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    • 8. 发明专利
    • AXIAL FLOW-TYPE GAS LASER DEVICE AND CONTROL METHOD THEREOF
    • JPH1079540A
    • 1998-03-24
    • JP25226596
    • 1996-09-02
    • KAWASAKI HEAVY IND LTD
    • MATSUMOTO KOJIWADA TAKAOSATO MASAAKI
    • H01S3/038H01S3/02H01S3/0977
    • PROBLEM TO BE SOLVED: To realize a gas laser device which is kept free from abnormal discharges by a method, wherein a main discharge and an auxiliary discharge are made to occur, overlapping with each other for a prescribed time. SOLUTION: A gas laser device L is equipped with a main discharge power supply SM for a main discharge, a simmer discharge power supply SS for a simmer discharge (auxiliary discharge), a main discharge power supply pulse-generating circuit CM, pulse-generating circuit CS for a simmer discharge power supply, and a pulse timing circuit CT which regulates the pulse-generating circuits CM and CS as to their pulse- generating timings. The simmer discharge power supply SS is turned on just before a main discharge is finished, and the simmer discharge power supply SS is so controlled as to be turned off just after a main discharge starts. Therefore, a discharge tube 10 is lessened in gas resistance due to the negative-resistance characteristic of gas which is filled in the discharge tube 10 at a time when the main discharge takes place, so that a main discharge takes place smoothly, and an abnormal discharge is prevented. As the simmer discharge power supply SS is turned off or on just after a main discharge starts or just before a main discharge stops, the adverse effects from a simmer discharge on a laser output is limited to a minimum.