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1. 发明专利

JP2006307084A Composition containing metal fine particle and inorganic fine particle and method for producing the same 有权
标题翻译：含有金属微粒和无机细颗粒的组合物及其制造方法
公开(公告)号：JP2006307084A
公开(公告)日：2006-11-09
申请号：JP2005133483
申请日：2005-04-28
申请人： Fuso Chemical Co Ltd , Koyo Matsukawa , Yukito Matsuura , Osaka Gas Co Ltd , 大阪瓦斯株式会社 , 扶桑化学工業株式会社 , 公洋松川 , 幸仁松浦
发明人： FUJIKI TAKESHI , SAKAMOTO HIRONORI , KOBORI KANA , MOTOKAWA TAKUYA , MATSUKAWA KOYO , MATSUURA YUKITO , KUNITOKI HIDEYUKI , YANAGISAWA TAKAO
IPC分类号： C08L83/16 , C08G77/60 , C08K3/10 , C08K3/36 , C23C18/18 , H01B5/14 , H01B13/00
摘要： PROBLEM TO BE SOLVED: To obtain a composition having improved adhesivity between a substrate and a metal fine particle (especially metal nanoparticle). SOLUTION: The composition comprises a polysilane compound, a metal compound (e.g. noble metal compound) to form the metal fine particle by reduction and an inorganic fine particle (silica). The polysilane compound may be a copolymer of a polysilane and a vinyl monomer containing a unit having affinity for a metal compound and/or a metal fine particle. A substrate is coated with the composition, the polysilane compound is decomposed by action of active energy ray to form a metal fine particle. The method is applied to various methods, for example, a substrate is coated with the composition, exposed to light to form a metal fine particle, which is developed to form a pattern containing the metal fine particle and an electroless plating pattern is formed by an electroless plating treatment. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：获得在基材和金属微粒（特别是金属纳米颗粒）之间具有改善的粘合性的组合物。解决方案：组合物包含聚硅烷化合物，通过还原形成金属微粒的金属化合物（例如贵金属化合物）和无机细颗粒（二氧化硅）。聚硅烷化合物可以是聚硅烷和含有对金属化合物和/或金属微粒具有亲和性的单元的乙烯基单体的共聚物。用该组合物涂布基材，聚硅烷化合物通过活性能量射线的作用分解形成金属微粒。该方法适用于各种方法，例如，用组合物涂布基材，暴露于光以形成金属微粒，其被开发以形成包含金属细颗粒的图案，并且化学镀图案通过化学镀处理。版权所有（C）2007，JPO＆INPIT

2. 发明专利

JP2006022314A Film-forming composition and method for forming film 有权
标题翻译：成膜组合物和形成薄膜的方法
公开(公告)号：JP2006022314A
公开(公告)日：2006-01-26
申请号：JP2005165604
申请日：2005-06-06
申请人： Fuso Chemical Co Ltd , Koyo Matsukawa , Yukito Matsuura , 扶桑化学工業株式会社 , 公洋松川 , 幸仁松浦
发明人： MATSUKAWA KOYO , MATSUURA YUKITO , KUNITOKI HIDEYUKI , SAKAI MASATOSHI , TABUCHI MINORU
IPC分类号： C09D183/16 , C08G77/38 , C08K5/10 , C08K9/06 , C08L53/00 , C08L83/16 , C09C1/28 , C09C3/12 , C09D4/00 , C09D5/25 , C09D7/12 , C09D153/00 , H01L21/312 , H01L21/768 , H01L23/522
摘要： PROBLEM TO BE SOLVED: To provide a film-forming composition for forming such a thin film on a substrate of a silicon wafer, a display, a liquid crystal display, a plasma display or a lens, as is transparent and of a low reflectivity and low dielectric constant and also is excellent in the mechanical strengths and in the adhesive property to the substrate, and to provide a method for forming the film.
SOLUTION: The film-forming composition contains a silica particle, in which the silanol group existing on the particle surface is treated with a surface modifier having a hydrophobic group, and a polysilane compound. The method for forming a film comprises coating this film-forming composition on a substrate and thereafter treating by heat and/or by light.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种用于在硅晶片，显示器，液晶显示器，等离子体显示器或透镜的基板上形成这样的薄膜的成膜组合物，如透明和低反射率和低介电常数，并且机械强度和对基材的粘合性也优异，并且提供了形成膜的方法。解决方案：成膜组合物含有其中存在于颗粒表面的硅烷醇基团用具有疏水基团的表面改性剂处理的二氧化硅颗粒和聚硅烷化合物。形成膜的方法包括将该成膜组合物涂布在基材上，然后用热和/或光进行处理。版权所有（C）2006，JPO＆NCIPI

3. 发明专利

JP2007065612A Silicon-containing photosensitive composition, method for manufacturing thin film pattern using the same, and protective film for electronic apparatus 有权
标题翻译：含硅含量的感光性组合物，使用该薄膜的薄膜图案的制造方法以及电子设备的保护膜
公开(公告)号：JP2007065612A
公开(公告)日：2007-03-15
申请号：JP2005378705
申请日：2005-12-28
申请人： Koyo Matsukawa , Yukito Matsuura , Sekisui Chem Co Ltd , 公洋松川 , 幸仁松浦 , 積水化学工業株式会社
发明人： MATSUKAWA KOYO , MATSUURA YUKITO , AZUMA KENICHI , NAKAMURA HIDE , KUSAKA YASUNARI
IPC分类号： G03F7/075 , C08G77/12 , G02B5/20 , G03F7/004 , H01L21/027 , H01L51/50 , H05B33/04
摘要： PROBLEM TO BE SOLVED: To provide a photosensitive composition having photosensitivity and alkaline developable without containing a crosslinking agent. SOLUTION: A silicon-containing photosensitive composition is provided that contains a silicon-containing polymer containing one kind of polymer (A1) having a structure expressed by a general formula (1), wherein one of R 11 to R 1n is H and the rest of them are organic groups, and a compound which generates an acid or a base when irradiated with active rays or radiation. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供不含交联剂的光敏性和碱显影性的光敏组合物。解决方案：提供含硅的光敏组合物，其含有含有一种具有由通式（1）表示的结构的聚合物（A1）的含硅聚合物，其中R“ SB>至R 1n 是H，其余的是有机基团，以及当用活性射线或辐射照射时产生酸或碱的化合物。版权所有（C）2007，JPO＆INPIT

4. 发明专利

JP2007091870A Polymerizable composition and the cured product 有权
标题翻译：可聚合组合物及其固化产品
公开(公告)号：JP2007091870A
公开(公告)日：2007-04-12
申请号：JP2005282809
申请日：2005-09-28
申请人： Koyo Matsukawa , Yukito Matsuura , Osaka Gas Co Ltd , 大阪瓦斯株式会社 , 公洋松川 , 幸仁松浦
发明人： MURASE HIROAKI , KAWASAKI SHINICHI , FUJIKI TAKESHI , MOTOKAWA TAKUYA , MATSUKAWA KOYO , MATSUURA YUKITO
IPC分类号： C08F220/26 , C08F2/50 , C08F220/30 , G02B1/10 , G02B1/14 , G03F7/027 , G03F7/029 , G03F7/075
摘要： PROBLEM TO BE SOLVED: To provide a polymerizable composition useful for obtaining cured products having excellent optical properties[e.g. high refractive index, high transparency(transparency to visible rays)] and also having characteristics including high adhesion to substrate, hard coatability and high heat resistance. SOLUTION: The polymerizable composition comprises a specific polyfunctional (meth)acrylate having a fluorene skeleton[for example, 9,9-bis(4- (meth)acryloyloxyethoxyphenyl)fluorene], a hydrolytically condensable organosilicon compound having polymerizable group[for example, (meth)acryloyloxyalkyl tri-1-4C alkoxysilane], and a photoacid generator. This composition may also contain a photoradical initiator for improving its photopolymerizability. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供可用于获得具有优异光学性质的固化产物的可聚合组合物[ 高折射率，高透明度（透明度至可见光）），并且具有包括对基材的高粘合性，硬涂布性和高耐热性的特性。解决方案：可聚合组合物包含具有芴骨架的特定多官能（甲基）丙烯酸酯[例如9,9-双（4-（甲基）丙烯酰氧基乙氧基苯基）芴]，具有可聚合基团的可水解缩合的有机硅化合物[用于例如，（甲基）丙烯酰氧基烷基三1-4C烷氧基硅烷]和光酸产生剂。该组合物还可以含有用于改善其光聚合性的光自由基引发剂。版权所有（C）2007，JPO＆INPIT

5. 发明专利

JP2006139083A Photosensitive resin composition, method for forming thin film pattern and insulating film for electronic instrument 审中-公开
标题翻译：光敏树脂组合物，形成薄膜图案和电子仪器绝缘膜的方法
公开(公告)号：JP2006139083A
公开(公告)日：2006-06-01
申请号：JP2004328858
申请日：2004-11-12
申请人： Koyo Matsukawa , Yukito Matsuura , Sekisui Chem Co Ltd , 公洋松川 , 幸仁松浦 , 積水化学工業株式会社
发明人： NAKAMURA HIDE , AZUMA KENICHI , MATSUKAWA KOYO , MATSUURA YUKITO
IPC分类号： G03F7/075 , G03F7/004 , G03F7/031 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a polysilane-based photosensitive resin composition which has photosensitivity and can be developed by an alkali and from which a thin film having excellent electrical insulating property can be obtained; and to provide a method for forming a thin film pattern using the polysilane-based photosensitive resin composition.
SOLUTION: The photosensitive resin composition contains a polysilane expressed by general formula (1), a sensitizer, and an alkoxysilane polymer having a weight-average molecular weight of 300-50,000, which is blended in an amount of 25-3,000 parts by weight to 100 parts by weight of the polysilane. In the formula (1), R
1 , R
2 , R
3 and R
4 are each independently selected from the group comprising a substituted or unsubstituted aliphatic hydrocarbon group, an alicyclic hydrocarbon group, an aromatic hydrocarbon group, a polar group, and hydrogen; and m and n are integers.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：待解决的问题：提供具有光敏性并可通过碱显影的聚硅烷系感光性树脂组合物，能够获得具有优异的电绝缘性的薄膜; 并提供使用聚硅烷系感光性树脂组合物形成薄膜图案的方法。解决方案：感光性树脂组合物含有通式（1）表示的聚硅烷，增感剂，重均分子量为300〜5000的烷氧基硅烷聚合物，其配合量为25〜3000份至100重量份的聚硅烷。在式（1）中，各自独立地选择R SB 1，R SB 2，R SB 3，R SB 4，由取代或未取代的脂族烃基，脂环族烃基，芳香族烃基，极性基团和氢原子组成的基团; 并且m和n是整数。版权所有（C）2006，JPO＆NCIPI

6. 发明专利

JP2005078001A Method for forming refractive index pattern 有权
$Method for forming refractive index pattern$
标题翻译：形成折射指数图案的方法
公开(公告)号：JP2005078001A
公开(公告)日：2005-03-24
申请号：JP2003311375
申请日：2003-09-03
申请人： Koyo Matsukawa , Yukito Matsuura , Osaka Gas Co Ltd , 大阪瓦斯株式会社 , 公洋松川 , 幸仁松浦
发明人： MATSUKAWA KOYO , MATSUURA YUKITO , KAWASAKI SHINICHI , FUJIKI TAKESHI , TANAKA MASASHI
IPC分类号： G03F7/004 , C08G77/60 , G02B5/18 , G02B6/12
摘要： PROBLEM TO BE SOLVED: To provide a method for forming a chemically stable refractive index pattern, having a relatively large difference in the refractive indices. SOLUTION: In the method for forming the refractive index pattern, a hybrid material comprising a polysilane compound and an inorganic compound is irradiated with an active energy line via a mask, a polysilane decomposition product of the irradiated part is removed, and then the whole hybrid material is hardened by heating. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种形成折射率差异较大的化学稳定折射率图案的方法。解决方案：在形成折射率图案的方法中，通过掩模用活性能量线照射包含聚硅烷化合物和无机化合物的杂化材料，除去照射部分的聚硅烷分解产物，然后整个混合材料通过加热硬化。版权所有（C）2005，JPO＆NCIPI

7. 发明专利

JP2006023706A Photosensitive resin composition, thin-film pattern forming method using same, protective film for electronic equipment, and liquid crystal display element 审中-公开
标题翻译：光敏树脂组合物，使用其的薄膜图案形成方法，电子设备用保护膜和液晶显示元件
公开(公告)号：JP2006023706A
公开(公告)日：2006-01-26
申请号：JP2005006748
申请日：2005-01-13
申请人： Koyo Matsukawa , Yukito Matsuura , Sekisui Chem Co Ltd , 公洋松川 , 幸仁松浦 , 積水化学工業株式会社
发明人： MATSUKAWA KOYO , MATSUURA YUKITO , AZUMA KENICHI , NAKAMURA HIDE
IPC分类号： G03F7/075 , G03F7/004 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a polysilane photosensitive resin composition which has photosensitive properties, which can carry out alkali development and in which deterioration or change of a pattern shape hardly occurs, and to provide a thin-film pattern forming method that uses the photosensitive resin composition.
SOLUTION: A photosensitive resin composition which includes a polysilane indicated in general formula (1), a sensitizer, and translucent particles at least one part of whose surface has hydrophobic property, and in which 25 to 3000 weight parts of translucent particles are compounded for polysilane 100 weight parts; and a thin film pattern forming method, using the photosensitive composition, are provided. In the formula (1), R
1 , R
2 , R
3 and R
4 in the formula are groups independently selected from among a group consisting of a substituted or unsubstituted aliphatic hydrocarbon group, an alicyclic hydrocarbon group, an aromatic hydrocarbon group, a polar group and hydrogen, and m and n are integers.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：解决问题的方法：提供一种具有光敏性的聚硅烷感光性树脂组合物，其可以进行碱显影，并且几乎不发生图案形状的劣化或变化，并且提供薄膜图案形成方法，其中使用感光性树脂组合物。解决方案：一种感光树脂组合物，其包含通式（1）所示的聚硅烷，敏化剂和表面具有疏水性的至少一部分的半透明颗粒，其中25-30重量份的半透明颗粒为复合聚硅烷100重量份; 以及使用该感光性组合物的薄膜图案形成方法。在式（1）中，式中的R SB 1，R SB 2，R SB 3，R SB 4，独立地选自由取代或未取代的脂族烃基，脂环族烃基，芳族烃基，极性基团和氢原子组成的基团，m和n是整数。版权所有（C）2006，JPO＆NCIPI

8. 发明专利

JP2005290286A Transparent hybrid sheet 有权
标题翻译：透明混合纸
公开(公告)号：JP2005290286A
公开(公告)日：2005-10-20
申请号：JP2004109768
申请日：2004-04-02
申请人： Asahi Kasei Chemicals Corp , Koyo Matsukawa , Yukito Matsuura , 旭化成ケミカルズ株式会社 , 公洋松川 , 幸仁松浦
发明人： TSUJIOKA NORIO , AOKI SATOSHI , MATSUKAWA KOYO , MATSUURA YUKITO
IPC分类号： C08J5/04 , C08L63/00 , C08L83/00
摘要： PROBLEM TO BE SOLVED: To obtain a hybrid sheet that is obtained by improving performance of a plastic substrate, has excellent performances such as strength, rigidity, toughness, transparency, heat resistance, light resistance, gas barrier properties, coefficient of thermal expansion, double refractive index, etc., and is suitable as a transparent substrate.
SOLUTION: In a hybrid sheet obtained by impregnating a glass cloth with an organic-inorganic hybrid resin comprising a metal alkoxide and a thermosetting resin as constituent elements and curing the resin, the transparent hybrid sheet has a relation represented by formula n
2 -0.05≤n
1 ≤n
2 +0.05 between the refractive index (n
1 ) of the hybrid resin and the refractive index (n
2 ) of glass constituting the glass cloth and has ≥50 μm thickness.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题为了获得通过提高塑料基板的性能而获得的混合片材，具有优异的性能，例如强度，刚性，韧性，透明度，耐热性，耐光性，阻气性，热系数膨胀，双折射率等，并且适合作为透明基材。解决方案：在通过用包含金属醇盐和热固性树脂作为构成元素的有机 - 无机杂化树脂浸渍玻璃布并固化树脂而获得的混合片材中，透明混合片材具有由式n < 混合树脂的折射率（n 1 ）之间的SB> 2 -0.05≤n 1 ≤n 2 和构成玻璃布的玻璃的折射率（n 2 ），厚度≥50μm。版权所有（C）2006，JPO＆NCIPI

9. 发明专利

JP2003327782A Silicon resin composition and process for forming inorganic porous thin film 审中-公开
标题翻译：硅树脂组合物和形成无机多孔薄膜的方法
公开(公告)号：JP2003327782A
公开(公告)日：2003-11-19
申请号：JP2002138886
申请日：2002-05-14
申请人： Hiroshi Inoue , Koyo Matsukawa , Yukito Matsuura , 弘井上 , 公洋松川 , 幸仁松浦
发明人： MATSUKAWA KOYO , MATSUURA YUKITO , INOUE HIROSHI
IPC分类号： C08L53/00 , C08K5/057
摘要： PROBLEM TO BE SOLVED: To provide a silicon resin composition which can be suitably used for easily forming an inorganic porous thin film at a low cost, and a process for forming the inorganic porous thin film by using this.
SOLUTION: The silicon resin composition contains a block copolymer of a polysilane and a vinyl monomer and a sol-gel reactive metal compound. In the formation process, the silicon resin composition is applied onto a substrate and heated and cured at 50-250°C to form a hybrid thin film comprising the block copolymer of the polysilane and the vinyl monomer and a metal oxide. Then, the surface of the film is exposed to an active energy beam irradiation to decompose the polysilane part in the copolymer, and the decomposition product is removed by a solvent.
COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：提供可以以低成本适合用于容易地形成无机多孔薄膜的硅树脂组合物，以及通过使用它来形成无机多孔薄膜的方法。解决方案：硅树脂组合物含有聚硅烷和乙烯基单体的嵌段共聚物和溶胶 - 凝胶活性金属化合物。在形成过程中，将硅树脂组合物施加到基底上，并在50-250℃加热固化，形成包含聚硅烷和乙烯基单体的嵌段共聚物和金属氧化物的杂化薄膜。然后，将膜的表面暴露于活性能量束照射以分解共聚物中的聚硅烷部分，并且通过溶剂除去分解产物。版权所有（C）2004，JPO

10. 发明专利

JP2006199854A Membrane having low refractive index 审中-公开
$Membrane having low refractive index$
标题翻译：具有低折射率的膜
公开(公告)号：JP2006199854A
公开(公告)日：2006-08-03
申请号：JP2005014001
申请日：2005-01-21
申请人： Koyo Matsukawa , Yukito Matsuura , Sekisui Chem Co Ltd , 公洋松川 , 幸仁松浦 , 積水化学工業株式会社
发明人： MATSUKAWA KOYO , MATSUURA YUKITO , AZUMA KENICHI , NAKAMURA HIDE
IPC分类号： C08L83/16 , C08K3/36 , C08L83/06 , G02B1/11
摘要： PROBLEM TO BE SOLVED: To provide a membrane having a low refractive index, not only excellent in the low refractive index but also excellent in alkali resistance. SOLUTION: This membrane having the low refractive index is characterized by containing silica particles and a polysilane expressed by general formula (1) [wherein, R 1 to R 4 are each independently selected from a group consisting of a substituted or non-substituted aliphatic hydrocarbon group, alicyclic hydrocarbon group and aromatic hydrocarbon group, a polar group and H; and (m), (n) are each an integer], and blending ≤100 pts.wt. polysilane based on 100 pts.wt. silica particles. COPYRIGHT: (C)2006,JPO&NCIPI

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