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1. 发明专利

JPH06310076A TRANSMISSION TYPE SCANNING ELECTRON BEAM DEVICE AND SAMPLE DENSITY MEASURING METHOD 失效
公开(公告)号：JPH06310076A
公开(公告)日：1994-11-04
申请号：JP10215393
申请日：1993-04-28
申请人： HITACHI LTD , CENTRAL RES INST ELECT
发明人： NAKAIZUMI YASUSHI , ISHIDA MASAYOSHI , OKAMOTO TATSUKI , OKURA AKIMITSU , NAKAGAWA MINE
IPC分类号： H01J37/05 , H01J37/244 , H01J37/26 , H01J37/28
摘要： PURPOSE:To measure density of a substance in a scanning area by arranging a means to detect incident electron intensity to a sample and a means to detect transmitted electron intensity after passing through the sample, and carrying out computation on a ratio of the incident electron intensity to the transmitted electron intensity. CONSTITUTION:An electron beam 4 emitted from a field emission type electron gun 3 is converged to a narrow electron probe 10 on a surface of a sample 9 by capacitor lenses 5 and 6 and an objective lens 7. Here, in order to make a part of the probe 10 detected by an objective lens diaphragm 26 in proportion to an incident electron current, an absorption electron signal detected by the diaphragm 26 is amplified, and is converted into a signal having incident electron intensity Iin by multiplying a proportional constant. On the other hand, transmitted electron intensity Iout is regarded as the same with a transmitted electron signal detected by a transmitted electron detector 19, and is introduced to a computing circuit 28, and computation on Iin/Iout is carried out, and it is displayed on a CRT22 by a changeover switch 29. Thereby, density of a substance in a scanning area can be found from the relationship between transmissivity of the electron beam of the sample, a sample thickness (t) in the scanning area and density rho of a substance.

2. 发明专利

JPH09134696A SCANNING ELECTRON MICROSCOPE 失效
公开(公告)号：JPH09134696A
公开(公告)日：1997-05-20
申请号：JP29302795
申请日：1995-11-10
申请人： HITACHI LTD , HITACHI INSTRUMENTS ENG
发明人： NAKAGAWA MINE , UENO TAKEO
IPC分类号： H01J37/244
摘要： PROBLEM TO BE SOLVED: To prevent the degradation of an image quality of a secondary electron image, and prevent the degradation of sensitivity of an X-ray detector when a sample holder to heat a sample at a high temperature is provided. SOLUTION: A light shielding plate 13 to shield the emitted light generated from a heating member 11 and a sample is arranged between a sample holder 14 having the heating member 11, a secondary electron detector 9 and an X-ray detector. A primary electron beam 4 is irradiated to the sample through a small hole 22 of the light shielding plate, and a secondary electron 10 generated from the sample is rolled upward by a magnetic field of an objective lens 8, and is detected by the secondary electron detector 9. On the other hand, since the emitted light 12 generated from the heating member 11 or the sample is not made incident on the secondary electron detector 9 and the X-ray detector by being shielded by the light shielding plate 13, the degradation of a secondary electron image and the degradation of sensitivity of the X-ray detector can be prevented.

3. 发明专利

JP2003045370A Scanning electron microscope 审中-公开
标题翻译：扫描电子显微镜
公开(公告)号：JP2003045370A
公开(公告)日：2003-02-14
申请号：JP2001233767
申请日：2001-08-01
申请人： Hitachi Ltd , Hitachi Sci Syst Ltd , 株式会社日立サイエンスシステムズ , 株式会社日立製作所
发明人： ITO HIROYUKI , NAKAGAWA MINE , KANEOKA NORIYUKI
IPC分类号： G01N23/207 , G01N23/225 , H01J37/20 , H01J37/21
摘要： PROBLEM TO BE SOLVED: To provide a scanning microscope enabled to observe and analyze in a focalized state at all times even when a specimen is tilted and rotating against the direction of scanning.
SOLUTION: The rotational angle θ of a specimen 7 is calculated by a control part 16 depending on arbitrary coordinates (x, y) of two points on one scanning line of an electron beam 4 in the observation/analysis region of the specimen 7, and a focus current variation amount ΔI at every pixels are calculated depending on the rotational angle θ, and a deviation of focus is prevented by superposing the variation amount on a focus current of an object lens 6. A focalized image is easily obtained for the entire observation/analysis region of the specimen 7 even when the specimen is tilted and rotating against the direction of scanning.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：提供一种扫描显微镜，即使当试样相对于扫描方向倾斜并旋转时，也可以始终在聚焦状态下观察和分析。解决方案：根据样本7的观察/分析区域中的电子束4的一条扫描线上的两点的任意坐标（x，y），通过控制部分16计算样本7的旋转角度θ，根据旋转角θ计算每个像素的聚焦电流变化量ΔI，并且通过将变化量叠加在物镜6的聚焦电流上来防止聚焦的偏差。容易获得用于整个观察的聚焦图像 /分析区域，即使样品相对于扫描方向倾斜并旋转。

4. 发明专利

JP2002031520A CALIBRATION MEMBER FOR THREE-DIMENSIONAL SHAPE ANALYZER AND METHOD FOR THREE-DIMENSIONAL SHAPE ANALYSIS 失效
公开(公告)号：JP2002031520A
公开(公告)日：2002-01-31
申请号：JP2000303379
申请日：2000-10-03
申请人： HITACHI LTD , HITACHI SCIENCE SYSTEMS LTD
发明人： YOSHINARI JUNICHI , TAMOCHI RYUICHIRO , NAKAGAWA MINE , MUTO ATSUSHI , TAKAHASHI KANAME
IPC分类号： G01B15/00 , G01B15/04
摘要： PROBLEM TO BE SOLVED: To provide a Z standard calibration specimen for accurately performing a Z calibration in a scanning electron microscope having a three- dimensional shape analyzing means. SOLUTION: When a silicon substrate is etched, a chemical difference in etching rate is produced by the difference of arrangement of atoms in crystals and a pyramid-shaped structure (micro pyramid) having slopes with accurate angles (54 and 74 deg.) is manufactured. The angles of the slopes of the micro pyramid are utilized for the Z calibration.

5. 发明专利

JP2001185069A CHARGE PARTICLE BEAM DEVICE 失效
公开(公告)号：JP2001185069A
公开(公告)日：2001-07-06
申请号：JP37268599
申请日：1999-12-28
申请人： HITACHI LTD , HITACHI SCIENCE SYSTEMS LTD
发明人： NAKAGAWA MINE , YOSHINARI JUNICHI , YAMADA OSAMU , KUMADA TAKAO
IPC分类号： G03F7/20 , H01J37/147 , H01J37/22 , H01J37/317 , H01L21/027 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide a charged particle beam device which is capable of identifying movement condition of observation position by an image and a counter while arriving at a designated observation position. SOLUTION: If a predetermined sample structure is designated from a display image of a monitor 22 by a pointing device 26, a designated position is moved to a center of picture and a moved counter number 35 is displayed. A counter number 36 up to a predetermined target structure is compared with the moved counter number 35 while moving of an observation position is repeated to arrive at a designated position. By this way, a minute analogous structure can move surely and efficiently to a predetermined position in the sample regularly arranged according to the rules.

6. 发明专利

JP2001089855A HEAVY METL FILM DEPOSITION DEVICE 失效
公开(公告)号：JP2001089855A
公开(公告)日：2001-04-03
申请号：JP26497399
申请日：1999-09-20
申请人： HITACHI LTD , HITACHI SCIENCE SYSTEMS LTD
发明人： KASAHARA MARI , NAKAGAWA MINE
IPC分类号： C23C16/06 , C23C16/448
摘要： PROBLEM TO BE SOLVED: To minimize the pressure (partial pressure) of reaction gas in a state in which the inside of a vacuum vessel is held to a pressure realizing stable discharge in thin film deposition and to retain the amount (partial pressure) of reaction gas in a vacuum vessel to the one equal to or above a fixed value in thick film deposition. SOLUTION: In a state in which the inside of a vacuum vessel is held to the pressure realizing stable discharge, for minimizing the pressure (partial pressure) of reaction gas, before the introduction of reaction gas, inert gas other than reaction gas is introduced to balance the pressure in the vacuum vessel, and after that, reaction gas is introduced. In this way, a film is deposited at a proper film deposition rate, and thin film deposition good in reproducibility is executed. At the time of discharge, for holding the partial pressure of gas components contributing to the reaction in the vacuum vessel to the one equal to or above the fixed value, the amount of the reaction gas is presumed from the amount of the reaction gas. A mechanism for forcedly exhausting the inside of the vacuum vessel, again introducing gas therein and repeatedly executing discharge in the case the film deposition rate reaches the one equal to or below the fixed value (the amount of the reaction gas is made insufficient) is provided, and a relatively thick optional film is deposited.

7. 发明专利

JPH11144665A SCANNING CHARGED PARTICLE BEAM DEVICE AND IMAGE RECORDING METHOD WITH IT 失效
公开(公告)号：JPH11144665A
公开(公告)日：1999-05-28
申请号：JP32235297
申请日：1997-11-07
申请人： HITACHI LTD , HITACHI INSTRUMENTS ENG
发明人： DAN MURASAKI , YAMADA MITSUHIKO , NAKAGAWA MINE
IPC分类号： H01J37/22 , H01J37/147 , H01J37/28
摘要： PROBLEM TO BE SOLVED: To simply change the magnifying power during the scanning of one frame for recording an image by interlockingly and automatically changing the scanning width in the X direction and the scanning width in the Y direction of a sample by a charged particle beam during the scanning of one frame of the sample by the particle beam when the image of the sample is generated for recording. SOLUTION: A scanning signal generator 14 is controlled by a computer 13, the output signal is converted into a pulse current by a deflection amplifier 15 and is fed to a scanning (deflection) coil 8, and an electron beam 4 is deflected in two-dimensional directions of the X direction and Y direction. A sample 7 is scanned in the two-dimensional directions of the X direction and Y direction, and the scanning width is controlled by the computer 13. The scanning width in the X direction and the scanning width in the Y direction of the sample 7 are interlockingly and automatically changed during the scanning of one frame by the charged electron beam 4, and the image of the sample 7 is recorded, thereby the image having perspective feeling and stereoscopic feeling can be displayed.

8. 发明专利

JPH10223170A SCANNING ELECTRON MICROSCOPE/SCANNING PROBE MICROSCOPE COMPOSITE DEVICE 失效
公开(公告)号：JPH10223170A
公开(公告)日：1998-08-21
申请号：JP2178097
申请日：1997-02-04
申请人： HITACHI LTD , HITACHI INSTRUMENTS ENG
发明人： MORIMOTO GOJI , NAKAGAWA MINE , YAMADA MITSUHIKO
IPC分类号： G01N37/00 , G01Q10/02 , G01Q30/02 , H01J37/28
摘要： PROBLEM TO BE SOLVED: To provide a scanning electron microscope/scanning probe mirocscope composite device, capable of easily and quickly coping with an observation position by calculating the distance between the observation position and a scanning probe, and automatically matching the position of the scanning probe and the observation position, based on the calculated result. SOLUTION: An objective lens current value Is when an electron beam is focused on an observation position 7 and an SEM objective lens current value Ip when the electron beam is focused on a tip 2 of a scanning probe are recorded. A distance Ih between an objective lens 12 and the observation position 7 is calculated, based on the objective lens current value Is. The distance Id between the tip 2 of the scanning probe and the observation position 7 is obtained from Is-Ip, and the approach time is calculated via the selection of an automatic approach mode after the distance information has been inputted. A sample stage is automatically driven thereafter, and quick scanning can be made.

9. 发明专利

JPH08279345A SCANNING ELECTRON MICROSCOPE AND SAMPLE OBSERVING METHOD USING IT 失效
公开(公告)号：JPH08279345A
公开(公告)日：1996-10-22
申请号：JP8037095
申请日：1995-04-05
申请人： HITACHI LTD , HITACHI INSTRUMENTS ENG
发明人： NAKAGAWA MINE , YAMADA MITSUHIKO
IPC分类号： H01J37/22 , H01J37/244 , H01J37/252
摘要： PURPOSE: To continuously seize a dynamic condition and a compositional change of a sample caused by local electron irradiation by repeatedly switching two-dimensional electron beam irradiation and spot irradiation to a preset position in the preset timing by a control means. CONSTITUTION: An electron beam 4 emitted from the tip of a filament 1 is condensed down by a condenser lens 5 and an objective lens 7, and is focused on a surface of a sample 10. XY two-dimensional scanning and a movement, stopping or the like to a specific position are performed by a deflection coil 6. A secondary electron 9 generated from the sample 10 is displayed as an image on a display 19 through a detector 8 or the like. On the other hand, an X-ray 11 is displayed in a spectral shape on a display 16 through a detector 12 or the like. Observation of a growing process of a deposit and component analysis can be simultaneously performed by alternately performing two-dimensional scanning and spot irradiation in a short time on the basis of a timing chart by a computer 20 having an input means 35.

10. 发明专利

JPH05251027A 失效
公开(公告)号：JPH05251027A
公开(公告)日：1993-09-28
申请号：JP35576792
申请日：1992-12-18
申请人： HITACHI LTD , HITACHI INSTRUMENTS ENG
发明人： OKURA AKIMITSU , SHINOHARA MINORU , NAKAGAWA MINE , SAITO TSUKASA , SATO MITSUGI , NIINUMA KIYOSHI
IPC分类号： H01J37/244 , H01J37/26
摘要： PURPOSE:To realize X-ray analysis superior in SN rate. CONSTITUTION:Characteristic X-ray 3a, 3b, 3c are generated from a minute area of a sample 2 irradiated by an incident electron beam 1 and only the characteristic X-ray 3a among them can be detected by the detectioin part 11 of an X-ray analyzer 4 through the X-ray penetration hole 8 of a collimeter 7. Though the reflected electrons generated from the sample 2 travel while drawing tracks 10a, 10b to enter into the X-ray passing hole 8, they can not reach the X-ray detection part 11 because of being multiple scattered by said recessed and projecting structure 9 formed on the inner wall surface of the X-ray penetration hole 8.

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