reference signal from an oscillator 11. Consequently, variation of capacitance between the sample 5 and the probe 31 due to variation in the thickness of a depletion layer formed in the sample 5 can be detected based on the voltage between the probe 31 and an electrode film.

5. 发明专利

JPH09204898A CANTILEVER AND PARTICLE BEAM ALIGNMENT ASSISTING MECHANISM USING THE SAME 失效
公开(公告)号：JPH09204898A
公开(公告)日：1997-08-05
申请号：JP1028796
申请日：1996-01-24
申请人： NIKON CORP
发明人： YAMAMOTO TAKUMA , SUZUKI YOSHIHIKO , SUGIMURA HIROYUKI
IPC分类号： G01B21/30 , G01N37/00 , G01Q20/04 , G01Q30/02 , G01Q60/38 , G01Q90/00 , H01J37/20 , H01J37/28 , H01J37/317
摘要： PROBLEM TO BE SOLVED: To provide an alignment support mechanism to assist the aligning operation for a particle beam with a sample without direct irradiation of the sample surface with particle beam. SOLUTION: An alignment support mechanism concerned is composed of a cantilever 11 equipped with an aligning mark, a piezo element 13 and drive mechanism 14 to drive the cantilever 11, and a secondary electron sensor 20 to sense secondary electrons generated from an object to be processed 15 when it is irradiated with electron beam emitted by an electron gun 18, whereby the shape features of the part to be aligned on the object 15 are acknowledged on the basis of the surface shape data obtained by the cantilever 11. Also the aligning mark 4 on the cantilever 11 is acknowledged using the secondary electron distribution data obtained by the electron sensor 20, and the part to be aligned is defined with the aid of the acquired control data of a condenser lens 19 at the time the acknowledgement took place and the control data of the piezo element 13 and drive mechanism 14.

6. 发明专利

JPH0321678A COATING COMPOSITION 失效
公开(公告)号：JPH0321678A
公开(公告)日：1991-01-30
申请号：JP15600889
申请日：1989-06-19
申请人： NIKON CORP
发明人： SUGIMURA HIROYUKI
IPC分类号： C09D7/12 , C09D183/00 , C09D183/02 , C09D183/04 , C09D201/00 , G02B1/10 , G02B1/11 , G02B1/14 , G02B1/16
摘要： PURPOSE:To obtain the title composition free from unevenness of reflecting color when reflection preventing film is formed on rigid coating film formed by applying to plastic glass lens by dispersing diamond fine granules into a coating liquid containing a coating film-forming ingredient. CONSTITUTION:The aimed composition obtained by dispersing diamond fine granules (preferably having 10-100nm granule size) into a coating liquid containing a coating film-forming ingredient (preferably organosilicon compound or hydrolysate thereof) and further as necessary adding a curing catalyst (preferably aluminum chelate compound) thereto. The coating film has excellent scratch resistance, surface hardness, abrasion resistance, flexibility, transparency, heat resistance and antistatic properties, large degree of surface reflection and good adhesion with reflection preventing film, metallized film, etc., and slippery characteristics of coating film surface.

7. 发明专利

JPH1038916A PROBE DEVICE AND ELECTRICALLY CONNECTING METHOD FOR MINUTE REGION 失效
公开(公告)号：JPH1038916A
公开(公告)日：1998-02-13
申请号：JP21318796
申请日：1996-07-23
申请人： NIKON CORP
发明人： NAKAGIRI NOBUYUKI , SUGIMURA HIROYUKI , YAMAMOTO TAKUMA
IPC分类号： G01R1/06 , B81B3/00 , G01N37/00 , G01Q20/04 , G01Q60/38 , G01Q70/16 , G01R31/28 , H01L21/66 , H01R11/18
摘要： PROBLEM TO BE SOLVED: To prevent the damage of a substance to be connected. SOLUTION: A prove device has a cantilever 2, and makes electric connection by contact to a minute region of a substance 1 to be connected. The cantilever 2 has a lever section 2b having a probe 2a in the tip-side region, and a supporting substance 2c for supporting the lever section 2b. The tip of the probe 2a has conductivity. The cantilever 2 has a conductive path reaching the supporting substance 2c side from the tip of the probe 2a. If the tip of the probe 2a comes in contact with the substance 1 to be connected to make an electric connection to the substance 1 to be connected, the lever section 2b bends.

8. 发明专利

JPH1026628A CAPILLARY AND MANUFACTURE THEREOF AND SCANNING NEAR-FIELD MICROSCOPE 失效
公开(公告)号：JPH1026628A
公开(公告)日：1998-01-27
申请号：JP18083596
申请日：1996-07-10
申请人： NIKON CORP
发明人： OKIGUCHI KEIKO , SUGIMURA HIROYUKI
IPC分类号： G01B11/30 , G01N37/00 , G01Q60/22
摘要： PROBLEM TO BE SOLVED: To achieve the perfect flare stop with the intended aperture being provided excellently by forming a metal film on the inner surface of the pit part at least in a capillary, which is formed in the taper shape, whose end part is in the tapered shape, and wherein the main part is formed in a tubular shape. SOLUTION: A probe 50 of a scanning near-field microscope is formed by heating a hollow glass tube and pulling the tube in the axial direction. At this time, the aperture of an opening 50A of a tip part 50B is formed as the intended aperture R0. On an inner wall 50E of the probe 50, a metal film 51 having a film thickness (d) more than the specified value is formed. Furthermore, the metal film 51 is formed of silver, aluminum and the like having the high reflectivity in the wavelength region when the light illuminated from a light source is in the visible light region. When the light irradiated from the light source is out of the infrared region, the film 51 is formed of gold, copper and the like having the high reflecticity in the wavelength region.

9. 发明专利

JPH08262042A MICROELECTRODE, PROBE AND MANUFACTURE OF THE MICROELECTRODE 失效
公开(公告)号：JPH08262042A
公开(公告)日：1996-10-11
申请号：JP6103795
申请日：1995-03-20
申请人： NIKON CORP
发明人： SUGIMURA HIROYUKI , YAMAMOTO TAKUMA , NAKAGIRI NOBUYUKI
IPC分类号： G01R1/067 , G01N37/00 , G01Q60/00 , G01Q60/60 , G01Q70/08 , G01Q70/16
摘要： PURPOSE: To obtain a microelectrode of a microscopic scale by covering the surface of a silicon substrate with an electrically insulating film having an opening part in a microscopic area to form a conductive layer at the opening part. CONSTITUTION: A resist pattern 12 is formed on the surface of a silicon substrate 11 and with this pattern as mask, silicon is etched in an anisotropic manner with a 25% tetramethyl ammonium hydride aqueous solution to from a pyramid-shaped chip 13 with a flat tip thereof. The surface of the chip 13 is oxidized thermally to form a thermally oxidized film 14 and a resist pattern 15 is formed having a fine opening at the tip thereof. With this pattern as mask, the thermally oxidized film 14 is etched by a hydrofluoric aqueous solution to form an opening on the oxide film 14. The surface of the silicon opening part is hydrogen terminated by this hydrofluoric acid treatment. The silicon surface thus hydrogen terminated is kept from being oxidized for several hour to maintain electric conductivity and this hydrogen termination enables carrying out of a surface treatment in the subsequent process with sufficient lead time.

10. 发明专利

JPH08262038A MICROOPENING PROBE AND MANUFACTURE OF MICROOPENING PROBE 失效
公开(公告)号：JPH08262038A
公开(公告)日：1996-10-11
申请号：JP6103295
申请日：1995-03-20
申请人： NIKON CORP
发明人： SUGIMURA HIROYUKI , YAMAMOTO TAKUMA , NAKAGIRI NOBUYUKI
IPC分类号： G01B9/04 , G01N37/00 , G01Q60/22
摘要： PURPOSE: To obtain a microopening probe in which the shape of a microopening can be formed with good accuracy by a method wherein a part of a light-shielding layer formed on a transparent substrate is oxidized and a light transmission region is formed. CONSTITUTION: A titanium film 2 is vapor-deposited, by vacuum evaporation, on the surface of a quartz glass transparent substrate 1, the film 2 is coated with a resist 4, and an opening part having a diameter of about 200nm is formed in the resist. The substrate 1 is mounted on, and attached to, a holder 8 which has been connected to a power supply 7, and the film 2 and the power supply 7 are connected electrically. Then, a counter electrode 6 which is connected to the power supply 7 and the opening part in the resist are arranged so as to be immersed in a reaction solution. Then, a DC voltage is applied across the counter electrode 6 and the film 2, an anodic oxidation operation is performed, only the film 2 which is situated in the opening part is made transparent with reference to titanium oxide 3, and a probe which comprises a micoopening composed of the titanium 3 is manufactured. At this time, the film 2 other than the opening part does not come into contact with the solution 5 thanks to the resist 4, and it is not oxidized. When a part of a metal material which shields light is oxidized in this manner, an oxidized region is used as a light transmission region, and the microopening which is stable and whose accuracy is high can be formed in the probe.

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