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1. 发明专利

JP2010001897A Bearing structure 审中-公开
标题翻译：轴承结构
公开(公告)号：JP2010001897A
公开(公告)日：2010-01-07
申请号：JP2006083643
申请日：2006-03-24
申请人： Mitsubishi Electric Corp , 三菱電機株式会社
发明人： KOYAMA HIROSHI , DOI HIROFUMI
IPC分类号： F16C25/06 , F16C19/16
CPC分类号： F16C25/083 , F16C19/54
摘要： PROBLEM TO BE SOLVED: To provide a bearing structure capable of reducing the occurrence of damage and deformation of a bearing, while preventing permanent set of a preload member. SOLUTION: This bearing structure includes a rotary part 1 for receiving driving force from a motor, the bearing 2 fixing an inner ring 2a to an end part in the axial direction of the rotary part 1 and supporting an outer ring 2b on the bearing casing side, the preload member 3 for applying a compressive load of pushing up in the axial direction in a bearing casing to the rotary part 1 by abutting on the outer ring 2b of the bearing 2, and a stopper 4 for regulating a movement quantity of pushing down in the axial direction of the rotary part 1 by butting on the inner ring 2a of the bearing 2. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供能够减少轴承的损坏和变形的发生的轴承结构，同时防止预紧件的永久变形。解决方案：该轴承结构包括用于接收来自电动机的驱动力的旋转部件1，轴承2将内圈2a固定在旋转部件1的轴向上的端部，并且在外壳2b上支撑外圈2b 轴承壳体侧，用于通过抵靠在轴承2的外圈2b上而将轴承壳体中的沿轴向向上推压到旋转部件1的预压件3和用于调节轴承2的移动量的止动件4 通过在轴承2的内圈2a上对接而在旋转部件1的轴向方向上下推。（C）2010，JPO＆INPIT

2. 发明专利

JPH04122806A MICROMOTION SCANNING MECHANISM OF INTERATOMIC FORCE MICROSCOPE 失效
公开(公告)号：JPH04122806A
公开(公告)日：1992-04-23
申请号：JP24260390
申请日：1990-09-14
申请人： MITSUBISHI ELECTRIC CORP
发明人： NISHIOKA SUNAO , YASUE TAKAO , KOYAMA HIROSHI
IPC分类号： G01B7/34 , G01B21/30 , G01N37/00 , G01Q10/04 , G01Q60/10 , G01Q60/24 , H01J37/28 , H01L41/09
摘要： PURPOSE:To achieve production easily and operability to be improved by mounting a first probe and a bimorph-type piezoelectric element to a three-dimensional displacement side edge part of a cylindrical type piezoelectric element and by mounting a cantilever and a second probe to a one-dimensional displacement side edge part of the bimorph-type piezoelectric element for displacement. CONSTITUTION:While tunnel current is measured with no deflection at a cantilever 300, voltage for enabling distance between a free edge 300a of the lever 300 and a first probe 110 to be a specified tunnel region is applied to a bimorph- type piezoelectric element 200 for displacement. Then, when a triangular wave voltage is applied to a cylindrical piezoelectric element 100, a probe 410 performs two-dimensional scanning for a surface of a still sample 510. From this state, an interatomic force is applied between the probe 410 and the sample 510, thus operating a feedback for maintaining the tunnel current at a set value. Therefore, production can be eased and operability can be improved and at the same time limitation in the sample dimensions can be reduced.

3. 发明专利

JPS63182538A AIRTIGHTNESS INSPECTING DEVICE 失效
公开(公告)号：JPS63182538A
公开(公告)日：1988-07-27
申请号：JP1476987
申请日：1987-01-23
申请人： MITSUBISHI ELECTRIC CORP
发明人： NISHIOKA SUNAO , MASUKO YOJI , KOYAMA HIROSHI
IPC分类号： H01L21/66 , G01M3/04 , G01M3/06 , H01L23/02
摘要： PURPOSE:To inspect the airtightness of a body to be inspected by providing an air bubble catching part, a circulating flow means, and an air bubble detecting means. CONSTITUTION:The body 105 to be inspected which is put in the air bubble catching part 1 is dipped in liquid 103, which is sent to the circulating flow means 2 by a pump 114. The air bubble detecting means 3 is put in an operation state after air bubbles on the surface of the body 105 to be inspected are removed. At this time, when an air bubble is generated from the body 105 to be inspected, irradiation light 110 is scattered by the air bubble when passing through a transparent part 108. The quantity of photodetection varies greatly because the light is scattered more and more as the size of the air bubble is larger and larger, so that a pulse signal indicates the passage in the air bubble and the number of air bubbles. The pulse signal is counted 111 and the number of signals and signal intensity within a constant time are compared with reference values to make a decision 112, so that the result is displayed 113. The detecting operation is stopped and the pump 114 is also stopped; and the air bubble catching part 1 is elevated from the liquid 103 and the body 105 which is inspected a taken out. Consequently, the airtightness is grasped accurately, speedily, and quantitatively.

4. 发明专利

JPS63122940A SECONDARY ION MASS SPECTROMETER 失效
公开(公告)号：JPS63122940A
公开(公告)日：1988-05-26
申请号：JP27066886
申请日：1986-11-12
申请人： MITSUBISHI ELECTRIC CORP
发明人： NISHIOKA SUNAO , KOMORI JUNKO , MASUKO YOJI , KOYAMA HIROSHI
IPC分类号： G01N23/225 , H01J37/252 , H01J49/04 , H01J49/14
摘要： PURPOSE:To enable the positioning of points to be analyzed without vanishing the surface layer of a sample, by making a primary ion beam to irradiate the surface of the sample fixed on a sample base with a primary ion beam generator. CONSTITUTION:Conducting element 31 not contained in a semiconductor element is jetted onto the surface of the semiconductor element with a conductive element releasing section 30 thereof, and then a primary ion beam 11 is directed onto the thin film surface thereof by a primary ion beam generator 10. Since the face density of the element 31 viewed from the angle and direction of incidence of the beam 11 with respect to the thin film surface is different between a step part those other than that, there appears a difference in the release efficiency of secondary ions released according to the irradiation with the beam 11. That is, the secondary ion beam 22 has a clear density difference between a portion equivalent to the step part and those other than that. Thus, the beam 22 is analyzed with a secondary ion analyzer 20 to learn the pattern geomery of the step part, thereby enabling the positioning of points to be analyzed of the semiconductor element.

5. 发明专利

JPS62126532A ADJUSTABLE FOCUS MICRO-X-RAY GENERATOR 失效
公开(公告)号：JPS62126532A
公开(公告)日：1987-06-08
申请号：JP26506485
申请日：1985-11-27
申请人： MITSUBISHI ELECTRIC CORP
发明人： KOYAMA HIROSHI
IPC分类号： H01J35/14 , H01L21/027 , H01L21/30
摘要： PURPOSE:To let a device perform the minimal focusing of characteristic X-rays on an object as well as to make the focal position variable, by constituting it to generate the characteristic X-rays out of a metallic thin film and focusing them by the electron beam diffracted at a Fresnel zone. CONSTITUTION:A wide electron beam 20 out of a filament 1a is accelerated by a grid 3a and an anode 4a and then it is passed through a plate transmission mask 22. Next, the total diameter of the Fresnel-diffracted parallel beam flux 20a is enlarged or contracted by an electromagnetic lens 24, irradiating it to a surface of a metallic thin film 26, thus characteristic X-rays 28 are generated there. And, these rays are irradiated to the object 9 set up in a focal point 30 to be regulated by a radius of a Fresnel zone of the mask 22 and a wavelength of the characteristic X-rays 28 whereby an X-ray generator is formed. Therefore, a microfocus is securable on the object 9 and, what is more, a focal position is alterable according to a variation in the Fresnel zone radius or a diameter of the electron beam 20.

6. 发明专利

JPS614181B2 JPS614181B2 - 失效
公开(公告)号：JPS614181B2
公开(公告)日：1986-02-07
申请号：JP1831077
申请日：1977-02-21
申请人： Mitsubishi Electric Corp
发明人： KAWAZU SATORU , KOYAMA HIROSHI , FUJIKAWA KYOICHIRO
IPC分类号： H01L21/66 , H01L21/316

7. 发明专利

JPS6056431B2 失效
公开(公告)号：JPS6056431B2
公开(公告)日：1985-12-10
申请号：JP14148080
申请日：1980-10-09
申请人： MITSUBISHI ELECTRIC CORP
发明人： YONEDA MASAHIRO , HINE SHIRO , KOYAMA HIROSHI
IPC分类号： C23F4/00 , H01J37/16 , H01J37/32 , H01L21/00 , H01L21/302 , H01L21/3065

8. 发明专利

JPS6057934A X-RAY EXPOSURE METHOD 失效
公开(公告)号：JPS6057934A
公开(公告)日：1985-04-03
申请号：JP16685783
申请日：1983-09-09
申请人： MITSUBISHI ELECTRIC CORP
发明人： KOYAMA HIROSHI
IPC分类号： G03F7/20 , H01L21/027 , H01L21/30
摘要： PURPOSE:To utilize both advantages of electron-beam exposure and X-ray exposure by controlling the generating section of X-rays by electron beams and executing exposure itself only by X-rays. CONSTITUTION:A metallic thin-film 10 is superposed on a resist 8 for X-ray photosensitization, and the resist 8 for X-ray photosensitization is exposed by characteristic X-rays generated by the projection of electron beams 11 to the metallic thin-film 10. A mask such as a fine mask 9 is interposed between the resist 8 for X-ray photosensitization and the metallic thin-film 10. Accordingly, an arbitrary one point can be designated as the generating point of X-rays in the same manner as electron-beam direct exposure, the X-ray resist is exposed only by characteristic X-rays generated by electron beams, and secondary electrons generated simultaneously cannot join in exposure in relation to escape depth.

9. 发明专利

JPS59143251A High sensitive mass analyzer 失效
标题翻译：高灵敏度分析仪
公开(公告)号：JPS59143251A
公开(公告)日：1984-08-16
申请号：JP1658783
申请日：1983-02-02
申请人： Mitsubishi Electric Corp
发明人： KOYAMA HIROSHI , SEI JIYUNKO
IPC分类号： G01N23/225 , G01N27/62 , H01J37/252 , H01J49/10 , H01J49/14 , H01J49/26
CPC分类号： H01J49/142
摘要： PURPOSE:To isolate atoms and molecules migrating along the surface, keep clean the surface of a sample and analyze carbon and oxygen included in the sample with high sensitivity by irradiating the ion beam radiating part with a laser beam. CONSTITUTION:In the figure, 3 is a laser beam used for irradiating the sputter surface of a sample 4. Atoms and molecules migrating along the surface of sample 4 are usually physically attracted weakly by the van der Waals forces. It is said that the activated energy moving on the surface of sample 4 is 0.1- 1kcal/mol. Meanwhile, since the light of 1eV corresponds to 11.600k in terms of thermal energy, it gives energy which is sufficient for atoms and molecules to be isolated from the surface of sample 4. Accordingly, when the area to be sputtered by ion is irradiated by laser beam before and during the sputtering, oxygen and carbon etc. are isolated from the surface and moreover inflow of new atoms and molecules can also be prevented.
摘要翻译：目的：为了分离沿表面迁移的原子和分子，通过用激光束照射离子束辐射部分，保持清洁样品表面并以高灵敏度分析样品中包含的碳和氧。构成：在图中，3是用于照射样品4的溅射表面的激光束。沿着样品4的表面迁移的原子和分子通常通过范德华力弱物理地吸引。据说在样品4的表面上移动的活化能为0.1-1kcal / mol。同时，由于1eV的光对应于热能的11.600k，因此能够提供足以使原子和分子与样品4的表面隔离的能量。因此，当被离子溅射的区域被溅射之前和期间的激光束，氧和碳等从表面分离出来，而且还可以防止新原子和分子的流入。

10. 发明专利

JPS59108929A Pressure sensor 失效
标题翻译：压力传感器
公开(公告)号：JPS59108929A
公开(公告)日：1984-06-23
申请号：JP22087582
申请日：1982-12-14
申请人： Mitsubishi Electric Corp
发明人： KOYAMA HIROSHI , KAWAZU SATORU , NISHIOKA SUNAO
IPC分类号： G01L1/24 , G01L11/00
CPC分类号： G01L1/241
摘要： PURPOSE:To detect a pressure, by monitoring a double refraction pattern, which is dependent on the pressure of a polarizing plate. CONSTITUTION:The light, which is emitted from a light emitting element 1, is transmitted through a polarizer 2 and becomes flat plane polarized light. Said light undergoes double refraction when the light passes through a polarizing plate 3. The double refraction is delicately changed by the stress, which is applied to the polarizing plate. The light passed an analyzer 5 indicates an optical elastic pattern. When the optical elastic pattern is known, external stress is detected. When light receiving elements 6 are arranged in a matrix shape, the judging accuracy of the optical elastic pattern in increased. Even the two dimensional distribution of the external stress can be judged.
摘要翻译：目的：通过监测取决于偏振片的压力的双折射图案来检测压力。构成：从发光元件1射出的光透过偏振片2，成为平面偏振光。当光通过偏振片3时，所述光经受双折射。双折射由施加到偏振片上的应力精细地改变。通过分析器5的光表示光学弹性图案。当光学弹性图案已知时，检测到外部应力。当光接收元件6以矩阵形状排列时，光弹性图案的判断精度提高。甚至可以判断外部应力的二维分布。

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