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1. 发明专利

JP2000013027A MANUFACTURE OF MULTI-LAYER SUBSTRATE 失效
公开(公告)号：JP2000013027A
公开(公告)日：2000-01-14
申请号：JP18010098
申请日：1998-06-26
申请人： MATSUSHITA ELECTRIC IND CO LTD
发明人： MORISAKO ISAMU , HAJI HIROSHI , YOSHIDA NAOHITO
IPC分类号： H05K3/46
摘要： PROBLEM TO BE SOLVED: To provide a method for manufacturing a multi-layer substrate wherein smear-removal is performed under an appropriate condition after inner via hole work. SOLUTION: Related to a method for manufacturing a multi-layer substrate, an inner via hole 4 is formed at an insulating resin layer 3 across a circuit pattern 2 by laser working for the circuit pattern 2 of each layer to be conductive, and after a smear 3a on the surface of the circuit pattern 2 at the bottom surface of the inner via hole 4 is removed by plasma process, the inner via hole 4 is irradiated with ultraviolet light, and the fluorescence emitted from the smear 3a is detected by a fluorescence detecting sensor 24 to inspect the residue state of the smear 3a. Thus, an appropriate process condition for removing smear is set for appropriate smear removal.

2. 发明专利

JPH09311562A IMAGE FORMING METHOD, AND DEVICE THEREFOR 失效
公开(公告)号：JPH09311562A
公开(公告)日：1997-12-02
申请号：JP12673196
申请日：1996-05-22
申请人： MATSUSHITA ELECTRIC IND CO LTD
发明人： YOSHIDA NAOHITO , NAKAJIMA HIROAKI , KUSUDA HIROSHI
IPC分类号： G03G15/16 , G03G15/00
摘要： PROBLEM TO BE SOLVED: To stably carry transfer material by a transfer belt. SOLUTION: In the case where an image is formed by transferring a toner image on an image carrier 1 on the transfer material 8 carried on the transfer belt 12, the transfer material 8 is guided to a position between a pressing roller 16 arranged on an upstream side from a position where the image carrier 1 abuts on the belt 12 and a resist roller 9 carrying the transfer material 8 from a paper feeding part and inside a line linking the tangent B of the roller 16 and the belt 12 with the nip A of the roller 9 and carried on the belt 12. Thus, the transfer material 8 is stably carried by the belt 12.

3. 发明专利

JPH0996962A IMAGE FORMING DEVICE 失效
公开(公告)号：JPH0996962A
公开(公告)日：1997-04-08
申请号：JP25319195
申请日：1995-09-29
申请人： MATSUSHITA ELECTRIC IND CO LTD
发明人： YASUDA HIDEKI , SHIMAZAKI HIROMITSU , YOSHIDA NAOHITO , KITAHARA TOSHIAKI
IPC分类号： G03G15/08
摘要： PROBLEM TO BE SOLVED: To provide an image forming device which controls the thickness of a toner layer on a developing roller highly accurately, is capable of high speed printing and obtaining uniform image-characteristics such as high gradation and high resolution by the prevention of deterioration of the quality of an image such as a vertical streak, and is excellent in durability and reliability. SOLUTION: The image forming device is equipped with the developing roller 10 which holds toner 8 used for developing an electrostatic latent image formed on a photoreceptor 2, a toner hopper 7 which stores the toner 8, a toner supply roller 11 which supplies the toner 8 to the developing roller 10, and a layer-thinning member 1 which is disposed on the developing roller 10 and regulates the thickness of the toner layer on the developing roller 10. The layer-thinning member 1 is composed of a layer-thinning roller 1a having a cylindrical shape which is positioned parallel to the developing roller 10 and rotates opposite to the direction of the rotation of the developing roller 10, and a layer-thinning-roller support member 1b which supports the layer-thinning roller 1a so that it freely rotates.

4. 发明专利

JP2001144075A PLASMA TREATMENT DEVICE 失效
公开(公告)号：JP2001144075A
公开(公告)日：2001-05-25
申请号：JP32402599
申请日：1999-11-15
申请人： MATSUSHITA ELECTRIC IND CO LTD
发明人： HAJI HIROSHI , MORISAKO ISAMU , YOSHIDA NAOHITO
IPC分类号： H01L21/302 , B01J19/08 , H01L21/3065 , H05H1/46
摘要： PROBLEM TO BE SOLVED: To provide a plasma treatment device which can secure thermal conduction from a work and obtain a sufficient cooling effect. SOLUTION: In a plasma treatment device wherein plasma treatment is performed by placing a substrate 4 on an electrode 3 in a treatment chamber 11, a thermally conductive sheet member 5 is attached to the electrode 3. Then, the substrate 4 to be treated is placed on the sheet member 5. Consequently, thermal conduction from the substrate 4 heated due to the plasma treatment to the electrode 3 can be secured to obtain a sufficient cooling effect.

5. 发明专利

JP2000068653A SMEAR REMOVING METHOD OF MULTILAYER BOARD 失效
公开(公告)号：JP2000068653A
公开(公告)日：2000-03-03
申请号：JP23529998
申请日：1998-08-21
申请人： MATSUSHITA ELECTRIC IND CO LTD
发明人： YOSHIDA NAOHITO , HAJI HIROSHI , MORISAKO ISAMU
IPC分类号： H05K3/26 , H05K3/42 , H05K3/46
摘要： PROBLEM TO BE SOLVED: To provide a method of completely removing smears on a multilayer board without leaving a filler component. SOLUTION: Smears left in an inner viahole 4 provided by laser processing to an insulating resin layer 3 on a multilayer board 1 are removed from the inner viahole 4 through a smear removing method, where the inner viahole 4 is treated with a plasma by the use of oxygen-containing plasma generating gas, and a filler component 3b, which is left after smears of resin component left on a conductor layer inside the inner viahole are removed, is removed through wet cleaning by the use of fluid. By this setup, smears can be completely removed.

6. 发明专利

JP2000040881A SMEAR REMOVER OF MULTILAYER BOARD, AND SMEAR REMOVAL METHOD 失效
公开(公告)号：JP2000040881A
公开(公告)日：2000-02-08
申请号：JP20741298
申请日：1998-07-23
申请人： MATSUSHITA ELECTRIC IND CO LTD
发明人： YOSHIDA NAOHITO , MORISAKO ISAMU , HAJI HIROSHI
IPC分类号： H05K3/46 , H05K3/26 , H05K3/42
摘要： PROBLEM TO BE SOLVED: To raise the reliability on circuit properties, by removing the increase of connection resistance. SOLUTION: A smear remover, which removes the smear remaining at the bottom of the inner via hole of a multilayer board by plasma treatment, is equipped with a lower electrode 13 on which to place a layer board 1, an upper electrode 17 which is arranged and earthed in opposition to the lower electrode 13, a high frequency power source 16 which applies high frequency voltage, a vacuum exhaust part 14, a vacuum chamber 12, a first gas supplier 15A and a second gas supplier 15B which supply gas for generation of oxygen plasma and generation of reductive plasma, respectively, into this vacuum chamber 12, and valves 18A and 18B which switch the kind of gas supplied to the vacuum chamber 12. Here, the plasma treatment by the reductive plasma after the plasma treatment by the oxygen plasma for removal of smear is performed to remove the oxide film on a copper film produced at smear removal.

7. 发明专利

JPH1168501A CRYSTAL OSCILLATOR AND ITS PRODUCTION 失效
公开(公告)号：JPH1168501A
公开(公告)日：1999-03-09
申请号：JP22603897
申请日：1997-08-22
申请人： MATSUSHITA ELECTRIC IND CO LTD
发明人： MORISAKO ISAMU , YOSHIDA NAOHITO
IPC分类号： C23C14/10 , H01L41/09 , H01L41/22 , H01L41/23 , H01L41/253 , H03H3/02 , H03H9/19
摘要： PROBLEM TO BE SOLVED: To prevent an oscillation characteristics from deteriorating due to a change with the lapse of time. SOLUTION: In this method, production of a crystal oscillator where silver electrodes are formed on both sides of a crystal plate is performed. In this case, silver is vapor deposited on the crystal plate in a vacuum chamber 14, a silver electrode 12 is formed, and an insulated film 13 such as an oxidized silicon or the like is stacked on the silver electrode 12. In a process of accumulating an insulation film 13' on the other side (or a process of eliminating the insulation film 13' accumulated thick by a dry etching), the frequency of the crystal oscillator 25 is measured continuously and frequency adjustment is performed by stopping the accumulation (or an elimination) at a time when the measured frequency matches the set frequency. Since both the sides of the silver electrodes 12 and 12' are protected by the insulation films 13 and 13', the change with the laps of time in weight of the silver electrodes 12 and 12' is extremely small and it is possible to prevent the deterioration of oscillation characteristic.

8. 发明专利

JPH0996972A ELECTROPHOTOGRAPHIC DEVICE AND ELECTROPHOTOGRAPHIC TRANSFER METHOD 失效
公开(公告)号：JPH0996972A
公开(公告)日：1997-04-08
申请号：JP25314595
申请日：1995-09-29
申请人： MATSUSHITA ELECTRIC IND CO LTD
发明人： YOSHIDA NAOHITO , KITAHARA TOSHIAKI , YASUDA HIDEKI
IPC分类号： G03G15/16
摘要： PROBLEM TO BE SOLVED: To increase transfer efficiency by allowing a transfer unit to come into contact with a toner image carrier only at the time of transferring, applying a transfer bias to a transfer material and heating toner up to a temperature higher than a glass- transition temp. and lower than a melting temp., in a device for performing a transfer from the toner image carrier having a specific size to the transfer material. SOLUTION: In the device using the toner image carrier having a diameter of >=60nm or a radius of curvature of >=30mm in a transfer part or a separating part, a toner composite image is carried to the transfer material 10, the transfer unit 14 comes into contact with an intermediate transfer body 18 and a voltage is applied to a charge roller 26 from a transfer belt 24 to charge it, and transferring the toner image on the intermediate transfer body 18 to the transfer material 10 all together. Simultaneously, the transfer material 10 is electrostatically attracted to the belt 24, separated from the intermediate transfer body 18. At this time, heat energy is applied to the toner from a roller 22 through the transfer belt 24, so that the toner is heated to a temp. higher than the glass-transition temp. and lower than the melting temp. In a fixing process, the toner image is fixed on the transfer material 10 by a fixing unit 17.

9. 发明专利

JP2004148282A Plasma treatment apparatus 有权
标题翻译：等离子体处理装置
公开(公告)号：JP2004148282A
公开(公告)日：2004-05-27
申请号：JP2002319716
申请日：2002-11-01
申请人： Matsushita Electric Ind Co Ltd , 松下電器産業株式会社
发明人： YOSHIDA NAOHITO , HAJI HIROSHI , FURUKAWA RYOTA , IWAI TETSUHIRO , KORENAGA TETSUO
IPC分类号： H05H1/46 , B01J3/00 , B01J19/08 , C23F4/00
摘要： PROBLEM TO BE SOLVED: To provide a plasma treatment apparatus which reduces the amount of organic particles adhered to and accumulated in the inside of a treatment chamber and can keep a tact time without delaying a vacuum exhaust time. SOLUTION: In the plasma treatment apparatus for allowing the plasma generated in the treatment chamber to act on a work, the insulating member 12 interposed between the electrode 3 connected to a high frequency power supply and a base member 2 is constituted of a material prepared by mixing a substance enhancing heat conductivity such as an inorganic material or the like with a resin and the heat of the electrode 3 heated to a high temperature by the plasma is transmitted to the base member 2 through the insulating member 12 to raise the temperature of the base member 2 in a plasma treatment process. By this constitution, the amount of the organic particles adhered to and accumulated in the inside of the treatment chamber can be reduced to keep the tact time without delaying the vacuum exhaust time. COPYRIGHT: (C)2004,JPO
摘要翻译：解决的问题：提供一种等离子体处理装置，其减少了附着在和积聚在处理室内部的有机颗粒的量，并且可以保持节拍时间而不延迟真空排气时间。解决方案：在用于使处理室中产生的等离子体作用于工件的等离子体处理装置中，插入在与高频电源连接的电极3和基座部件2之间的绝缘部件12由通过将提高导热性的物质如无机材料等与树脂混合并通过等离子体加热到高温的电极3的热量而制备的材料通过绝缘构件12传递到基底构件2，在等离子体处理工艺中基体2的温度。通过这种结构，可以减少粘附到和积聚在处理室内部的有机颗粒的量，以保持节拍时间而不延迟真空排气时间。版权所有（C）2004，JPO

10. 发明专利

JP2004148281A Plasma treatment apparatus 审中-公开
公开(公告)号：JP2004148281A
公开(公告)日：2004-05-27
申请号：JP2002319707
申请日：2002-11-01
申请人： Matsushita Electric Ind Co Ltd , 松下電器産業株式会社
发明人： YOSHIDA NAOHITO , HAJI HIROSHI , FURUKAWA RYOTA , IWAI TETSUHIRO , KORENAGA TETSUO
IPC分类号： H05H1/46 , B01J3/00 , B01J19/08 , C23F4/00
摘要： PROBLEM TO BE SOLVED: To provide a plasma treatment apparatus for reducing the amount of organic particles adhered to and accumulated in the inside of a pressure reducing exhaust pipe to make reducible the load of apparatus maintenance work. SOLUTION: In the plasma treatment apparatus for allowing plasma generated in a treatment chamber 4a to act on a work, the exhaust pipe 26 for evacuating the treatment chamber 4a with a vacuum pump 29 is divided into a first exhaust pipe 26a, a second exhaust pipe 26c and a short pipe part 26b freely exchangeable with respect to the fixing piping of those exhaust pipes and a range to be heated excepting the short pipe part 26b is heated by a heater. By this constitution, the amount of particles adhered and accumulated of organic matter to the insides of the exhaust pipes is reduced, the adhesion of the particles of the organic matter to the short pipe part 26b is concentrated and only the short pipe part 26b is replaced at the time of maintenance work to reduce the load of the maintenance work. COPYRIGHT: (C)2004,JPO

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