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    • 2. 发明专利
    • Pattern drawing method and mask for contact x-ray lithography
    • 用于联系X射线光刻的图形绘制方法和掩模
    • JP2004342872A
    • 2004-12-02
    • JP2003138338
    • 2003-05-16
    • Univ Waseda学校法人早稲田大学
    • TOYODA EIJIROWASHIO MASAICHI
    • G03F1/22G03F7/20H01L21/027G03F1/16
    • PROBLEM TO BE SOLVED: To provide a pattern drawing method for contact X-ray lithography wherein drawing is carried out by moving the zeroth-order diffraction image of an opening formed in a mask relatively with respect to a substrate applied with a photosensitive agent, and which enables high-contrast continuous drawing.
      SOLUTION: Using the mask (50) which is such that annular openings (54) are formed in an X-ray absorbing layer (52) formed on a mask substrate (8) which is virtually transparent with respect to X-rays, the light intensity is enhanced at positions on the substrate (6) along which the central line of each opening (54) passes by the diffraction effect of the openings (54) and the phase shift effect of the X-ray absorbing layer (52).
      COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:提供一种用于接触X射线光刻的图案描绘方法,其中通过相对于施加感光体的基底移动形成在掩模中的开口的零级衍射图像来进行拉伸 代理,并且可实现高对比度连续绘图。 解决方案:使用在相对于X射线实质上透明的掩模基板(8)上形成的X射线吸收层(52)中形成环状开口(54)的掩模(50) ,在每个开口(54)的中心线通过开口(54)的衍射效应的基板(6)上的位置和X射线吸收层(52)的相移效应的位置处增强了光强度 )。 版权所有(C)2005,JPO&NCIPI
    • 6. 发明专利
    • Electric field processing device
    • 电场加工装置
    • JP2007190041A
    • 2007-08-02
    • JP2006008156
    • 2006-01-17
    • Hexa KkUniv Wasedaヘキサ株式会社学校法人早稲田大学
    • WASHIO MASAICHIOSHIMA AKIHIROWASHIO MASAHIRO
    • A47J37/12
    • PROBLEM TO BE SOLVED: To sufficiently secure the electric field obtained by applying alternating voltage of the same polarity to a relative area of an electrode and to fully exhibit the intended equipment performance.
      SOLUTION: A fryer 10 is composed of an oil tub 11 in which frying oil L is stored, a pair of insulators 12 and 12 disposed inside the oil tub 11, a pair of electrodes 13 and 13 disposed inside the insulators 12 and 12, and a heating pipe 14 for heating the frying oil L. The electrodes 13 and 13 are disposed apart from the apparatus component members such as the oil tub 11 and the heating pipe 14 connected to the earth at the insulation distance of at least 10 mm, or preferably, at least 20 mm. The alternating voltage of the same polarity and the same phase is applied to the respective electrodes 13 and 13 alternately at the same timing.
      COPYRIGHT: (C)2007,JPO&INPIT
    • 要解决的问题:为了充分确保通过将相同极性的交变电压施加到电极的相对面积而获得的电场,并且充分展现出预期的设备性能。 解决方案:油炸锅10由储存有油炸油L的油桶11,设置在油桶11内部的一对绝缘体12和12,设置在绝缘体12内部的一对电极13和13构成, 12和用于加热煎炸油L的加热管14.电极13和13与绝缘距离至少为10°的连接到地面的油桶11和加热管14之类的装置部件配置 mm,优选为至少20mm。 相同极性和相同相位的交流电压在相同的时刻交替地施加到各个电极13和13。 版权所有(C)2007,JPO&INPIT
    • 7. 发明专利
    • Drawing method of contact x-ray lithography
    • 接触X射线光刻的绘图方法
    • JP2005166708A
    • 2005-06-23
    • JP2003399727
    • 2003-11-28
    • Univ Waseda学校法人早稲田大学
    • TOYODA EIJIROWASHIO MASAICHI
    • G03F7/20H01L21/027
    • PROBLEM TO BE SOLVED: To realize high contrast drawing in a pattern drawing method of a close X-ray lithography, with which an intermittent parallel linear pattern where parallel lines in a regular interval (p) are periodically intermittent at every fixed interval is drawn.
      SOLUTION: (a) A thin film of resist (11) is formed on the surface of a substrate (6) serving as an object of exposure. (b) A mask for forming LS pattern, which has a pitch (2p) twice as much as a parallel line of the intermittent parallel linear pattern, is doubly exposed at two positions whose interval (1+2n)p ((n) is a "0" or positive integer.) is deviated in a space widthwise direction, and an LS pattern of one pitch (p) interval is formed in resist (11). (c) An unexposed continuous line of the LS pattern formed in resist (11) in the step (b) is parted and exposed by using a mask for forming spot pattern, in which a spot pattern is formed at a pitch of (1+m)p ((m) is an integer of one or above.) in the space width direction of the mask for forming LS pattern.
      COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:为了在紧密的X射线光刻的图形绘制方法中实现高对比度绘制,其中以每个固定间隔周期性地间断地以规则间隔(p)的平行线的间歇并行线图案 被绘制 解决方案:(a)在用作曝光对象的基板(6)的表面上形成抗蚀剂(11)薄膜。 (b)用于形成LS图案的掩模,其间隔(2p)是间断平行线形图案的平行线的两倍,在间隔(1 + 2n)p((n)为 “0”或正整数)在空间宽度方向上偏离,并且在抗蚀剂(11)中形成一个间距(p)间隔的LS图案。 (c)通过使用用于形成点图案的掩模来分离并曝光在步骤(b)中形成在抗蚀剂(11)中的LS图案的未曝光连续线,其中以(1+ m)在形成LS图案的掩模的空间宽度方向上p((m)是1以上的整数)。 版权所有(C)2005,JPO&NCIPI