专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JP2001020068A ION BEAM PROCESSOR 失效
公开(公告)号：JP2001020068A
公开(公告)日：2001-01-23
申请号：JP19429099
申请日：1999-07-08
申请人： HITACHI LTD
发明人： FUJISAWA TATSUYA , OKAWA HIROO , OISHI SEITARO , HASHIMOTO ISAO
IPC分类号： H01J37/30 , C23C14/46 , H01L21/302 , H01L21/3065
摘要： PROBLEM TO BE SOLVED: To achieve the ion beam processing on a sample using an electrode having an ion beam generating area smaller than the area of the sample. SOLUTION: A lead electrode 62 of an ion source is rectangular, the length (height) 62a in the longitudinal direction of the lead electrode 62 is smaller than the length (width) 46a in the longitudinal direction of a substrate 46, and larger than the height direction. In a process that the substrate 46 is carried along the carrying direction Y, a surface to be worked of the substrate 46 is irradiated with the ion beam 52 from the lead electrode 62 in the orthogonal direction.

2. 发明专利

JPH10112448A VACUUM PROCESSING DEVICE AND HOLDER USED FOR THE PROCESSING 失效
公开(公告)号：JPH10112448A
公开(公告)日：1998-04-28
申请号：JP26423496
申请日：1996-10-04
申请人： HITACHI LTD
发明人： ISHIKAWA YASUSHI , OKAWA HIROO , KUROGANE MASAHARU
IPC分类号： H01L21/302 , H01L21/205 , H01L21/3065 , H01L21/68 , H01L21/683
摘要： PROBLEM TO BE SOLVED: To provide a substrate holder and a substrate cooling method which can make a uniform cooling of a whole surface of a substrate in such a device as an ion milling. SOLUTION: A substrate W is cooled by storing cooling gas in a gap part 10 of a substrate holder 1. A gas supplying groove 12 is provided at a region between an O-ring 2 and the gap part 10 so as to surround the gap part 10. Gas supplying ports 13 are provided at each portion of the gas supplying groove 12, and the cooling gas is made to flow in from the ports. Most of the cooling gas made to flow in from the gas supplying ports 13 once spreads at the inner part of the gas supplying groove 12, and after that it enters the gap part 10 through the slit 120. That is, the cooling gas is introduced at the near part of easily leaking of gas (especially at more inside position than the part of easily leaking of gas). A gas exhausting port 15 is provided at the center of the gap part 10. Pressure adjustment of the cooling gas is performed at both sides of cooling gas supplying and exhausting.

3. 发明专利

JPH02241681A LIQUID CRYSTAL TYPE LASER MARKER 失效
公开(公告)号：JPH02241681A
公开(公告)日：1990-09-26
申请号：JP25720788
申请日：1988-10-14
申请人： HITACHI LTD
发明人： FUJIMOTO MINORU , IWAKI KIYOE , OKAWA HIROO , KUWABARA KOJI , YANO MAKOTO
IPC分类号： B41J2/44 , B23K26/00 , B41J2/00
摘要： PURPOSE:To improve the efficiency of laser light and to allow marking of a distinct mark on a printing work by rotating a beam splitter in such a manner that the axis of polarization thereof is aligned to the major axis of exit light. CONSTITUTION:A holder 31 is supported on a supporting base 30 and a mirror mount 32 is inserted into the holder. The beam splitter 10 is mounted to the mirror mount 32. The beam splitter 10 is fixed in an inclined state to the mirror mount 32. A set screw 33 is inserted into the holder 31 and the mirror mount 32 is fixed by rotating the screw 33. After the screw 33 of the mirror mount 32 is loosened, the mirror mount 32 is rotated in an alpha direction, by which the axis B of polarization is aligned to the major axis C. As a result, not only the efficiency of the laser light is improved but also the energy at the time of printing on the work is large and the marking over a wide area is possible, and therefore, the distinct printing is executed.

4. 发明专利

JPH0292475A LASER MARKING DEVICE 失效
公开(公告)号：JPH0292475A
公开(公告)日：1990-04-03
申请号：JP24411788
申请日：1988-09-30
申请人： HITACHI LTD
发明人： OKAWA HIROO , IWAKI KIYOE , FUJIMOTO MINORU
IPC分类号： B23K26/00 , H01L23/00
摘要： PURPOSE:To execute positioning of a work without pressing it by floating a ceramic work by air on flat parts which are inclined, carrying and positioning it on one base, assembling as one body each device of an optical system and inclining all of them. CONSTITUTION:In a work positioning part 4, a work is floated up by blowing out air from a hole made on a plane base. Since friction is small, when the base is inclined by about maximum 5-10 degrees, the work slides on the plane base 1, hits against a V-shaped stopper 4 of the end part of the base and stops. In this case, when a laser optical system 2 and a carrying part 5 which are positioned are also in parallel to the work, handling can be executed more easily, therefore, they are inclined. When the positioning part, the laser optical part and the carrying part are fixed onto one base 1 and inclined against the horizontal plane 6, accuracy between each part is obtained easily, and the assembly is also facilitated. In such a way, a work which is apt to be damaged can be positioned without pressing it.

5. 发明专利

JP2001006898A MICROWAVE NEUTRALIZER AND ION BEAM TREATMENT DEVICE 失效
公开(公告)号：JP2001006898A
公开(公告)日：2001-01-12
申请号：JP17224899
申请日：1999-06-18
申请人： HITACHI LTD
发明人： FUJISAWA TATSUYA , OKAWA HIROO , OGURA SATOSHI , ONUKI HISAO , ICHIMURA SATOSHI
IPC分类号： H01J27/02 , C23C14/46 , C23F4/00 , G21K5/04 , H01J37/08 , H01L21/302 , H01L21/3065 , H05H1/46
摘要： PROBLEM TO BE SOLVED: To prevent the occurrence of a bias in the variation of plasma density. SOLUTION: A microwave introduction tube 34 having microwave introduction passages 34a, 34b is connected to the circumferential side of a band-like electrode 36 formed so as to surround an ion beam generated from an ion source, two lines of magnet groups M1, M2 are arranged, and the permanent magnet groups M1, M2 in the respective lines are so arranged that their magnetizing directions are reversed by using the center axis of the microwave introduction tube 34 as a boundary. Microwave plasma 42a, 42b is generated by the microwave introduced from the respective microwave introduction passages 34a, 34b, the microwave plasma 42a moves in the direction Z1 and the microwave plasma 42b moves in the direction Z2.

6. 发明专利

JPH04200886A LASER MARKING DEVICE 失效
公开(公告)号：JPH04200886A
公开(公告)日：1992-07-21
申请号：JP33218890
申请日：1990-11-29
申请人： HITACHI LTD
发明人： OKAWA HIROO , FUJIMOTO MINORU , OKUMURA KIYOSHI , NAKAZAWA AKIO , YANO MAKOTO
IPC分类号： B23K26/06 , B23K26/00 , B23K26/073 , H01S3/00 , H01S3/091 , H01S3/136
摘要： PURPOSE:To easily adjust a laser beam marking device by mounting an image rotator on the laser beam axis in the optical system of a laser beam transmitter to uniformize the intensity distribution of the laser beam. CONSTITUTION:The size of the laser beam is shaped into a size nearly the same as a mask where the laser beam is transmitted through only a mark part such as a letter, etc. The shaped laser beam is passed through the mask to obtain the same shape as the mark. The surface of an object work is irradiated with the laser beam of the same shape to carve the mark. In a laser marking device to execute this operation, an image rotator 7 is mounted on the laser beam axis 4 in the optical system of the inner or outer part of the laser beam oscillator generating the laser beam to uniformize the intensity distribution of the laser beam. In this way, a high utility can be obtained without giving a special constraint to the arrangement of a light condenser.

7. 发明专利

JPH02187287A LASER BEAM MARKER 失效
公开(公告)号：JPH02187287A
公开(公告)日：1990-07-23
申请号：JP270189
申请日：1989-01-11
申请人： HITACHI LTD
发明人： YOSHIOKA YOSHIO , KUWABARA KOJI , YANO MAKOTO , SAITO KIYOSHI , IWAKI KIYOE , FUJIMOTO MINORU , NEMOTO KENICHI , OKAWA HIROO
IPC分类号： G02F1/13 , B23K26/00 , B41J29/38
摘要： PURPOSE:To apply marking on the wholly wide area by marking while shifting the marking position to one direction at each laser beam irradiation on the same surface of a material to be printed. CONSTITUTION:A laser beam marking system control unit 1 executes timing control for laser beam irradiation of a pulse laser beam generator 2, control for display contents of a liquid crystal cell 4 with signal transmission to liquid crystal driving circuit 3 and control for driving system 5 of conveying table 13 for shifting the materials 10, 11, 12 to be printed. When polarized laser beam 6 emitted with the pulse laser beam generator 2 passes through the liquid crystal cell 4, only the displaying dot part A passes through a beam splitter 8, and the displaying contents A are printed on the surface of the material 11 to be printed with an image formation optical system 9. On the liquid crystal cell 4, B, A and G are displayed in order and at each time, the material 10 to be printed is shifted to the fixed distance and by emitting the laser beam 6, B, A and G are printed. The marking in the wide area can be executed without increasing the laser beam output, etc.

8. 发明专利

JPH01225558A LASER MARKING APPARATUS 失效
公开(公告)号：JPH01225558A
公开(公告)日：1989-09-08
申请号：JP4955788
申请日：1988-03-04
申请人： HITACHI LTD
发明人： IWAKI KIYOE , FUJIMOTO MINORU , OKAWA HIROO
IPC分类号： B41J2/44 , B41J2/455
摘要： PURPOSE:To increase the speed of marking work by reducing the moving number of times of a mirror apparatus, by making the dimension of the second mirror in the longitudinal direction thereof longer than that of the first mirror corresponding thereto. CONSTITUTION:A mirror apparatus 17 has function for focusing laser beam 15 and is constituted of the first mirror 26X and the second mirror 26Y. The first mirror 26X is inclined so that the laser beam 15 is emitted in the direction of the second mirror 26Y and the second mirror 26Y is inclined so that the emitted beam goes toward a liquid display device. The dimension l2 of the second mirror 26Y in the longitudinal direction thereof is made longer by about two times than the dimension l1 of the first mirror 26X in the moving direction thereof. Since the first mirror 26X may be moved twice in the x-axis direction within the second mirror and the second mirror 26Y may be moved once in a y-axis direction, the moving number of times may be reduced by one as compared with the conventional moving number of times (4 times) and the speed of marking work can be increased.

9. 发明专利

JP2005208833A Intruder's activity interference system 审中-公开
标题翻译：入侵者的活动干扰系统
公开(公告)号：JP2005208833A
公开(公告)日：2005-08-04
申请号：JP2004013321
申请日：2004-01-21
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： OKAWA HIROO
IPC分类号： G08B15/00 , G08B13/18 , G08B15/02 , G08B25/00
摘要： PROBLEM TO BE SOLVED: To realize an intruder's activity interference system for interrupting the approach of an intruder to a significant division since the intruder has been found, and any danger has been recognized until a security guard arrives.
SOLUTION: A water drainage nozzle 1 is moved while being interlinked with the movement of a photographing camera 2 so that water can be drained to the photographic object of the photographing camera 2. Thus, it is possible to realize an intruder's activity interference system for interfering the approach of an intruder 4 to a significant division as much as possible since the intruder 4 has been found by the sensor 3 or the photographing camera 2, and any danger has been recognized until a security guard arrives. Also, the intruder 4 is found, and reported to a security guard such as a police, and the operation image of the intruder is transmitted to the police station. The police station is able to quickly facilitate proper countermeasures, and to preliminarily prevent the destruction of a facility.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：为了实现入侵者的活动干扰系统，从入侵者被发现以来，中断入侵者进入重大分裂的方式，并且在安全警卫到达之前已经认识到任何危险。
解决方案：排水喷嘴1在与摄像机2的移动相互连接的同时移动，从而可以将水排出到拍摄照相机2的摄影对象。因此，可以实现入侵者的活动干扰系统，由于传感器3或摄像机2已经发现入侵者4已经被认识到，所以直到安全警卫到达之前，已经认识到入侵者4到达有效分区的方式是可能的。此外，发现入侵者4，并向警察等保安人员报告，将入侵者的操作图像发送到警察局。派出所能够迅速采取适当对策，并初步防止设施毁坏。版权所有（C）2005，JPO＆NCIPI

10. 发明专利

JPH09120792A ION BEAM IRRADIATION DEVICE AND PROCESSING DEVICE USING ION BEAM 失效
公开(公告)号：JPH09120792A
公开(公告)日：1997-05-06
申请号：JP27908895
申请日：1995-10-26
申请人： HITACHI LTD
发明人： ISHIKAWA YASUSHI , OKAWA HIROO
IPC分类号： C23C14/32 , H01J37/30
摘要： PROBLEM TO BE SOLVED: To provide ion beam irradiation device whose filament can be used till severance or immediately before it and which is equipped with a neutrizer mechanism capable of refilling new filament without releasing the processing chamber to the atmosphere. SOLUTION: A neutrizer is equipped with an accommodating means 300 to accommodate at least one filament for refilling, a transporting means 310 to transport filament 112, and electrodes 126, 127 for feeding the current to the filament 112. The transporting means receives a refill filament from the accommodating means, moves to the specified position where thermions are supplied from the filament to ion beam, and carries the used filament to the position for collection.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式