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1. 发明专利

JP2008193119A Inspection system by charged particle beam and method of manufacturing devices using system 审中-公开
标题翻译：通过充电颗粒束检查系统和使用系统制造设备的方法
公开(公告)号：JP2008193119A
公开(公告)日：2008-08-21
申请号：JP2008112489
申请日：2008-04-23
申请人： Ebara Corp , 株式会社荏原製作所
发明人： NAKASUJI MAMORU , NOMICHI SHINJI , SATAKE TORU , KANEUMA TOSHIFUMI , SOFUGAWA TAKUJI , YOSHIKAWA SEIJI , KARIMATA TSUTOMU , OWADA SHIN , NISHIFUJI MUTSUMI , HAMASHIMA MUNEKI , TAKAGI TORU
IPC分类号： H01L21/66 , H01J37/29
摘要： PROBLEM TO BE SOLVED: To improve inspection process, which has required much time to inspect a whole sample, by means of moving the inspection surface (test piece) of a conventional apparatus intermittently. SOLUTION: The inspection apparatus includes: a primary electron optics system for irradiating a plurality of primary charged particles onto the sample; and a secondary electron optics system. The secondary electron optics system accelerates and focuses secondary charged particles by means of electric field applied across an objective lens and the sample surface, the secondary charged particles being respectively emitted from irradiation points which are formed on sample for irradiating the plurality of primary charged particles, separates the focused secondary charged particles from the primary electron optics system by means of a E×B separator arranged between the objective lens and a lens at beam generation means side of the objective lens, and introduces it to a secondary electron detection device (4000). In the primary electron optics system, the irradiation points for irradiating a plurality of primary charged particles are formed on the surface of the sample in two dimensions, and points projected in an axial direction of irradiating point are equally spaced. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：通过间歇地移动常规设备的检查表面（试件），改进检查过程需要大量时间来检查整个样品。解决方案：检查装置包括：用于将多个初级带电粒子照射到样品上的初级电子光学系统; 和二次电子光学系统。二次电子光学系统通过施加在物镜和样品表面上的电场加速并聚焦二次带电粒子，二次带电粒子分别从形成在用于照射多个初级带电粒子的样品上的照射点发射，通过布置在物镜和物镜的光束产生装置侧的透镜之间的E×B分离器将聚焦的二次带电粒子与初级电子光学系统分离，并将其引入二次电子检测装置（4000）。在初级电子光学系统中，用于照射多个初级带电粒子的照射点在两个维度上形成在样品的表面上，并且沿照射点的轴向突出的点相等间隔。版权所有（C）2008，JPO＆INPIT

2. 发明专利

JP2007206050A Substrate inspection method, substrate inspection device, and electron beam unit 审中-公开
标题翻译：基板检查方法，基板检查装置和电子束单元
公开(公告)号：JP2007206050A
公开(公告)日：2007-08-16
申请号：JP2006071948
申请日：2006-03-16
申请人： Ebara Corp , 株式会社荏原製作所
发明人： NAKASUJI MAMORU , NOMICHI SHINJI , SATAKE TORU , HAMASHIMA MUNEKI , KANEUMA TOSHIFUMI , HATAKEYAMA MASAKI , WATANABE KENJI , SOFUGAWA TAKUJI , KARIMATA TSUTOMU , YOSHIKAWA SEIJI , OWADA SHIN , NISHIFUJI MUTSUMI
IPC分类号： G01N23/225 , G01R31/302 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide a substrate inspection method, a substrate inspection device and an electron beam unit for inspection, capable of inspecting and evaluating highly reliably a sample with a high through-put. SOLUTION: The substrate inspection method/device of the present invention is provided with: a charged particle beam generating means 71 for generating a charged particle beam; a primary optical system 72 for irradiating a substrate with scan of the plurality of primary charged particle beams; a secondary optical system 74 introduced with a secondary charged particle beam emitted from the substrate by the irradiation of the charged electron beam; a detection system 76 having a detector for detecting the secondary charged particle beam introduced into the secondary optical system to be converted into electric signals; and a process control system 77 for evaluating the substrate, based on the electric signals. A coupling area in divided areas is selected to conduct evaluation, in the evaluation of a pattern forming face where the whole pattern is formed by dividing the pattern forming face into the plurality of areas and by forming a pattern for every area. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种基板检查方法，基板检查装置和用于检查的电子束单元，能够高可靠地检查和评估具有高通量的样品。解决方案：本发明的基板检查方法/装置设置有：用于产生带电粒子束的带电粒子束产生装置71; 用于对多个初级带电粒子束的扫描照射基板的主光学系统72; 二次光学系统74引入了通过照射带电电子束从衬底发射的二次带电粒子束; 检测系统76，具有检测器，用于检测引入二次光学系统的二次带电粒子束以转换成电信号; 以及用于基于电信号来评估衬底的过程控制系统77。选择分割区域中的耦合区域来评估通过将图案形成面分割成多个区域而形成整个图案的图案形成面，并且通过形成每个区域的图案。版权所有（C）2007，JPO＆INPIT

3. 发明专利

JP2007184283A Charged particle beam device and method 审中-公开
标题翻译：充电颗粒束装置和方法
公开(公告)号：JP2007184283A
公开(公告)日：2007-07-19
申请号：JP2007000925
申请日：2007-01-09
申请人： Ebara Corp , 株式会社荏原製作所
发明人： NAKASUJI MAMORU , SATAKE TORU , WATANABE KENJI , MURAKAMI TAKESHI , NOMICHI SHINJI , SOFUGAWA TAKUJI , KARIMATA TSUTOMU , YOSHIKAWA SEIJI , KANEUMA TOSHIFUMI , OWADA SHIN , NISHIFUJI MUTSUMI , HAMASHIMA MUNEKI , TAKAGI TORU , KIHARA NAOTO , NISHIMURA HIROSHI
IPC分类号： H01J37/147 , G01N23/225 , H01J37/28 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide an electron beam device which improves inspection throughput and detection accuracy. SOLUTION: The device irradiates primary charged particles to a region of a sample W to be measured and detects secondary charged particles emitted from the sample W. When the primary charged particles are irradiated to small unit areas of the divided measured region, it is controlled so that at least one or more adjacent areas R12 are skipped after one small area R11 is irradiated, and unirradiated areas R13 are irradiated. In this case, irradiation of each area is started from a side nearer to the area which is irradiated next and proceeded to a farther side. For example, in the case of the area R11, irradiation starts from the point P11 nearer to the area R13 which is irradiated next and when it reaches the farther point P12, irradiation of the area R13 is started from the point P13. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种提高检查吞吐量和检测精度的电子束装置。解决方案：该装置将一次带电粒子照射到要测量的样品W的区域，并检测从样品W发射的二次带电粒子。当初级带电粒子照射到被划分的测量区域的小单位面积时，被控制使得在照射一个小区域R11之后跳过至少一个或多个相邻区域R12，并且照射未照射区域R13。在这种情况下，每个区域的照射从更靠近下一个被照射的区域的一侧开始并进行到更远的一侧。例如，在区域R11的情况下，从接近照射区域R13的点P11开始照射，当到达更远点P12时，从点P13开始照射区域R13。版权所有（C）2007，JPO＆INPIT

4. 发明专利

JP2003031171A Electron beam device, and manufacturing method of device using the same 审中-公开
标题翻译：电子束装置，以及使用该装置的装置的制造方法
公开(公告)号：JP2003031171A
公开(公告)日：2003-01-31
申请号：JP2001217858
申请日：2001-07-18
申请人： Ebara Corp , Nikon Corp , 株式会社ニコン , 株式会社荏原製作所
发明人： HAMASHIMA MUNEKI , NAKASUJI MAMORU , KATO TAKAO , NOMICHI SHINJI , SATAKE TORU
IPC分类号： G21K1/02 , G21K5/04 , H01J9/14 , H01J37/09 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide an electron beam device enabled to obtain multi-beam by using an electron gun having one cathode, and to provide a manufacturing method of a device using the electron beam device. SOLUTION: The electron beam device irradiates an electron beam emitted from a cathode 63 having a plurality of protrusions to a plurality of openings of a plate with openings 3, and reduce-projects the electron beam passed through the openings on a sample. The plurality of openings on the plate with openings 3 are formed by etching a Si single crystal plate 21. The plurality of openings on the plate with openings 3 can be formed by metal coating. A square nock hole, for the positioning of θ-direction, is formed to the plate with openings 3, or the outer form of the plurality of openings on the plate with openings 3 has sides which are parallel with X-axis or Y-axis.
摘要翻译：要解决的问题：提供一种能够通过使用具有一个阴极的电子枪来获得多光束的电子束装置，并提供使用电子束装置的装置的制造方法。解决方案：电子束装置将具有多个突起的阴极63发射的电子束照射到具有开口3的板的多个开口中，并且减少通过样品上的开口的电子束。通过蚀刻Si单晶板21形成具有开口3的板上的多个开口。具有开口3的板上的多个开口可以通过金属涂层形成。在具有开口3的板上形成用于定位θ方向的方形孔，或者具有开口3的具有开口3的板上的多个开口的外部形状具有与X轴或Y轴平行的侧面。

5. 发明专利

JP2006339169A Method of manufacturing device using electron beam apparatus 有权
标题翻译：使用电子束装置制造装置的方法
公开(公告)号：JP2006339169A
公开(公告)日：2006-12-14
申请号：JP2006231802
申请日：2006-08-29
申请人： Ebara Corp , 株式会社荏原製作所
发明人： NAKASUJI MAMORU , SATAKE TORU , NOMICHI SHINJI , HAMASHIMA MUNEKI , OKUBO YUKIHARU , KOHAMA SADAAKI , SOFUGAWA TAKUJI , KARIMATA TSUTOMU , YOSHIKAWA SEIJI , KANEUMA TOSHIFUMI , OWADA SHIN , NISHIFUJI MUTSUMI
IPC分类号： H01J37/28 , G01N23/225 , H01J37/09 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To improve a throughput, precision or the like of an electron beam apparatus. SOLUTION: An electron beam apparatus is composed of a single electron gun which discharges electron beams, a condenser lens, an open plate having a plurality of holes, an E×B separator and a objective lens, and moreover, is provided with a first optical system which irradiates the electron beams from the electron gun on to a surface of a testpiece to be inspected, a second optical system which takes into a secondary electron detecting apparatus a secondary electron which is discharged from the above testpiece and accelerated by the objective lens and separated from the first optical system by the E×B separator, and the condenser lens made in two steps is positioned adjacent to the electron gun and the above open plate is positioned behind the two-step condenser lens and a plurality of electron beams are formed by irradiating electron beams on the open plate. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：为了提高电子束装置的产量，精度等。解决方案：电子束装置由放电电子束的单电子枪，聚光透镜，具有多个孔的开放板，E×B分离器和物镜组成，此外，第一光学系统，其将来自电子枪的电子束照射到要检查的被测件的表面;第二光学系统，其进入二次电子检测装置，二次电子从上述试件排出并被加速物镜，并通过E×B分离器与第一光学系统分离，并且以两个步骤制成的聚光透镜邻近电子枪定位，并且上述开放板位于两步聚光透镜后面，并且具有多个电子通过在开放板上照射电子束形成光束。版权所有（C）2007，JPO＆INPIT

6. 发明专利

JP2003016985A Electron beam device and device manufacturing method using the device 审中-公开
标题翻译：电子束装置和使用装置的装置制造方法
公开(公告)号：JP2003016985A
公开(公告)日：2003-01-17
申请号：JP2001202970
申请日：2001-07-04
申请人： Ebara Corp , Nikon Corp , 株式会社ニコン , 株式会社荏原製作所
发明人： HAMASHIMA MUNEKI , NAKASUJI MAMORU , KATO TAKAO , NOMICHI SHINJI , SATAKE TORU
IPC分类号： G01N23/225 , H01J37/21 , H01J37/28 , H01J37/29 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To detect the optical axis direction position of a sample without using complicated expensive parts, with no restrictions on the dimension and spacing of each part. SOLUTION: A Z-sensor is provided with electrostatic deflection systems 19, 20. The deflection systems 19, 20 are connected to a deflection voltage ratio setter 27 for setting the ratio of each deflection voltage, through a control power supply 26, and capable of adjusting the deflection center within a prescribed range from the upper side to the lower side of a sample face. The sample 8 is formed with a marker 18 formed of a substance with a large secondary electron emission rate η on the right side and a substance with small ηon the left side, and a display part 29 can display the image of the marker 18. The optical axis direction position of the sample face is detected on the basis of the deflection voltage ratio of the deflection systems 19, 20 when the left and right of a secondary electron image of the marker obtained while a primary electron beam is deflected by the electrostatic deflection systems 19, 20 to scan on the marker 18, are just reversed, or the magnification substantially becomes infinite.
摘要翻译：要解决的问题：在不使用复杂的昂贵部件的情况下检测样品的光轴方向位置，对每个部件的尺寸和间距没有限制。解决方案：Z传感器设置有静电偏转系统19,20.偏转系统19,20连接到偏转电压比设定器27，用于通过控制电源26设置每个偏转电压的比率，并且能够将偏转中心调整在从样品面的上侧到下侧的规定范围内。样品8由右侧具有大的二次电子发射率η的物质和左侧的小的物质形成的标记18形成，显示部29可以显示标记18的图像。基于偏转系统19,20的偏转电压比，当在一次电子束被静电偏转偏转时获得的标记的二次电子图像的左右被检测到样品面的光轴方向位置在标记18上进行扫描的系统19,20被恰好反转，或者放大率基本上变得无限大。

7. 发明专利

JP2007048754A Inspection device with charged particle beam and device manufacturing method using inspection device 有权
标题翻译：具有充电颗粒光束的检查装置和使用检查装置的装置制造方法
公开(公告)号：JP2007048754A
公开(公告)日：2007-02-22
申请号：JP2006232088
申请日：2006-08-29
申请人： Ebara Corp , 株式会社荏原製作所
发明人： NAKASUJI MAMORU , NOMICHI SHINJI , SATAKE TORU , KANEUMA TOSHIFUMI , SOFUGAWA TAKUJI , YOSHIKAWA SEIJI , KARIMATA TSUTOMU , OWADA SHIN , NISHIFUJI MUTSUMI , HAMASHIMA MUNEKI , TAKAGI TORU
IPC分类号： H01J37/28 , G01N23/225 , H01J37/147 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide a flaw inspection method equipped with an enhanced throughput capable of precluding a crosstalk between a plurality of electron beams and leading the discharged secondary electrons efficiently to a detector. SOLUTION: The apparent angle on a specimen surface 1010 viewed from an objective lens is determined from the aperture angle and the magnification at the image surface 1005 of secondary electrons, and the receiving angle at the specimen surface is determined from the obtained apparent angle, the initial energy of the secondary electrons and the beam potential of the objective lens, followed by determining the yield of the secondary electrons on the basis of the obtained receiving angle, and on the basis of the resolution decided by the aperture angle, the spacing of irradiation with adjoining primary electron beams is separated to a distance or more which does not present a problem of crosstalk. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种具有能够排除多个电子束之间的串扰并且将放电的二次电子有效地引导到检测器的增强的吞吐量的缺陷检查方法。解决方案：从物镜观察的样品表面1010上的视角根据二次电子的图像表面1005的孔径角和倍率确定，并且从获得的表观上确定样品表面处的接收角度角度，二次电子的初始能量和物镜的光束电位，然后基于获得的接收角确定二次电子的产量，并且基于由孔径角决定的分辨率，相邻的一次电子束的照射间隔被分离到一定距离以上，这不会产生串扰的问题。版权所有（C）2007，JPO＆INPIT

8. 发明专利

JP2006317466A Defect inspection method 有权
标题翻译：缺陷检查方法
公开(公告)号：JP2006317466A
公开(公告)日：2006-11-24
申请号：JP2006219104
申请日：2006-08-11
申请人： Ebara Corp , 株式会社荏原製作所
发明人： HAMASHIMA MUNEKI , HATAKEYAMA MASAKI , NOMICHI SHINJI , SATAKE TORU , NAKASUJI MAMORU , MURAKAMI TAKESHI , WATANABE KENJI
IPC分类号： G01N23/225 , G01N1/28
摘要： PROBLEM TO BE SOLVED: To provide a defect inspection method that can appropriately control a charge amount of a surface of a sample even when the irradiation current value for enlarging the throughput or the like is increased, obtains clear image data with small distortion, and can perform an inspection with high reliability.
SOLUTION: The defect inspection method employs an inspection device having a beam source 1 for irradiating a sample 10 with a charged particle beam 2 and a detector 18 for detecting a charged particle from the sample surface. The surface of the sample 10 is coated with a resistance film 42 having a predetermined electric resistance value, the charged particle beam 2 is radiated to the sample 10, and a secondary charged particle or the like generated from the sample surface is detected by the detector 18.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：为了提供即使当用于扩大吞吐量等的照射电流值增加时也可以适当地控制样品表面的电荷量的缺陷检查方法，获得具有小失真的清晰图像数据，可以高可靠性进行检查。解决方案：缺陷检查方法采用具有用于向样品10照射带电粒子束2的光束源1和用于检测来自样品表面的带电粒子的检测器18的检查装置。样品10的表面涂覆有具有预定电阻值的电阻膜42，将带电粒子束2照射到样品10，并且由检测器检测从样品表面产生的二次带电粒子等 18.版权所有（C）2007，JPO＆INPIT

9. 发明专利

JP2006153871A Substrate inspection method, substrate inspecting device, and electron beam system 审中-公开
标题翻译：基板检查方法，基板检查装置和电子束系统
公开(公告)号：JP2006153871A
公开(公告)日：2006-06-15
申请号：JP2005328590
申请日：2005-11-14
申请人： Ebara Corp , 株式会社荏原製作所
发明人： NAKASUJI MAMORU , NOMICHI SHINJI , SATAKE TORU , HAMASHIMA MUNEKI , KANEUMA TOSHIFUMI , HATAKEYAMA MASAKI , WATANABE KENJI , SOFUGAWA TAKUJI , KARIMATA TSUTOMU , YOSHIKAWA SEIJI , OWADA SHIN , NISHIFUJI MUTSUMI
IPC分类号： G01N23/225 , G01B15/04 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide test method and inspection device for achieving inspection and evaluation of sample data, and moreover with high throughput, as well as higher reliability. SOLUTION: This electron beam system comprises a charged particle beam generation means 71 for generating a charged particle beam, a primary optical system 72, which allows a plurality of the primary charged particle beams to be scanned and then irradiated on the substrate, a secondary optical system 74 into which the secondary charged particle beams, discharged from the substrate by the irradiation of the charged particle beam are injected, a detection system 76 for detecting the secondary charged particle beams injected into the secondary optical system for converting them into electrical signals, and a processing control system 77 for evaluating the substrate, based on the electrical signals. By dividing the pattern formation face into several areas and then select-joining the areas of the divided areas, evaluation of the pattern forming face where an entire pattern formation is made by forming patterns for each area is conducted. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供用于实现样本数据检查和评估的测试方法和检查装置，以及高吞吐量以及更高的可靠性。解决方案：该电子束系统包括用于产生带电粒子束的带电粒子束产生装置71，允许多个初级带电粒子束被扫描然后在基底上照射的主光学系统72，注入通过照射带电粒子束从基板排出的二次带电粒子束的二次光学系统74，用于检测注入二次光学系统中的二次带电粒子束的检测系统76，用于将其转换为电信号，以及用于基于电信号来评估衬底的处理控制系统77。通过将图案形成面分割成若干区域，然后选择连接分割区域的区域，进行通过形成每个区域的图案来进行整体图案形成的图案形成面的评价。版权所有（C）2006，JPO＆NCIPI

10. 发明专利

JP2002373612A Electron beam device, and manufacturing method of the device using electron beam device 审中-公开
标题翻译：电子束装置以及使用电子束装置的装置的制造方法
公开(公告)号：JP2002373612A
公开(公告)日：2002-12-26
申请号：JP2001181968
申请日：2001-06-15
申请人： Ebara Corp , Nikon Corp , 株式会社ニコン , 株式会社荏原製作所
发明人： HAMASHIMA MUNEKI , NAKASUJI MAMORU , KATO TAKAO , NOMICHI SHINJI , SATAKE TORU
IPC分类号： G01N23/225 , G01R31/02 , G21K5/04 , H01J37/22 , H01J37/244 , H01J37/28 , H01J37/29
摘要： PROBLEM TO BE SOLVED: To provide an electron beam device, capable of maximally utilizing an advantage of using multi-beams by providing a specific signal processing circuit processing a detection signal, after detecting a secondary electron by a detector. SOLUTION: The electron beam device is provided with a primary optical system 10 scanning a sample by focusing a plurality of primary electron beams, a secondary optical system 30 introducing a plurality of secondary electrons emitted from the sample by the first electron beams to each detector 41, and a detection system 40 performing image processing of a plurality of detection signals outputted from each detector. In the detection system, an analog-to- digital converter 42 which converts detection signal from a detector into a digital signal, an imaging circuit 43 converting the digital signal into a two-dimensional pattern, a circuit 44 detecting an edge of the two-dimensional pattern and converting it into an edge image, and a pattern comparison circuit 48 comparing the detected two-dimensional pattern with a two-dimensional pattern from pattern data are individually provided by each detector.
摘要翻译：要解决的问题：提供一种电子束装置，其能够通过在检测器检测到二次电子之后提供处理检测信号的特定信号处理电路，最大限度地利用使用多光束的优点。解决方案：电子束装置设置有通过聚焦多个一次电子束来扫描样品的主光学系统10，将由第一电子束从样品发射的多个二次电子引入到每个检测器41的二次光学系统30 以及对从各检测器输出的多个检测信号进行图像处理的检测系统40。在检测系统中，将检测信号从检测器转换为数字信号的模拟数字转换器42，将数字信号转换为二维图案的成像电路43，检测二维图像的边缘的电路44，并且将其转换成边缘图像，并且由每个检测器分别提供将检测到的二维图案与来自图案数据的二维图案进行比较的图案比较电路48。

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