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1. 发明专利

JP2008288517A Brush for cleaning substrate, and substrate cleaning apparatus 审中-公开
标题翻译：用于清洁基板的刷子和底板清洁装置
公开(公告)号：JP2008288517A
公开(公告)日：2008-11-27
申请号：JP2007134311
申请日：2007-05-21
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： SATO MASANOBU , MATSUNAGA SANENOBU
IPC分类号： H01L21/304 , G02F1/13 , G02F1/1333 , G11B5/84 , G11B7/26
摘要： PROBLEM TO BE SOLVED: To efficiently clean a formed surface on which fine circuit patterns are formed without destroying the circuit patterns.
SOLUTION: A substrate cleaning brush 7 which is formed by densely setting a plurality of thread-shaped members 71, each of which is constructed with carbon nanotubes, is equipped in a substrate cleaning apparatus 1. The substrate 90 is held by a chuck 3 in such a way that the surface on which fine circuit patterns are formed is set upside, and the thread-shaped members 71 of the substrate cleaning bush 7 are touched on the surface. Under this condition, the formed surface of the substrate 90 is cleaned by rubbing thereon with the substrate cleaning brush 7 (thread-shaped members 71) by rotating rotary motors 10, 11, 12.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：为了有效地清洁在其上形成精细电路图案的成形表面而不破坏电路图案。解决方案：在基板清洗装置1中装备有通过密集地设置多个螺旋形构件71（每个都由碳纳米管构成）形成的基板清洁刷7。基板90由卡盘3，使得形成微细电路图案的表面设置在上侧，并且衬底清洁衬套7的螺纹状构件71在表面上被触摸。在这种条件下，通过旋转旋转马达10,11,12，用基板清洁刷7（螺纹状构件71）摩擦基板90的形成表面。（C）2009，JPO＆INPIT

2. 发明专利

JP2008277518A Substrate cleaning device and substrate cleaning method 审中-公开
标题翻译：基板清洁装置和基板清洁方法
公开(公告)号：JP2008277518A
公开(公告)日：2008-11-13
申请号：JP2007118920
申请日：2007-04-27
申请人： Dainippon Screen Mfg Co Ltd , Nippon Tokushu Kento Kk , 大日本スクリーン製造株式会社 , 日本特殊研砥株式会社
发明人： KONO MOTOHIRO , MATSUNAGA SANENOBU , IKUTA AKITOSHI , TSUJI KUNSHICHIRO
IPC分类号： H01L21/304 , G02F1/13 , G11B5/84
摘要： PROBLEM TO BE SOLVED: To provide a substrate cleaning device and a substrate cleaning method, which are capable of nicely removing foreign matter adhered firmly to the edge part of a substrate without polishing the substrate itself. SOLUTION: The substrate cleaning device 1 removes the foreign matter adhered to the edge part E by abutting an abutting member 32, constituted of an elastic material having a compression elasticity not less than 0.3 MPa and not more than 2.7 MPa, against the edge part E of the substrate W. Accordingly, the foreign matter, such as metallic film, slurry or the like which is adhered firmly to the edge part E, can be removed nicely without polishing the edge part of the substrate W. On the other hand, silica is mixed into the elastic material for constituting the abutting member 32 as an abrasive grain whereby the foreign matter adhered firmly to the edge part E can be removed nicely while peeling the same. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够很好地去除衬底牢固地附着到衬底的边缘部分而不抛光衬底本身的衬底清洗装置和衬底清洗方法。解决方案：基板清洁装置1通过将由具有不小于0.3MPa且不大于2.7MPa的压缩弹性的弹性材料构成的抵接构件32抵靠在邻接构件32上而去除附着到边缘部E的异物因此，不会对衬底W的边缘部分进行研磨，可以很好地除去粘附在边缘部分E上的异物如金属膜，浆料等。另一方面，将二氧化硅混合到用于构成抵接构件32的弹性材料中作为磨料颗粒，由此可以在剥离它的同时将其牢固地粘附到边缘部分E上的异物被去除。版权所有（C）2009，JPO＆INPIT

3. 发明专利

JP2004193538A Method and device for chemical development of pattern 有权
公开(公告)号：JP2004193538A
公开(公告)日：2004-07-08
申请号：JP2003056801
申请日：2003-03-04
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： SANADA MASAKAZU , HARUMOTO MASAHIKO , KOBAYASHI HIROSHI , MATSUNAGA SANENOBU , MORITA AKIHIKO
IPC分类号： G03F7/30 , B05C11/10 , B05D1/26 , B05D1/40 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To improve the uniformity of the supply form of rinsing liquid. SOLUTION: The substrate W is held by a substrate holding part 10 in an approximately horizontal position and is rotated by a spin motor 113. One end part of a rinsing liquid supply nozzle 140 is supported by a second moving mechanism 150 rotatably and is rotated to pass over the substrate W. The rinsing liquid supply nozzle 140 is rotated to pass over the substrate W while discharging rinsing liquid from a discharge part of the rinsing liquid supply nozzle 140. In the process, the rinsing liquid supply nozzle 140 and the substrate W are rotated so that a virtual scanning direction La of the substrate W is substantially vertical to an extension direction of the rinsing liquid supply nozzle 140. COPYRIGHT: (C)2004,JPO&NCIPI

4. 发明专利

JP2004015022A Substrate handling device 审中-公开
标题翻译：基板处理装置
公开(公告)号：JP2004015022A
公开(公告)日：2004-01-15
申请号：JP2002170500
申请日：2002-06-11
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： SUGIMOTO KENJI , MATSUNAGA SANENOBU , SANADA MASAKAZU , YOSHIOKA KATSUJI , AOKI KAORU , YANO MORITAKA , YAMAMOTO SATOSHI , MIHASHI TAKESHI , NAGAO TAKASHI , KODAMA MITSUMASA
IPC分类号： B25J9/06 , B65G49/07 , H01L21/027 , H01L21/677 , H01L21/68
摘要： PROBLEM TO BE SOLVED: To provide a substrate handling device in which the design of a substrate carrying passage is set freely and a mutual influence between treatment sections through the substrate carrying passage is reduced. SOLUTION: An arm base provided in each of carrying mechanisms 17-21, 23 and 24 is arranged to turn about a z-axis and to elevate/lower in the z-axis direction, and each arm is arranged to advance/retract in the radial direction of rotation. Passages for carrying substrates, i.e. treatment section carrying passages 25 and 26, are installed on respective floors by interposing heat treatment sections 16 (16A-16H) and juxtaposing the carrying mechanisms 17-21, 23 and 24 on the same horizontal plane. COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：提供一种基板搬运装置，其中基板承载通道的设计自由设定，并且通过基板承载通道的处理部分之间的相互影响减小。解决方案：设置在每个运送机构17-21,23和24中的臂基座布置成围绕z轴转动并在z轴方向上升/降，并且每个臂布置成前进/ 在径向旋转方向缩回。通过插入热处理部分16（16A-16H）并将携带机构17-21,23和24并置在同一水平面上，将各个承载基板的通道即处理部分承载通道25和26安装在相应的楼层上。版权所有（C）2004，JPO

5. 发明专利

JP2004015019A Substrate handling device 审中-公开
标题翻译：基板处理装置
公开(公告)号：JP2004015019A
公开(公告)日：2004-01-15
申请号：JP2002170497
申请日：2002-06-11
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： SUGIMOTO KENJI , MATSUNAGA SANENOBU , SANADA MASAKAZU , YOSHIOKA KATSUJI , AOKI KAORU , YANO MORITAKA , YAMAMOTO SATOSHI , MIHASHI TAKESHI , NAGAO TAKASHI , KODAMA MITSUMASA
IPC分类号： H01L21/677 , H01L21/02 , H01L21/027 , H01L21/68
摘要： PROBLEM TO BE SOLVED: To provide a substrate handling device in which a footprint is reduced and a means for carrying a substrate can be maintained conveniently. SOLUTION: Heat treatment sections 16A and 16F, 16B and 16G, 16C and 16H, 16D and 16F and 16E and 16G are disposed vertically in a hierarchic structure such that a substrate can be delivered to/from each carrying mechanism. The stacked heat treatment sections 16A-16F are mounted on each rail 27 extended from a steady-state position C facing each carrying mechanism to a retreat position D. Each carrying mechanism can be maintained conveniently by moving each of heat treatment sections 16A-16F from the steady-state position C to the retreat position D and ensuring a common maintenance zone for maintaining each carrying mechanism. COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：提供一种其中足迹减小的基板处理装置，并且可以方便地保持用于承载基板的装置。解决方案：热处理部分16A和16F，16B和16G，16C和16H，16D和16F和16E和16G以分层结构垂直设置，使得可以将基板输送到每个传送机构/从每个传送机构传送。堆叠式热处理部16A-16F安装在从面向各个搬运机构的稳定状态位置C延伸到后退位置D的每个轨道27上。通过将热处理部16A-16F中的每一个从稳定位置C到退回位置D，并且确保用于维持每个承载机构的公共维护区域。版权所有（C）2004，JPO

6. 发明专利

JP2003297739A Chemical liquid treatment apparatus 有权
标题翻译：化学液体处理设备
公开(公告)号：JP2003297739A
公开(公告)日：2003-10-17
申请号：JP2002351415
申请日：2002-12-03
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： GOTO SHIGEHIRO , YOSHIOKA KATSUJI , MATSUNAGA SANENOBU
IPC分类号： G03F7/16 , B05B7/16 , B05C5/00 , H01L21/00 , H01L21/027 , H01L21/304
CPC分类号： H01L21/6715 , B05B7/1666 , B05B12/1472 , B05C5/001 , H01L21/67051
摘要： PROBLEM TO BE SOLVED: To provide a chemical liquid treatment apparatus that can efficiently regulate a temperature in treatment liquid without increasing the size of the apparatus.
SOLUTION: The chemical liquid treatment apparatus has a temperature- regulating pot 80 that sandwiches a treatment liquid pot 22 at the tip of a nozzle 20 to heat-exchange the treatment liquid and regulates a temperature in the treatment liquid in the treatment liquid pot 22, thus discharging the treatment liquid in the treatment liquid pot 22 where the temperature is regulated on the main surface of the substrate for treating a substrate, eliminating the need for providing piping for regulating a temperature along treatment liquid piping such as a conventional apparatus, miniaturizing a treatment liquid supply system, giving proper heat exchange efficiency to the treatment liquid in the treatment liquid pot 22, and efficiently regulating the temperature in the treatment liquid.
COPYRIGHT: (C)2004,JPO
摘要翻译：解决的问题：提供一种可以在不增加设备尺寸的情况下有效地调节处理液中的温度的化学液体处理装置。解决方案：化学液体处理装置具有温度调节罐80，其将喷嘴20的尖端处的处理液罐22夹持以对处理液进行热交换并调节处理液中的处理液的温度从而将处理液体罐22中的处理液排出到处理基板的基板的主表面上的处理液体22，从而不需要提供用于调节诸如常规装置的处理液体管道的温度的管道使处理液供给系统小型化，对处理液罐22内的处理液赋予适当的热交换效率，有效地调节处理液的温度。版权所有（C）2004，JPO

7. 发明专利

JP2006093164A Manufacturing method of organic el display device, and its manufacturing apparatus 有权
标题翻译：有机EL显示装置的制造方法及其制造装置
公开(公告)号：JP2006093164A
公开(公告)日：2006-04-06
申请号：JP2005368196
申请日：2005-12-21
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： IMAMURA HIDEKAZU , TAKAMURA YUKIHIRO , MATSUNAGA SANENOBU
IPC分类号： H05B33/10 , H01L51/50
摘要： PROBLEM TO BE SOLVED: To provide a manufacturing method of an organic EL display device and its manufacturing apparatus, where splashing of organic EL materials can be prevented, and coating control of the organic EL materials can be simplified.
SOLUTION: The manufacturing method of the organic EL display device wherein the organic EL display device is manufactured by coating the organic EL materials on a glass substrate S into a prescribed pattern shape, after a groove 11 according to the prescribed pattern shape on which the organic EL materials are to be coated has been formed on the glass substrate S, is equipped with the glass substrate S and nozzles 4a to 4c moved relatively so as to make the nozzle 4a to 4c positioned alongside the groove 11, and with a process in which the organic EL materials from the nozzles 4a to 4c are poured into the groove 11 to be coated is equipped.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了提供可以防止有机EL材料飞溅的有机EL显示装置及其制造装置的制造方法，并且可以简化有机EL材料的涂布控制。解决方案：有机EL显示装置的制造方法，其中有机EL显示装置是通过将玻璃基板S上的有机EL材料涂覆在规定图案形状之后，在根据规定图案形状的槽11之后在玻璃基板S上形成有机EL材料的玻璃基板S，配备有相对移动的玻璃基板S和喷嘴4a〜4c，使喷嘴4a〜4c位于槽11的旁边，配备有将来自喷嘴4a〜4c的有机EL材料注入待涂布槽11的工序。版权所有（C）2006，JPO＆NCIPI

8. 发明专利

JP2004015023A Substrate handling device and handling method 审中-公开
公开(公告)号：JP2004015023A
公开(公告)日：2004-01-15
申请号：JP2002170501
申请日：2002-06-11
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： SUGIMOTO KENJI , MATSUNAGA SANENOBU , SANADA MASAKAZU , YOSHIOKA KATSUJI , AOKI KAORU , YANO MORITAKA , YAMAMOTO SATOSHI , MIHASHI TAKESHI , NAGAO TAKASHI , KODAMA MITSUMASA
IPC分类号： B65G49/07 , H01L21/027 , H01L21/677 , H01L21/68
摘要： PROBLEM TO BE SOLVED: To provide a substrate handling device and a handling method in which the processing efficiency of a substrate is enhanced without increasing a footprint.
SOLUTION: A first floor treatment section carrying passage 25 and a second floor treatment section carrying passage 26 each arranged vertically in a two-story hierarchic structure are coupled with an indexer 1 and an interface 4, respectively. Since the substrate is retreated or carried to the first floor or second floor processing section carrying passages 25, 26 by the indexer 1 or the interface 4, the interference of substrates can be reduced and the treatment efficiency of the substrate can be enhanced.
COPYRIGHT: (C)2004,JPO

9. 发明专利

JP2004015020A Substrate handling device 有权
公开(公告)号：JP2004015020A
公开(公告)日：2004-01-15
申请号：JP2002170498
申请日：2002-06-11
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： SUGIMOTO KENJI , MATSUNAGA SANENOBU , SANADA MASAKAZU , YOSHIOKA KATSUJI , AOKI KAORU , YANO MORITAKA , YAMAMOTO SATOSHI , MIHASHI TAKESHI , NAGAO TAKASHI , KODAMA MITSUMASA
IPC分类号： H01L21/677 , H01L21/027 , H01L21/68
摘要： PROBLEM TO BE SOLVED: To provide a substrate handling device in which treatment efficiency can be enhanced when the substrate is inspected. SOLUTION: An indexer 1, a carrying mechanism 17 for heat treatment section, and a section T for inspecting a mounted substrate W being delivered between carrying mechanisms 18 for antireflection film forming section are disposed at the starting point of a treatment section carrying passage 25 on a first floor. Similar inspecting sections T are disposed at the end point of the treatment section carrying passage 25, and at the starting point and the end point of a treatment section carrying passage on a second floor. Since the state of the substrate W can be inspected before the substrate is treated or immediately after it is treated and the inspecting sections T are disposed at the starting point or the end point, the waiting time of the substrate W being inspected due to an interference with the other substrate W can be reduced. COPYRIGHT: (C)2004,JPO

10. 发明专利

JP2003309058A Method and apparatus for treating substrate 有权
标题翻译：用于处理基板的方法和装置
公开(公告)号：JP2003309058A
公开(公告)日：2003-10-31
申请号：JP2002113365
申请日：2002-04-16
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： SUGIMOTO KENJI , MATSUNAGA SANENOBU , SANADA MASAKAZU , YOSHIOKA KATSUJI , AOKI KAORU , YANO MORITAKA , YAMAMOTO SATOSHI , MIHASHI TAKESHI , NAGAO TAKASHI , KODAMA MITSUMASA
IPC分类号： G03F7/30 , B05C5/00 , B05C11/10 , B05D1/26 , B05D3/00 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a substrate treating method and a substrate treating apparatus that can improve treatment accuracy when treating substrates by discharging a treatment liquid to the substrates, and can effectively utilize the treatment liquid. SOLUTION: In the substrate treating apparatus, the discharge area of a discharge section 7a in a nozzle 7 is not changed, thus preventing a change in the flow rate of a developer Q due to a change in the discharge area, and irregularities in the development of the substrate W due to the change in the flow rate of the developer Q discharged to the substrate W. Additionally, the developer Q discharged to the substrate W from the nozzle 7 is collected by a slender collection port 22 at a collection section 15 oppositely arranged at the lower side of the discharge section 7a of the nozzle 7. As a result, the developer Q is exposed to air only while the developer Q is discharged from the discharged section 7a for reaching the collection ports 22, thus decreasing the exposure of the developer Q to air for reducing a change in the characteristics, and reusing the developer Q for effective utilization. COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：提供一种基板处理方法和基板处理装置，其可以通过将处理液排出到基板来处理基板时能够提高处理精度，并且可以有效地利用处理液体。解决方案：在基板处理装置中，喷嘴7中的排出部分7a的排放面积不改变，从而防止由于排放区域的变化而导致的显影剂Q的流量变化，并且不规则在由于排出到基板W的显影剂Q的流量的变化引起的基板W的显影中。另外，从喷嘴7排出到基板W的显影剂Q被收集在细长的收集口22上部分15相对地布置在喷嘴7的排出部分7a的下侧。结果是，只有当显影剂Q从排出部分7a排出以达到收集口22时，显影剂Q才暴露于空气中，从而减少将显影剂Q暴露于空气中以减少特性变化，并且重新使用显影剂Q以进行有效利用。版权所有（C）2004，JPO

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