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1. 发明专利

JP2000018407A PROCESS GAS SUPPLY UNIT 失效
公开(公告)号：JP2000018407A
公开(公告)日：2000-01-18
申请号：JP18706698
申请日：1998-07-02
申请人： CKD CORP , TOSHIBA CORP
发明人： OKUMURA KATSUYA , MIKATA YUICHI , HATTORI KEI , SUDO YOSHIHISA , ITO MINORU , NITTA SHINICHI
IPC分类号： F16K21/00 , F16K31/06
摘要： PROBLEM TO BE SOLVED: To provide a compact, short and cost-reduced mass flow controller system. SOLUTION: An inlet-switching valve is an air-operated proportional valve 15 with a cutoff function. This valve has control valves 35 and 36 to control air pressure supplied to the inlet switching valve and a control means 32 for control valves 35 and 36 to set pressure at an outlet port 21 of the inlet- switching valve to specified values based on output of a pressure sensor 13.

2. 发明专利

JP2007107606A Fluid control valve 有权
标题翻译：流体控制阀
公开(公告)号：JP2007107606A
公开(公告)日：2007-04-26
申请号：JP2005298865
申请日：2005-10-13
申请人： Ckd Corp , シーケーディ株式会社
发明人： NABEI TATSUMI , NITTA SHINICHI
IPC分类号： F16K17/04 , F16K7/17 , F16K17/06 , F16K31/145
摘要： PROBLEM TO BE SOLVED: To resolve inconveniences such as residues of bubbles or liquid accumulation without causing complication of a composition.
SOLUTION: The fluid control valve 10 is provided with: a valve element 30 having a second diaphragm member 32 and a shaft part (a boss part 32c of the second diaphragm member 32 and a rod part33); and a body 11 operably housing the valve element 30. In the fluid control valve 10, a second fluid chamber R2 is formed along the shaft part, a pressure acting chamber R4 is formed in one side of the second diaphragm member 32, sandwiching it, and a third fluid chamber R3 is formed in the other side so as to surround the shaft part. A communication groove 27 connecting the second fluid chamber R2 and the third fluid chamber R3 is provided in a side of the shaft part opposite to an opening 24a of a discharge passage 24.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：解决诸如气泡残留或液体积聚的不便，而不会导致组合物的复杂化。流体控制阀10设置有具有第二隔膜构件32和轴部（第二隔膜构件32的凸台部32c和杆部33）的阀体30; 以及可操作地容纳阀元件30的主体11.在流体控制阀10中，沿着轴部形成有第二流体室R2，压力作用室R4形成在第二隔膜构件32的一侧，夹在其中，并且第三流体室R3形成在另一侧以围绕轴部。连接第二流体室R2和第三流体室R3的连通槽27设置在与排出通道24的开口24a相对的轴部的一侧。（C）2007，JPO＆INPIT

3. 发明专利

JP2004353784A Vacuum proportional opening and closing valve 有权
公开(公告)号：JP2004353784A
公开(公告)日：2004-12-16
申请号：JP2003153148
申请日：2003-05-29
申请人： Ckd Corp , シーケーディ株式会社
发明人： ITOU TAKEHIRO , NITTA SHINICHI , ITO TOMOHIRO , TOYODA TETSUYA
IPC分类号： F16K1/36 , F16K51/02
摘要： PROBLEM TO BE SOLVED: To provide a vacuum proportional opening/closing valve capable of enlarging valve conductance while stabilizing fluid pressure.
SOLUTION: In the vacuum proportional opening/closing valve, a valve hole 23 is provided on an input port 21 side, and an O-ring 27 provided on a valve body 25 contacts to/separates from a valve seat 24 around the valve hole 23 to carry out opening/closing the valve. The valve body 25 comprises an insertion part 25a for being inserted into the valve hole 23 and a flange part 25b for holding the O-ring 27. A space of a predetermined interval m is formed between the insertion part 25a and the wall surface of the valve hole 23.
COPYRIGHT: (C)2005,JPO&NCIPI

4. 发明专利

JP2001235099A REMOUNTING SYSTEM OF PROCESS GAS SUPPLY UNIT 失效
公开(公告)号：JP2001235099A
公开(公告)日：2001-08-31
申请号：JP2000043090
申请日：2000-02-21
申请人： CKD CORP
发明人： SUDO YOSHIHISA , GOSHIMA KENICHI , NITTA SHINICHI , MATSUOKA YUJI , ITO MINORU
IPC分类号： F16K27/00 , F17D1/04 , H01L21/205 , H01L21/302 , H01L21/3065
摘要： PROBLEM TO BE SOLVED: To provide a remounting system of a process gas supply unit capable of remounting a module corresponding to each variation, in the process gas supply unit compact and in light weight. SOLUTION: In this process gas supply unit 1, mounting a check valve 11, a purge valve 12, a regulator 13 with interrupting function, a supply valve 15, and either one of a mass flow controller 14 or a sensor pack in a single base block 10 formed with flow paths 21 to 26, the mass flow controller 14 and the sensor pack can be remounted relating to the same base block 10.

5. 发明专利

JP2000018408A MASS FLOW CONTROL SYSTEM 失效
公开(公告)号：JP2000018408A
公开(公告)日：2000-01-18
申请号：JP18706798
申请日：1998-07-02
申请人： CKD CORP
发明人： SUDO YOSHIHISA , NITTA SHINICHI
IPC分类号： F16K21/00 , F16K31/06
摘要： PROBLEM TO BE SOLVED: To provide a cost-reduced mass flow controller system. SOLUTION: This mass flow control system uses a mass flow controller comprised of a valve system with a valve element and a valve seat, and a mass flow control system, where mass flow is controlled by changing a position of an appropriate valve element based on an output from a sensor. In this control system, two or more independent mass flow controllers 15A, 15B, 15C and 15D, and one controller for these two or more mass flow controller 15A, 15B, 15C and 15D are equipped.

6. 发明专利

JPH0774113A GAS SUPPLY SYSTEM 失效
公开(公告)号：JPH0774113A
公开(公告)日：1995-03-17
申请号：JP24387493
申请日：1993-09-02
申请人： CKD CORP
发明人： KOKETSU MASAYUKI , NITTA SHINICHI , SUDO YOSHIHISA
IPC分类号： F16K27/00 , C23C16/44 , C23C16/455 , F16K31/06 , G01F1/68 , G01F1/688 , G01F1/69 , H01L21/205 , H01L21/31
摘要： PURPOSE:To provide a gas supply system for feeding process gas, which is likely to liquefy at normal temperature under normal pressure, precisely at a predetermined flow rate while heating it. CONSTITUTION:A gas supply system for feeding dichlorosilane F, which is likely to liquefy at normal temperature under normal pressure, comprises a solenoid valve 53 provided with a mass flow meter to measure the mass flow of dichlorosilane F and pass it at a predetermined flow rate; an input block 10 connected with the input port of the solenoid valve 53; an input switch valve 52 provided on the input block 10; an output block 11 connected with the output port of the solenoid valve 53; an output switch valve 54 provided with the output block 11; and rod heaters 14 and 15 embedded in the input and output blocks 10 and 11.

7. 发明专利

JP2002095954A CONTROLLING SYSTEM FOR VACUUM PRESSURE 失效
公开(公告)号：JP2002095954A
公开(公告)日：2002-04-02
申请号：JP2000289753
申请日：2000-09-25
申请人： CKD CORP
发明人： MATSUOKA YUJI , NITTA SHINICHI , ISHIHARA TETSUYA , ITO MINORU
IPC分类号： B05C9/12 , B01J3/00 , H01L21/027 , H01L21/316
摘要： PROBLEM TO BE SOLVED: To provide a controlling system for vacuum pressure, in which a liquid material film formed on a wafer is dried and solidified without performing temperature control and also uniformity of thickness of the liquid material film can be secured. SOLUTION: In the controlling system 1 for vacuum pressure, when a wafer 16 applied with a liquid material film 17 is disposed in the inside of a vacuum vessel 11, the opening degree of a vacuum proportional stop valve 14 positioned on a pipeline 13 connecting both the vacuum vessel 11 and a vacuum pump 12 is controlled on the basis of output of a vacuum pressure sensor 15 measuring vacuum pressure of the inside of the vacuum vessel 11. Thereby, the vacuum pressure in the inside of the vacuum vessel 11 is reached to a target vacuum pressure from the atmospheric pressure at the change velocity of the target vacuum pressure. At this time, the target vacuum pressure is established to a value within the range from the atmospheric pressure to the saturated vapor pressure of an organic solvent contained in the liquid material film 17 formed on the wafer 16.

8. 发明专利

JPH0972458A VACUUM PRESSURE CONTROL SYSTEM 失效
公开(公告)号：JPH0972458A
公开(公告)日：1997-03-18
申请号：JP24849595
申请日：1995-09-01
申请人： CKD CORP
发明人： KOKETSU MASAYUKI , WATANABE MASAYUKI , NITTA SHINICHI , TAKEHARA HIROSHI
IPC分类号： F15B5/00 , F16K31/122 , F16K37/00 , F16K51/02 , G05D16/16
摘要： PROBLEM TO BE SOLVED: To control vacuum pressure in a vacuum vessel exactly over all ranges of a low vacuum range, a medium vacuum range and a high vacuum range by controlling a servo valve for changing air pressure supplied to a pilot valve based on the output of a pressure sensor, in a vacuum pressure controller. SOLUTION: A vacuum pressure control circuit compares a target vacuum pressure value given by an interface circuit with a present vacuum pressure value in a vacuum chamber measured by a pressure sensor, and controls the valve opening of a vacuum proportional opening and closing control valve so that both of them may meet each other. Therefore, the position of the piston is moved vertically to control the stopping position of a poppet valve disc 33. A stainless steel valve disc 34 has a tapered surface 34a, so the cross section of a clearance formed by a valve seat 36 and the tapered surface 34a changes little by little from the stopping position of the poppet valve disc 33. It is thus possible to conduct such control as change the valve opening by a very fine quantity.

9. 发明专利

JPH0916268A FLOW RATE CONTROL VALVE WITH DELAY COMPENSATING FUNCTION 失效
公开(公告)号：JPH0916268A
公开(公告)日：1997-01-17
申请号：JP18803395
申请日：1995-06-29
申请人： TAKAHASHI HISASHI , CKD CORP
发明人： TAKAHASHI HISASHI , KOKETSU MASAYUKI , NITTA SHINICHI
IPC分类号： G05B11/36 , G05D7/06
摘要： PURPOSE: To provide a flow rate control valve with the delay compensating function which becomes stable in flow rate in a short time after gas is started to supply by providing a delay compensating circuit. CONSTITUTION: When the gas is started to supply by opening a cutoff valve, a gas flow rate is outputted from the flow meter part 2 of the flow rate control valve 1 with the delay compensating function. This output value includes time delay against variation in actual flow rate of the gas. For the purpose, the delay compensating circuit 5 compensates the delay to generate a signal having the time delay canceled. On the basis of the signal, the solenoid valve part 3 of the flow rate control valve 1 with the delay compensating function is controlled to adjust the flow rate. Consequently, the flow rate becomes stable in a short time after the gas is started to supply, so a response stabilization wait time can greatly be shortened and the outflow of unnecessary gas is reducible.

10. 发明专利

JPH07286721A TEMPERATURE CONTROLLER FOR GAS SUPPLYING APPARATUS 失效
公开(公告)号：JPH07286721A
公开(公告)日：1995-10-31
申请号：JP10478094
申请日：1994-04-18
申请人： CKD CORP
发明人： KOKETSU MASAYUKI , NITTA SHINICHI , ITO MINORU
IPC分类号： F23N5/02 , F23K5/00 , F23N1/00
摘要： PURPOSE:To accurately supply process gas which is easily liquefied at normal temperature and normal pressure in a predetermined quantity while heating and heat insulating and to easily attach or detach it. CONSTITUTION:The temperature controller for a gas supplying apparatus comprises a locking part bent at a large curvature at part of a rectangular elastic member 18 bent substantially in a circular-arc state to lock a step of a rodlike or cylindrical member 19 to the part. The member 18 is detachably mounted at the side of a switching valve 54 in a recess formed in a band state by elastic force. A heater or a temperature sensor is mounted at a predetermined position by the member 19. Or, an insertion hole is formed on an upper surface of a highly thermally conductive plate 1 fixed to a switching valve or the valve 53, and the heater or the sensor having a step on its side is inserted. The heater or the sensor is mounted at the predetermined position by a step of the heater or the sensor from a peripheral edge of the hole.

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