专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JP2003285216A Elevator guide-rail machining machine and method 有权
标题翻译：电梯导轨加工机及方法
公开(公告)号：JP2003285216A
公开(公告)日：2003-10-07
申请号：JP2002088619
申请日：2002-03-27
申请人： Hitachi Ltd , Mitsubishi Electric Corp , 三菱電機株式会社 , 株式会社日立製作所
发明人： FUKUNAKA TOSHIAKI , NAKADA MASASHI , OGAWA YOSHIO , KAJITA NAOKI , TERADA KAZUO , OTSUKI HIROYUKI , YAMADA MITSURU , SUGANO ATSUSHI , KAZAMA SHIGERU , ONOZUKA HIDEAKI
IPC分类号： B23Q3/15 , B23C3/00 , B23C5/12 , B66B7/02
摘要： PROBLEM TO BE SOLVED: To provide an elevator guide-rail machining machine capable of increasing productivity by shortening a working time and capable of improving working precision and provide a method of working.
SOLUTION: The elevator guide-rail machining machine cuts both sides 32a, 32b and a top surface 32c of a vertical section 32 in a long elevator guide- rail 30 in a satin longitudinal direction with regard to a cross-sectional reversed T-shape comprising a planar base 31 and the planar vertical section 32 which is vertically erected on an almost central line of the base 31. The machine is provided with a feed base 1 to which the base 31 of the guide-rail 30 is fixed in place and which is horizontally moved in a longitudinal direction of the guide-rail 30 and a rotary cutting tool 2 which simultaneously cuts both sides 32a, 32b and the top surface 32c of the vertical section 32 in the guide-rail 30.
COPYRIGHT: (C)2004,JPO
摘要翻译：解决的问题：提供一种能够通过缩短工作时间来提高生产率并且能够提高工作精度并提供工作方法的电梯导轨加工机。解决方案：升降机导轨加工机在长电梯导轨30的两侧侧面32a，32b和垂直部分32的上表面32c相对于横截面反向的T 形状，其包括平面基部31和垂直竖立在基部31的几乎中心线上的平面垂直部分32.机器设置有馈送基座1，导轨30的基部31固定到馈电基座1 并且在导轨30的纵向方向上水平移动;以及旋转切割工具2，其同时切割导轨30中的垂直部分32的两侧32a，32b和顶表面32c。版权所有（C）2004，JPO

2. 发明专利

JPH0470945A INPUT/OUTPUT CONTROLLER 失效
公开(公告)号：JPH0470945A
公开(公告)日：1992-03-05
申请号：JP17532790
申请日：1990-07-04
申请人： MITSUBISHI ELECTRIC CORP
发明人： YAMADA MITSURU , TERAMOTO AKIYOSHI
IPC分类号： G06F13/12 , G06F13/00
摘要： PURPOSE:To carry out the test of a control part of an input/output controller where many function confirming/adjusting items of software are included in a safe environment free from exposure to the radioactive rays by separating the control part from an input/output part of the input/output controller and connecting both parts to each other via a long distance connectable bus. CONSTITUTION:An output command is transmitted to a control part 7 through a host interface 9d. At the part 7 the contents of the output command are converted into the data of a bus form corresponding to an input/output part 8 and transferred to an optical link function 71 of the part 7. The function 71 converts the received data of a bus form into the optical signals and outputs them to an optical cable 9e. These optical signals transmitted via the cable 9e reach an optical function 81 of the part 8 and are restored again into the data of a bus form from the optical signals. These restored data are outputted to the peripheral devices 2 and 3 from the semiconductor elements corresponding to the devices 2 and 3 of the part 8 via the device interfaces 9a and 9b. Thus the part 7 where many function confirming/adjusting items of software are included is set in an environment free from exposure to the radioactive rays.

3. 发明专利

JPH0332113B2 失效
公开(公告)号：JPH0332113B2
公开(公告)日：1991-05-09
申请号：JP26504885
申请日：1985-11-27
申请人： MITSUBISHI ELECTRIC CORP
发明人： YAMADA MITSURU , SHIROCHI SHINJI , HOSOKAWA YASUHIKO
IPC分类号： G06G7/18

4. 发明专利

JPS62256435A MANUFACTURE OF SEMICONDUCTOR DEVICE 失效
公开(公告)号：JPS62256435A
公开(公告)日：1987-11-09
申请号：JP10060486
申请日：1986-04-28
申请人： MITSUBISHI ELECTRIC CORP
发明人： TADA KENICHI , YAMADA MITSURU , NIIRU SHIYANKI
IPC分类号： H01L21/302 , H01L21/3065
摘要： PURPOSE:To eliminate the difference in film thickness between a stepped part and a flat part on a semiconductor substrate and prevent the etching remnant from remaining on the stepped part at the time of just etching by forming etching-resistant films with a suitable thickness on the whole surface of the semiconductor substrate except the stepped part. CONSTITUTION:After a polycrystalline silicon film 2 and a molybdenum silicide film 3 are successively formed on a silicon substrate 1, for instance thin photoresist is applied to the flat parts of the silicon substrate 1 to form etching- resistant films 6 which expose the stepped part of the silicon substrate 1 and, after that, a resist pattern 4 is formed on the required part. After the etching- resistant films 6 are removed by anisotropic plasma etching except the part under the resist pattern 4, the molybdenum silicide film 3 on the stepped part of the silicon substrate l only is removed by etching. Then the molybdenum silicide film 3 and the polycrystalline silicon film 2 are etched by RIE. With this constitution, etching which does not leave remnant at the time of just etching of the required pattern can be realized.

5. 发明专利

JPS6254932A TESTING OF SEMICONDUCTOR WAFER 失效
公开(公告)号：JPS6254932A
公开(公告)日：1987-03-10
申请号：JP19641185
申请日：1985-09-03
申请人： MITSUBISHI ELECTRIC CORP
发明人： YAMADA MITSURU
IPC分类号： H01L21/66
摘要： PURPOSE:To improve throughput and productivity by moving down a probe in contact only with a complete chip of a wafer to test it, skipping a defective circuit chip to omit its test, and putting an improper mark to increase the processing capacity. CONSTITUTION:The defective circuit pattern 4 of a photomask 1 obtained by a photomask defect inspecting unit 11 is replaced at a position of a circuit pattern unit with an X-Y coordinates, the information is input to the input unit 14 of a minicomputer 13, replaced by the minicomputer 13 with a chip unit in the X-Y coordinates of a wafer 6 to be tested, recorded in recording means 15 such as a magnetic disk as position information of a defective circuit chip 8, filed and stored. The probe 18 of a wafer testing unit 16 is not moved down to the chip 8, an X-Y table 17 is skipped at the position of the chip 8, an improper mark is put by an improper mark printing needle 19 during the period, the probe 18 is moved down in contact only with a complete chip to be tested.

6. 发明专利

JPS5437579A CHROME PLATE 失效
公开(公告)号：JPS5437579A
公开(公告)日：1979-03-20
申请号：JP10447577
申请日：1977-08-30
申请人： MITSUBISHI ELECTRIC CORP
发明人： NISHIOKA KIYUUSAKU , YAMAZAKI TERUHIKO , UNO JIYUN , HOSHIKA HARUYUKI , KANEDAKI YUKIMICHI , YAMADA MITSURU
IPC分类号： H01L21/302 , G03F1/00 , G03F1/58 , H01L21/027 , H01L21/3065
摘要： PURPOSE:To manufacture a high-precision mask by setting the density of O in CrOx to 0 to 0.01 or 0.1 to 2.5 at an atom-number ratio of O to Cr and by providing a thin film of no oxide to the interface between a Cr film surface and transparent substrate at need.

7. 发明专利

JP2003300130A System for processing terminal part of guide rail for elevator 有权
标题翻译：用于电梯的导轨终端处理系统
公开(公告)号：JP2003300130A
公开(公告)日：2003-10-21
申请号：JP2002107541
申请日：2002-04-10
申请人： Hitachi Ltd , Mitsubishi Electric Corp , 三菱電機株式会社 , 株式会社日立製作所
发明人： TERADA KAZUO , NAKADA MASASHI , OGAWA YOSHIO , KAJITA NAOKI , FUKUNAKA TOSHIAKI , OTSUKI HIROYUKI , YAMADA MITSURU , SUGANO ATSUSHI , KAZAMA SHIGERU , ONOZUKA HIDEAKI
IPC分类号： B23Q7/04 , B23P23/06 , B23Q41/02 , B66B7/02
摘要： PROBLEM TO BE SOLVED: To obtain a system for processing a terminal part of a guide rail for an elevator for improving workability of each processing machine, narrowing an occupied floor area of a system, and improving processing precision.
SOLUTION: This system for processing the terminal part of the guide rail for the elevator comprises a plurality of processing machines 1-4 for processing a series of processing portions of the terminal part of the guide rail 50 for the elevator which is long in a longitudinal direction; and a transfer device 5 for raising and moving the guide rail 50 between a plurality of the processing machines 1-4. A transfer direction of the transfer device 5 is perpendicular to the longitudinal direction of the guide rail 50.
COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：为了获得一种用于处理电梯的导轨的端子部分以提高每个加工机的可操作性的系统，缩小系统的占用面积并提高加工精度。解决方案：用于加工用于电梯的导轨的端子部分的系统包括多个处理机器1-4，用于处理长的用于电梯的导轨50的端子部分的一系列处理部分沿纵向; 以及用于在多个处理机1-4之间升高和移动导轨50的传送装置5。传送装置5的传送方向垂直于导轨50的纵向方向。版权所有（C）2004，JPO

8. 发明专利

JPH0635745A DATA PROCESSOR AND TEST SYSTEM FOR THE SAME 失效
公开(公告)号：JPH0635745A
公开(公告)日：1994-02-10
申请号：JP20852692
申请日：1992-07-13
申请人： MITSUBISHI ELECTRIC CORP
发明人： YAMADA MITSURU , MORISHIMA NAOKI
IPC分类号： G06F11/22
摘要： PURPOSE:To provide a data processor in which the waiting period of time of a CPU due to a system bus and a peripheral control part or the like can be shortened, and an original CPU performance can be utilized. CONSTITUTION:'Control information' is allocated to a dual port memory 22 directly connected with a CPU 1, and connected with a system bus 4, a bus arbitration circuit is provided at a peripheral control part 3A of an inputting and outputting part 41A, the read/write of the 'control information' can be actively performed through the system bus 4 to the dual port memory 22 by the peripheral control part 3A and a control part 5A, and an asynchronous and high speed access from the CPU 1 to the 'control information' can be performed.

9. 发明专利

JPS61122726A Control circuit of reactive power compensator 失效
标题翻译：无功补偿器的控制电路
公开(公告)号：JPS61122726A
公开(公告)日：1986-06-10
申请号：JP24343184
申请日：1984-11-20
申请人： Mitsubishi Electric Corp
发明人： YAMADA MITSURU , HOSOKAWA YASUHIKO , MORISHIMA NAOKI
IPC分类号： G05F1/70 , H02J3/18
CPC分类号： G05F1/70
摘要： PURPOSE:To control highly accurately a reactive power compensator by executing the operation of primary delay processing and reset filter processing by an operating means based upon software. CONSTITUTION:The voltage of a power system 1 is detected by a voltage detecting circuit 5 and a signal obtained through a delay circuit 7 having a delay element of which time constant is variable and a signal outputted from the detecting circuit 5 are inputted to a voltage control circuit 9. A thyristor ignition phase control circuit 11 determines the control variable of a thyristor device 3 in accordance with the output of the circuit 9. A current detecting circuit 13 detects the current of the device 3 and determines the time constant of the delay circuit 7. The operation for the primary delay processing of the delay circuit 7 is executed by the operating means based upon the software.
摘要翻译：目的：通过执行基于软件的操作手段执行主延迟处理和复位滤波处理的操作，高精度地控制无功功率补偿器。构成：通过电压检测电路5检测电力系统1的电压，通过具有时间常数的延迟元件的延迟电路7得到的信号是可变的，从检测电路5输出的信号被输入到电压控制电路9.晶闸管点火相位控制电路11根据电路9的输出确定晶闸管器件3的控制变量。电流检测电路13检测器件3的电流并确定延迟的时间常数延迟电路7的一次延迟处理的操作由操作装置基于软件执行。

10. 发明专利

JPS5931975B2 JPS5931975B2 - 失效
公开(公告)号：JPS5931975B2
公开(公告)日：1984-08-06
申请号：JP12828077
申请日：1977-10-25
申请人： Mitsubishi Electric Corp
发明人： NISHIOKA KYUSAKU , KANEDAKI YUKIMICHI , YAMADA MITSURU , UNO JUN , HOSHIKA HARUYUKI , YAMAZAKI TERUHIKO
IPC分类号： H01L21/302 , G03F1/00 , G03F1/54 , H01L21/027 , H01L21/3065

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式