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1. 发明专利

JP2007128115A Embedded etch stop for phase shift mask and planar phase shift mask to reduce topography induced and waveguide effect 审中-公开
标题翻译：嵌入式ETCH停止用于相位移屏蔽和平面相移屏蔽以减少地形诱导和波形效应
公开(公告)号：JP2007128115A
公开(公告)日：2007-05-24
申请号：JP2007039089
申请日：2007-02-20
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： CUMMINGS KEVIN
IPC分类号： G03F1/00 , G03F7/20 , H01L21/027
CPC分类号： G03F1/30 , G03F1/32
摘要： PROBLEM TO BE SOLVED: To provide an etching mask for engraving a substrate to generate phase difference in the manufacture of a phase shift mask.
SOLUTION: The etching mask 300 for forming a phase difference comprises a glass or quartz layer 310, an etch stop layer 380, a polymer layer 330 and a hard mask 320. After a resist process is carried out, the hard mask 320 is patterned; the polymer layer 330 is etched, and then the etch stop layer 380 is removed. By using the etching mask to etch the glass or quartz layer 310, a phase difference by 180° is generated.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供用于雕刻基板的蚀刻掩模以在相移掩模的制造中产生相位差。用于形成相位差的蚀刻掩模300包括玻璃或石英层310，蚀刻停止层380，聚合物层330和硬掩模320.在进行抗蚀剂处理之后，硬掩模320 是图案; 蚀刻聚合物层330，然后去除蚀刻停止层380。通过使用蚀刻掩模蚀刻玻璃或石英层310，产生180°的相位差。版权所有（C）2007，JPO＆INPIT

2. 发明专利

JP2009009143A Stationary and dynamic radial transverse electric polarizer for high numerical aperture system 有权
标题翻译：用于高数值孔径系统的静态和动态径向横向电极
公开(公告)号：JP2009009143A
公开(公告)日：2009-01-15
申请号：JP2008188601
申请日：2008-07-22
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： FLAGELLO DONIS GEORGE , CUMMINGS KEVIN , STRAAIJER ALEXANDER , MARIE DIERICHS MARCEL MATHIJS
IPC分类号： G02B5/30 , G02B27/28 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70566 , G02B5/3058
摘要： PROBLEM TO BE SOLVED: To provide a radial transverse electric polarizer device that includes a first layer of a material having a first refractive index, a second layer of a material having a second refractive index, and a plurality of elongated elements azimuthally and periodically spaced apart and disposed between the first layer and the second layer. SOLUTION: The radial transverse electric polarizer device includes: a first layer of a material having a first refractive index; a second layer of a material having a second refractive index; and a plurality of elongated elements azimuthally and periodically spaced apart and disposed between the first layer and the second layer. The plurality of elongated elements interacts with electromagnetic waves of radiation to transmit transverse electric polarization of electromagnetic waves of radiation. The polarizer device can be used in a lithographic projection apparatus to increase imaging resolution. A method of manufacturing a device includes polarizing a beam of radiation in a transverse electric polarization. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种径向横向电偏振器装置，其包括具有第一折射率的材料的第一层，具有第二折射率的材料的第二层和多个细长元件的方位角和周期性间隔开并设置在第一层和第二层之间。解决方案：径向横向电偏振器装置包括：具有第一折射率的材料的第一层; 具有第二折射率的材料的第二层; 以及多个细长元件，其方位角和周期性间隔开并设置在第一层和第二层之间。多个细长元件与辐射的电磁波相互作用以传输辐射电磁波的横向电极化。偏振器装置可用于光刻投影装置中以增加成像分辨率。一种制造器件的方法包括使横向电极化中的辐射束偏振。版权所有（C）2009，JPO＆INPIT

3. 发明专利

JP2008116979A Perfluoropolyether liquid pellicle and mask-cleaning method using perfluoropolyether liquid 有权
标题翻译：全氟代乙烯醇溶液和全面清洗方法
公开(公告)号：JP2008116979A
公开(公告)日：2008-05-22
申请号：JP2007327526
申请日：2007-12-19
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： CUMMINGS KEVIN
IPC分类号： G03F1/24 , G03F1/48 , G03F1/82 , G03F7/11 , G03F7/20 , G03F7/22 , G03F9/00 , H01L21/027
CPC分类号： G03F1/82 , B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/48 , G03F7/2041
摘要： PROBLEM TO BE SOLVED: To provide a perfluoropolyether liquid pellicle which can be used in a photolithography projection device which provides a patterned projection beam such as a radiation of 157 nm or a radiation so as to print a pattern on a substrate, and also provide a mask-cleaning method using a perfluoropolyether liquid.
SOLUTION: A patterning device includes a material layer 31, a patterned opaque material layer 32 on the surface of the material layer, and a pellicle 40 of a perfluoropolyether (PFPE) liquid, the pellicle covering the surface. In order to provide the patterning device 32, which has the material layer 31 and the patterned layer of the opaque material, on the surface of the material layer and form the PFPE liquid layer 40, the PFPE liquid which covers the surface is applied to the surface, and at least a part of the PFPE liquid layer is removed.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供可用于提供诸如157nm的辐射的图案化投影光束或辐射以在基板上印刷图案的光刻投影装置中的全氟聚醚液体防护薄膜，以及还提供了使用全氟聚醚液体的掩模清洁方法。解决方案：图案形成装置包括材料层31，材料层表面上的图案化不透明材料层32和覆盖表面的防护薄膜的全氟聚醚（PFPE）液体的防护薄膜40。为了提供具有材料层31和不透明材料的图案化层的图案形成装置32在材料层的表面上并形成PFPE液体层40，将覆盖表面的PFPE液体施加到表面，并且除去至少一部分PFPE液体层。版权所有（C）2008，JPO＆INPIT

4. 发明专利

JP2004220032A Perfluoropolyether liquid pellicle and method of cleaning mask using perfluoropolyether liquid 有权
标题翻译：全氟酚液体和使用全氟代醇液体清洁面膜的方法
公开(公告)号：JP2004220032A
公开(公告)日：2004-08-05
申请号：JP2004006824
申请日：2004-01-14
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： CUMMINGS KEVIN
IPC分类号： G03F1/24 , G03F1/48 , G03F1/82 , G03F7/11 , G03F7/20 , G03F7/22 , G03F9/00 , H01L21/027 , G03F1/14
CPC分类号： G03F1/82 , B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/48 , G03F7/2041
摘要： PROBLEM TO BE SOLVED: To provide a pellicle of a mask to be used in a lithography projector and a method for cleaning the mask. SOLUTION: A patterning device for the mask etc., used for a photolithographic apparatus includes a blank layer, a layer of patterned opaque materials existing on the surface of the blank layer and a pellicle of perfluoropolyether (PFPE) liquid covering the surface. The method of manufacturing the patterning device, includes providing a patterning device having the blank layer and the patterned layer of the opaque material on the surface of the blank layer, applying the PFPE liquid to the surface covering the surface in order to form the PFPE liquid layer and removing at least a portion of the PFPE liquid layer. In the method of cleaning the patterning device used for the lithographic projector, the patterning device includes the blank layer and the patterned layers of the opaque material existing on the surface of the blank layer and the PFPE liquid covering the surface is applied on the surface of the blank layer in order to form the PFPE liquid layer and at least a portion of the PFPE liquid layer is removed. COPYRIGHT: (C)2004,JPO&NCIPI
摘要翻译：要解决的问题：提供用于光刻投影仪中的掩模的防护薄膜和用于清洁面罩的方法。解决方案：用于光刻设备的用于掩模等的图案形成装置包括空白层，存在于空白层表面上的图案化不透明材料层和覆盖表面的全氟聚醚（PFPE）薄膜的薄膜。制造图案形成装置的方法包括在空白层的表面上设置具有空白层和不透明材料的图案化层的图案形成装置，将PFPE液体施加到覆盖表面的表面上以形成PFPE液体并且除去至少一部分PFPE液体层。在清洁用于光刻投影仪的图案形成装置的方法中，图案形成装置包括坯料层，并且存在于坯料层的表面上的不透明材料的图案化层和覆盖表面的PFPE液体被施加在空白层以形成PFPE液体层，并且除去至少一部分PFPE液体层。版权所有（C）2004，JPO＆NCIPI

5. 发明专利

JP2004226967A Induced topography and phase shift photomask for reducing waveguide effect, and imbedded type etching stop section for planar phase shift mask 审中-公开
公开(公告)号：JP2004226967A
公开(公告)日：2004-08-12
申请号：JP2004005757
申请日：2004-01-13
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： CUMMINGS KEVIN
IPC分类号： G03F1/00 , G03F7/20 , H01L21/027 , G03F1/08
CPC分类号： G03F1/30 , G03F1/32
摘要： PROBLEM TO BE SOLVED: To provide an etching mask for forming a phase difference by digging down a substrate in manufacturing of a phase shift mask.
SOLUTION: The etching mask 300 for forming the phase difference comprises a layer 310 of glass or quartz, an etching stop layer 380, a polymer layer 330, and a hard mask 320. The hard mask 320 is patterned after resist processing and the etching stop layer 380 is removed after the polymer layer 330 is etched. The phase difference of 180° is formed by etching the layer 310 of the glass or quartz by using the etching mask.
COPYRIGHT: (C)2004,JPO&NCIPI

6. 发明专利

JP2004258670A Fixation of high numerical aperture and dynamic radial transverse electric polarizer 审中-公开
公开(公告)号：JP2004258670A
公开(公告)日：2004-09-16
申请号：JP2004090530
申请日：2004-02-27
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： FLAGELLO DONIS GEORGE , CUMMINGS KEVIN , STRAAIJER ALEXANDER , MARIE DIERICHS MARCEL MATHIJS
IPC分类号： G02B5/30 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70566 , G02B5/3058
摘要： PROBLEM TO BE SOLVED: To provide a radial transverse electric polarizer comprising a first layer of material having a first refractive index, a second layer of material having a second refractive index and a plurality of elongated elements azimuthally and periodically spaced apart and disposed between the first layer and the second layer. SOLUTION: A plurality of the elongated elements interact with electromagnetic waves of radiation to transmit transverse electric polarization of electromagnetic waves of radiation. The polarizer device may be used, for example, in a lithographic projection apparatus to increase imaging resolution. A device manufacturing method includes the polarizing of a radiation beam PB by means of a transverse electric polarization. COPYRIGHT: (C)2004,JPO&NCIPI

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