专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JPS59117261A One dimension photosensor 失效
标题翻译：一维照相机
公开(公告)号：JPS59117261A
公开(公告)日：1984-07-06
申请号：JP22632282
申请日：1982-12-24
申请人： Hitachi Ltd , Hitachi Tokyo Electronics Co Ltd
发明人： HORI GIICHI
IPC分类号： H04N1/028 , H01L21/339 , H01L27/146 , H01L27/148 , H01L29/762
CPC分类号： H01L27/14825
摘要： PURPOSE:To obtain an image signal efficiently, by making gates common for every MOSFET group of transfer gates, which are divided into several units, providing a variable bit length in a combination of bits which supply a timing output to each gate, thereby selecting the optimum bit length for a scanning area. CONSTITUTION:When an output bit length is 512 bits, control signals C1-C3 are set at a logic ''1''. Then timing signals phig1-phig4 are simultaneously supplied to all transfer gates MOSFET 2a and 2b, and an image signal formed by 512 photodiodes is outputted. When a scanning area is made small and all the control signals C1-C3 are made to be logic ''0'', the image signal is outputted from 128 photodiodes. The transfer time is reduced to 1/4. The contents of CCD registers 3a and 3b are automatically cleared by the last bit. Therefore extra processing such as cut out of unnecessary image signal can be eliminated, and the efficient scanning in correspondence with the size of an object can be performed.
摘要翻译：目的：为了有效地获得图像信号，通过将分为多个单元的传输门的每个MOSFET组共用门，在向每个栅极提供定时输出的位组合中提供可变位长度，从而选择扫描区域的最佳位长度。构成：当输出位长度为512位时，控制信号C1-C3设置为逻辑“1”。然后定时信号phig1-phig4同时提供给所有传输门MOSFET 2a和2b，并且输出由512个光电二极管形成的图像信号。当扫描区域变小并且所有控制信号C1-C3变为逻辑“0”时，图像信号从128个光电二极管输出。传输时间减少到1/4。 CCD寄存器3a和3b的内容由最后一位自动清零。因此，可以消除诸如切出不需要的图像信号的额外处理，并且可以执行与对象的尺寸相对应的有效扫描。

2. 发明专利

JPH05141936A APPEARANCE INSPECTING DEVICE 失效
公开(公告)号：JPH05141936A
公开(公告)日：1993-06-08
申请号：JP31042291
申请日：1991-11-26
申请人： HITACHI LTD , HITACHI TOKYO ELECTRONICS
发明人： SOEDA HIDEKI , HORI GIICHI , SAITO MIKITO
IPC分类号： G01B11/24 , G01N21/88 , G06K9/78 , H01L21/66 , H01L27/14
摘要： PURPOSE:To easily observe the shift output signal of all bits of a multi-channel charge coupled device (CCD) by outputting the image input signal from the CCD front one end to the other end of the detection visual field of the CCD in sequence. CONSTITUTION:The image input signal from a CCD 1 is converted into the digital signal by an A/D converter 2 and inputted to a memory 3 for each channel. The image input digital signal inputted to the memory 3 is outputted in sequence from the channel No.1 to the channel No.(n) of the memory 3, where (n) is the number of channels. The address corresponding to the bit position of the CCD 1 and the readout timing signal chip-selecting the memory 3 from the channel No.1 to the channel No.(n) in sequence are inputted to the memory 3 from a timing generator 5. The digital signal read out is converted into the analog signal by a D/A converter 4 and outputted.

3. 发明专利

JPS60103616A METHOD OF INSPECTION OF DEFECT 失效
公开(公告)号：JPS60103616A
公开(公告)日：1985-06-07
申请号：JP21093483
申请日：1983-11-11
申请人： HITACHI OME ELECTRONIC CO , HITACHI LTD
发明人： HORI GIICHI , YABUHARA YOUJI
IPC分类号： G01N21/88 , G01N21/93 , G01N21/956 , G03F1/84 , H01L21/027 , H01L21/30 , H01L21/66
摘要： PURPOSE:To ensure a high-speed inspection in the section of an ordinary pattern density and to restrain prolongation of the total inspection time by avoiding a delay in input of an ideal pattern relatively by delaying an input time of a real pattern in the section of a high pattern density. CONSTITUTION:When a CCD5 starts scanning in Y-direction by the movement of an X-Y table 2, the CCD5 takes the picture of the pattern of a mask 1 and a real pattern is stored in a memory 8. Meanwhile, the inspection data corresponding to the design pattern data are read out from a tape 11 and a ideal pattern is formed by a forming device 14 based on said data and is stored in an ideal pattern memory 15. If the pattern density in the mask 1 is low in a scanning line region, scanning of the CCD5 in Y direction is performed at an ordinary high speed and if it is high, the scanning is performed at a low speed. As the input for a defect dicision circuit 9 is performed for every two periods, there is no possibility that the input of the ideal pattern from the ideal pattern memory 15 is late for the input of the real pattern.

4. 发明专利

JP2001281164A METHOD AND DEVICE FOR INSPECTING PATTERN 失效
公开(公告)号：JP2001281164A
公开(公告)日：2001-10-10
申请号：JP2001041851
申请日：2001-02-19
申请人： HITACHI LTD
发明人： TANIGUCHI YUZO , FUKUI TORU , SAITO MIKITO , HORI GIICHI , KAMAGATA TAKAHIRO
IPC分类号： G01N21/956 , G06T1/00 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide a pattern defect inspecting technology capable of realizing both an enhancement of detection sensitivity and an enhancement of inspection speed. SOLUTION: A chip comparison inspection for comparing patterns of two adjoining chips on an inspected object and a repetitive pattern comparison inspection for comparing same patterns with each other in the same pattern repetition part in a chip are carried out in parallel.

5. 发明专利

JPH04109647A AUTOMATIC EXTERNAL APPEARANCE INSPECTING DEVICE 失效
公开(公告)号：JPH04109647A
公开(公告)日：1992-04-10
申请号：JP22717290
申请日：1990-08-29
申请人： HITACHI LTD , HITACHI TOKYO ELECTRONICS
发明人： TANIGUCHI YUZO , HORI GIICHI
IPC分类号： G01N21/88 , G01N21/956 , H01L21/66
摘要： PURPOSE:To improve a detecting ratio and to reduce an erroneously detecting ratio by providing processing means for setting an optimum differentiating formula in response to the dense or pale of an image signal of a pattern, differentiating the image signal and aligning with its differentiated value. CONSTITUTION:Processing means 14, 15 for setting an optimum differentiating formula in response to the dense or pale of an image signal of a pattern, differentiating the image signal based on the formula and aligning with its differentiated value, are provided. That is, since a differentiated signal for differentiating the signal of the pattern by the set optimum formula indicates a position where the density change of the image is vigorous and a position having an edge, relative positional deviation between the patterns can be known by comparing the differentiated signals of the two points of the same pattern. Thus, only a defective part can be subjected to defect check to improve a detecting accuracy.

6. 发明专利

JPH04107945A AUTOMATIC VISUAL INSPECTOR 失效
公开(公告)号：JPH04107945A
公开(公告)日：1992-04-09
申请号：JP22717090
申请日：1990-08-29
申请人： HITACHI LTD , HITACHI TOKYO ELECTRONICS
发明人： TANIGUCHI YUZO , SAITO MIKITO , HORI GIICHI , YODA HARUO
IPC分类号： H01L21/66 , G01N21/88 , G01N21/956
摘要： PURPOSE:To detect a deficiency with high sensitivity by providing a histogram processing means for obtaining the variable-density distribution of the picture of the pattern of an object to be inspected and an operating means for operating an optimum concentration transformation based on processing results of the histogram processing means and setting the obtained function in a concentration converter. CONSTITUTION:The reflected light of a semiconductor wafer 3 passes through a half mirror 7 to image a pattern on a light-intercepting element 8. A picture signal photoelectrically transferred by the light-intercepting element 8 is amplified by a signal processing circuit 9 and formed into a multiple gradation picture signal by an A/D converter 10. The output signal of the A/D converter 10 is inputted to a concentration converter 11 and picture memory 12 and inputted to a histogram processor 13 for counting the frequency distribution of the variable-density value of a picture information read from this picture memory 12. The processing results of the histogram processor are read by a computer 14. The computer 14 calculates an optimum concentration transformation based on data of a variable-density histogram to set the function value in the concentration converter 11. The concentration-converted signal is applied to a deficiency detector 15 for the purpose of conducting the detection of deficiency. Thus, it is always possible to detect a deficiency with high sensitivity.

7. 发明专利

JPH03232250A METHOD AND DEVICE FOR INSPECTING PATTERN 失效
公开(公告)号：JPH03232250A
公开(公告)日：1991-10-16
申请号：JP33260890
申请日：1990-11-29
申请人： HITACHI LTD , HITACHI TOKYO ELECTRONICS
发明人： TANIGUCHI YUZO , FUKUI TORU , SAITO MIKITO , HORI GIICHI , KAMAGATA TAKAHIRO
IPC分类号： H01L21/66 , G01N21/93 , G01N21/956
摘要： PURPOSE:To enable a repetitive pattern comparison inspection excellent in detection sensitivity to be applied to a repetitive pattern section so as to improve a pattern check device in detection sensitivity and check speed by a method wherein the repetitive pattern section such as the photodetective section of a photosensor and a peripheral circuit are separately inspected by the use of different circuits. CONSTITUTION:Either of the outputs of an AD converter 9 is stored in a repetitive pattern delay memory 11 which stores an image data by a pattern repetition pitch. The difference between the outputted signal delayed by a cycle of pattern and a non-delayed signal is obtained by a comparator 12', which is compared with the set value of a threshold circuit where a prescribed density difference threshold value is previously set, and when it is found that the density difference concerned is higher than the threshold value, the threshold circuit 13' outputs a signal as a potential defect signal. The signal concerned is outputted only when a defect output is possible through a repetitive pattern comparison inspection output control circuit 14', a defect larger than a certain size is detected through a defect size decision circuit 15', the detected result is stored in an inspection result memory 16', and data can be read by a computer 23.

8. 发明专利

JPH02210249A METHOD AND DEVICE FOR INSPECTING APPEARANCE 失效
公开(公告)号：JPH02210249A
公开(公告)日：1990-08-21
申请号：JP3159189
申请日：1989-02-10
申请人： HITACHI LTD , HITACHI TOKYO ELECTRONICS
发明人： TANIGUCHI YUZO , FUKUI TORU , MAKIHIRA HIROSHI , SATO OSAMU , HORI GIICHI
IPC分类号： G01B11/30 , G01N21/88 , G01N21/94 , G01N21/95 , G01N21/956 , H01L21/66
摘要： PURPOSE:To enhance scanning efficiency and a speed for inspecting appearance by successively scanning plural areas arranged in a matrix direction on an object to be inspected and starting the scanning for a next row with an area adjacent to a scanning final area as a head. CONSTITUTION:A Ztheta stage 2 is placed on an XY stage 1 and a semiconductor wafer 3 is placed on the stage 2 as the object to be inspected. An optical recognition means is obtained by constituting a line sensor 71 of a CCD driven with clock pulses. The wafer 3 is irradiated with light from an illuminating light source 4 through a half mirror 6 and an objective lens 5 and detecting light which reaches the sensor 71 is converted into a binary image signal by a signal processing circuit 8 and inputted in an image storage circuit 14 and a signal comparison circuit 9. When the scanning of one row is completed in the case of the scanning of the sensor 71, the detection signal of the final area of the previous row is read out in a reverse direction by a storage circuit 14 so that the head area of the scanning of the next row may be an area which is the nearest to the final area. Thus, the scanning efficiency and the speed for inspecting the appearance are enhanced.

9. 发明专利

JPS63126242A APPEARANCE INSPECTION AND DEVICE THEREFOR 失效
公开(公告)号：JPS63126242A
公开(公告)日：1988-05-30
申请号：JP27185986
申请日：1986-11-17
申请人： HITACHI LTD , HITACHI TOKYO ELECTRONICS
发明人： SAITO MIKITO , HORI GIICHI
IPC分类号： H01L21/66 , G01N21/88 , G01N21/93 , G01N21/956
摘要： PURPOSE:To contrive an increase in the accuracy of an inspection by a method wherein a threshold value which is used as a reference for detecting defect in a site to be inspected is controlled according to the density or dimension of a calculated pattern. CONSTITUTION:A semiconductor wafer 1 placed on an X-Y stage is moved relatively to objectives 2 and 3 and the image of a site D to be inspected and the picture image of a reference site R are respectively detected by an image sensing element 2a and an image sensing element 3a. A difference between an inspection picture image signal 4 and a a reference picture image signal 5, which is calculated in a difference arithmetic part 6, is inputted in a decision part 9 through a difference signal delay part 8, and at the same time, the difference picture image signal 5 is inputted in a pattern density decision part 10 to obtain a pattern density signal 11. A threshold calculating part 12 inputs a threshold signal 13 to correspond to this calculated density signal in the decision part 9. The decision part 9 performs a decision of defect in the site D to be inspected using the optimum threshold value 13 to correspond to a pattern density existing in the side D to be inspected.

10. 发明专利

JP2003098118A METHOD AND APPARATUS FOR INSPECTING PATTERN 审中-公开
公开(公告)号：JP2003098118A
公开(公告)日：2003-04-03
申请号：JP2002161819
申请日：2002-06-03
申请人： HITACHI LTD
发明人： TANIGUCHI YUZO , FUKUI TORU , SAITO MIKITO , HORI GIICHI , KAMAGATA TAKAHIRO
IPC分类号： G01B11/24 , G01N21/956 , G06T1/00 , G06T7/00 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide a technique for inspecting pattern defects in which improving the detection sensitivity and improving the inspection speed can be realized at the same time. SOLUTION: In a pattern inspection method used in a visual inspection such as an inspection of defects in a pattern of an object to be inspected such as a semiconductor wafer, a chip comparison inspection of comparing patterns of adjoining two chips on the object and a repeated pattern comparison inspection of comparing equal patterns of equal repeated pattern parts in the chips with each other are carried out to continuously detected images while a separate threshold is set to each. The obtained results of the chip comparison inspection and of the pattern inspection are outputted after edited.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式