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1. 发明专利

JPH08153378A HEAD SUSPENSION MECHANISM AND DISK DRIVE DEVICE 失效
公开(公告)号：JPH08153378A
公开(公告)日：1996-06-11
申请号：JP29414494
申请日：1994-11-29
申请人： CITIZEN WATCH CO LTD
发明人： YAMAMOTO IZUMI , KOSHI MASAO , NONAKA SHINICHI , TANAKA AKIHIRO , TAKENOUCHI MASAAKI
IPC分类号： G11B21/21 , G11B21/02
摘要： PURPOSE: To make the performance stable with less variations by providing a columnar projection part measuring its height larger than the plate thickness of a suspension plate and having a hollow part on one surface of a base plate. CONSTITUTION: One surface of the base plate 29 as a reinforcing member is provided with the columnar projection part 39 measuring its height larger than the plate thickness of the suspension plate 31 and having the hollow part, and this projection part 39 is inserted into a hole of the suspension plate 31 to join the base plate 29 to the suspension plate 31. Thus, the upper surface and the lower surface of the projection part 39 of the base plate are regarded as reference surfaces for deciding a relative position between the head suspension mechanism and an actuator. Consequently, since superposition of the head suspension mechanism and a coil supporting part of the actuator is performed only by the base plate 29 without holding the suspension plate 31 inside, superposing position accuracy is not dependent upon the accuracy of the joining surface between the base plate 29 and the suspension plate 31, thus reducing variations in position accuracy and stabilizing the performance.

2. 发明专利

JPH0153350B2 失效
公开(公告)号：JPH0153350B2
公开(公告)日：1989-11-14
申请号：JP10515582
申请日：1982-06-18
申请人： CITIZEN WATCH CO LTD
发明人： SASANUMA KYOJU , KOSHI MASAO , TAKAHASHI AKIKIMI , SHIMIZU SHOTARO , ENOMOTO MITSUGI , YOSHIKAWA YOJI
IPC分类号： C23C14/32 , H01J37/32

3. 发明专利

JPS5571028A HEATING METHOD FOR SUBSTRATE 失效
公开(公告)号：JPS5571028A
公开(公告)日：1980-05-28
申请号：JP14478778
申请日：1978-11-22
申请人： CITIZEN WATCH CO LTD
发明人： SHIROTA TOSHIMITSU , KOSHI MASAO
IPC分类号： H01L21/324 , H01L21/265 , H01L21/31 , H01L21/314
摘要： PURPOSE:To amplify width setting condition at the time of forming a film by an arrangement wherein a thermoin source beased to negative potential is provided one or more and a bias value between a substrate and the thermion source is set at 500- 3,000V. CONSTITUTION:A substrate 1 is biased to a potential negative from grounding potential by a bias power supply 11. A thermion source 2 biased to a potential negative from another negative bias power supply 12-A is arranged one or more in the neighborhood of the substrate 1. Since the thermion is biased to a potential negative to the substrate 1, it is in accelerating collision with the substrate 1 side having a correlatively positive potential and thus gives a heat energy to heating. A filament current at the source 2 and a bias value between the substrate 1 and the source 2 are adjusted to control the heating condition. The bias value set at 500-3,000V will be proper.

4. 发明专利

JPH042786A METHOD FOR PLATING SURFACE OF ALUMINUM OXIDE-BASED PRECIOUS STONE WITH ELECTRICALLY CONDUCTIVE WEAK MAGNETIC BODY 失效
公开(公告)号：JPH042786A
公开(公告)日：1992-01-07
申请号：JP10286390
申请日：1990-04-20
申请人： CITIZEN WATCH CO LTD
发明人： SHIMURA IKUO , KATAOKA YASUMASA , MATSUO SEINOSUKE , KOSHI MASAO
IPC分类号： C23C14/14 , C23C28/02
摘要： PURPOSE:To improve the adhesive strength of a plating layer to a precious stone by successively forming a thin film of Ti, V or Al and a thin film of Cu on the surfaces of the precious stone and a stone fitting member and then carrying out plating with a nonmagnetic metal having high electrical conductivity. CONSTITUTION:The surfaces of an Al oxide-based precious stone such as sapphire or ruby and a stone fitting member are coated with a thin film of Ti, V or Al by surface treatment such as vapor deposition, ion plating or sputtering. The surfaces are further coated with a thin film of Cu and then plated with a metal such as Au as a chemically stable nonmagnetic body having high electrical conductivity. Since the lower layer of Ti, V or Al has high adhesive strength to the precious stone, the resulting plating layer is prevented from peeling and falling.

5. 发明专利

JPS58221271A Formation of film by ion plating method 失效
标题翻译：通过离子镀法形成薄膜
公开(公告)号：JPS58221271A
公开(公告)日：1983-12-22
申请号：JP10515582
申请日：1982-06-18
申请人： Citizen Watch Co Ltd
发明人： SASANUMA KIYOUYUU , KOSHI MASAO , TAKAHASHI AKIKIMI , SHIMIZU SHIYOUTAROU , ENOMOTO MITSUGI , YOSHIKAWA YOUJI
IPC分类号： C23C14/32 , H01J37/32
CPC分类号： H01J37/32422 , C23C14/32 , Y10T428/31678
摘要： PURPOSE: To form a film having a uniform thickness of the surface of a substrate having an intricate three-dimensional shape, by applying the potential, which is negative with respect to a vapor source, on the substrate in the beginning and end periods of forming the film, and maintaining the substrate at a floating potential in the intermediate period.
CONSTITUTION: The inside of a vacuum chamber 2 is evacuated with an evacuation system 1 and gaseous Ar is introduced through a gas introducing port 10 therein to maintain the inside of said chamber under prescribed pressure. When filaments 12 for generating thermions and a pair of anode electrodes 13, 14 are driven in such a state, the electron flow radiated from the filaments 12 and accelerated by the anodes 13, 14 energizes the gaseous Ar to discharge electricity and to ionize, thus filling the gaseous plasma of the electric discharge in the chamber 2. A power source switch 8 is closed in this stage and a potential which is negative with respect to a vapor source 4 is applied on a substrate 6 to form a film on the substrate 6. The switch 8 is opened to maintain the substrate 6 at a floating potential to form the film on the substrate 6. Again the switch 8 is closed to apply the potential which is negative with respect to the source 4 on the substrate 6.
COPYRIGHT: (C)1983,JPO&Japio
摘要翻译：目的：为了形成具有复杂三维形状的基板表面的均匀厚度的膜，通过在成形的开始和结束周期中将相对于蒸气源为负的电位施加在基板上并且在中间周期中将基板保持在浮动电位。构成：真空室2的内部用排气系统1抽真空，气体Ar通过其中的气体引入口10引入，以将所述室的内部保持在规定压力下。当用于产生热电偶的灯丝12和一对阳极电极13,14在这种状态下被驱动时，从灯丝12辐射并被阳极13,14加速的电子流激发气态Ar以放电并电离，因此填充室2中的放电的气体等离子体。在该阶段中关闭电源开关8，并将相对于蒸气源4的负电位施加在基板6上以在基板6上形成膜打开开关8以将基板6保持在浮动电位，以在基板6上形成薄膜。再次关闭开关8以将相对于源4的负电位施加在基板6上。

6. 发明专利

JPS57131363A ION PLATING DEVICE 失效
公开(公告)号：JPS57131363A
公开(公告)日：1982-08-14
申请号：JP1383681
申请日：1981-02-03
申请人： CITIZEN WATCH CO LTD
发明人： ENOMOTO MITSUGI , KOSHI MASAO , SHIMIZU SHIYOUTAROU
IPC分类号： C23C14/32 , C23C14/50
摘要： PURPOSE:To make the position setting of electrodes optimum and to expand the free treating space for the purpose of uniform vapor deposition treatment by bringing the lead-in contacts of the anode and cathode provided on the outside freely slidingly with the sliding contacts provided in a working chamber. CONSTITUTION:Members 5 to be worked are mounted to the revolving shafts 18 for the members to be worked inside of a frame body 2 of a mounting base for the members to be worked, and said body 2 is mounted in a working chamber 1. The cathode lead-in contact 12a, main anode lead-in contact 16a, and auxiliary anode lead-in contact 15a provided on the outside of the body 2 are brought into sliding contact with the sliding contacts 12, 16, 15 provided in the chamber 1. The material evaporated from an evaporating material support body 8 is ionized by a main electrode 10 and is deposited on the members 5. At this time, sufficient ionization is caused in places remote from the evaporating source as well by an auxiliary electrode 14. The materials 5 rotate while revolving around the shafts 18, whereby the uniform vapor deposition films are applied thereon. The ion atmosphere in the treating space is controlled by regulating the power sources 19, 20, 21 of the electrodes 4, 10, 14.

7. 发明专利

JPS529009A OUTER PART FOR WATCHES 失效
公开(公告)号：JPS529009A
公开(公告)日：1977-01-24
申请号：JP8572075
申请日：1975-07-12
申请人： CITIZEN WATCH CO LTD , SHINGIJUTSU KAIHATSU JIGYODAN
发明人： ANDOU NAOTAKE , KOSHI MASAO
IPC分类号： A44C5/00 , C23C30/00 , G04B37/00 , G04B37/22

8. 发明专利

JPH0494036A EXTRACTING ELECTRODE FOR TON SOURCE 失效
公开(公告)号：JPH0494036A
公开(公告)日：1992-03-26
申请号：JP21328890
申请日：1990-08-10
申请人： CITIZEN WATCH CO LTD
发明人： MURATA KAZUO , KOSHI MASAO
IPC分类号： H01J27/02 , H01J37/08
摘要： PURPOSE:To prevent electrodes each of which is different in potential, from making contact with one another, and thereby secure the stably operating electrodes by inserting an insulator made of ceramics between a shielding electrode and an accelerating electrode. CONSTITUTION:A shielding electrode 2, an insulating plate 3 and an accelerating electrode 1 are mechanically insulated and are monolithically mounted onto an ion source main body 4 where these three components are furnished with a great number of holes for ions to pass through while each hole is penetrated through these three components. The shielding electrode 2 confining plasma 5 is of floating potential, and negative potential is applied to the accelerating electrode 1 extracting ions out of plasma 5. It is absolutely necessary that the shielding electrode 2 has to be completely insulated from the accelerating electrode 1. In this case, when the insulating plate 3 made of ceramics acting as an insulating material is inserted between both of the accelerating electrode 1 and the shielding electrode 2, insulating property between both of the electrodes can thereby be completely maintained even if an electrode gap between the accelerating electrode 1 and the shielding electrode 2 is extremely narrow.

9. 发明专利

JPS6435914A DRY ETCHING DEVICE 失效
公开(公告)号：JPS6435914A
公开(公告)日：1989-02-07
申请号：JP19081687
申请日：1987-07-30
申请人： CITIZEN WATCH CO LTD
发明人： NAKADA TOSHIKAZU , KOSHI MASAO , TOIDA TAKASHI
IPC分类号： H01L21/302 , H01L21/3065
摘要： PURPOSE:To contrive improvement in uniformity of etching by providing an opposing electrode, to be arranged facing to the source of plasma beam, and a plurality of sample electrodes to be arranged in parallel with a plasma region. CONSTITUTION:A disc-like plasma region 18, having high density of expansion in vertical direction between a plasma beam source 10 and an opposing electrode 12, is formed by the action of the magnetic field which will be formed by the permanent magnet 13, to be used for the opposing electrode, located on the rear of a pair of convergent coils 26 and the opposing electrode 12, and the permanent magnet 44 located at the outlet of a plasma beam source 10. The sample 28 on sample electrodes 14a and 14b is etched by the ions and radical which are grown from the inert gas and etching gas introduced into a vacuum chamber 20 from a gas introducing bole 24 and an auxiliary cathode 32. As the sample is vertically arranged, a reaction product comes down and deposited on the surface of the sample, it does not impede the progress of etching, and the uniformity of etching can be improved.

10. 发明专利

JPS5916970A Method for detecting and controlling evaporation amount of evaporation material in ion plating 失效
标题翻译：用于检测和控制离子镀层中蒸发材料的蒸发量的方法
公开(公告)号：JPS5916970A
公开(公告)日：1984-01-28
申请号：JP12345582
申请日：1982-07-15
申请人： Citizen Watch Co Ltd
发明人： ENOMOTO MITSUGI , YOSHIKAWA YOUJI , KOSHI MASAO
IPC分类号： C23C14/32 , C23C14/54 , H01J37/32
CPC分类号： H01J37/32935 , C23C14/544
摘要： PURPOSE: To detect the available evaporation amount of an evaporation material from an evaporation source simply and accurately, by measuring the current value or the voltage value of a probe of ion plating when voltage applied to said probe or a current flowed therethrough is made constant.
CONSTITUTION: In ion plating wherein the evaporation material 5 in an evaporation source 2 is evaporated under heating by an evaporation power source 6 in a bell jar 1 while a constant current Ip is flowed through a probe 3 by a constant- current power source 10 to form a plasma state and the evaporated substance is adhered on a substrate 4 to which negative voltage is applied by a DC power source 8 to form a thin film, probe voltage Vp between the probe 3 and earth is measured by a DC voltmeter 11. Because the probe voltage Vp almost accurately corresponds to the film thickness on the substrate 4, an available evaporation amount can be detected by said measured value. In addition, a current flowed through the evaporation source 2 is changed so as to keep the probe voltage Vp constant and the available evaporation amount of the evaporation material 5 can be controlled so as to be kept constant.
COPYRIGHT: (C)1984,JPO&Japio
摘要翻译：目的：通过测量离子镀探针的电流值或电压值，可以简单，准确地从蒸发源检测蒸发材料的蒸发量，使电流加到所述探针上或流过其中的电流恒定。构成：在蒸发源2中的蒸发材料5在钟罩1中由蒸发动力源6加热蒸发的离子电镀中，同时恒定电流Ip通过恒定电流源10流过探针3至形成等离子体状态，并且通过直流电源8将蒸发的物质粘附到施加了负电压的基板4上以形成薄膜，通过直流电压表11测量探针3和地之间的探针电压Vp。因为探针电压Vp几乎准确地对应于基板4上的膜厚度，可以通过所述测量值检测可用的蒸发量。此外，改变流经蒸发源2的电流，以保持探针电压Vp恒定，并且可以控制蒸发材料5的可用蒸发量以保持恒定。

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