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    • 2. 发明专利
    • MANUFACTURE OF LAMINATED THIN FILM CAPACITOR
    • JPH02222123A
    • 1990-09-04
    • JP4223589
    • 1989-02-22
    • MATSUSHITA ELECTRIC IND CO LTD
    • TAKADA YUSUKEOMURA TORU
    • H01G4/33H01G4/06H01G4/30H01L27/01
    • PURPOSE:To reduce in size and to increase in capacitance of the above capacitor by voltage-processing a dielectric and an electrode each time they are alternately laminated. CONSTITUTION:A lower electrode 2A of Al is formed on the upper surface of a board 1 of glazed ceramics having 0.7mm in thickness of 2000Angstrom by a sputtering SP method by providing an exposed part 1a, and a dielectric 3A of a Ta2O5 thin film is formed on the electrode 2A in thickness of 3000Angstrom including an adjacent part 3a to the end of the electrode 2A of the part 1a by an SP method. An upper electrode 2B of Al is formed in thickness of 500Angstrom on the remainder of the part 1a and the dielectric 3A by an SP method except the exposed part 3b on the opposite end of the part 1a. Then, a pulse voltage of 30V, 100msec is applied between the electrodes 2A and 2B for 2sec to remove the electrode 2B on the upper surface part of a defect of the dielectric 3A, and a dielectric 3B of a Ta2O5 thin film is formed in thickness of 3000Angstrom on the electrode 3B and the part 3b of the dielectric 3A by an SP method. Thus, a thin film capacitor having a small size and a large capacitance can be obtained.
    • 3. 发明专利
    • METALLIZED FILM CAPACITOR
    • JPH01114016A
    • 1989-05-02
    • JP27246087
    • 1987-10-28
    • MATSUSHITA ELECTRIC IND CO LTD
    • OMURA TORUHAGA MIKIO
    • H01G4/18
    • PURPOSE:To suppress the growth of a transparent insulating film, to reduce the size and the cost of a metallized film capacitor by employing a dielectric film and electrodes formed by depositing manganese or alloy containing manganese on the film. CONSTITUTION:Manganese or an alloy of manganese and platinum, nickel, aluminum or the like is deposited to form an electrode 2 on a dielectric film 1, and a metallized film capacitor is compose by employing the electrodes 2. Thus, the manganese having low specific resistance of oxide is employed as the electrode thereby to reduce the concentration of an electric field to a boundary between the electrodes and an insulating film. Accordingly, the reduction of the effective area of the electrode 2 due to the generation of the transparent insulating film when it is employed as a high potential trend, i.e., the reduction of the electrostatic capacity of the capacitor can be suppressed. Thus, the high potential trend design of the capacitor can be performed, thereby reducing the size and the cost of the capacity.
    • 6. 发明专利
    • MULTILAYER THIN FILM CAPACITOR
    • JPH02222124A
    • 1990-09-04
    • JP4224289
    • 1989-02-22
    • MATSUSHITA ELECTRIC IND CO LTD
    • OMURA TORUTAKADA YUSUKEKINUTA YUKIOHAGA MIKIO
    • H01G4/33H01G4/06H01G4/30H01L27/01
    • PURPOSE:To reduce in size, weight and cost of the above capacitor by providing external electrodes at both ends of an insulating board by a low pressure plasma spraying method. CONSTITUTION:A thin film laminate 4 in which three inner electrode layers 2A, 2B, 2C of metal material such as aluminum, copper, gold, etc., and two dielectric layers 3A, 3B are alternately laminated and the layers 2A-2C are extended and laminated at upper and lower layers in the end direction of opposite side of an insulating board 1 made of alumina, polyimide, or the like, is formed on the upper surface of the board 1. The laminate 4 and a protective film 5 covering the board 1 of the periphery are formed, and outer electrodes 6A, 6B are formed at both ends of the board 1 including the ends of the layers 2A-2C by a low pressure plasma splaying method. The film 5 is made of organic thin film made of silicon nitride, organic film made of epoxy resin, and the electrodes 6A, 6B are made of metal such as copper, nickel, gold, etc. Thus, the cost of the material and the number of steps can be reduced, and reduction in size, weight and cost can be realized.
    • 7. 发明专利
    • MULTILAYER THIN FILM CAPACITOR
    • JPH02121313A
    • 1990-05-09
    • JP27406888
    • 1988-10-29
    • MATSUSHITA ELECTRIC IND CO LTD
    • HAGA MIKIOOMURA TORUYOSHIDA ZENICHI
    • H01G4/33H01G4/06
    • PURPOSE:To make it possible to markedly cut down the cost of material and the number of man-hours, and to contrive accomplishment of a small-sized and lightweight capacitor at low cost by a method wherein an inner electrode layer of three or more layers and a dielectric layer of two or more layers are alternately laminated on one side or both sides of an insulated substrate, and an external electrode is formed using a dry type technique on both end parts of the insulated substrate containing the extended end part of the inner electrode layer. CONSTITUTION:A three-layer inner electrode layer 2 and a two-layer dielectric layer 3 are alternately laminated on one surface of an insulated substrate 1. The inner electrode layer 2 is arranged in such a manner that it is positionally deviated for every layer against the dielectric layer 3 respectively in the direction of both ends of the insulated substrate, and they are opposingly positioned pinching the adjacently positioned inner electrode layer 2 and the dielectric layer 3. Outer electrode 5 are formed using a dry-type technical method on both en parts of the insulated substrate 1 including the end part of the extended section of each inner electrode layer 2 which is not covered by a protective film 4. As the dry type technical method to form the outer electrodes 5, spraying method, a sputtering method, a vacuum vapor-deposition method and the like are applicable.
    • 8. 发明专利
    • CAPACITOR
    • JPH0334506A
    • 1991-02-14
    • JP17019189
    • 1989-06-30
    • MATSUSHITA ELECTRIC IND CO LTD
    • KINUTA YUKIOKATSUBE ATSUSHIOMURA TORUHAGA MIKIO
    • H01G4/33H01G4/06
    • PURPOSE:To make a capacitor small-sized and lightweight and to lower its cost by a method wherein two or more layers of internal electrodes of a specific film thickness, formed by a dry process and one or more layers of dielectrics are overlapped alternately on one side or on both sides of an insulating substrate whose average roughness in the center line is specific in order to sharply relax an influence of the surface roughness of the insulating substrate on a characteristic. CONSTITUTION:A film thickness of a first layer of an internal electrode formed by using a physical vapor growth method such as a sputtering method or the like is set at 1000Angstrom or higher; a substrate whose cost is comparatively low and whose average roughness in the center line is 0.1 to 1.0mum is utilized fully in order to sharply lower costs of a capacitor. That is to say, an internal electrode layer 2, composed of aluminum, having a film thickness of 3000Angstrom is formed, as a first layer of an internal electrode, on an alumina ceramic substrate 1; then, a dielectric layer 3, composed of strontium titanate, having a film thickness of 5000Angstrom is formed by using a sputtering method. In succession, an internal electrode layer, composed of aluminum, having a film thickness of 5000Angstrom is formed as a second layer of the internal electrode.