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    • 1. 发明专利
    • MANUFACTURE OF GOLD-PLATINUM-COBALT ALLOY WIRE ROD
    • JPH0238548A
    • 1990-02-07
    • JP18885288
    • 1988-07-28
    • CITIZEN WATCH CO LTD
    • SHIMIZU SHOTARO
    • C22F1/14C22F1/00
    • PURPOSE:To manufacture the title alloy wire rod contg, uniformly distributed components by cutting a stock cast with a vertical mold into plural pieces, subjecting them to plastic working into bars, suitably bundling them in parallel in such a manner that the part corresponding to bottom and the part corresponding to top are approached with and rolling the bars into a wire rod. CONSTITUTION:At the time of forming an alloy wire rod constituted of gold, platinum and cobalt, gold, platinum and cobalt are firstly melted by high-frequency heating and are cast with a vertical mold to form an ingot. The bottom part B and top part T of the ingot are cut away and the balance is, e.g., divided into six parts, which are subjected to plastic working into six pieces of bars. The bars are bundled in parallel in such a manner that cutting planes 1 and 12, 3 and 10, 5 and 8 are individually approached with, which are charged to a metallic mold and are subjected to cold pressure welding under high pressure; after that, they are charged to a mold made of refractories and are subjected to hot pressure welding under low pressure into a joined body. By this method, the wire rod of a gold-platinum-cobalt alloy contg. uniform compsn. can surely be formed from an ingot having remarkable segregation.
    • 5. 发明专利
    • ION PLATING DEVICE
    • JPS63282257A
    • 1988-11-18
    • JP11347187
    • 1987-05-12
    • CITIZEN WATCH CO LTD
    • SHIMIZU SHOTAROARAKAWA ISAMU
    • C23C14/32
    • PURPOSE:To uniformly, highly efficiently, and simultaneously treat many substrates by forming a plasma region between a plasma gun and a counter anode, and a counter anode, and providing another heater at a vaporization source. CONSTITUTION:The anode 16 to be positively charged with respect to the plasma gun 20 is arranged on the side of a vacuum chamber 10 opposed to the plasma gun 20 provided on the side of the vacuum chamber 10, and a focusing coil 15 is arranged at the rear. The electron beam from the plasma gun 20 is diffused in the region shown by the broken line 14 and further focused on the anode 16, hence the introduced gas and the vapor from the vaporization source 12 are ionized in the region, and the wide and uniform plasma region is formed. The vaporization source 12 consisting of the electron beam melting device is arranged at the lower part of the vacuum chamber 10, and the evaporation rate can be independently adjusted. the particles evaporated from the vaporization source 12 are ionized in the plasma region or further react with the introduced gas, and deposited on the substrate on the substrate holder 13 negatively biased with respect to the vaporization source 12.