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    • 1. 发明专利
    • Resistance value measuring device of film resistor
    • 电阻电阻值测量装置
    • JP2006086252A
    • 2006-03-30
    • JP2004267925
    • 2004-09-15
    • Matsushita Electric Ind Co Ltd松下電器産業株式会社
    • IMANAKA SEIJITAKAHASHI MASAHARU
    • H01C17/22G01R27/02
    • PROBLEM TO BE SOLVED: To provide a measuring device which is capable of measuring the resistance value of a film resistor accurately through a four-contact structure consisting of electrodes which serve as a tapered chuck which pinches an electrode contact probe equipped with a whirl stop mechanism and the electrodes while the resistance value of the film resistor is corrected. SOLUTION: The resistance value measuring device measuring the resistance value of the film resistor is composed of the chuck 1 which has a function of serving as a contact, pinching the film resistor 18; the electrode contact probe 3 electrically insulated from the chuck 1 with an insulating sleeve 2; a whirl stop holder 4 and a whirl stop block 5 which are both used to rotate the electrode contact probe 3 and the chuck 1, synchronizing them with each other; and an irregularly-pitched spring 6 which firmly fastens the whirl stop block 5 to an electrode pin 7, making the electrode contact probe 3 bear against the film resistor 18. COPYRIGHT: (C)2006,JPO&NCIPI
    • 要解决的问题:提供一种能够通过由用作锥形卡盘的电极组成的四触点结构来精确地测量薄膜电阻器的电阻值的测量装置,该电容器夹着具有 旋转停止机构和电极,同时修正膜电阻器的电阻值。 < P>解决方案:测量薄膜电阻器的电阻值的电阻值测量装置由具有作为接触功能的卡盘1夹持薄膜电阻18组成; 电极接触探针3与卡盘1与绝缘套管2电绝缘; 用于旋转电极接触探针3和卡盘1的旋转止动支架4和旋转止动块5,使它们彼此同步; 以及将旋转止动块5牢固地固定到电极针7上的不规则偏心的弹簧6,使得电极接触探针3抵靠薄膜电阻器18.版权所有(C)2006,JPO&NCIPI
    • 7. 发明专利
    • GROOVING DEVICE FOR FILM RESISTOR
    • JPH09298107A
    • 1997-11-18
    • JP11343796
    • 1996-05-08
    • MATSUSHITA ELECTRIC IND CO LTD
    • IMANAKA SEIJIHARAZONO KOHEIMINAFUJI HIROTADATAKAHASHI MASAHARUSAIKAWA HIROYUKI
    • H01C17/245
    • PROBLEM TO BE SOLVED: To perform a stable grooving work on in the width of a groove and the depth of the groove by a method wherein an arbitrary force is added to a cutter by a pressing mechanism using a solenoid and the like and an adjusting spring and an adjusting bolt for an arbitrary time from the time of start of a grooving in addition to the own weight of a cutter head part. SOLUTION: The solenoid and the like of a pressing mechanism 6, which applies a arbitrary force other than the own weight of a cutter head part 19 to a cutter 21, is energized to rotate clockwise a cutter arm 3 on a pivot 18 via a pressing point 15, an adjusting point 14 and an adjusting spring 7, that is, a prescribed force is added to the surface of the cylindrical part of a film resistor 20 and the cutter 21 is pressed to start a grooving. After that, the energization of the solenoid and the like of the mechanism 6 is stopped, the clockwise rotation of the arm 3 is released to reduce the forces, which are applied to the cutter, to only the own weight of the part 29 and a spiral groove is cut in a film on the surface of the cylindrical part 4 of the resistor 20. Thereby, the width of the groove and the depth of the groove can be stably subjected to grooving work.
    • 8. 发明专利
    • Sputtering system
    • 喷射系统
    • JP2006336085A
    • 2006-12-14
    • JP2005163928
    • 2005-06-03
    • Matsushita Electric Ind Co Ltd松下電器産業株式会社
    • IMANAKA SEIJINAKANO MITSUHIKOHIRATA SHINJI
    • C23C14/34H01L21/31
    • PROBLEM TO BE SOLVED: To provide a sputtering system capable of stabilizing crystal grains by repeating film deposition and annealing, and simultaneously depositing a plurality of films by a configuration having a turntable capable of setting a plurality of wafers. SOLUTION: The sputtering system comprises the turntable 3 capable of placing the plurality of wafers 5 inside a vacuum tank 1 composed of a vacuum chamber 6a and a vacuum base 6b, heaters 2 of the same number as that of the wafers 5 placed on the turntable 3, a plurality of targets 12, an inner deposition preventive plate 8 to surround the targets 12 on the circumference, and an outer deposition preventive plate 9 to surround its outer circumference. The film deposition by the sputtering and the anneal are repeated for each wafer 5 by turning the turntable 3 by the predetermined angle, and the plurality of wafers can be simultaneously treated. COPYRIGHT: (C)2007,JPO&INPIT
    • 要解决的问题:提供一种能够通过重复膜沉积和退火来稳定晶粒的溅射系统,并且通过具有能够设置多个晶片的转台的构造同时沉积多个膜。 解决方案:溅射系统包括能够将多个晶片5放置在由真空室6a和真空基座6b构成的真空容器1内的转盘3,与设置的晶片5相同数量的加热器2 在转盘3上设置有多个靶12,围绕圆周的靶12的内部防沉积板8和围绕其外周的外部防止沉积板9。 通过使转盘3转动预定角度,通过溅射和退火对每个晶片5重复进行膜沉积,并且可以同时处理多个晶片。 版权所有(C)2007,JPO&INPIT
    • 10. 发明专利
    • Correcting method of resistance value of metal plate resistor and apparatus therefor
    • 金属电阻器的电阻值校正方法及其设备
    • JP2004014935A
    • 2004-01-15
    • JP2002168760
    • 2002-06-10
    • Matsushita Electric Ind Co Ltd松下電器産業株式会社
    • IMANAKA SEIJITAKAHASHI MASAHARUMINAFUJI HIROTADA
    • H01C17/22
    • PROBLEM TO BE SOLVED: To provide a resistance value correcting method for a metal plate resistor, which suppresses the generation of burrs in the correction of a resistance value, change of the resistance value due to heat generation or the like and permits inexpensive high speed/high accuracy correction of resistance value, and an apparatus therefor. SOLUTION: The correcting apparatus is constituted of a probe 11, abutted against an electrode 11 to measure the resistance value of a resistor consisting of a metal plate 12 and correct the value to an objective resistance value in the metal plate resistor arranged between the electrodes while employing the metal plate 12 as a resistance body, a disc type grinding stone 1 for working a groove on the metal plate 12, a driving motor 5 for turning the disc type grinding stone 1, another motor 6 for driving the rotation of a ball screw 9 to feed the grinding stone 1, and an instantaneous correcting and stopping mechanism, which releases the disc type grinding stone 1 from the metal plate 12 to stop the working of the groove and which is constituted of an attracting body 3 as well as an attracting plate 7, which are constituted of an electromagnet, a rotary supporting shaft 2, a spring 4 and the like. COPYRIGHT: (C)2004,JPO
    • 要解决的问题:为了提供一种金属板电阻器的电阻值校正方法,其抑制电阻值校正中的毛刺的产生,由于发热等导致的电阻值的变化,并且允许廉价 电阻值的高速/高精度校正及其装置。 解决方案:校正装置由与电极11抵接的探针11构成,以测量由金属板12组成的电阻器的电阻值,并将该值修正为布置在金属板电阻器之间的金属板电阻器中的目标电阻值 使用金属板12作为电阻体的电极,用于在金属板12上加工槽的盘式研磨石1,用于转动盘式磨石1的驱动电动机5,用于驱动盘式研磨石1的旋转的另一个电动机6 用于进给研磨石1的滚珠丝杠9和将金属板12上的盘式研磨石1从停止凹槽的工作并由吸引体3构成的瞬时校正停止机构 作为由电磁体,旋转支撑轴2,弹簧4等构成的吸引板7。 版权所有(C)2004,JPO