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    • 5. 发明专利
    • Vacuum deposition method and vacuum deposition apparatus
    • 真空沉积方法和真空沉积装置
    • JP2004156069A
    • 2004-06-03
    • JP2002320214
    • 2002-11-01
    • Matsushita Electric Ind Co Ltd松下電器産業株式会社
    • SATO NOBUOSHINOHARA AKIHITOYASUDA OSAMUISHIDA MIKIOADACHI HIROSHI
    • C23C14/56G11B5/85
    • PROBLEM TO BE SOLVED: To provide a vacuum deposition method and a vacuum deposition apparatus which enable a vapor deposition film of high quality to be deposited even on a thin film-shaped support at high speed without causing the melting of the support by heat.
      SOLUTION: In the vacuum deposition method, the film-shaped support is moved and transported by an intermediate roll while feeding the same to the vicinity of a vapor deposition source by a feed roll, and, an evaporation source is heated and melted, and is evaporated toward the film-shaped support to perform vapor deposition, and further, the vapor-deposited film-shaped support is wound by a winding roll while sticking the same to a cooling means, and performing cooling. In the vacuum deposition method, the intermediate roll and the winding roll are insulated from the film-shaped support.
      COPYRIGHT: (C)2004,JPO
    • 要解决的问题:提供一种真空沉积方法和真空沉积装置,其能够使高质量的气相沉积膜甚至在薄膜状载体上高速沉积,而不会引起支撑体的熔化 热。 解决方案:在真空沉积方法中,通过中间辊将膜状载体移动并输送,同时通过进料辊将其送入气相沉积源附近,并将蒸发源加热熔化 并向薄膜状支持体蒸发,进行蒸镀,另外,将蒸镀膜状支持体卷绕在卷绕辊上,同时将其粘贴在冷却机构上,进行冷却。 在真空沉积方法中,中间辊和卷绕辊与膜状支撑体绝缘。 版权所有(C)2004,JPO