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1. 发明专利

JP2009278091A Lithography method 有权
标题翻译： LITHOGRAPHY方法
公开(公告)号：JP2009278091A
公开(公告)日：2009-11-26
申请号：JP2009114604
申请日：2009-05-11
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： FLAGELLO DONIS GEORGE
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F1/42 , G03F7/095 , G03F7/12 , G03F7/20 , G03F7/26 , G03F7/405 , G03F7/70325 , Y10T428/24479 , Y10T428/24802
摘要： PROBLEM TO BE SOLVED: To provide a lithography method wherein a mask for generation of near-field radiation is not required to be accurately spaced from a resist-applied substrate or be brought into contact with a resist. SOLUTION: A lithographic method for a substrate provided with a resist layer and a further layer on the resist layer includes: providing a pattern in the further layer so that the resist layer may be exposed to radiation via a space defined by a distance between features of the pattern; and exposing the resist layer to radiation having a wavelength greater than the distance between features of the pattern defining the space, such that near-field radiation is generated which propagates into and exposes an area of the resist. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种光刻方法，其中用于产生近场辐射的掩模不需要与抗蚀剂涂覆的基板准确地间隔开或与抗蚀剂接触。解决方案：在抗蚀剂层上设置有抗蚀剂层和另外的层的基板的光刻方法包括：在另一层中提供图案，使得抗蚀剂层可以通过由距离限定的空间暴露于辐射在模式的特征之间; 以及将抗蚀剂层暴露于具有大于限定空间的图案的特征之间的距离的波长的辐射，使得产生传播进入并暴露抗蚀剂的区域的近场辐射。版权所有（C）2010，JPO＆INPIT

2. 发明专利

JP2009105385A Lithography system, lithography apparatus, and method of manufacturing device 审中-公开
标题翻译：平版印刷系统，光刻设备及其制造方法
公开(公告)号：JP2009105385A
公开(公告)日：2009-05-14
申请号：JP2008240100
申请日：2008-09-19
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： LOOPSTRA ERIK ROELOF , FLAGELLO DONIS GEORGE
IPC分类号： H01L21/027
CPC分类号： G03F7/70408
摘要： PROBLEM TO BE SOLVED: To provide a lithography system incorporating interference lithography apparatuses, which makes it possible to scan over a substrate so as to expose continuous parts of a pattern on respective regions of the substrate and can be used for generating the densest portion of the pattern on the substrate.
SOLUTION: The lithography system includes two lithography apparatuses. The first lithography apparatus projects a radiation beam with a pattern on a first target portion of the substrate, and the second lithography apparatus includes an interference arrange which splits the radiation beam and recombines the split beams to generate an interference pattern. A masking arrange selectively transmits a part of the interference pattern, and a projection system transfers the selectively transmitted part of the interference pattern on a second target portion of the substrate.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种包含干涉光刻设备的光刻系统，其使得可以在基板上扫描以暴露基板的各个区域上的图案的连续部分，并且可以用于产生最密集的部分图案在基板上。光刻系统包括两个光刻设备。第一光刻设备在衬底的第一目标部分上投射具有图案的辐射束，并且第二光刻设备包括干涉布置，其分裂辐射束并重新组合分裂光束以产生干涉图案。掩蔽布置选择性地发送干涉图案的一部分，并且投影系统将干涉图案的选择性透射部分传送到基板的第二目标部分上。版权所有（C）2009，JPO＆INPIT

3. 发明专利

JP2007266155A Variable illumination source 有权
标题翻译：可变照明源
公开(公告)号：JP2007266155A
公开(公告)日：2007-10-11
申请号：JP2006086914
申请日：2006-03-28
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： FLAGELLO DONIS GEORGE , SOCHA ROBERT JOHN , GREENEICH JAMES SHERWOOD
IPC分类号： H01L21/027 , G03F7/20
摘要： PROBLEM TO BE SOLVED: To provide an illumination source which is controlled variably for usage in lithography equipment. SOLUTION: A device includes a variable illumination field to be used for lithographic plotting in order to manufacture a semiconductor. Concerning the device and its method, an illumination system is arranged, which includes a variable optical element having the array of address capable of designating elements which are respectively arranged and constituted to have variable transmittance. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供可变地控制用于光刻设备的照明源。解决方案：为了制造半导体，器件包括用于光刻绘图的可变照明场。关于该装置及其方法，布置了照明系统，其包括具有地址阵列的可变光学元件，其可以指定分别布置和构造为具有可变透射率的元件。版权所有（C）2008，JPO＆INPIT

4. 发明专利

JP2010045360A Diffraction optical element, lithographic apparatus, and manufacturing method of semiconductor device 审中-公开
$Diffraction optical element, lithographic apparatus, and manufacturing method of semiconductor device$
标题翻译：衍射光学元件，光刻设备和半导体器件的制造方法
公开(公告)号：JP2010045360A
公开(公告)日：2010-02-25
申请号：JP2009186180
申请日：2009-08-11
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： FLAGELLO DONIS GEORGE
IPC分类号： H01L21/027 , G02B5/32 , G03F7/20
CPC分类号： G03F7/70158 , G02B5/18
摘要： PROBLEM TO BE SOLVED: To provide a diffraction optical element capable of redistributing incoming radiation beams more uniformly on an output plane, a lithographic apparatus, and a manufacturing method of a semiconductor device. SOLUTION: The diffraction optical element and the lithographic apparatus with the diffraction optical element cause radiation beams to be diffracted on an output plane. The diffraction optical element comprises a plurality of unit gratings each having such a phase structure as to adjust a cross section intensity distribution of the incoming radiation beam to be a desired intensity distribution. The unit gratings of the diffraction optical element are arranged adjacently to have such phase structures corresponding to each other in a mirror image or a reversal image. In addition, the manufacturing method of the semiconductor device is presented. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供能够更均匀地将输入辐射束重新分布在输出平面上的光学元件，光刻设备和半导体器件的制造方法。解决方案：具有衍射光学元件的衍射光学元件和光刻设备使得辐射束在输出平面上被衍射。衍射光学元件包括多个单元光栅，每个单元光栅具有这样的相位结构，以将入射辐射束的横截面强度分布调整为期望的强度分布。衍射光学元件的单位光栅相邻布置以具有在镜像或反转图像中彼此对应的这种相位结构。另外，提出了半导体器件的制造方法。版权所有（C）2010，JPO＆INPIT

5. 发明专利

JP2009009143A Stationary and dynamic radial transverse electric polarizer for high numerical aperture system 有权
标题翻译：用于高数值孔径系统的静态和动态径向横向电极
公开(公告)号：JP2009009143A
公开(公告)日：2009-01-15
申请号：JP2008188601
申请日：2008-07-22
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： FLAGELLO DONIS GEORGE , CUMMINGS KEVIN , STRAAIJER ALEXANDER , MARIE DIERICHS MARCEL MATHIJS
IPC分类号： G02B5/30 , G02B27/28 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70566 , G02B5/3058
摘要： PROBLEM TO BE SOLVED: To provide a radial transverse electric polarizer device that includes a first layer of a material having a first refractive index, a second layer of a material having a second refractive index, and a plurality of elongated elements azimuthally and periodically spaced apart and disposed between the first layer and the second layer. SOLUTION: The radial transverse electric polarizer device includes: a first layer of a material having a first refractive index; a second layer of a material having a second refractive index; and a plurality of elongated elements azimuthally and periodically spaced apart and disposed between the first layer and the second layer. The plurality of elongated elements interacts with electromagnetic waves of radiation to transmit transverse electric polarization of electromagnetic waves of radiation. The polarizer device can be used in a lithographic projection apparatus to increase imaging resolution. A method of manufacturing a device includes polarizing a beam of radiation in a transverse electric polarization. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种径向横向电偏振器装置，其包括具有第一折射率的材料的第一层，具有第二折射率的材料的第二层和多个细长元件的方位角和周期性间隔开并设置在第一层和第二层之间。解决方案：径向横向电偏振器装置包括：具有第一折射率的材料的第一层; 具有第二折射率的材料的第二层; 以及多个细长元件，其方位角和周期性间隔开并设置在第一层和第二层之间。多个细长元件与辐射的电磁波相互作用以传输辐射电磁波的横向电极化。偏振器装置可用于光刻投影装置中以增加成像分辨率。一种制造器件的方法包括使横向电极化中的辐射束偏振。版权所有（C）2009，JPO＆INPIT

6. 发明专利

JP2007311783A Lithographic apparatus and method of manufacturing device 有权
标题翻译：光刻设备及其制造方法
公开(公告)号：JP2007311783A
公开(公告)日：2007-11-29
申请号：JP2007120705
申请日：2007-05-01
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： FLAGELLO DONIS GEORGE
IPC分类号： H01L21/027 , G02B5/18
CPC分类号： G03F7/70408 , G03F7/70158 , G03F7/70258 , G03F7/70308 , G03F7/70341
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus capable of creating sharper images with a deep focal depth.
SOLUTION: The lithographic apparatus is provided with: a first beam splitter 101 configured to create a first plurality of spatially coherent radiation beams 102; and a second beam splitter 110 configured to receive at least a portion of the first plurality of spatially coherent radiation beams and create, based on the first plurality of spatially coherent radiation beams, a second plurality of spatially coherent radiation beams 106. The apparatus is also provided with a beam combiner 115 adapted to direct and combine at least a portion of the second plurality of spatially coherent radiation beams onto a surface of a substrate to form an interference pattern.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供能够以深焦深创建更清晰的图像的光刻设备。解决方案：光刻设备设置有：第一分束器101，被配置为产生第一多个空间相干辐射束102; 以及第二分束器110，被配置为接收第一多个空间相干辐射束的至少一部分，并且基于第一多个空间相干辐射束产生第二多个空间相干辐射束106.该装置也是设置有光束组合器115，其适于将第二多个空间相干辐射束的至少一部分引导并组合到衬底的表面上以形成干涉图案。版权所有（C）2008，JPO＆INPIT

7. 发明专利

JP2004343079A Device manufacturing method 有权
公开(公告)号：JP2004343079A
公开(公告)日：2004-12-02
申请号：JP2004104522
申请日：2004-03-31
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： HANSEN STEVEN GEORGE , FLAGELLO DONIS GEORGE , KLAAASSEN MICHEL FRANCOIS HUBE , DE WINTER LAURENTIUS CORNELIUS , KNOLS EDWIN WILHELMUS MARIE
IPC分类号： G02B5/18 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70066 , G03F7/70091 , G03F7/701 , G03F7/70566 , G03F7/70891
摘要： PROBLEM TO BE SOLVED: To provide an improved method and device for printing, e.g., a fine isolated gate, and particularly a method and device for achieving a higher processing latitude and/or a more even heating of a lens.
SOLUTION: A rectangular or stick-like on-axis illumination mask is provided which polarizes a radiation in parallel with the length of a stick. The mask improves a depth of focus (DOF) and an exposure latitude as compared with a circular monopole having the same σ value, and heats a relatively small lens.
COPYRIGHT: (C)2005,JPO&NCIPI

8. 发明专利

JP2005223321A Reinforced lithographic resolution by double exposure 审中-公开
标题翻译：双重曝光增强光刻解决方案
公开(公告)号：JP2005223321A
公开(公告)日：2005-08-18
申请号：JP2005019007
申请日：2005-01-27
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： HANSEN STEVEN G , FINDERS JOSEF MARIA , FLAGELLO DONIS GEORGE
IPC分类号： G03B27/42 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70433 , G03F7/70466
摘要： PROBLEM TO BE SOLVED: To reinforce lithographic resolution by double exposure for a semiconductor substrate. SOLUTION: A desired pattern can be generated on a substrate, by compositing primary and secondary sub-patterns through steps which include a step of decomposing a reticle pattern into at least two component sub-patterns that can optically receive decomposition a lithographic system, a step of performing coating of a predesignated photoresist layer on the substrate, a step of exposing the primary pattern between at least two component sub-patterns on the predesignated photoresist layer, a step of treating the exposed substrate, a step of exposing the secondary pattern between at least two component sub-patterns on the predesignated photoresist layer. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：通过双重曝光来增强半导体衬底的光刻分辨率。解决方案：通过将主要和次要子图案通过步骤合成，可以在衬底上产生所需的图案，该步骤包括将掩模版图案分解成可光学地接收分解光刻系统的至少两个分量子图案的步骤在基板上进行预定光致抗蚀剂层的涂覆的步骤，在预先指定的光致抗蚀剂层上的至少两个成分子图案之间曝光初级图案的步骤，处理曝光的基板的步骤，在预先指定的光致抗蚀剂层上的至少两个分量子图案之间的图案。版权所有（C）2005，JPO＆NCIPI

9. 发明专利

JP2005191568A Lithographic device and using method of lithographic device 有权
标题翻译： LITHOGRAPHIC DEVICE和使用LITHOGRAPHIC设备的方法
公开(公告)号：JP2005191568A
公开(公告)日：2005-07-14
申请号：JP2004369364
申请日：2004-12-21
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： VAN DIJK REMCO MARCEL , FLAGELLO DONIS GEORGE , KLAASSEN MICHEL FRANCOIS HUBER , TREYGER LEONID , UITTERDIJK TAMMO
IPC分类号： G01M11/00 , G01J1/00 , G01J4/04 , G03F1/14 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70566 , G01J4/04 , G03F1/44 , G03F7/70125 , G03F7/70133 , G03F7/70591
摘要： PROBLEM TO BE SOLVED: To provide a method of discriminating the polarization status of light that has passed through the projection lens of a lithographic device.
SOLUTION: The polarization is measured by the lithographic device, the behaviors of the optical parts are measured, and a specific polarizer is used as a part of the system for modeling. The polarizer includes four polarized components, each polarized component is provided with grating having each orientation. The polarizer can be disposed on a reticle plane or a reticle per se. Further, a polarization sensitivity structure that is a sensor is disposed on the object side of the projection lens in the lithographic device. The information on polarization characteristics of the projection lens can be discriminated by measuring the light that has passed through the polarization sensitivity structure.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种鉴别通过光刻设备的投影透镜的光的偏振状态的方法。
解决方案：通过光刻设备测量极化，测量光学部件的行为，并将特定的偏振器用作建模系统的一部分。偏振器包括四个偏振分量，每个偏振分量都具有每个取向的光栅。偏振器本身可以设置在掩模版平面或掩模版本上。此外，作为传感器的偏振敏感度结构设置在光刻设备中的投影透镜的物体侧。可以通过测量已经通过极化灵敏度结构的光来判别投影透镜的偏振特性信息。版权所有（C）2005，JPO＆NCIPI

10. 发明专利

JP2006324664A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
公开(公告)号：JP2006324664A
公开(公告)日：2006-11-30
申请号：JP2006136422
申请日：2006-05-16
申请人： ASML NETHERLANDS BV , ZEISS CARL SMT AG
发明人： HANSEN STEVEN G , FLAGELLO DONIS GEORGE , SINGER WOLFGANG , GEH BERND PETER , BLAHNIK VLADAN
IPC分类号： H01L21/027 , G03F7/20
摘要： PROBLEM TO BE SOLVED: To provide a method of reducing a minimum printable size on a mask which provides sufficient process latitude in photolithography and eliminates the need for the development of new process technologies. SOLUTION: A lithographic apparatus 10 includes an illumination unit 12 that has a pupil plane and is configured to provide an illumination configuration, and a projection system 34 having a numerical aperture. A method of transferring a pattern image to a substrate 38 by using the lithographic apparatus 10 comprises a process of illuminating a mask pattern 26 with an illumination configuration including a dark field component 88, and a process of projecting an image of the illuminated pattern 26 to a photoresist layer 40 applied on the substrate 38. The numerical aperture NA 0 of the illumination unit 12 is greater than the object-side numerical aperture NA OB1 of the projection lens 34. COPYRIGHT: (C)2007,JPO&INPIT

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