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    • 4. 发明专利
    • Mounting structure for semiconductor device
    • 半导体器件的安装结构
    • JP2014007207A
    • 2014-01-16
    • JP2012140257
    • 2012-06-21
    • Fujitsu Ltd富士通株式会社
    • WATANABE MANABUKOIDE MASATERUFUKUSONO KENJISUGATA TAKASHI
    • H05K1/14H01L25/00
    • H01L21/50H01L21/82H01L29/06H01L2924/15311H01L2924/19106H05K1/141H05K3/323H05K3/368H05K2201/2018
    • PROBLEM TO BE SOLVED: To resolve a problem in which further increase in density and performance of a semiconductor device to be mounted on an information device may cause that even an inductance component of a plating through hole penetrating through a core layer of a build-up substrate of the semiconductor device becomes a primary factor in increase of noise, and to provide a highly-reliable mounting structure for a semiconductor device capable of reducing the inductance component by using a coreless substrate instead of the build-up substrate.SOLUTION: A mounting structure for a semiconductor device includes: a mounting substrate provided with an opening; a frame part provided at an edge part of the opening, and housed in the edge part; a frame-like member composed of a protrusion part protruded from the frame part; a coreless substrate arranged on the mounting substrate, and supported by the protrusion part of the frame-like member; and a semiconductor element arranged on the coreless substrate.
    • 要解决的问题:为了解决要安装在信息装置上的半导体装置的密度和性能的进一步增加的问题可能导致即使电穿孔的电感分量穿过积层的核心层 半导体器件的衬底成为增加噪声的主要因素,并且通过使用无芯衬底代替堆积衬底,能够提供可降低电感成分的半导体器件的高度可靠的安装结构。解决方案:安装 半导体器件的结构包括:设置有开口的安装基板; 框架部分,设置在开口的边缘部分,并容纳在边缘部分中; 框架状构件,其由从框架部突出的突出部构成; 无芯基板,其布置在所述安装基板上,并且由所述框架构件的突出部支撑; 以及设置在无芯基板上的半导体元件。
    • 9. 发明专利
    • Substrate manufacturing method, and circuit board
    • 基板制造方法和电路板
    • JP2006080349A
    • 2006-03-23
    • JP2004263729
    • 2004-09-10
    • Fujitsu Ltd富士通株式会社
    • KOIDE MASATERU
    • H05K3/46
    • H01L23/50H01L23/13H01L23/49816H01L23/49827H01L2224/16235H01L2224/16237H01L2924/01025H01L2924/01078H01L2924/15153H01L2924/1517H01L2924/15311H01L2924/19106H05K1/183H05K3/0035H05K3/0044H05K3/381H05K3/4644H05K3/4697H05K2201/09127H05K2201/09472H05K2201/10636H05K2203/0228Y02P70/611
    • PROBLEM TO BE SOLVED: To create conductor patterns in the inside of a substrate and expose to the external some portions of the conductor patterns at a low cost in a short time without roughing their surfaces, with respect to a substrate manufacturing method etc. which has a laminating process for obtaining the substrate of a multilayer structure, wherein insulating layers and the conductor patterns are laminated alternately and has a processing process for processing the substrate obtained by the execution of the laminating process. SOLUTION: In the laminating process, there is included a second step wherein a second insulating layer 30 is so laminated on conductor patterns 20 formed finally in a first step as to rough a surface 30a of the laminated second insulating layer 30 except for a desired region S and as to form thereafter conductor layers 21 in at least the region S of the surface 30a of the second insulating layer 30. Further, the processing process has a removing step for removing portions R present above the region S which are also present in the higher layers than the second insulating layer 30 of a substrate 1, and has an exposing step for exposing to the external portions 25 of the adjacent conductor patterns 20 to each other which are present in the region S and are present under the second insulating layer 30. COPYRIGHT: (C)2006,JPO&NCIPI
    • 要解决的问题:为了在基板内部形成导体图案,并且在短时间内以低成本暴露于导体图案的外部部分,而不会使其表面粗糙,相对于基板制造方法等 其具有用于获得多层结构的基板的层压工艺,其中绝缘层和导体图案交替层叠,并且具有用于处理通过执行层压处理获得的基板的处理过程。 解决方案:在层压过程中,包括第二步骤,其中第二绝缘层30被层压在最终形成在第一步骤中的导体图案20上,以使得层压的第二绝缘层30的表面30a粗糙 期望的区域S,并且至少在第二绝缘层30的表面30a的区域S中形成导体层21.此外,处理工艺具有去除存在于区域S之上的部分R的去除步骤, 存在于比衬底1的第二绝缘层30更高的层中,并且具有暴露步骤,用于暴露于存在于区域S中并存在于第二区域中的相邻导体图案20的彼此的外部部分25 绝缘层30.版权所有(C)2006,JPO&NCIPI