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1. 发明专利

JP2003165718A NON-POROUS SPHERICAL SILICA AND METHOD FOR PRODUCING THE SAME 审中-公开
公开(公告)号：JP2003165718A
公开(公告)日：2003-06-10
申请号：JP2001360595
申请日：2001-11-27
申请人： FUSO CHEMICAL CO LTD
发明人： NAKANAGA AKIRA , KUNITOKI HIDEYUKI , SAKAI MASATOSHI
IPC分类号： C01B33/148
摘要： PROBLEM TO BE SOLVED: To provide a non-porous spherical silica and a method for producing the same having high purity and a substantially same particle size, in which silica fine particles are substantially monodispersed without forming aggregates. SOLUTION: The method for producing the non-porous spherical silica comprises subjecting to surface modification by a surface-modifying agent of a silica fine particle dispersion obtained by hydrolyzing a hydrolyzable silicon compound, and then drying and burning at a temperature of 650-1,100°C before shredding. The non-porous spherical silica has silica fine particles that are substantially monodispersed without forming aggregates and a purity of 99.9% or more and a number average particle size of 0.05-50 μm, and satisfies a relational expression of [S×d 2 /g) as measured by a BET method, and a denotes a number average particles size (μm)). COPYRIGHT: (C)2003,JPO

2. 发明专利

JP2003165719A METHOD FOR PRODUCING HYDROPHOBIC, LIGHTWEIGHT AND POROUS SILICA GEL 审中-公开
公开(公告)号：JP2003165719A
公开(公告)日：2003-06-10
申请号：JP2001360596
申请日：2001-11-27
申请人： FUSO CHEMICAL CO LTD
发明人： SAKAI MASATOSHI , MIZUMOTO HIROJI
IPC分类号： C01B33/159
摘要： PROBLEM TO BE SOLVED: To provide a method for producing a hydrophobic, lightweight and porous silica gel that is simple and allows low cost production. SOLUTION: The method for producing a hydrophobic, lightweight and porous silica gel comprises a first step for preparing wet gel slurry that is flowable in a non-aqueous solvent by a sol-gel process, a second step for preparing hydrophobic wet gel by reacting the wet gel with a hydrophobic agent, and a third step for drying the hydrophobic wet gel. COPYRIGHT: (C)2003,JPO

3. 发明专利

JP2002045681A COLLOIDAL SILICA SLURRY 失效
公开(公告)号：JP2002045681A
公开(公告)日：2002-02-12
申请号：JP2000236454
申请日：2000-08-04
申请人： FUSO CHEMICAL CO LTD
发明人： MATSUMURA SHIGETOYO , OKADA YUKIO , MANAKI TATSUO , TOYAMA KEIJI , SAKAI MASATOSHI
IPC分类号： C01B33/14 , B01J13/00 , C01B33/141 , C01B33/145 , C09K3/14
摘要： PROBLEM TO BE SOLVED: To provide colloidal silica slurry which gives no adverse influence such as corrosion to a silica wafer and wiring materials on the silica wafer, further suppresses the generation of microorganisms, has high preservation stability due to excellent grain size stability of colloidal particles and thereby can continuously use for a long period. SOLUTION: The colloidal silica slurry is distinguished by being produced by adding 5 to 100 ppm of hydrogen peroxide to the colloidal silica.

4. 发明专利

JP2006022314A Film-forming composition and method for forming film 有权
标题翻译：成膜组合物和形成薄膜的方法
公开(公告)号：JP2006022314A
公开(公告)日：2006-01-26
申请号：JP2005165604
申请日：2005-06-06
申请人： Fuso Chemical Co Ltd , Koyo Matsukawa , Yukito Matsuura , 扶桑化学工業株式会社 , 公洋松川 , 幸仁松浦
发明人： MATSUKAWA KOYO , MATSUURA YUKITO , KUNITOKI HIDEYUKI , SAKAI MASATOSHI , TABUCHI MINORU
IPC分类号： C09D183/16 , C08G77/38 , C08K5/10 , C08K9/06 , C08L53/00 , C08L83/16 , C09C1/28 , C09C3/12 , C09D4/00 , C09D5/25 , C09D7/12 , C09D153/00 , H01L21/312 , H01L21/768 , H01L23/522
摘要： PROBLEM TO BE SOLVED: To provide a film-forming composition for forming such a thin film on a substrate of a silicon wafer, a display, a liquid crystal display, a plasma display or a lens, as is transparent and of a low reflectivity and low dielectric constant and also is excellent in the mechanical strengths and in the adhesive property to the substrate, and to provide a method for forming the film.
SOLUTION: The film-forming composition contains a silica particle, in which the silanol group existing on the particle surface is treated with a surface modifier having a hydrophobic group, and a polysilane compound. The method for forming a film comprises coating this film-forming composition on a substrate and thereafter treating by heat and/or by light.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种用于在硅晶片，显示器，液晶显示器，等离子体显示器或透镜的基板上形成这样的薄膜的成膜组合物，如透明和低反射率和低介电常数，并且机械强度和对基材的粘合性也优异，并且提供了形成膜的方法。解决方案：成膜组合物含有其中存在于颗粒表面的硅烷醇基团用具有疏水基团的表面改性剂处理的二氧化硅颗粒和聚硅烷化合物。形成膜的方法包括将该成膜组合物涂布在基材上，然后用热和/或光进行处理。版权所有（C）2006，JPO＆NCIPI

5. 发明专利

JP2004091220A Method for manufacturing high purity silica sol dispersed in hydrophilic organic solvent, high purity silica sol dispersed in hydrophilic organic solvent obtained by the method, method for manufacturing high purity silica sol dispersed in organic solvent, and high purity silica sol dispersed in organic solvent obtained by the method 有权
标题翻译：用于制造在有机溶剂中分散的高纯度二氧化硅溶液的方法，用于制造在有机溶剂中分散的高纯度二氧化硅溶液的方法，以及在有机溶剂中分散的高纯度二氧化硅溶液中分离的有机溶剂中分离的高纯度有机溶剂中的高纯度二氧化硅溶胶方法
公开(公告)号：JP2004091220A
公开(公告)日：2004-03-25
申请号：JP2002251019
申请日：2002-08-29
申请人： Fuso Chemical Co Ltd , 扶桑化学工業株式会社
发明人： KUNITOKI HIDEYUKI , NAKANAGA AKIRA , SAKAI MASATOSHI
IPC分类号： C01B33/145
摘要： PROBLEM TO BE SOLVED: To provide a method for manufacturing high purity silica sol dispersed in a hydrophilic organic solvent, the sol to be used as a raw material for an electronic material, a film material, a polishing material of an organic surface, or the like, requiring high purity, and to prepare a high purity silica sol dispersed in the hydrophilic organic solvent obtained by the method, to provide a method for manufacturing high purity silica sol dispersed in an organic solvent, and to prepare high purity silica sol dispersed in the organic solvent obtained by the method.
SOLUTION: The method for manufacturing the high purity silica sol dispersed in the hydrophilic organic solvent includes: (a) a first process of hydrolyzing alkoxisilanes in an alcohol aqueous solution; (b) a second process of concentrating the silica sol solution obtained by the hydrolysis; (c) a third process of adding a silane coupling agent for coupling treatment and then controlling the pH of the silica sol solution to neutral; and (d) a fourth process of substituting the hydrophilic organic solvent for the water content in the silica solution.
COPYRIGHT: (C)2004,JPO
摘要翻译：待解决的问题：为了提供分散在亲水性有机溶剂中的高纯度二氧化硅溶胶的制造方法，可以使用作为电子材料原料的膜，薄膜材料，有机表面的研磨材料等，需要高纯度，并制备分散在通过该方法获得的亲水性有机溶剂中的高纯度二氧化硅溶胶，以提供分散在有机溶剂中的制备高纯度二氧化硅溶胶的方法，并制备高纯度二氧化硅溶胶分散在通过该方法获得的有机溶剂中。解决方案：分散在亲水性有机溶剂中的制备高纯度二氧化硅溶胶的方法包括：（a）在醇水溶液中水解烷氧基硅烷的第一种方法; （b）浓缩通过水解获得的二氧化硅溶胶溶液的第二种方法; （c）添加用于偶联处理的硅烷偶联剂，然后将二氧化硅溶胶溶液的pH控制为中性的第三种方法; 和（d）用亲水性有机溶剂代替二氧化硅溶液中含水量的第四种方法。版权所有（C）2004，JPO

6. 发明专利

JP2003267722A NONPOROUS SPHERICAL SILICA AND METHOD OF MANUFACTURING IT 审中-公开
公开(公告)号：JP2003267722A
公开(公告)日：2003-09-25
申请号：JP2002067585
申请日：2002-03-12
申请人： FUSO CHEMICAL CO LTD
发明人： NAKANAGA AKIRA , SAKAI MASATOSHI , SEIJI HARUO
IPC分类号： C01B33/18
摘要： PROBLEM TO BE SOLVED: To provide a nonporous spherical silica having a certain particle size distribution, where the maximum particle diameter can be optionally set to a value within a certain range and a nonporous spherical silica having a particle diameter over the said value is not substantially included, and a method of manufacturing the same. SOLUTION: A spherical silica gel formed by a reaction of a hydrolyzable silicon compound with water is separated, dried, sieved by a sieve with ≥250 meshes, and finally fired to give a nonporous spherical silica. In the presence of an organic solvent incompatible with water, a surfactant, and a catalyst, a water-in-oil type emulsion is formed and a hydrolyzable silicon compound and water are reacted to form the silica gel. The resulting silica gel is separated, dried, sieved by a sieve with ≥250 meshes, and finally fired to give a nonporous spherical silica. COPYRIGHT: (C)2003,JPO

7. 发明专利

JP2005162533A Method for producing modified colloidal silica 有权
标题翻译：生产改性胶体二氧化硅的方法
公开(公告)号：JP2005162533A
公开(公告)日：2005-06-23
申请号：JP2003403732
申请日：2003-12-02
申请人： Fuso Chemical Co Ltd , 扶桑化学工業株式会社
发明人： YANAGISAWA TAKAO , TOMOTA YOSHIAKI , SAKAI MASATOSHI
IPC分类号： C01B33/148
摘要： PROBLEM TO BE SOLVED: To provide a method for producing high-purity modified colloidal silica which can be stably dispersed for a long period of time and has little content of metal impurities without causing aggregation or gelation of the colloidal silica even in an acidic dispersion medium.
SOLUTION: The method for producing modified colloidal silica is characterized in that colloidal silica obtained by hydrolysis and condensation of a hydrolyzable silicon compound is modified with a modifying agent.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种高纯度改性胶体二氧化硅的制造方法，其可以长时间稳定地分散，金属杂质含量少，而不引起胶体二氧化硅的凝集或凝胶化，即使在酸性分散介质。解决方案：改性胶体二氧化硅的制备方法的特征在于用可水解硅化合物的水解和缩合获得的胶体二氧化硅用改性剂改性。版权所有（C）2005，JPO＆NCIPI

8. 发明专利

JP2005060219A Silica sol and manufacturing method therefor 有权
标题翻译：二氧化硅溶胶及其制造方法
公开(公告)号：JP2005060219A
公开(公告)日：2005-03-10
申请号：JP2004217655
申请日：2004-07-26
申请人： Fuso Chemical Co Ltd , 扶桑化学工業株式会社
发明人： YAMAKAWA TAKAHIRO , TOMOTA YOSHIAKI , TOYAMA KEIJI , SAKAI MASATOSHI
IPC分类号： C01B33/141
摘要： PROBLEM TO BE SOLVED: To prepare a silica sol which can be suitably used as a material such as a polishing material for an electronic material and a silicon wafer requiring high purity and which has excellent stability of the sol so that the silica concentration is easily increased and can be controlled to a level equal to or higher than a silica sol produced from water glass, and to provide a manufacturing method therefor.
SOLUTION: The silica sol has silica fine particles dispersed in water and has 10 to 1,000 nm average secondary particle size of the silica fine particles, ≤1 ppm metal impurity content, and 10 to 50 wt.% silica concentration. The stable method for manufacturing the silica sol includes processes of: (a) subjecting a hydrolyzable silicon compound to hydrolysis and polycondensation to produce a silica sol; and (b) concentrating the silica sol obtained in the process (a) to a specified silica concentration or lower according to the particle size of the silica sol, substituting water for a dispersion medium and an alkali catalyst in the silica sol and controlling the pH to 6.0 to 9.0.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：为了制备适合用作电子材料用抛光材料和需要高纯度并且具有优异的溶胶稳定性的硅晶片等材料的二氧化硅溶胶，使得二氧化硅浓度容易地增加并且可以控制到等于或高于由水玻璃制成的硅溶胶的水平，并提供其制造方法。解决方案：二氧化硅溶胶具有分散在水中的二氧化硅微粒，二氧化硅微粒的平均二次粒径为10〜1000nm，金属杂质含量≤1ppm，二氧化硅浓度为10〜50重量％。制造二氧化硅溶胶的稳定方法包括以下工序：（a）使水解性硅化合物进行水解和缩聚反应，生成二氧化硅溶胶; 和（b）根据二氧化硅溶胶的粒度，将方法（a）中得到的二氧化硅溶胶浓缩至规定的二氧化硅浓度以下，在二氧化硅溶胶中取代水分散介质和碱催化剂，控制pH 至6.0〜9.0。版权所有（C）2005，JPO＆NCIPI

9. 发明专利

JP2005060217A Silica sol and manufacturing method therefor 有权
标题翻译：二氧化硅溶胶及其制造方法
公开(公告)号：JP2005060217A
公开(公告)日：2005-03-10
申请号：JP2004216371
申请日：2004-07-23
申请人： Fuso Chemical Co Ltd , 扶桑化学工業株式会社
发明人： YAMAKAWA TAKAHIRO , TOMOTA YOSHIAKI , TOYAMA KEIJI , SAKAI MASATOSHI
IPC分类号： C01B33/145 , C09K3/14
摘要： PROBLEM TO BE SOLVED: To prepare a silica sol which can be suitably used as a material such as a polishing material for an electronic material and a silicon wafer requiring high purity, which has uniform particle diameters of silica fine particles, and which has excellent long-term storage stability, an increased concentration of the silica fine particles in a reaction solution and excellent productivity, and to provide a manufacturing method therefor.
SOLUTION: The method for manufacturing the silica sol is characterized in that an organic solvent containing tetramethoxy silane and a solvent containing an alkali catalyst and water are added to an organic solvent containing an alkali catalyst and water, thereby subjecting the tetramethoxy silane to hydrolysis and polycondensation to manufacture the silica sol. The silica sol has silica fine particles dispersed in water, and has 20 to 1,000 nm average secondary particle size of the silica fine particles, ≤1 ppm metal impurity content, and 10 to 50 wt.% silica concentration.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：为了制备适合用作电子材料用研磨材料的硅溶胶和需要高纯度的硅晶片，其具有均匀的二氧化硅微粒的粒径，并且其中具有优异的长期储存稳定性，反应溶液中二氧化硅细颗粒的浓度增加和生产率优异，并提供其制备方法。解决方案：制备二氧化硅溶胶的方法的特征在于，将含有四甲氧基硅烷和含有碱催化剂和水的溶剂的有机溶剂加入到含有碱催化剂和水的有机溶剂中，由此使四甲氧基硅烷水解和缩聚以制造硅溶胶。硅溶胶具有分散在水中的二氧化硅微粒，二氧化硅微粒的平均二次粒径为20〜1000nm，金属杂质含量≤1ppm，二氧化硅浓度为10〜50重量％。版权所有（C）2005，JPO＆NCIPI

10. 发明专利

JP2002050594A COLLOID-LIKE SILICA SLURRY 失效
公开(公告)号：JP2002050594A
公开(公告)日：2002-02-15
申请号：JP2000236453
申请日：2000-08-04
申请人： FUSO CHEMICAL CO LTD
发明人： MATSUMURA SHIGETOYO , OKADA YUKIO , MANAKI TATSUO , TOYAMA KEIJI , SAKAI MASATOSHI
IPC分类号： A01N25/04 , A01N25/08 , A01N31/08 , A01N33/12 , A01N35/06 , A01N43/36 , A01N43/64 , A01N43/78 , A01N43/80 , A01N47/44 , B24B37/00 , C09K3/14 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a colloid-like silica slurry which will not adversely influence, such as corrosion to a silicon wafer and a wiring material on the silicon wafer, suppresses the occurrence of microbes, whose preservation stability is high, since the particle size stability of colloid particles is superior and which can be used continuously. SOLUTION: Colloid-like silica slurry which includes colloid-like silica prepared from low metal silica sol and antibacterial/biocide and whose pH is 6.0-8.0 is supplied.

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