专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JP2012017658A Chemical feed system 有权
标题翻译：化学进料系统
公开(公告)号：JP2012017658A
公开(公告)日：2012-01-26
申请号：JP2010153823
申请日：2010-07-06
申请人： Ckd Corp , シーケーディ株式会社
发明人： SAKAI ATSUYUKI , YOSHIDA MASATERU , TOYODA TETSUYA
IPC分类号： F04B49/00 , F04B43/06
摘要： PROBLEM TO BE SOLVED: To provide a technology for measuring a flow rate of a diaphragm pump.SOLUTION: A chemical feed system is provided for calculating at least one of a sucked amount and a discharged amount of a chemical based on a flow rate of a working gas. The chemical feed system includes: a pump body having an internal space formed to communicate with a chemical sucking port 21b and a chemical discharging port 21c; a pump 13 having a diaphragm for partitioning into a pump chamber on a side communicating with the chemical sucking port and the chemical discharging port, and a working chamber on a side communicating with a working gas supply port; a pump driving part 59 for supplying the working gas to the working gas supply port; a control part for sucking and discharging the chemical by operating the chemical sucking port, the chemical discharging port, and the pump driving part; and a gas flow rate measuring part for measuring the flow rate of the working gas.
摘要翻译：要解决的问题：提供一种用于测量隔膜泵的流量的技术。解决方案：提供一种基于工作气体的流量来计算化学品的吸入量和排出量中的至少一种的化学进料系统。所述化学品供给系统包括：具有形成为与化学品吸入口21b和化学品排出口21c连通的内部空间的泵体; 具有隔膜的泵13，其与与所述化学吸附口和所述化学物质排出口连通的一侧分隔成泵室;以及与工作气体供给口连通的一侧的工作室; 用于将工作气体供给到工作气体供给口的泵驱动部59; 用于通过操作化学品吸入口，化学品排出口和泵驱动部分来吸取和排出化学品的控制部分; 以及用于测量工作气体的流量的气体流量测量部件。版权所有（C）2012，JPO＆INPIT

2. 发明专利

JP2006046284A Chemical fluid supply system, and chemical fluid supply pump 有权
标题翻译：化学液体供应系统和化学液体供应泵
公开(公告)号：JP2006046284A
公开(公告)日：2006-02-16
申请号：JP2004232070
申请日：2004-08-09
申请人： Ckd Corp , Okutekku:Kk , シーケーディ株式会社 , 株式会社オクテック
发明人： OKUMURA KATSUYA , ITO SHIGENOBU , TOYODA TETSUYA
IPC分类号： F04B43/06 , B05C11/10 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To prevent heat generation from a pump during actuation, and eliminate an energization means for actuating a volume changeable member toward the counter-pump chamber side for achieving compactness of a pump, while sufficiently securing actuation quantity of the volume chamber to the counter-pump chamber side.
SOLUTION: In this chemical fluid supply system, actuation air pressurized at a supply source 52 is introduced to an actuation chamber in the pump 13 when resist fluid R as chemical fluid is delivered, and the actuation air in the actuation chamber in the pump 13 is sucked by a vacuum generating source 54 when the resist fluid R is sucked to form negative pressure.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了防止在致动期间从泵产生热量，并且消除用于致动体积可变构件朝向反向泵室侧的通电装置，以实现泵的紧凑性，同时充分确保泵的致动量容积室到反泵室侧。解决方案：在这种化学液体供应系统中，当作为化学流体被输送的抗蚀剂流体R时，在供应源52处被加压的致动空气被引入到泵13中的致动室中，并且致动室中的致动空气当吸附抗蚀剂流体R以形成负压时，泵13被真空产生源54吸入。版权所有（C）2006，JPO＆NCIPI

3. 发明专利

JP2011208598A Chemical supply system 有权
标题翻译：化学供应系统
公开(公告)号：JP2011208598A
公开(公告)日：2011-10-20
申请号：JP2010078702
申请日：2010-03-30
申请人： Ckd Corp , シーケーディ株式会社
发明人： NAGASAKI ISAO , ITO AKIHIRO , TOYODA TETSUYA
IPC分类号： F04B43/06 , F04B43/02
CPC分类号： F04B43/073
摘要： PROBLEM TO BE SOLVED: To provide a chemical supply system which automatically reduces the influence of water head pressure while simplifying construction.SOLUTION: In a chemical supply pump 10, a diaphragm 13 as a volume changeable member is stored in a pair of bodies 11 and 12. The diaphragm 13 defines a pump chamber 14 and a working chamber 15. An electropneumatic regulator 30 is connected to the working chamber 15. A controller 60 sets pressure in the working chamber 15 to atmospheric pressure when chemical suction is started, and in this state, brings a suction valve 23 into an open state. The controller then reads through a pressure sensor 52 a pressure in the working chamber 15 which changes with the chemical running in the pump chamber 14 under the water head pressure of a chemical tank 27. The controller controls the electropneumatic regulator 30 based on the read pressure.
摘要翻译：要解决的问题：提供一种在简化结构的同时自动降低水头压力的影响的化学品供应系统。解决方案：在化学品供应泵10中，作为体积可变构件的隔膜13存储在一对主体11和隔膜13限定泵室14和工作室15.电动气动调节器30连接到工作室15.控制器60在化学吸入开始时将工作室15中的压力设定为大气压，并且在此状态，使吸入阀23成为打开状态。然后，控制器通过压力传感器52读取工作室15中的压力，该压力随化学罐27的水头压力下的泵室14中的化学品运行而变化。控制器基于读取压力来控制电动气动调节器30 。

4. 发明专利

JP2006063815A Liquid chemical supply system 有权
标题翻译：液体化学供应系统
公开(公告)号：JP2006063815A
公开(公告)日：2006-03-09
申请号：JP2004244661
申请日：2004-08-25
申请人： Ckd Corp , Okutekku:Kk , シーケーディ株式会社 , 株式会社オクテック
发明人： OKUMURA KATSUYA , ITO SHIGENOBU , TOYODA TETSUYA
IPC分类号： F04B49/00 , F04B9/08 , F04B43/06
摘要： PROBLEM TO BE SOLVED: To prevent heat generation from a pump during operation and reduce the size of the pump by eliminating an energizing means for performing operation of a volume variable member to an opposite pump chamber side. SOLUTION: Discharge/suction operation of resist liquid R by the discharge pump 13 is performed by pressure adjustment of operation air using an electropneumatic regulator 51 adjustable to both positive and negative set pressures. This eliminates the necessity of a heat generating source such as a motor, and heat generation from the discharge pump 13 is prevented. The necessity of the energizing means such as a spring is also eliminated, by operating a flexible film to the opposite pump chamber side by setting inside of an operation chamber of the discharge pump 13 to be negative pressure. In addition, it is unnecessary to provide a constitution such as a switching means for switching positive pressure and negative pressure in piping connecting the electropneumatic regulator 51 to the discharge pump 13, and reduction of the size of the discharge pump 13 can be realized. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了防止在操作期间从泵产生热量并且通过消除用于将体积可变构件操作到相对的泵室侧的激励装置来减小泵的尺寸。解决方案：通过排气泵13对抗蚀剂液体R的排出/抽吸操作是通过使用可调整到正设定压力和负设定压力的电动气动调节器51进行操作空气的压力调节来进行的。这消除了诸如电动机之类的发热源的必要性，并且防止了来自排放泵13的发热。通过将排出泵13的操作室内部设置为负压，通过将柔性膜操作到相对的泵室侧，也消除了诸如弹簧的通电装置的必要性。此外，不需要提供诸如用于在将电动气动调节器51连接到排出泵13的管道中切换正压和负压的切换装置的结构，并且可以实现排气泵13的尺寸的减小。版权所有（C）2006，JPO＆NCIPI

5. 发明专利

JP2004353784A Vacuum proportional opening and closing valve 有权
公开(公告)号：JP2004353784A
公开(公告)日：2004-12-16
申请号：JP2003153148
申请日：2003-05-29
申请人： Ckd Corp , シーケーディ株式会社
发明人： ITOU TAKEHIRO , NITTA SHINICHI , ITO TOMOHIRO , TOYODA TETSUYA
IPC分类号： F16K1/36 , F16K51/02
摘要： PROBLEM TO BE SOLVED: To provide a vacuum proportional opening/closing valve capable of enlarging valve conductance while stabilizing fluid pressure.
SOLUTION: In the vacuum proportional opening/closing valve, a valve hole 23 is provided on an input port 21 side, and an O-ring 27 provided on a valve body 25 contacts to/separates from a valve seat 24 around the valve hole 23 to carry out opening/closing the valve. The valve body 25 comprises an insertion part 25a for being inserted into the valve hole 23 and a flange part 25b for holding the O-ring 27. A space of a predetermined interval m is formed between the insertion part 25a and the wall surface of the valve hole 23.
COPYRIGHT: (C)2005,JPO&NCIPI

6. 发明专利

JP2007278514A Control method for flow control valve 审中-公开
标题翻译：流量控制阀的控制方法
公开(公告)号：JP2007278514A
公开(公告)日：2007-10-25
申请号：JP2007150286
申请日：2007-06-06
申请人： Ckd Corp , シーケーディ株式会社
发明人： KAGOHASHI HIROSHI , SUGATA KAZUHIRO , ITO TOMOHIRO , TOYODA TETSUYA , KATO TAKASHI
IPC分类号： F16K31/42 , F16K7/17 , F16K31/124 , F16K35/00 , G05D7/06
摘要： PROBLEM TO BE SOLVED: To provide a control method for a flow control valve attaining flow control of high accuracy by reducing the individual difference of valve opening caused by the mounting accuracy of a detecting means. SOLUTION: In this control method for the flow control valve 1, a detecting means 25 is provided for detecting the arrival of a piston 22 to close the valve from the state of the detecting means being turned OFF from ON or turned ON from OFF, and the difference between an operation signal when the detecting means 25 is turned OFF from ON or turned ON from OFF, and an operation signal value corresponding to the reference origin is set as an individual difference value to compensate a reference curve with the individual difference value. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种流量控制阀的控制方法，通过减小由检测装置的安装精度引起的阀开度的个体差异，从而实现高精度的流量控制。解决方案：在这种流量控制阀1的控制方法中，设置检测装置25，用于检测活塞22的到来，以便从检测装置的ON状态或ON状态关闭阀 OFF，并且当检测装置25从OFF断开或从OFF导通时的操作信号与对应于基准原点的操作信号值之间的差被设置为个体差值，以补偿与个体的参考曲线差值。版权所有（C）2008，JPO＆INPIT

7. 发明专利

JP2006049756A Chemical feeding system 有权
标题翻译：化学进料系统
公开(公告)号：JP2006049756A
公开(公告)日：2006-02-16
申请号：JP2004232071
申请日：2004-08-09
申请人： Ckd Corp , Okutekku:Kk , シーケーディ株式会社 , 株式会社オクテック
发明人： OKUMURA KATSUYA , ITO SHIGENOBU , TOYODA TETSUYA , SUGATA KAZUHIRO
IPC分类号： H01L21/027 , F04B43/06
CPC分类号： F04F1/06 , F04B43/073 , Y10T137/3124
摘要： PROBLEM TO BE SOLVED: To provide a chemical feeding system preventing heat transfer from a pump at the time of operation, and realizing the miniaturization of a delivery pump that drops the chemical from a top nozzle. SOLUTION: A resist liquid R is filled in a pump chamber by pressurizing the chemical positively pressured inside the pump chamber of the delivery pump 11 by supplying the compressed air to the upper space 15a of a resist bottle 15. It is unnecessary, therefore, to adopt a conventional configuration that a spring or the like is used to suck the resist liquid R by driving a flexible membrane of the delivery pump 11 towards an operating chamber side. This allows the system to eliminate the use of a motor, which never damages a semiconductor wafer 19 by heat, and also allows the delivery pump 11 to be further miniaturized. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种防止在操作时从泵传热的化学物质输送系统，并实现从顶部喷嘴滴下化学物质的输送泵的小型化。解决方案：通过将压缩空气供给到抗蚀剂瓶15的上部空间15a，通过对输送泵11的泵室内的化学物进行正压加压来将抗蚀剂液体R填充在泵室中。不需要，因此，为了采用弹簧等通过将输送泵11的柔性膜朝向操作室侧驱动来吸附抗蚀剂液体R的常规构造。这允许系统消除使用不会因半导体晶片19受热而损坏的电动机，并且还允许输送泵11进一步小型化。版权所有（C）2006，JPO＆NCIPI

8. 发明专利

JP2006018767A Vacuum pressure control system 有权
标题翻译：真空压力控制系统
公开(公告)号：JP2006018767A
公开(公告)日：2006-01-19
申请号：JP2004198439
申请日：2004-07-05
申请人： Ckd Corp , シーケーディ株式会社
发明人： TOYODA TETSUYA
IPC分类号： G05B23/02 , C23C16/52 , F16K37/00 , F16K51/02 , G05D16/20 , H01L21/205
CPC分类号： G05D16/2093
摘要： PROBLEM TO BE SOLVED: To provide a vacuum pressure control system capable of early detecting abnormalities of the system such as abnormalities of a vacuum pressure sensor, leaks from a reactor, and clogging of pipes. SOLUTION: When the degree of opening of a valve 16 opening/closing in proportion to vacuum, which is acquired through a potentiometer 18 reaches a preliminarily fixed set value X1 (S22:Yes), the occurrence of an abnormality of system, like an abnormality of the vacuum pressure sensor, a leakage from the reactor, or clogging of pipes is determined to perform abnormality processing (S25) when a vacuum pressure of a reaction chamber 10 acquired through pressure sensors 14 and 15 is higher than a preliminarily fixed set value X2 (S24:NO). Set values X1 and X2 are obtained in advance by experiments or the like so that abnormalities of the system such as abnormalities of the vacuum pressure sensor, leaks from the reactor, and clogging of pipes can be properly detected. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种真空压力控制系统，其能够早期检测真空压力传感器的异常，反应器的泄漏和管道的堵塞等系统异常。解决方案：当通过电位计18获得的与真空成比例的阀16的打开/关闭程度达到预先设定的设定值X1（S22：是）时，发生系统异常，像真空压力传感器的异常一样，当通过压力传感器14和15获取的反应室10的真空压力高于预先固定的值时，确定来自反应器的泄漏或管道的堵塞进行异常处理（S25）设定值X2（S24：否）。通过实验等预先获得设定值X1和X2，从而可以适当地检测系统的异常，例如真空压力传感器的异常，从反应器泄漏和堵塞管道。版权所有（C）2006，JPO＆NCIPI

9. 发明专利

JP2004138178A Fluid supply controller 有权
公开(公告)号：JP2004138178A
公开(公告)日：2004-05-13
申请号：JP2002304167
申请日：2002-10-18
申请人： Ckd Corp , シーケーディ株式会社
发明人： MURAKUMO HIKARI , TOYODA TETSUYA , KAGOHASHI HIROSHI , SUZUKI NOBUYA
IPC分类号： F16K23/00 , F17D3/01
摘要： PROBLEM TO BE SOLVED: To provide a fluid supply controller to control a fluid supply system having an electropneumatic proportional valve to supply the pilot air to a pneumatic type pilot valve, in which no ill influence is given on the peripheral apparatus by eliminating any unstable operation when the power is put on to the fluid supply controller.
SOLUTION: The electropneumatic proportional valve 7 to supply the pilot air, for example to a suckback valve 3, is started with the power supplied by turning on a power switch S1 through a timer relay switch T and a relay switch K1 at the time T14 later than the time T13 when a control signal to instruct the suckback amount according to the initial setting from a CPU part 21 and a D/A conversion part 22 is fed to an analog output part 23 (approximately two seconds after the time T11 when the power supply is put on).
COPYRIGHT: (C)2004,JPO

10. 发明专利

JP2007110004A Chemical supply system 有权
标题翻译：化学供应系统
公开(公告)号：JP2007110004A
公开(公告)日：2007-04-26
申请号：JP2005301439
申请日：2005-10-17
申请人： Ckd Corp , Okutekku:Kk , シーケーディ株式会社 , 株式会社オクテック
发明人： OKUMURA KATSUYA , TOYODA TETSUYA , ITO TOMOHIRO , MURAKUMO HIKARI , SAKAI ATSUYUKI
IPC分类号： H01L21/027 , B05C11/10
CPC分类号： F04B49/08
摘要： PROBLEM TO BE SOLVED: To always properly perform pressure feedback control even if a set value of a working pressure differs according to a change in a type of a chemical or the like, and as a result to accurately control the flow rate of the discharged chemical.
SOLUTION: A pump 11 has a pump chamber 13 and a working chamber 14 partitioned by a diaphragm 12 made of a flexible film, for sucking and discharging the chemical depending on a change in pressure in the working chamber 14. An electro-pneumatic regulator 32 supplies working air to the working chamber 14. In addition, this system is equipped with a plurality of pressure sensors 51 and 63 different in a pressure detection range as pressure detecting means for detecting the pressure of the working air. A controller 40 selectively employs either of detection results of the plurality of sensors 51 and 63 depending on a set pressure value of the working air which is specified each time, for performing the pressure feedback control.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：即使工作压力的设定值根据化学品的类型的变化等而不同，也可以始终适当地执行压力反馈控制，并且因此精确地控制流量排出的化学物质。解决方案：泵11具有由柔性膜制成的隔膜12隔开的泵室13和工作室14，用于根据工作室14内的压力变化来抽吸和排出化学品。气动调节器32将工作空气供给到工作室14.此外，该系统配备有多个压力检测范围不同的压力传感器51,63，作为用于检测工作空气的压力的压力检测单元。控制器40根据每次指定的工作空气的设定压力值选择性地使用多个传感器51和63的检测结果中的任一个，以执行压力反馈控制。版权所有（C）2007，JPO＆INPIT

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式