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1. 发明专利

JP2004177284A Defect inspecting apparatus and defect inspection method 有权
公开(公告)号：JP2004177284A
公开(公告)日：2004-06-24
申请号：JP2002344327
申请日：2002-11-27
申请人： Hitachi Electronics Eng Co Ltd , Hitachi Ltd , 日立電子エンジニアリング株式会社 , 株式会社日立製作所
发明人： UTO YUKIO , NOGUCHI MINORU , NISHIYAMA HIDETOSHI , OSHIMA YOSHIMASA , HAMAMATSU REI , JINGU TAKAHIRO , NAKADA TOSHIHIKO , WATANABE MASAHIRO
IPC分类号： G01N21/956 , G01N21/95 , G06T7/00
CPC分类号： G01N21/00 , G01N21/9501 , G06T7/0004 , G06T2207/30148
摘要： PROBLEM TO BE SOLVED: To provide a defect inspecting apparatus and its method for sensitively and quickly inspecting defects, such as minute foreign particles, flaws, etc. of the order of 0.1μm on an inspection substrate, such as a wafer having a transparent thin film on a surface, a wafer having a circuit pattern, etc. SOLUTION: The defect inspecting apparatus is provided with an illumination optical system 10 for irradiating an illumination light flux on a surface of the inspection substrate 1 at a determined tilt angle and a detection optical system 200, having an upward detection optical system 20 for detecting upwardly reflected and scattered light which is emitted upwardly from the inspection substrate 1 and a lateral detection optical system 600 for detecting the lateral reflected scattered light emitted from the inspection substrate 1, in a direction inclined with respect to the direction for two-dimensionally intersecting the illumination light flux. COPYRIGHT: (C)2004,JPO

2. 发明专利

JP2004184142A Defect inspection method and apparatus therefor 审中-公开
标题翻译：缺陷检查方法及其设备
公开(公告)号：JP2004184142A
公开(公告)日：2004-07-02
申请号：JP2002349357
申请日：2002-12-02
申请人： Hitachi Electronics Eng Co Ltd , Hitachi Ltd , 日立電子エンジニアリング株式会社 , 株式会社日立製作所
发明人： HAMAMATSU REI , NOGUCHI MINORU , NISHIYAMA HIDETOSHI , OSHIMA YOSHIMASA , JINGU TAKAHIRO , UTO YUKIO
IPC分类号： G01B11/30 , G01N21/956 , G06T1/00 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To efficiently separate a signal from a pattern from a signal from a defect, in a technique for inspecting a micro circuit pattern using an image formed by irradiation with a white light, a laser beam or an electron beam.
SOLUTION: This inspection apparatus for a semiconductor device is provided with a function for shielding selectively diffracted light of the circuit pattern existing on an object to be inspected.
COPYRIGHT: (C)2004,JPO&NCIPI
摘要翻译：要解决的问题：为了有效地将信号与来自缺陷的信号分离，在使用通过用白光照射形成的图像，激光束或电子束的微电路图案的检查技术中。解决方案：该半导体装置的检查装置具有选择存在于待检查对象上的电路图案的衍射光的屏蔽功能。版权所有（C）2004，JPO＆NCIPI

3. 发明专利

JP2004177377A Inspecting method and inspecting apparatus 审中-公开
公开(公告)号：JP2004177377A
公开(公告)日：2004-06-24
申请号：JP2002347134
申请日：2002-11-29
申请人： Hitachi Electronics Eng Co Ltd , Hitachi Ltd , 日立電子エンジニアリング株式会社 , 株式会社日立製作所
发明人： HAMAMATSU REI , NOGUCHI MINORU , NISHIYAMA HIDETOSHI , OSHIMA YOSHIMASA , JINGU TAKAHIRO , UTO YUKIO
IPC分类号： G01B11/30 , G01N21/88 , G01N21/94 , G01N21/95 , G01N21/956 , H01L21/66
CPC分类号： G01N21/8806 , G01N21/94 , G01N21/9501 , G01N21/95623
摘要： PROBLEM TO BE SOLVED: To efficiently separate a signal from a pattern from a signal from a defect, in a technology of inspecting a micro circuit pattern using an image formed by irradiating with a white light, a laser beam, or an electronic beam.
SOLUTION: In this inspecting apparatus 91 of a semiconductor device, a space filter on which a Fourier transformation image of a circuit pattern on an inspected object is printed is disposed in a detection optical system 200, and a diffracted light of the circuit pattern existing on the inspected object is shielded selectively. Using the space filter on which the Fourier transformation image of the pattern on a wafer 1 is printed, a foreign matter and a defect can be detected with high accuracy and high sensitivity.
COPYRIGHT: (C)2004,JPO

4. 发明专利

JP2004093252A Defect inspection device and defect inspection method 有权
公开(公告)号：JP2004093252A
公开(公告)日：2004-03-25
申请号：JP2002252799
申请日：2002-08-30
申请人： Hitachi Electronics Eng Co Ltd , Hitachi Ltd , 日立電子エンジニアリング株式会社 , 株式会社日立製作所
发明人： NISHIYAMA HIDETOSHI , NOGUCHI MINORU , HAMAMATSU REI , OSHIMA YOSHIMASA , UTO YUKIO , JINGU TAKAHIRO , CHIKAMATSU SHUICHI , YAMASHITA HIROYUKI
IPC分类号： G01N21/956 , G06T1/00 , G06T7/00 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide a device and a method capable of rapidly and accurately inspecting micro foreign matters and pattern defects occurring in a production process in a device manufacturing process in which circuit patterns are formed on a substrate such as a semiconductor device. SOLUTION: According to the inspected object, the angle of illumination radiated to the inspected object is optimized, and the magnification of a detection optical system detecting reflected scattered light from the inspected object is optimized to provide signals from an optical system. From the signals, foreign matters or defects in a plurality of detection pixel sizes are detected and, based on the features thereof, the foreign matters or defects are classified into categories. COPYRIGHT: (C)2004,JPO

5. 发明专利

JP2003042967A Inspection device for pattern defect 审中-公开
标题翻译：用于图案缺陷的检查装置
公开(公告)号：JP2003042967A
公开(公告)日：2003-02-13
申请号：JP2001228166
申请日：2001-07-27
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： UTO YUKIO , YOSHIDA MINORU , NAKADA TOSHIHIKO , MAEDA SHUNJI , SHIMODA ATSUSHI
IPC分类号： G01N21/33 , G01N21/95 , G01N21/956 , H01L21/66
CPC分类号： G01N21/21 , G01N21/33 , G01N21/55 , G01N21/9501 , G01N21/956 , G01N21/95607 , G01N2021/151 , G01N2021/95615 , G01N2201/06113 , G01N2201/1035
摘要： PROBLEM TO BE SOLVED: To provide an inspection device for pattern defects, capable of realizing high reliability stable pattern defect inspection, having high resolution relative to minute patterns by using an ultraviolet laser beam as the light source.
SOLUTION: In this pattern defect inspection device, the quantity change in the ultraviolet laser beam is detected during inspection, to thereby determine the existence of an influence on the inspection, and service life prediction and abnormality of the light source are detected, and the inside of an optical system is cleaned, to thereby ensure prolongation of service life and long-term reliability of optical parts.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：提供一种能够实现高可靠性稳定图案缺陷检查的图形缺陷检查装置，通过使用紫外激光束作为光源，相对于微小图案具有高分辨率。解决方案：在该图案缺陷检查装置中，在检查期间检测紫外激光束的数量变化，从而确定对检查的影响的存在，并检测使用寿命预测和光源的异常，并且内部清洁光学系统，从而确保光学部件的使用寿命延长和长期可靠性。

6. 发明专利

JP2003329610A Method and apparatus for inspecting pattern defects 有权
标题翻译：检查图案缺陷的方法和装置
公开(公告)号：JP2003329610A
公开(公告)日：2003-11-19
申请号：JP2002134839
申请日：2002-05-10
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： UTO YUKIO , YOSHIDA MINORU , NAKADA TOSHIHIKO , MAEDA SHUNJI
IPC分类号： G01B11/30 , G01N21/94 , G01N21/95 , G01N21/956 , H01L21/66
CPC分类号： G01N21/956 , G01N21/94 , G01N2021/9513 , G01N2201/10 , G01N2201/1045
摘要： PROBLEM TO BE SOLVED: To provide an apparatus for inspecting pattern defects provided with an illumination optical system and a detecting optical system wherein the quantity of detected light of an image sensor does not change depending on the place by the change of the incident angle of an illumination light and the thickness change of a thin film formed on a specimen surface, and an unevenness in brightness is not produced on the detected image. SOLUTION: This apparatus for inspecting pattern defects is provided with a laser light source 3 eradiating the illumination light on a specimen, a coherent reducing optical system for reducing the coherence of the laser, a converging means for converging the laser light to the pupil position of an object lens 11, and a means for detecting the reflected light from a circuit pattern formed on a substrate from a position above the substrate. An illuminance light impinged onto the object substrate to be inspected is partially adjusted by matching the illumination light impinged on the specimen 1 with the irradiation form of the laser light converged at the pupil position of the object lens by the converging means. Therefore, the fluctuation in the intensity of the reflected light due to the thickness difference of the specimen surface can be reduced, an unevenness in brightness of the detected image can be suppressed and a minute defect can be detected. COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：提供一种用于检查具有照明光学系统和检测光学系统的图案缺陷的设备，其中图像传感器的检测光的量根据事件的变化而不会改变检测图像上不产生照明光的角度和形成在试样表面上的薄膜的厚度变化，亮度不均匀。解决方案：用于检查图案缺陷的装置设置有对标本上的照明光进行扫描的激光光源3，用于降低激光器的相干性的相干减少光学系统，用于将激光会聚到物镜11的光瞳位置，以及用于从基板上方的位置检测来自形成在基板上的电路图案的反射光的装置。通过使被照射在被检体1上的照明光与会聚装置在物镜的瞳孔位置会聚的激光的照射形式匹配，照射被检查物体基板上的照度光。因此，可以减少由于样品表面的厚度差引起的反射光强度的波动，可以抑制检测图像的亮度不均匀性并且可以检测到微小的缺陷。版权所有（C）2004，JPO

7. 发明专利

JP2006064496A Measuring method and measuring device for surface roughness of magnetic disk substrate and manufacturing method for magnetic disk 审中-公开
标题翻译：磁盘基板表面粗糙度的测量方法和测量装置及磁盘制造方法
公开(公告)号：JP2006064496A
公开(公告)日：2006-03-09
申请号：JP2004246444
申请日：2004-08-26
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： OKAWA TETSUO , UTO YUKIO
IPC分类号： G01B11/30 , G11B5/84
摘要： PROBLEM TO BE SOLVED: To provide a nondestructive high-precision and high-reproducibility measuring method and device capable of performing measurement in a measuring time shorter than an AFM, by coping with a tendency of reduction in the surface roughness of a disk substrate, resulting from improvements in the performance of a magnetic medium and an advance of reduction in floatation of a magnetic head, and to provide a magnetic disk manufacturing method capable of selecting defective texture of a magnetic disk substrate and reducing production of defective magnetic disks, by the measuring method and measuring device.
SOLUTION: In the method and device for measuring the surface roughness of a magnetic disk substrate by irradiating the surface of the magnetic disk substrate with a laser beam, the laser beam is converged, the angle between the optical axis of the laser beam incident on the surface of the magnetic disk substrate and a texture tangent at a point where the optical axis touches the texture, and the incident angle of the laser beam incident on the surface of the magnetic disk substrate are kept approximately constant, rays of scattered light from the substrate surface are received on a two-dimensional array optical sensor, a scattered light intensity distribution is computed from received optical signals, and the scattered light intensity distribution is converted into a numerical value of the surface roughness.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了提供能够在短于AFM的测量时间内进行测量的非破坏性的高精度和高再现性的测量方法和装置，通过应对减小盘的表面粗糙度的趋势由于磁性介质的性能的提高和磁头的浮起的减少而导致的基板，并且提供一种能够选择磁盘基板的缺陷纹理并减少有缺陷的磁盘的产生的磁盘制造方法，通过测量方法和测量装置。解决方案：在通过用激光束照射磁盘基板的表面来测量磁盘基板的表面粗糙度的方法和装置中，激光束会聚，激光束的光轴之间的角度入射在磁盘基板的表面上，并且在光轴接触纹理的点处的纹理切线，并且入射在磁盘基板的表面上的激光束的入射角保持近似恒定，散射光线从基板表面接收在二维阵列光学传感器上，从接收到的光信号计算散射光强度分布，将散射光强度分布转换为表面粗糙度的数值。版权所有（C）2006，JPO＆NCIPI

8. 发明专利

JP2005333150A Tft substrate and display device 有权
标题翻译： TFT基板和显示装置
公开(公告)号：JP2005333150A
公开(公告)日：2005-12-02
申请号：JP2005171796
申请日：2005-06-13
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： HONGO MIKIO , UTO YUKIO , NOMOTO MINEO , NAKADA TOSHIHIKO , HATANO MUTSUKO , YAMAGUCHI SHINYA , OKURA OSAMU
IPC分类号： G02F1/1362 , G02F1/1368 , H01L21/20 , H01L21/268 , H01L21/336 , H01L29/786
摘要： PROBLEM TO BE SOLVED: To provide a display device having pixel transistors and driving transistors for driving the pixel transistors respectively formed on an identical substrate, adapted to raise mobilities in the active regions of the driving transistors and achieve speed-up thereof. SOLUTION: A polycrystalline silicon film 103 is formed on a major surface of a glass substrate 100 on which pixel transistors and driving transistors are to be formed, and continuously oscillated and rectangularly cross-sectioned laser light 105 is swept along a side of the relevant major surface on a peripheral edge along the relevant side. The polycrystalline silicon film 103, irradiated with the relevant laser light 105, transforms into crystal grains that extend in the sweep direction of the laser light while arrayed through grain boundaries 304, 304' in the direction that crosses the sweep direction, so that the crystal grains can be used as active regions of the driving transistors. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：解决的问题：提供一种具有像素晶体管和驱动晶体管的显示装置，用于驱动分别形成在相同基板上的像素晶体管，其适于提高驱动晶体管的有源区域中的迁移率并实现加速。解决方案：在玻璃基板100的主表面上形成多晶硅膜103，在该主表面上将形成像素晶体管和驱动晶体管，并且连续振荡并且矩形横截面的激光105沿着相关主面在相关边缘的边缘。用相关的激光105照射的多晶硅膜103沿着与扫描方向交叉的方向排列在晶界304,304'的同时沿着激光的扫掠方向转变成晶粒，从而晶体晶粒可以用作驱动晶体管的有源区。版权所有（C）2006，JPO＆NCIPI

9. 发明专利

JP2003051106A Device and method for measuring dimension of thin film magnetic head, and method for manufacturing thin film magnetic head 审中-公开
标题翻译：用于测量薄膜磁头的尺寸的装置和方法以及制造薄膜磁头的方法
公开(公告)号：JP2003051106A
公开(公告)日：2003-02-21
申请号：JP2001239223
申请日：2001-08-07
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： YOSHIDA MINORU , UTO YUKIO , SASAZAWA HIDEAKI , NAKADA TOSHIHIKO
IPC分类号： G01B11/02 , G11B5/31 , G11B5/455
摘要： PROBLEM TO BE SOLVED: To provide a technique for measuring the track width of writing magnetic head formed on a substrate, orthogonally to the writing direction without cutting it out, namely, from the above with high precision, and also to provide a method for manufacturing a thin film magnetic head by using this technique.
SOLUTION: The device is equipped with a lighting optical system for illuminating a light track bottom in a wafer with a light beam, an imaging optical system for forming image of scattering light from the light track bottom, and a measuring part for measuring the dimension of a predetermined portion from a formed image. The lighting optical system emits visible rays, ultraviolet rays or far ultraviolet rays as illuminating light, and is provided with a focusing optical system for focusing an objective lens on the light track bottom. As a result, image measurement of a light track width is made possible with high precision, high stability and high resolution on a wafer, enabling the narrow track width of a GMR head to be measured with high precision.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：提供一种用于测量形成在基板上的写入磁头的磁道宽度的技术，与写入方向正交，而不是高精度地从上方切出，并且还提供一种制造方法通过使用这种技术的薄膜磁头。解决方案：该装置配备有用于用光束照射晶片中的光轨底部的照明光学系统，用于形成来自光轨底部的散射光的图像的成像光学系统和用于测量来自光轨底部的散射光的尺寸的测量部件来自形成图像的预定部分。照明光学系统发射可见光，紫外线或远紫外线作为照明光，并且设置有用于将物镜聚焦在光轨底部上的聚焦光学系统。结果，能够以高精度，高稳定性和高分辨率在晶片上进行光轨宽度的图像测量，从而可以高精度地测量GMR头的窄轨道宽度。

10. 发明专利

JPH08255749A EXPOSURE METHOD 失效
公开(公告)号：JPH08255749A
公开(公告)日：1996-10-01
申请号：JP1140196
申请日：1996-01-26
申请人： HITACHI LTD
发明人： UTO YUKIO , SHIBA MASATAKA , OSHIDA YOSHITADA
IPC分类号： G01N21/88 , G01N21/94 , G01N21/956 , G03F7/20 , H01L21/027 , H01L21/66 , H01L21/677 , H01L21/68
摘要： PURPOSE: To enable high yield exposure to an exposure substrate by exposing an exposure substrate after carrying and positioning a substrate in an exposure position without a foreign matter which is a hindrance to exposure on a surface of a substrate and on a foreign matter attaching prevention film mounted on a substrate with a frame between. CONSTITUTION: A substrate 39 is cleaned, and the substrate 39 whereon a foreign matter attaching prevention film 23 is mounted with a frame 24 between is contained in a magazine 6 put in a cassette without a foreign matter in a presence surface or an absence surface of a circuit pattern. A substrate is unloaded one by one in an exposure process. Meanwhile, if an upper foreign matter inspection device 1 and a lower foreign matter inspection device 2 inspect the absence of a foreign matter, a transfer arm 3 is turned in a direction of an arrow 7a and put in an exposure position and a chip is transferred on an exposure substrate 11 one by one through an exposure optical system 10. After an exposure process is finished, the substrate 39 is contained in a cassette inside the magazine 6 again.

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