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1. 发明专利

JPS6036469B2 失效
公开(公告)号：JPS6036469B2
公开(公告)日：1985-08-20
申请号：JP14779977
申请日：1977-12-09
申请人： CITIZEN WATCH CO LTD
发明人： TAKAHASHI AKIKIMI
IPC分类号： C23C14/32 , C23C14/50

2. 发明专利

JPS57168102A FILM THICKNESS MONITOR IN WET PLATING 失效
公开(公告)号：JPS57168102A
公开(公告)日：1982-10-16
申请号：JP5382881
申请日：1981-04-10
申请人： CITIZEN WATCH CO LTD
发明人： TAKAHASHI AKIKIMI
IPC分类号： C25D5/00 , G01B7/06
摘要： PURPOSE:To detect the change in thickness of a plated film, by connecting two electrode terminals arranged on an untreated surface of an insulating substrate with a specified interval being provided by a high resistance film, holding the member in a plating bath, and detecting the change in resistance between one electrode and the other electrode with the potential of one electrode being maintained at the same potential of the plating sample. CONSTITUTION:The high resistance film 2 of Ta2N is coated on the insulating substrate 1. Two electrode terminals 31 and 32 are evaporated on the substrate with the specified interval 4 being provided, and a monitor 10 is formed. One electrode terminal 31 is conncted to the negative electrode side of a plating power source 6 so that the potential of the electrode becomes the same potential of the plating sample 5. The positive electrode side of the plating power source 6 is connected to the plating electrode 7. The entire member except the plating power source 6 is held in the plating bath, and a plating film is formed on the side of the electrode 31 at the same speed as the plating sample. By detecting the change in the resistance between the floating electrode terminal 32 and the electrode terminal 31, the change in the film thickness of the plating is quantitatively detected.

3. 发明专利

JPH0153350B2 失效
公开(公告)号：JPH0153350B2
公开(公告)日：1989-11-14
申请号：JP10515582
申请日：1982-06-18
申请人： CITIZEN WATCH CO LTD
发明人： SASANUMA KYOJU , KOSHI MASAO , TAKAHASHI AKIKIMI , SHIMIZU SHOTARO , ENOMOTO MITSUGI , YOSHIKAWA YOJI
IPC分类号： C23C14/32 , H01J37/32

4. 发明专利

JPS6125775B2 JPS6125775B2 - 失效
公开(公告)号：JPS6125775B2
公开(公告)日：1986-06-17
申请号：JP676579
申请日：1979-01-23
申请人： Citizen Watch Co Ltd
发明人： TAKAHASHI AKIKIMI
IPC分类号： C23C14/30 , C23C14/32
CPC分类号： C23C14/32

5. 发明专利

JPS60238817A LIQUID CRYSTAL DISPLAY DEVICE 失效
公开(公告)号：JPS60238817A
公开(公告)日：1985-11-27
申请号：JP9536884
申请日：1984-05-12
申请人： CITIZEN WATCH CO LTD
发明人： WATANABE HARUO , TAJIMA EIICHI , MATSUNAGA MASAAKI , HIROHARA TOSHIHIDE , IINUMA YOSHIO , ANDOU NAOTAKE , TAKAHASHI AKIKIMI , TAKAHASHI SHIGEYUKI
IPC分类号： G09F9/00 , G02F1/13 , G02F1/1345
摘要： PURPOSE:To join an IC chip to the same substrate as the substrate of a liquid crystal display panel and to execute a high-density wiring terminal treatment without deteriorating the liquid crystal panel by joining the IC chip onto said substrate by means of a conductive adhesive agent then molding the entire part of the IC chip by a molding agent. CONSTITUTION:A transparent conductive film 12 and a wiring part 13 having lower resistance are formed respectively on the inside surfaces of a lower transparent substrate 11 and an upper transparent substrate 111. A liquid crystal 110 is injected to the inside and is sealed by a sealing part 19. The IC17 and the film 12 are electrically connected by the conductive adhesive agent 14 and the wiring substrate 16 connecting the liquid crystal display panel and peripheral circuit is joined to the film 12 by a conductive joining member 15. The IC17 and the conductive part of the substrate are then molded by the molding agent.

6. 发明专利

JPS61167975A MANUFACTURE OF ELECTRODE SUBSTRATE FOR LIQUID CRYSTAL DISPLAY PANEL 失效
公开(公告)号：JPS61167975A
公开(公告)日：1986-07-29
申请号：JP839185
申请日：1985-01-22
申请人： CITIZEN WATCH CO LTD
发明人： ANDO NAOTAKE , TAKAHASHI AKIKIMI
IPC分类号： G02F1/1343 , G02F1/133 , G09F9/35

7. 发明专利

JPS5594473A ION PLATING APPARATUS FOR MULTIICOMPONENT COATING 失效
公开(公告)号：JPS5594473A
公开(公告)日：1980-07-17
申请号：JP192679
申请日：1979-01-11
申请人： CITIZEN WATCH CO LTD
发明人： TAKAHASHI AKIKIMI
IPC分类号： H01J37/32 , C23C14/22 , C23C14/24 , C23C14/32 , C23C14/34
摘要： PURPOSE:To make the control of component ratio easy and to form the multi-component coating, by providing one or two or more of sputtering electrode near the substrate and composing so as to be co-deposited the substrate composing the above electrode with the substance from evaporation source on the surface of the substrate at the same time. CONSTITUTION:Apparatus is constructed by arranging the evaporation source 2 and the substrate 5 facing each other in the vacuum room 1 provided gas exhausting system (not shown in the figure) and gas introducing system and newly providing the sputtering electrode 6 near the substrate 5 with an usual construction arranged the thermal cathode 3 and the anode 4 is order to form discharge plasma. It is constructed so as to be applied a hogh negative voltage on the electrode 6 in the room 1. By the above apparatus, the substance from the source 2 and that of composing the electrode 6, are co-deposited on the substrate 5 and also, the component ratio is able to control easily. Multi-component coating having disired component ratio, is able to form easily with a cheap apparatus compared with usual method.

8. 发明专利

JPS5481594A IONNPLATING DEVICE 失效
公开(公告)号：JPS5481594A
公开(公告)日：1979-06-29
申请号：JP14779977
申请日：1977-12-09
申请人： CITIZEN WATCH CO LTD
发明人： TAKAHASHI AKIKIMI
IPC分类号： C23C14/32 , C23C14/50
摘要： PURPOSE:A high-frequency power adjusting body is inserted into a grounded circuit of a base plate holder which hold a substrate, and thereby a sufficient ion bombard phenomenon for the film-formed surface of the substrate can be carried out. CONSTITUTION:Vacuum chamber 1 is exhausted to a vacuum of 10 -10 Torr by exhausting system P through exhaust port 2. After this, vacuum chamber 1 is maintained at a vacuum of 10 -10 by drawing in gas of at least 10 by means of gas drawing-in system G via gas conduit 3. Next, high-frequency power source Rf is driven and a high-frequency discharge plasma is formed by an ionization electrode 5. Then, the values of L, C. R, which are the component elements of high- frequency power adjusting body S are properly adjusted, and thereby an induced high-frequency electric field due to high-frequency resonance is formed on the substrate. By the ion-bombard phenomenon on the base plate to the negative bias with respect to the plasma due to the characteristics in the plasma of the induced electric field, the substrate is cleaned and volatile matters are evaporated.

9. 发明专利

JPS5456577A GOLDEN EXTERIOR PARTS FOR DECORATION 失效
公开(公告)号：JPS5456577A
公开(公告)日：1979-05-07
申请号：JP12274577
申请日：1977-10-13
申请人： CITIZEN WATCH CO LTD
发明人： TAKAHASHI AKIKIMI
IPC分类号： B44C1/04 , B44C1/00 , G02C5/00
摘要： PURPOSE:To reduce coats of products by forming a yellow titanium oxide film on an exterior part base material for lighters, glasses and the like through a reactive ion plating. CONSTITUTION:Argon as a carrier gas and oxygen as a reactive gas are introduced into a gas discharge plasma presenting an active atmosphere. A vaporized titunuim is reacted with the reactive gas to form a compound film of the vaporized metal and the reacitive gas on a exterior part base mateial such as stainles steel, copper alloy, aluminium allroy or the like under the electric field. When the atom ratio of oxygen to titanium is set at about 0.5 to 1.3, the basic material obtained by the reactive ion plating presents a glossy yellow appearance. This reduces the cost of surface treatment, thus enabling production at lower cost.

10. 发明专利

JPS5944644A Method for measuring pin hole quantitatively in plating film 失效
标题翻译：用于在电镀膜中定量测定针孔的方法
公开(公告)号：JPS5944644A
公开(公告)日：1984-03-13
申请号：JP15536882
申请日：1982-09-08
申请人： Citizen Watch Co Ltd
发明人： ANDOU NAOTAKE , TAKAHASHI AKIKIMI
IPC分类号： G01N19/08 , G01N21/84 , G01N21/88
CPC分类号： G01N21/8803 , G01N21/894
摘要： PURPOSE:To detect pin holes in a plating film according to the form by disposing a piece of a simple plated with a plating film in a vacuum chamber and counting the number of pore generating positions under reduced pressure. CONSTITUTION:A sample piece 12 prepared by plating nickel phosphor alloy on the aluminum substrate surface is laid on a hot plate 15, and the vacuum chamber 7 is evacuated through an evacuating valve 9. Then the valve 9 is closed, and nitrogen gas is introduced through a gas introducing valve 10 to reach the prescribed pressure. An operating rod 11 is operated to dip the piece 12 into a laboratory dish 13 containing pure water therein, and the chamber 7 is evacuated again. Since the nitrogen gas occluded in the pin holes of the plating film appears on the film surface to form bubbles, these are counted. After the piece 12 is again heated and dried, it is dipped into the dish 14 containing 5% aqueous caustic soda solution, and the evacuation is performed. In case of existence of the pin holes reaching the substrate, these react with the aluminum substrate and hydrogen gas babbles are generated. By counting the number of positions on which these babbles are generated, the number of pin holes is measured.
摘要翻译：目的：通过在真空室中放置一块简单的电镀薄膜并在减压下计数孔产生位置，根据形式检测镀膜中的针孔。构成：通过在铝基板表面上镀镍磷光体合金而制备的样品片12放置在热板15上，真空室7通过排气阀9抽真空。然后关闭阀9，引入氮气通过气体导入阀10达到规定的压力。操作杆11被操作以将件12浸入其中含有纯净水的实验室皿13中，再次抽空腔室7。由于在膜表面上露出镀膜的针孔内的氮气，因此形成气泡，因此计数。将片12再次加热干燥后，将其浸入含有5％苛性钠水溶液的培养皿14中，进行抽真空。在存在针孔到达基板的情况下，这些与铝基板反应，产生氢气混合。通过计数产生这些不匹配的位置的数量，测量针孔的数量。

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