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1. 发明专利

JP2004014710A Method for measurement, method for adjusting optical system to be examined, method for projection exposure, imaging apparatus, measuring instrument, adjusting adjustment of optical system to be examined, projection exposure apparatus, and method for manufacturing imaging apparatus 审中-公开
标题翻译：用于测量的方法，用于调整要检查的光学系统的方法，投影曝光方法，成像装置，测量仪器，调整待测光学系统的调整，投影曝光装置和制造成像装置的方法
公开(公告)号：JP2004014710A
公开(公告)日：2004-01-15
申请号：JP2002164634
申请日：2002-06-05
申请人： Nikon Corp , 株式会社ニコン
发明人： NAKAGIRI NOBUYUKI
IPC分类号： G01M11/02 , G03F7/20 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide an imaging apparatus, etc. which is less deteriorated even when used for a long period as for the imaging apparatus such as a CCD, a method for manufacturing the same, a method for measurement using the imaging apparatus, a method for adjusting an optical system to be examined, a method for projection exposure, a measuring instrument, an adjusting apparatus for the optical system to be examined, and a projection exposure apparatus.
SOLUTION: In order to suppress electrostatic charges on the photodetecting surface of the imaging apparatus, which causes the deterioration of the imaging apparatus, a first-conductive semiconductor base body, a first area of second-conductivity, a conductive second area and a conductive third area formed between the first area and the second area for regulating moving of the electric charges from the second area to the first area are laminated on a substrate to absorb measurement light in the first area for measurement and to absorb non-measurement light having a wavelength different from that of the measurement light in the second area for suppressing the electro static charge.
COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：为了提供即使长时间使用如CCD等成像装置而劣化的成像装置等，其制造方法，使用该方法的测定方法成像装置，用于调整被检查的光学系统的方法，投影曝光方法，测量仪器，用于待检查的光学系统的调节装置和投影曝光装置。解决方案：为了抑制成像装置的光检测表面的静电电荷，导致成像装置的劣化，第一导电半导体基体，第二导电的第一区域，导电第二区域和在第一区域和第二区域之间形成的用于调节电荷从第二区域移动到第一区域的导电第三区域被层叠在基板上以吸收第一测量区域中的测量光并吸收非测量光具有与用于抑制静电荷的第二区域中的测量光的波长不同的波长。版权所有（C）2004，JPO

2. 发明专利

JP2000097825A SPRING CHARACTERISTIC MEASUREMENT METHOD AND ITS DEVICE 失效
公开(公告)号：JP2000097825A
公开(公告)日：2000-04-07
申请号：JP28891298
申请日：1998-09-24
申请人： NIKON CORP
发明人： NAKAGIRI NOBUYUKI , SUGIZAKI KATSUMI
IPC分类号： G01N3/00 , G01N37/00 , G01Q60/38 , G01N13/16
摘要： PROBLEM TO BE SOLVED: To easily measure a spring constant of a minute plane spring-shaped member having a probe such as a cantilever or the like, by detecting displacement of the plate spring-shaped member having to probe brought into contact with a standard sample having a known spring constant, after moving the member in the vertical direction relative to the standard sample surface. SOLUTION: Alignment between a cantilever 1 and a standard sample 14 is carried out, so that the XY position of a probe 1a placed on the head of the cantilever 1 is positioned near the center of a self-standing membrane 21a of the standard sample 14 having a known spring constant. Thereafter, the standard sample 14 is moved in the Z-direction by a driving device 15, such as a piezoelectric actuator or the like, and the displacement caused by deflection of a plate spring-shaped member 1b is detected by a laser beam source 12 and PSD 13 by using an optical lever method. A data processing device 17 measures a resultant spring constant by the standard sample 14 and the plate spring-shaped member 1b from the detected displacement change, and calculates the spring constant of the plate spring-shaped member 1b from the obtained spring constant and the spring constant of the standard sample 14, and outputs the result. A display device 18 displays the output data.

3. 发明专利

JPH10111301A CANTILEVER HOLDER AND SCANNING PROBE MICROSCOPE USING THE SAME 失效
公开(公告)号：JPH10111301A
公开(公告)日：1998-04-28
申请号：JP26280496
申请日：1996-10-03
申请人： NIKON CORP
发明人： YAMAMOTO TAKUMA , SUZUKI YOSHIHIKO , NAKAGIRI NOBUYUKI
IPC分类号： G01B21/30 , G01N37/00 , G01Q60/00 , G01Q60/46 , G01Q70/04
摘要： PROBLEM TO BE SOLVED: To provide a scanning probe microscope provided with a cantilever holder, reducing a stray capacity in the cantilever holder and facilitating electrical bonding between a cantilever and a measuring circuit. SOLUTION: A scanning probe microscope has a cantilever 1 with metallic patterns 202, 203, a cantilever holder 2 for holding the cantilever 1, a sample holder for holding a sample, a space holding means for keeping a space between the sample and the cantilever 1 constant, and an electric circuit for processing electric signals of the metallic patterns of the cantilever 1. The cantilever holder 2 is provided with a pad part and a connecting terminal part 24 on a board 21. The pad part is connected to the wiring pattern 203 of the cantilever 1 by bonding or the like, and the connecting terminal part 24 is connected to an external electric circuit. With such constitution, floating capacity between the sample and the cantilever holder 2 can be reduced, and electrical bonding is facilitated.

4. 发明专利

JPH1030997A METHOD AND APPARATUS FOR MEASUREMENT OF LIGHT ABSORPTION DISTRIBUTION 失效
公开(公告)号：JPH1030997A
公开(公告)日：1998-02-03
申请号：JP18738196
申请日：1996-07-17
申请人： NIKON CORP
发明人： SUGIMURA HIROYUKI , NAKAGIRI NOBUYUKI , YAMAMOTO TAKUMA
IPC分类号： G01J3/42 , G01J5/48 , G01N21/00 , G01N25/20 , G01Q60/24 , G01Q60/58
摘要： PROBLEM TO BE SOLVED: To obtain a method and an apparatus by which the light absorption efficiency of a sample and the spatial distribution of a light absorption spectrum or the like can be measured with a spatial resolution higher than the wavelength of irradiation light by measuring change in the temperature of the sample due to the absorption of light locally with a temperature measuring means. SOLUTION: Light from a light source 1 is passed through a spectroscope 2 in such a way that the rear of a light-transmitting thin film 4 supporting a sample 5 is irradiated. A contact 7 at a thermocouple is installed at the probe tip of a cantilever 6 at an atomic force microscope. The light with which the rear of the thin film 4 is irradiated is transmitted through the thin film 4 so as to be absorbed by the sample 5, and a temperature in a place in which the sample 5 exists out of the surface of the thin film 4 is raised locally. The temperature is measured by scanning the contact 7 at the thermocouple, and the distribution of the existence of the sample 5 on the face of the thin film 4, i.e., the distribution of the light absorption efficiency of the sample, is measured. In addition, by using the spectroscope 2, the wavelength of the irradiation light for the sample 5 is scanned, and the absorption spectrum of the sample 5 can be measured on the basis of the temperature change due to the change of wavelength.

5. 发明专利

JPH1026627A SCANNING PROBE MICROSCOPE 失效
公开(公告)号：JPH1026627A
公开(公告)日：1998-01-27
申请号：JP18339096
申请日：1996-07-12
申请人： NIKON CORP
发明人： YAMAMOTO TAKUMA , NAKAGIRI NOBUYUKI , SUGIMURA HIROYUKI
IPC分类号： G01B7/34 , G01B21/30 , G01N37/00 , G01Q60/32 , G01Q60/46 , G01Q90/00
摘要： PROBLEM TO BE SOLVED: To provide a scanning probe microscope by which the pattern of a conductor on the surface or at the inside of a sample can be detected with high spatial resolution. SOLUTION: An AC-voltage signal is applied to a sample 4 from an AC- voltage application means 11. In addition, a cantilever 1 is vibrated near a resonance frequency by a vibration means 3 toward the sample 4. Since the cantilever is vibrated near the resonance frequency, a capacitance across the tip of the cantilever 1 and the sample 4 is changed by a vibration frequency, and the amplitude of a high-frequency voltage transmitted to the cantilever 1 is changed at a frequency which is equal to the vibration frequency. Then, the high-frequency voltage transmitted from the sample 4 to the cantilever 1 is detected by a detection means 8, and a frequency component which is equal to the vibration frequency of the cantilever 1 out of the amplitude signal of the detected high-frequency voltage is detected.

6. 发明专利

JPH09304411A CANTILEVER, CANTILEVER LINK BODY, AND MANUFACTURE THEREOF 失效
公开(公告)号：JPH09304411A
公开(公告)日：1997-11-28
申请号：JP15004696
申请日：1996-05-20
申请人： NIKON CORP
发明人： NAKAGIRI NOBUYUKI , SUZUKI YOSHIHIKO , SUGIMURA HIROYUKI
IPC分类号： G01B7/34 , G01B21/30 , G01N37/00 , G01Q60/38 , G01Q70/16
摘要： PROBLEM TO BE SOLVED: To prevent a trouble caused in the separation into individual cantilevers. SOLUTION: The cantilever 11 is provided with a lever part 13 having a probe 12 on the tip side thereof and a support body 14 supporting the lever part 13. A cantilever link body is made of a plurality of cantilevers 11 separably linked freely between adjacent support bodies 14. A crosslinking is made by an aluminum film (foil) 19 cuttable with a blade between the support bodies 14.

7. 发明专利

JPH0915137A FRICTIONAL FORCE MEASURING APPARATUS AND SCANNING FRICTIONAL FORCE MICROSCOPE 失效
公开(公告)号：JPH0915137A
公开(公告)日：1997-01-17
申请号：JP18978995
申请日：1995-07-03
申请人： NIKON CORP
发明人： NAKAGIRI NOBUYUKI , SUGIMURA HIROYUKI , YAMAMOTO TAKUMA
IPC分类号： G01L5/00 , G01B21/30 , G01N19/02 , G01N37/00 , G01Q20/02 , G01Q60/24 , G01Q60/26 , G01Q60/34
摘要： PROBLEM TO BE SOLVED: To measure various frictional forces acting between a probe and the surface of a sample without causing any damage on the surface of sample. SOLUTION: In a frictional force measuring apparatus and a scanning frictional force microscope, a probe 3 provided on a cantilever 1 is brought into contact with a sample surface 11 at a predetermined contact pressure and separated therefrom. When the probe 3 is touching the sample surface 11, the probe 3 and sample 11 are displaced or oscillated laterally along the sample surface. Displacement of the cantilever 1 caused by the interaction of the probe 3 and sample 11 is measured and a signal indicative of the frictional force between the probe and sample is generated therefrom. Subsequently, the probe is shifted sequentially to a plurality of measuring points on the sample surface and the frictional force is determined at each measuring point and the distribution thereof is imaged as required. A laser light source 21 for irradiating the surface ∥of cantilever 1 with a light beam and a quadripartite light receiving element 13 for receiving the reflected light are also provided.

8. 发明专利

JPH095373A METHOD AND EQUIPMENT FOR LOCALLY EVALUATING THIN FILM 失效
公开(公告)号：JPH095373A
公开(公告)日：1997-01-10
申请号：JP15623095
申请日：1995-06-22
申请人： NIKON CORP
发明人： NAKAGIRI NOBUYUKI , SUGIMURA HIROYUKI , SUZUKI YOSHIHIKO
IPC分类号： G01R27/26 , G01N27/22 , G01N27/60 , G01Q60/46 , H01L21/66
摘要： PURPOSE: To obtain an equipment for locally evaluating an insulation film by providing a voltage source for applying a voltage between a substrate and a probe, and means for measuring the capacitance between the substrate and probe. CONSTITUTION: The surface of an insulator film 10 formed on a semiconductor substrate 11 is touched, with a predetermined contact pressure, by a probe 9 provided at the forward end of a cantilever 8. Voltages generated from AC an DC voltage generators 18, 19 are applied between the cantilever 8 and a conductive layer formed on the probe 9 through the substrate 11 and the ground. Output signal from a capacity sensor 16 (capacitance detection means) is fed to a controller 20. The substrate 11 is moved two-dimensionally by means of a piezoelectric actuator such that the probe 9 and the insulation film 10 move relatively. Consequently, the capacitance between the probe 9 and substrate 11 and the variation thereof can be measured in a limited area corresponding to the radius at the tip of the probe 9. Local evaluation of the insulator film 10 can be made arbitrarily based on the capacitance thus measured.

9. 发明专利

JPH07181152A CAMERA APPARATUS 失效
公开(公告)号：JPH07181152A
公开(公告)日：1995-07-21
申请号：JP34537293
申请日：1993-12-21
申请人： NIKON CORP
发明人： YAMAMOTO TAKUMA , NAKAGIRI NOBUYUKI
IPC分类号： G01N23/227
摘要： PURPOSE:To achieve higher resolutions of a camera apparatus by scanning a target for a silicon vidicon with a probe to extract image information. CONSTITUTION:A target 1 for a silicon vidicon has a plurality of fine pn junction parts 1b and 1c formed on a silicon semiconductor substrate to generate a photoelectric effect. A probe 3 is arranged possibly facing the target 1. a bias power source means 6 to apply a bias voltage to the fine pn junction parts 1b nd 1c and a scanning means 8 to move the probe 2 and the target 1 relatively. A means 5 is provided to detect and output a current flowing passing through the probe 2 and the target 1 in response to the scanning by the scanning means 8.

10. 发明专利

JP2001324816A PATTERN FORMING METHOD AND EXPOSURE DEVICE 失效
公开(公告)号：JP2001324816A
公开(公告)日：2001-11-22
申请号：JP2000143485
申请日：2000-05-16
申请人： NIKON CORP , SUGIMURA HIROYUKI , TAKAI OSAMU
发明人： SUGIMURA HIROYUKI , TAKAI OSAMU , NAKAGIRI NOBUYUKI
IPC分类号： G01N1/10 , B81C1/00 , C12M1/00 , C12N15/09 , G01N35/00 , G01N37/00 , G03F7/20
摘要： PROBLEM TO BE SOLVED: To provide a method capable of rapidly forming patterns without damaging organic molecules. SOLUTION: The vacuum UV light from an excimer lamp 1 transmits a quartz window 3a transparent to the vacuum UV light and arrives at a mask 5 through a cavity part A. Since the cavity part A is filled with nitrogen, the vacuum UV light is hardly absorbed and arrives at the mask 5. The light transmitted through the mask irradiates a substrate 6 on which an organic molecular film is formed and excites the oxygen in the air existing between the mask 5 and the substrate 6, thereby generating oxygen atom radicals. The oxygen atom radicals react with the carbon and hydrogen of the organic molecules of the substrate 6 and change these to CO2 and H2O. The organic monomolecular film 7 of the segment irradiated with the vacuum UV light in the manner described above is decomposed to gas which is then exhausted and therefore nothing remains after etching and there is no need for cleaning in later process steps.

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