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1. 发明专利

JP2004149378A Method for forming thin film through intermediate layer on substrate 有权
公开(公告)号：JP2004149378A
公开(公告)日：2004-05-27
申请号：JP2002318477
申请日：2002-10-31
申请人： Internatl Superconductivity Technology Center , Japan Fine Ceramics Center , Sumitomo Electric Ind Ltd , 住友電気工業株式会社 , 財団法人ファインセラミックスセンター , 財団法人国際超電導産業技術研究センター
发明人： HASEGAWA KATSUYA , IZUMI TERUO , SHIOBARA TORU , SUGAWARA YOSHIHIRO , HIRAYAMA TSUKASA , OBA FUMIYASU , IKUHARA YUUICHI
IPC分类号： C30B29/22 , C30B23/02 , C30B25/18 , H01L39/24
CPC分类号： H01L39/2461 , C30B23/02 , C30B25/18 , C30B29/22 , C30B29/225
摘要： PROBLEM TO BE SOLVED: To make it possible to select a more appropriate material of an intermediate layer to form a thin film higher in quality in a method for forming the thin film through an intermediate layer on a subatrate. SOLUTION: In the method for forming the thin film on through the intermediate layer on the substrate, the interfacial energy Ea of the interface (A) between the substrate and the intermediate layer and the interfacial energy Eb of the interface (B) between the intermediate layer and the thin film are calculated, while the interfacial energy Ec of the interface (C) between the substrate and the thin film when the intermediate layer is not present. The material for the intermediate layer satisfying conditions of Ea COPYRIGHT: (C)2004,JPO

2. 发明专利

JP2004149380A Single crystalline thin film 有权
公开(公告)号：JP2004149380A
公开(公告)日：2004-05-27
申请号：JP2002318523
申请日：2002-10-31
申请人： Internatl Superconductivity Technology Center , Japan Fine Ceramics Center , Sumitomo Electric Ind Ltd , 住友電気工業株式会社 , 財団法人ファインセラミックスセンター , 財団法人国際超電導産業技術研究センター
发明人： HASEGAWA KATSUYA , IZUMI TERUO , SHIOBARA TORU , SUGAWARA YOSHIHIRO , HIRAYAMA TSUKASA , OBA FUMIYASU , IKUHARA YUUICHI
IPC分类号： C30B29/22 , C30B23/02 , C30B25/18 , H01L39/02 , H01L39/24
CPC分类号： H01L39/2458 , C30B23/02 , C30B25/18 , C30B29/22 , C30B29/225 , H01L39/2461
摘要： PROBLEM TO BE SOLVED: To form a single crystal thin film of higher quality when a thin film is to be formed on a base material and to provide a thin film having equal or higher characteristics as a bulk material. SOLUTION: The single crystal thin film formed on the base material consists of a substance different from the base material and has a layer of specified atoms commonly included in the base material and in the thin film on the interface between the base material and the thin film. In the proximity region of the interface within 100 unit gratings of the thin film from the interface, crystals growing with the direction of within ±2° shifted angles on the basis of the crystal orientation of the base material occupies by ≥50%. COPYRIGHT: (C)2004,JPO

3. 发明专利

JP2010123475A Substrate for superconductive film formation, superconductive wire rod, and method for manufacturing them 有权
标题翻译：超导薄膜形成用基板，超导线及其制造方法
公开(公告)号：JP2010123475A
公开(公告)日：2010-06-03
申请号：JP2008297703
申请日：2008-11-21
申请人： Chubu Electric Power Co Inc , Furukawa Electric Co Ltd:The , International Superconductivity Technology Center , Japan Fine Ceramics Center , Toshiba Corp , 中部電力株式会社 , 古河電気工業株式会社 , 株式会社東芝 , 財団法人ファインセラミックスセンター , 財団法人国際超電導産業技術研究センター
发明人： MIYATA NARINORI , FUKUSHIMA HIROYUKI , KURIKI REIJI , IHI AKIRA , YOSHIZUMI MASAAKI , KINOSHITA AKIO , YAMADA MINORU , SHIOBARA TORU , YOSHIDA RYUJI , KATO TAKEHARU , HIRAYAMA TSUKASA
IPC分类号： H01B12/06 , C01G1/00 , C01G3/00 , C22C19/03 , H01B13/00
CPC分类号： H01L39/2461 , Y10T428/24355
摘要： PROBLEM TO BE SOLVED: To provide a substrate for superconductive film formation in which there is no peeling-off between formed films in a film-forming process, or a heat treatment after film formation, a superconductive wire rod, and a method for manufacturing them. SOLUTION: This is the substrate for superconductive film formation equipped with the substrate composed of metal, and an oxide layer having chromium oxide formed directly on this substrate as the body. This is the superconductive wire rod in which a superconductive layer is formed on this base for superconductive film formation. This is the method for manufacturing the substrate for superconductive film formation equipped with a process of forming an oxide layer having chromium oxide directly on the substrate composed of the metal. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了提供一种用于超薄膜形成的基板，其中在成膜过程中成膜之间不会发生剥离，或者成膜后的热处理，超导线材和方法用于制造它们。解决方案：这是配备有由金属构成的基板的超导膜形成用基板，具有直接在该基板上形成的氧化铬的氧化物层作为主体。这是超导线材，其中在该基底上形成超导层用于形成超导膜。这是用于制造用于超导膜形成的衬底的方法，该衬底具有直接在由金属构成的衬底上形成具有氧化铬的氧化物层的工艺。版权所有（C）2010，JPO＆INPIT

4. 发明专利

JP2007263594A Observation technique due to coherent vibration 有权
标题翻译：观测技术由于共振
公开(公告)号：JP2007263594A
公开(公告)日：2007-10-11
申请号：JP2006085627
申请日：2006-03-27
申请人： Japan Fine Ceramics Center , 財団法人ファインセラミックスセンター
发明人： FUKUNAGA KEIICHI , HIRAYAMA TSUKASA
IPC分类号： G01N23/04 , G01N21/27 , G01N21/45 , G02B21/00
摘要： PROBLEM TO BE SOLVED: To provide a technique for reducing the effect of the vibration acting on an observation target when the observation target is observed by allowing vibration to act on the observation target.
SOLUTION: A plurality of vibrations having coherency are produced and the intensity of the vibration acting on the observation target by the interference of a plurality of the vibrations is set to 1/2 or below of the average intensity of the vibration at the position of the observation target. By shifting a focus from the observation target, the focus shift image containing the hologram of the observation target is formed on an observation surface from the vibration interacting with the observation target. Then, the vibration at the position of the observation target is regenerated from the focus shift image formed on the observation surface.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种通过允许振动作用在观察目标上来观察观察目标时减小作用于观察目标的振动的影响的技术。解决方案：产生具有一致性的多个振动，并且通过多个振动的干涉作用在观察目标上的振动的强度被设定为在该振动的平均强度的1/2或更低观察目标的位置。通过从观察目标移动焦点，从观察对象的相互作用的振动观察表面形成包含观察对象的全息图的聚焦偏移图像。然后，从形成在观察面上的聚焦移动图像再生观察对象位置的振动。版权所有（C）2008，JPO＆INPIT

5. 发明专利

JP2005106472A Observation technology by coherent wave 审中-公开
标题翻译：相干波观测技术
公开(公告)号：JP2005106472A
公开(公告)日：2005-04-21
申请号：JP2003336063
申请日：2003-09-26
申请人： Japan Fine Ceramics Center , Microphase Co Ltd , 株式会社マイクロフェーズ , 財団法人ファインセラミックスセンター
发明人： HIRAYAMA TSUKASA , YAMAMOTO KAZUO , OTA KEISHIN
IPC分类号： G01N23/04 , G01N21/27 , G01N21/45 , G02B21/00 , G21K1/087 , G21K5/04
摘要： PROBLEM TO BE SOLVED: To provide a technology for reducing affection of a wave affecting an observation object by applying a wave at the time of observation.
SOLUTION: A plurality of coherent waves are generated for reducing the intensity of wave activating on the observation object at the position of the observation object to ≤1/2 of average intensity by making the plurality of waves interfere. Then, at least one wave from among the plurality of waves mutually reacted with the observation object is observed.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供通过在观察时施加波来减少影响观察对象的波的影响的技术。解决方案：通过使多个波浪干扰，产生多个相干波，用于将观测对象的观测对象的波激活强度降低到平均强度的≤1/ 2。然后，观察到与观察对象相互反应的多个波中的至少一个波。版权所有（C）2005，JPO＆NCIPI

6. 发明专利

JP2014172812A Method of producing lithium ion conductive oxide 有权
标题翻译：生产锂离子导电氧化物的方法
公开(公告)号：JP2014172812A
公开(公告)日：2014-09-22
申请号：JP2013049617
申请日：2013-03-12
申请人： Japan Fine Ceramics Center , 一般財団法人ファインセラミックスセンター
发明人： KIMURA TEIICHI , MATSUDA TETSUSHI , NOMURA HIROSHI , HIRAYAMA TSUKASA
IPC分类号： C01G25/02 , H01M10/0562
摘要： PROBLEM TO BE SOLVED: To provide a method of producing a lithium ion conductive oxide more simply than before.SOLUTION: A method of producing a lithium ion conductive oxide comprises a burning step for burning a mixed raw material that comprises a complex oxide comprising a pyrochlore type structure comprising lanthanum and zirconium, and a lithium compound.
摘要翻译：要解决的问题：提供比以前更简单地制备锂离子导电氧化物的方法。解决方案：一种制备锂离子传导性氧化物的方法包括用于燃烧包含烧绿石复合氧化物的混合原料的燃烧步骤包括镧和锆的类型结构和锂化合物。

7. 发明专利

JP2013234855A Manufacture method of sample, and device for removing damage layer 有权
标题翻译：制造方法，以及用于去除损伤层的装置
公开(公告)号：JP2013234855A
公开(公告)日：2013-11-21
申请号：JP2012105565
申请日：2012-05-07
申请人： Japan Fine Ceramics Center , 一般財団法人ファインセラミックスセンター
发明人： SATO TAKASHI , YAMAMOTO KAZUO , HIRAYAMA TSUKASA
IPC分类号： G01N1/28 , G01N1/32 , G01N27/02 , H01J37/305
摘要： PROBLEM TO BE SOLVED: To provide a sample suitable for the on-site observation of an electrical element in an operation state.SOLUTION: In order to make a sample for the on-site observation of an electrical element in an operation state, a sample piece is cut out from an electrical element, so that a thin film part 920 is formed on a sample piece 910a by focused ion beam method. Subsequently the thin film region including the thin film part 920 is irradiated with inert gas ion beams. A damage layer which is formed during formation of the thin film part 920 and affects the action of the sample piece 910a as an electrical element is thus removed. When the damage layer is removed, predefined electrical characteristics of the sample piece 910a are evaluated for determination of whether the sample piece 910a is workable as an electrical element.
摘要翻译：要解决的问题：提供适于在操作状态下现场观察电气元件的样品。解决方案：为了在操作状态下制作用于现场观察电气元件的样品，样品从电气元件切出片，从而通过聚焦离子束法在样品片910a上形成薄膜部分920。随后，用惰性气体离子束照射包括薄膜部分920的薄膜区域。因此，去除了在形成薄膜部分920期间形成并影响作为电气元件的样品片910a的作用的损伤层。当去除损伤层时，评估样品片910a的预定电特性以确定样品片910a是否可作为电元件。

8. 发明专利

JP2014191969A Observation device for observing form of stress application region of film-like specimen, and observation jig 审中-公开
标题翻译：用于观察薄膜样品应力区域的观察装置，以及观察JIG
公开(公告)号：JP2014191969A
公开(公告)日：2014-10-06
申请号：JP2013065957
申请日：2013-03-27
申请人： Japan Fine Ceramics Center , 一般財団法人ファインセラミックスセンター
发明人： HAMANAKA TADASHI , KATO TAKEHARU , HIRAYAMA TSUKASA , YOKOE DAISAKU , YOSHIDA RYUJI
IPC分类号： H01J37/20
摘要： PROBLEM TO BE SOLVED: To more easily observe a form of a stress application region in the case where a local stress is applied to a film-like specimen.SOLUTION: An observation device for observing a form of a stress application region of a film-like specimen SPC comprises: a microscope; a base 210 disposed within a preset distance from an objective lens of the microscope; a height adjusting screw 220 which is provided in the base 210 closer to the objective lens and extends in an optical axis direction; a specimen holder 230 in which a screw hole 232 is provided into which the height adjusting screw 220 can be threaded and which penetrates the holder in an optical axis direction, and the specimen SPC is fixed over the screw hole 232; and a blade holder 242 in which a blade 244 is provided for locally applying a stress to the specimen SPC and which is configured to be abutted to the height adjusting screw 220 closer to the objective lens. A distance between an end of the height adjusting screw 220 closer to the objective lens and the base 210 is kept constant.
摘要翻译：要解决的问题：在局部应力施加到薄膜样品的情况下，更容易观察应力施加区域的形式。解决方案：一种用于观察膜状试样的应力施加区域形式的观察装置，样品SPC包括：显微镜; 设置在距显微镜的物镜预定距离内的基座210; 高度调节螺钉220设置在靠近物镜的基座210中并沿光轴方向延伸; 其中设置有螺纹孔232的样本保持器230，高度调节螺钉220可以被螺纹连接并且沿光轴方向穿过保持器，并且样本SPC被固定在螺钉孔232上; 以及刀片保持器242，其中设置刀片244用于对样本SPC局部施加应力，并且构造成抵靠靠近物镜的高度调节螺钉220。高度调节螺钉220的靠近物镜的端部与基座210之间的距离保持恒定。

9. 发明专利

JP2009070604A Sample support stage for observing three-dimensional structure, protractor and three-dimensional structure observing method 审中-公开
标题翻译：观察三维结构，三维结构和三维结构观察方法的样本支持阶段
公开(公告)号：JP2009070604A
公开(公告)日：2009-04-02
申请号：JP2007235315
申请日：2007-09-11
申请人： Japan Fine Ceramics Center , Univ Nagoya , 国立大学法人名古屋大学 , 財団法人ファインセラミックスセンター
发明人： YOSHIDA KENTA , HIRAYAMA TSUKASA , YAMAMOTO KAZUO , NAE RAI , TANAKA NOBUO , SAITO AKIRA , YAMAZAKI JUN
IPC分类号： H01J37/20
摘要： PROBLEM TO BE SOLVED: To provide a sample support stage for observing a three-dimensional structure of high versatility with a sample constitution while adopting a constitution capable of always holding a sample in the visual field center of an electron microscope, a protractor and a three-dimensional structure observing method.
SOLUTION: This sample support stage 30 has a base 31 and a sample support member 32 rotatably arranged to the base 31, and is arranged via a holder 10 in a tip part of a rotary member 16 rotatable in a ± specific angle range from a reference attitude. The protractor 40 marked with a plurality of angle graduations at a specific angle interval is installed on the sample support stage 30. While adjusting an index 34 of the sample support member 32 to the graduations 42 of the protractor 40, a plurality of turning angle states rotated stepwise at a specific angle interval to the base 31 are maintained, and the sample can be observed from all the directions of 360° by successively rotating a rotary member at the ± specific angle in the respective turning angle states.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：为了提供一种用于在采用能够将样品始终保持在电子显微镜的视场中心的构造的情况下用样品构成观察高通用性的三维结构的样品支撑台，量角器和三维结构观察方法。解决方案：该样品支撑台30具有基部31和可旋转地布置到基部31的样品支撑构件32，并且经由支架10布置在旋转构件16的可在±特定角度范围内旋转的顶端部分从参考态度。在样品支撑台30上安装有以特定角度间隔标记有多个角度刻度的量角器40。在将样品支撑构件32的折痕34调整到量角器40的刻度42时，多个转动角状态保持与基座31成一定角度的间隔逐步旋转，并且可以通过在旋转角度状态下以±特定角度继续旋转旋转部件，从360°的所有方向观察样本。版权所有（C）2009，JPO＆INPIT

10. 发明专利

JP2004233076A Calculation of magnetic field characteristic distribution of object using microvolume element 有权
公开(公告)号：JP2004233076A
公开(公告)日：2004-08-19
申请号：JP2003018764
申请日：2003-01-28
申请人： Japan Fine Ceramics Center , 財団法人ファインセラミックスセンター
发明人： YAMAMOTO KAZUO , HIRAYAMA TSUKASA
IPC分类号： G01R33/10 , G01R33/12 , G06F17/11
摘要： PROBLEM TO BE SOLVED: To provide a method for obtaining the magnetic field characteristic distribution regarding an object having an arbitrary shape or an arbitrary magnetic domain structure by calculation.
SOLUTION: An object model is prepared, where an object to be calculated is divided into microvolume elements having a specific shape. Additionally, a unit magnetic field characteristic distribution that is the magnetic field characteristic distribution of the microvolume element is prepared. Then, the unit magnetic field characteristic distribution of a plurality of microvolume elements for composing the object model is calculated, and the magnetic field characteristic distribution of the object is obtained, based on the addition result.
COPYRIGHT: (C)2004,JPO&NCIPI

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