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    • 2. 发明专利
    • METHOD AND APPARATUS FOR DESIGNING SEMICONDUCTOR DEVICE
    • JP2000021988A
    • 2000-01-21
    • JP18843898
    • 1998-07-03
    • HITACHI LTDHITACHI ULSI SYS CO LTD
    • TAKIGAWA TOSHIICHIKITAMURA NOBUAKI
    • H01L21/82G06F17/50
    • PROBLEM TO BE SOLVED: To provide a technology for designing semiconductor device by which the occurrence of readjusting man-hour can be suppressed through estimating and verifying the quantities of logical and wiring resources at an early stage. SOLUTION: A device for designing a semiconductor device applies an embedded array, uses an LSI floor plan CAD system and is constituted of a program processing section, etc., using software based on information on microcell shape species, ordinary cell shape species, and chip shape species, etc. The device selects a chip shape by reading the microcell shape, ordinary cell, and chip cell species based on steps 201-211 at designing of the system and outline and, after designating the arrangement of microcells, estimates the quantity of logical resources. Successively, the device makes the estimation of power supply wiring and ordinary wiring for verifying the laying space of chip wiring and the estimation of wiring among microcells for verifying the laying space of the wiring among microcells as the estimation of the quantity of wiring resources. After designing the system and outline, the device conducts the basic design, and at the same time, executes floor planning.
    • 8. 发明专利
    • NOISE SUPPRESSING CIRCUIT
    • JPS63107255A
    • 1988-05-12
    • JP25172486
    • 1986-10-24
    • HITACHI LTDHITACHI VLSI ENG
    • UEDA MASARUKITAMURA NOBUAKI
    • H03K5/1252H03K5/00H04L1/00H04L25/08
    • PURPOSE:To improve the noise discriminating characteristic by providing two shift registers, which transmit a reception digital signal synchronously with the leading edge and the trailing edge of a sampling clock signal, and a majority decision logic circuit which receives output signals consisting of a prescribed number of bits. CONSTITUTION:A noise suppressing circuit consists of two shift registers (flip flops FA1 and FA2 and flip flops FB1 and FB2) which shift a reception digital signal RD synchronously with the leading edge and the trailing edge of a sampling clock signal phis and the majority decision logic circuit which receives output signals having a prescribed number of bits from these shift registers and consists of AND gates AG1-AG6 and NOR gates NOG1 and NOG2. Thus, not only the reception digital signal which is in the high level for a time longer than the period of the sampling clock signal is surely transmitted as reception data but also the reception signal digital signal which is in the high level for a time equal to or shorter than a half period of the sampling clock signal phis is surely eliminated as noise.
    • 10. 发明专利
    • SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE
    • JPS57192062A
    • 1982-11-26
    • JP7646981
    • 1981-05-22
    • HITACHI LTDHITACHI MICROCUMPUTER ENG
    • KITAMURA NOBUAKI
    • H01L27/082H01L21/3205H01L21/66H01L21/8222H01L23/52
    • PURPOSE:To perform accurate measurement for checking logical functions of a lower wiring, by providing terminals which are connected to the lower wiring on a wiring channel region via through hole in an interlayer insulating film on the lower wiring in a wiring structure, and using said terminals for checking the logical functions. CONSTITUTION:The wiring channel region 3 is arranged between logic gates 1 and 2 such as an inverter. A first layer Al wiring 4 between blocks forming a multiple layer wiring structure and a second layer wirings 5-9 crossing the wiring 4 are provided longitudinally and laterally in the region 3. The measuring terminals 11 for checking the logic functions are provided in vacant channel parts 10, wherein no upper wiring layer is provided, in the region 3. Namely, the wiring 4 is provided on a phosphorous silicate glass film 13 on a field SiO2 film 12 in the region 3, and the wirings 5-8 are provided thereon through the interlayer insulating film comprising a phosphorous silicate glass film 14. The through holes 15 are formed in the film 14 by utilizing the space for the vacant channel part 10. The Al measuring terminals 11 are deposited in the holes 15 like the second wiring.