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1. 发明专利

JP2006310731A Substrate processing equipment and method 有权
标题翻译：基板加工设备和方法
公开(公告)号：JP2006310731A
公开(公告)日：2006-11-09
申请号：JP2005267330
申请日：2005-09-14
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： YASUDA SHUICHI , KANEOKA MASA , KANAYAMA KOJI , MIYAGI SATOSHI , SHIGEMORI KAZUSHI , ASANO TORU , TORIYAMA YUKIO , TAGUCHI TAKASHI , MIHASHI TAKESHI , OKUMURA TAKESHI
IPC分类号： H01L21/027 , B65G49/06 , B65G49/07 , H01L21/304 , H01L21/677
CPC分类号： G03F7/70991 , G03F7/70341
摘要： PROBLEM TO BE SOLVED: To provide substrate processing equipment and method in which the components of a photosensitive material on a substrate can be prevented from eluting into a liquid in an aligner. SOLUTION: The substrate processing equipment 500 comprises an indexer block 9, an anti-reflection film processing block 10, a resist film processing block 11, a cleaning/developing processing block 12, and an interface block 13. An aligner 14 is arranged contiguously to the interface block 13. A resist film is formed on a substrate W in the resist film processing block 11. Before the substrate W is exposed in the aligner, the substrate W is subjected to cleaning and drying processings in a cleaning unit in the cleaning/developing processing block 12. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供可以防止在基板上的感光材料的组分在对准器中洗脱到液体中的衬底处理设备和方法。解决方案：基板处理设备500包括分度器块9，防反射膜处理块10，抗蚀剂膜处理块11，清洁/显影处理块12和接口块13.对准器14是在光刻胶处理块11中的基板W上形成抗蚀剂膜。在基板W在对准器中露出之前，对基板W进行清洁和干燥处理，在清洁单元中进行清洁和干燥处理清洁/显影处理块12.版权所有（C）2007，JPO＆INPIT

2. 发明专利

JP2006310730A Substrate processing equipment 有权
标题翻译：基板加工设备
公开(公告)号：JP2006310730A
公开(公告)日：2006-11-09
申请号：JP2005267329
申请日：2005-09-14
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： YASUDA SHUICHI , KANEOKA MASA , KANAYAMA KOJI , MIYAGI SATOSHI , SHIGEMORI KAZUSHI , ASANO TORU , TORIYAMA YUKIO , TAGUCHI TAKASHI , MIHASHI TAKESHI , OKUMURA TAKESHI
IPC分类号： H01L21/027 , B05C9/12 , B05C9/14 , B05C11/08 , B65G49/06 , H01L21/677
CPC分类号： G03F7/70991 , H01L21/67051 , H01L21/67173 , H01L21/67178
摘要： PROBLEM TO BE SOLVED: To provide substrate processing equipment in which poor processing of a substrate can be prevented at low cost, during exposure processing in an aligner. SOLUTION: The substrate processing equipment 500 comprises an indexer block 9, an anti-reflection film processing block 10, a resist film processing block 11, a development processing block 12, a liquid immersion processing block 13, and an interface block 14. An aligner 15 is arranged contiguously to the interface block 14. The liquid immersion processing block 13 includes a resist cover film coating section 200 and a resist cover film removing section 250. Prior to exposure processing, a resist cover film is formed in the liquid immersion processing block 13. After exposure processing, the resist cover film is removed in the liquid immersion processing block 13. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：为了提供在对准器的曝光处理期间可以以低成本防止基板的不良处理的基板处理设备。解决方案：基板处理设备500包括分度器块9，防反射膜处理块10，抗蚀剂膜处理块11，显影处理块12，液浸处理块13和界面块14 对准器15与接口块14连续布置。液浸处理块13包括抗蚀剂覆盖膜涂覆部分200和抗蚀剂覆盖膜去除部分250.在曝光处理之前，在液体中形成抗蚀剂覆盖膜浸渍处理块13.在曝光处理之后，在液浸处理块13中去除抗蚀剂覆盖膜。版权所有：（C）2007，JPO＆INPIT

3. 发明专利

JP2005243690A Substrate processing apparatus 审中-公开
标题翻译：基板加工设备
公开(公告)号：JP2005243690A
公开(公告)日：2005-09-08
申请号：JP2004047944
申请日：2004-02-24
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： SUGIMOTO KENJI , MATSUNAGA SANENOBU , SANADA MASAKAZU , YOSHIOKA KATSUJI , AOKI KAORU , YANO MORITAKA , YAMAMOTO SATOSHI , MIHASHI TAKESHI , NAGAO TAKASHI , KODAMA MITSUMASA
IPC分类号： H01L21/677 , H01L21/027 , H01L21/68
摘要： PROBLEM TO BE SOLVED: To provide a substrate processing apparatus in which an occupying area is reduced. SOLUTION: The substrate processing apparatus is constituted by accumulating a unit for the substrate processing apparatus as a unit for constituting the substrate processing apparatus (cell). The apparatus has a treatment part for performing a predetermined treatment to the substrate, and a substrate conveyance means for performing delivery of the substrate at this treatment part on multiple steps. For example, since a cell 15A is accumulated on the cell 12, and a cell 15B is accumulated and constituted on a cell 13, the occupying area of the substrate processing apparatus can be reduced, and the footprint saving of the substrate processing apparatus can be performed. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：解决的问题：提供一种占用面积减小的基板处理装置。＆lt; P＆gt;解决方案：基板处理装置通过将用于基板处理装置的单元累积为构成基板处理装置（单元）的单元构成。该设备具有用于对基板执行预定处理的处理部分，以及用于在多个步骤上在该处理部分执行基板输送的基板输送装置。例如，由于单元电池15A蓄积在电池单元12上，单元电池15被积聚并构成在电池单元13上，所以能够减小基板处理装置的占用面积，并且可以使基板处理装置的占地面积节省执行。版权所有（C）2005，JPO＆NCIPI

4. 发明专利

JP2003309160A Unit for substrate handling device, substrate handling device and method for assembling the device 有权
标题翻译：用于基板处理装置的单元，基板处理装置和用于组装装置的方法
公开(公告)号：JP2003309160A
公开(公告)日：2003-10-31
申请号：JP2002113364
申请日：2002-04-16
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： SUGIMOTO KENJI , MATSUNAGA SANENOBU , SANADA MASAKAZU , YOSHIOKA KATSUJI , AOKI KAORU , YANO MORITAKA , YAMAMOTO SATOSHI , MIHASHI TAKESHI , NAGAO TAKASHI , KODAMA MITSUMASA
IPC分类号： G03F7/16 , G03F7/30 , H01L21/027 , H01L21/677 , H01L21/68
摘要： PROBLEM TO BE SOLVED: To provide a unit for a substrate handling device with improved reliability, the substrate handling device and a method for assembling the device. SOLUTION: This unit (cells 12 and 13) for the substrate handling device is provided with a substrate carrying means for each of a plurality of treatment parts individually, that is, the cell 12 is provided with a carrying mechanism 17 for the heat treatment parts 16A-16C and the carrying mechanism 18 for SC and the cell 13 is provided with the carrying mechanism 19 for the heat treatment parts 16C-16E and the carrying mechanism 20 for the SC. Thus, since it is sufficient to carry a substrate to the corresponding treatment parts (heat treatment parts and SC) by the single carrying mechanism 17-20, burdens of the respective carrying mechanisms 17-20 are reduced, the MTBF of the respective carrying mechanisms 17-20 is increased and reliability is improved. COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：为了提供具有改善的可靠性的基板处理装置的单元，基板处理装置和装置的组装方法。解决方案：用于基板处理装置的该单元（单元12和13）分别设置有用于多个处理部中的每一个的基板承载装置，即，单元12设置有用于用于SC和电池13的热处理部件16A-16C和运载机构18设置有用于热处理部件16C-16E的承载机构19和用于SC的承载机构20。因此，由于通过单个运载机构17-20将基板运送到相应的处理部件（热处理部分和SC）就足够了，所以各个承载机构17-20的负担减小，各个承载机构的MTBF 增加了17-20，提高了可靠性。版权所有（C）2004，JPO

5. 发明专利

JP2009283980A Substrate processor 审中-公开
标题翻译：基板处理器
公开(公告)号：JP2009283980A
公开(公告)日：2009-12-03
申请号：JP2009196588
申请日：2009-08-27
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： SUGIMOTO KENJI , MATSUNAGA SANENOBU , SANADA MASAKAZU , YOSHIOKA KATSUJI , AOKI KAORU , YANO MORITAKA , YAMAMOTO SATOSHI , MIHASHI TAKESHI , NAGAO TAKASHI , KODAMA MITSUMASA
IPC分类号： H01L21/677 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a substrate processor which raises processing efficiency of a substrate, and simply performs conveyance control of the substrate. SOLUTION: The substrate processor is configured such that a series of substrate conveyance routes which are the ones for conveying the substrate are vertically arranged in hierarchical structure and that the substrate W is transferred between a processing part conveyance route 25 on a first floor and a processing part conveyance route 26 on a second floor, wherein the processing part conveyance routes 25, 26 are composed by vertically arranging a forward exclusive route on which the substrate is conveyed in the forward direction and a backward exclusive route on which the substrate W is conveyed in the backward direction. In addition, one end of each of the processing part conveyance routes 25, 26 is connected by an indexer 1, and the other end of each is connected by an interface 4. By constituting the processing part conveyance routes as such, waiting time of the substrate by interference between a substrate to be conveyed on the forward exclusive route and a substrate to be conveyed on the backward exclusive route is reduced, and the processing efficiency of the substrate is raised. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：解决的问题：提供提高基板的加工效率的基板处理器，并且简单地进行基板的输送控制。解决方案：基板处理器被配置为使得用于传送基板的一系列基板输送路径以分层结构垂直布置，并且基板W在第一层的处理部分输送路径25之间传送以及位于二楼的处理部输送路线26，其中，处理部输送路线25,26是通过在前方向垂直排列基板被输送的正向排列路径和向下排列路径构成的，沿反方向传送。此外，处理部输送路线25,26的一端由分度器1连接，另一端通过接口4连接。通过构成处理部输送路径，等待时间为减少了在正向排斥路径上要传送的基板与要在后向专用路径上传送的基板之间的干涉的基板，并且提高了基板的处理效率。版权所有（C）2010，JPO＆INPIT

6. 发明专利

JP2006310732A Substrate processing equipment 有权
标题翻译：基板加工设备
公开(公告)号：JP2006310732A
公开(公告)日：2006-11-09
申请号：JP2005267331
申请日：2005-09-14
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： YASUDA SHUICHI , KANEOKA MASA , KANAYAMA KOJI , MIYAGI SATOSHI , SHIGEMORI KAZUSHI , ASANO TORU , TORIYAMA YUKIO , TAGUCHI TAKASHI , MIHASHI TAKESHI , OKUMURA TAKESHI
IPC分类号： H01L21/027 , B05C9/14 , B05C11/08 , B05C11/10 , B05C13/02 , B65G49/06 , H01L21/677
CPC分类号： G03F7/30 , H01L21/67028 , H01L21/67034 , H01L21/67051 , H01L21/67178 , H01L21/67225
摘要： PROBLEM TO BE SOLVED: To provide substrate processing equipment in which the components of a photosensitive material on a substrate can be prevented from eluting into a liquid in an aligner. SOLUTION: The substrate processing equipment 500 comprises an indexer block 9, an anti-reflection film processing block 10, a resist film processing block 11, a development processing block 12, a cleaning block 13, and an interface block 14. An aligner 15 is arranged contiguously to the interface block 14. The cleaning block 13 includes a cleaning section 80. A resist film is formed on a substrate W in the resist film processing block 11. Before the substrate W is exposed in the aligner, the substrate W is subjected to cleaning and drying processings in the cleaning section 80. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供可以防止基板上的感光材料的组分在对准器中洗脱成液体的基板处理设备。解决方案：基板处理设备500包括分度器块9，防反射膜处理块10，抗蚀剂膜处理块11，显影处理块12，清洁块13和接口块14。对准器15与接口块14连续布置。清洁块13包括清洁部分80.在抗蚀剂膜处理块11中的基板W上形成抗蚀剂膜。在基板W在对准器中露出之前，基板 W在清洁部分80中进行清洁和干燥处理。版权所有（C）2007，JPO＆INPIT

7. 发明专利

JP2004179289A Treatment-liquid feeder to substrate 有权
公开(公告)号：JP2004179289A
公开(公告)日：2004-06-24
申请号：JP2002342035
申请日：2002-11-26
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： OGURA HIROYUKI , MATSUI HIROSHI , MIHASHI TAKESHI
IPC分类号： H01L21/027 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a treatment-liquid feeder to a substrate in which a constitution and a control are simplified extremely and an installation space may also be reduced, by which an effect equal to a conventional device is obtained and which has a sack bag system. SOLUTION: The treatment-liquid feeder to the substrate is constituted so as to have a diaphragm 28 with a treatment-liquid housing chamber 26, in which a sack bag unit 16 interposed between a nozzle 12 for a treatment-liquid supply pipe 14 and an air on-off valve 18 is installed to the intermediate section of the in-pipe flow path of the supply pipe 14, a displacement section 32 having a permanent magnet 30 and being supported in a displaceable manner to the section 28, an electromagnet 36 being fixed while being opposed to the section 32 and displacing the section 32 by an electric conduction, a spring 34 being interposed between the electromagnet and the section 32 and urging the section 32 in the opposite direction to the displacement direction of the section 32 in the case of the electric conduction to the electromagnet, and a controller 24 controlling the electric conduction or a current interruption to the electromagnet so that the section 32 is displaced so as to increase the internal volume of the treatment-liquid housing chamber for the section 28 just after the valve 18 is closed. COPYRIGHT: (C)2004,JPO

8. 发明专利

JP2004015021A Substrate handling device 审中-公开
公开(公告)号：JP2004015021A
公开(公告)日：2004-01-15
申请号：JP2002170499
申请日：2002-06-11
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： SUGIMOTO KENJI , MATSUNAGA SANENOBU , SANADA MASAKAZU , YOSHIOKA KATSUJI , AOKI KAORU , YANO MORITAKA , YAMAMOTO SATOSHI , MIHASHI TAKESHI , NAGAO TAKASHI , KODAMA MITSUMASA
IPC分类号： G05B19/418 , H01L21/027 , H01L21/677 , H01L21/68
CPC分类号： Y02P90/08 , Y02P90/083
摘要： PROBLEM TO BE SOLVED: To provide a handling device system in which the carriage control of a substrate can be performed conveniently while enhancing the treatment efficiency of the substrate. SOLUTION: A series of substrate carrying passages as passages for carrying a substrate is arranged vertically in a hierarchic structure such that a substrate W can be delivered between a treatment section carrying passage 25 on a first floor and a treatment section carrying passage 26 on a second floor. The treatment section carrying passages 25 and 26 are vertically arranged as an outgoing passage for carrying the substrate forward and an incoming passage for carrying the substrate reversely, respectively. One end of the treatment section carrying passages 25 and 26 are coupled by an indexer 1 and the other end thereof are coupled by an interface 4. Since a waiting time due to the interference of the substrate carried on the outgoing passage with the substrate carried on the incoming passage is reduced, the treatment efficiency of the substrate can be enhanced. COPYRIGHT: (C)2004,JPO

9. 发明专利

JP2007214200A Developing device and developing method 有权
标题翻译：开发设备和开发方法
公开(公告)号：JP2007214200A
公开(公告)日：2007-08-23
申请号：JP2006029963
申请日：2006-02-07
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： MIHASHI TAKESHI , SUGIMOTO KENJI
IPC分类号： H01L21/027 , G03F7/30
CPC分类号： G03F7/3021 , H01L21/67051 , H01L21/67253
摘要： PROBLEM TO BE SOLVED: To provide a developing device and a method by which the occurrence of a developing defect caused by a large contact angle of a substrate can be prevented and a time can be shortened for performing developing treatment on the substrate.
SOLUTION: An integrated nozzle 11 discharging a developer, a rinsing liquid, and nitrogen gas is arranged near the rotation center C of the substrate W in a plane view. A control unit 51 operates electromagnetic opening/closing valves 25, 33a, 33b and 39. Thus, the supply of the developer is continued while the substrate is rotated in a developing process, the supply of the rinsing liquid is started immediately after the supply of the developer is terminated in a rinsing process, and a period of the developing process is shortened. The supply of nitrogen gas is started immediately after the rinsing process is terminated and a system moves to a drying process.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：解决的问题：提供一种可以防止由于基板的大的接触角引起的显影缺陷的发生并且可以缩短用于对基板进行显影处理的时间的显影装置和方法。解决方案：在平面图中，在基板W的旋转中心C附近布置排出显影剂，漂洗液体和氮气的集成喷嘴11。控制单元51操作电磁开/关阀25,33a，33b和39.因此，在显影过程中基板旋转的同时继续供应显影剂，在供给显影剂在漂洗过程中终止，并且缩短了显影过程的时间。漂洗过程终止后立即开始供应氮气，系统进入干燥过程。版权所有（C）2007，JPO＆INPIT

10. 发明专利

JP2004140168A Substrate treatment equipment 有权
公开(公告)号：JP2004140168A
公开(公告)日：2004-05-13
申请号：JP2002303076
申请日：2002-10-17
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： MIHASHI TAKESHI
IPC分类号： G03F7/30 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To control a supply quantity of a treatment liquid accurately by a simple operation.
SOLUTION: A nozzle for supplying a developer to a substrate held on a substrate mounting table is connected by a treatment liquid supply pipe connected to a developer tank. The treatment liquid supply pipe is equipped with a flow rate regulating valve 9. The flow rate regulating valve 9 is such that a valve body 11 for regulating the opening of a supply flow channel is equipped in a valve box 10 wherein the developer supply flow channel is formed. A hollow valve rod 12 having a square cross-sectional shape is integrally connected to the valve body 11, a nut 13 is connected at the tip of the valve rod 12, and the nut 13 is screwed on a screw shaft 15 which is rotated by an electric motor (stepping motor) 14. The valve body 11 is opened or closed by the bi-directional operation of the electric motor 14. By optionally regulating the opening and an opening/closing speed of the valve body 11, the supply quantity of the treatment liquid is controlled.
COPYRIGHT: (C)2004,JPO

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