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1. 发明专利

JP2006126205A Particle detection device, lithographic apparatus and device manufacturing method 审中-公开
标题翻译：颗粒检测装置，光刻装置和装置制造方法
公开(公告)号：JP2006126205A
公开(公告)日：2006-05-18
申请号：JP2005320099
申请日：2005-10-05
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： ONVLEE JOHANNES , GREVE PETER FERDINAND , FRANSSEN JOHANNES HENDRIKUS GE , VISSER RAYMOND , VERHAGEN ERWIN THEODORUS JACOB
IPC分类号： G01N21/956 , G01B11/02 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70916 , G01N21/94 , G01N21/956 , G03F7/7085
摘要： PROBLEM TO BE SOLVED: To provide a detector system for resolving radiation from a ghost particle from radiation from an actual particle for differentiation between a particle and a ghost particle. SOLUTION: The detector system outputs a plurality of detector signals corresponding to intensities of radiation being incident on a part of the detector system or the detector system outputs detector signals corresponding to intensities of radiation incident on the detector system. In the plurality of detector signals, radiation received from a particle does not have levels higher than a predetermined threshold level respectively and, when radiation is received from the ghost particle, an approximately same level above the threshold level is displayed. The detector system includes a radiation detector device for generating a first detector signal in response to radiation incident on a predetermined part and a radiation blocking assembly for preventing radiation not originating from a particle from being incident on the predetermined part of the detector device. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种检测器系统，用于从来自实际颗粒的辐射分解来自重影颗粒的辐射，以在颗粒和重影颗粒之间进行区分。解决方案：检测器系统输出对应于入射在检测器系统的一部分上的辐射强度的多个检测器信号，或者检测器系统输出对应于入射在检测器系统上的辐射强度的检测器信号。在多个检测器信号中，从粒子接收的辐射分别不具有高于预定阈值的电平，并且当从重影粒子接收到辐射时，显示高于阈值电平的大致相同的电平。检测器系统包括用于响应于入射在预定部件上的辐射产生第一检测器信号的辐射检测器装置和用于防止不是源自颗粒的辐射入射在检测器装置的预定部分上的辐射阻挡组件。版权所有（C）2006，JPO＆NCIPI

2. 发明专利

JP2005236310A Control method for lithographic processing cell, manufacturing method for device , lithography apparatus, track unit, lithographic processing cell, and computer program 有权
标题翻译：图像处理单元的控制方法，设备的制造方法，平面设备，轨迹单元，光刻处理单元和计算机程序
公开(公告)号：JP2005236310A
公开(公告)日：2005-09-02
申请号：JP2005078033
申请日：2005-02-18
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： VAN DEN NIEUWELAAR NORBERTUS J , ONVLEE JOHANNES , BOUMEN ROEL
IPC分类号： H01L21/027 , G03D5/00
CPC分类号： G03D5/00 , G03F7/70525 , G03F7/70991 , Y10S414/135 , Y10S414/14
摘要： PROBLEM TO BE SOLVED: To provide a manufacturing method of improved model for synchronizing a track unit and a lithography apparatus for maximizing the throughput in lithographic processing cell configuration.
SOLUTION: Lithographic processing cell includes a lithographic exposure apparatus configured to expose a substrate, and track unit configured prepare the substrate before the exposure, and to develop the substrate after the exposure. The method includes predicting the time needed for the lithographic exposure apparatus to become ready to receive a substrate that has been prepared by the track unit for exposure, and adjusting the speed with which the track unit prepares the substrate so that the substrate becomes ready for the lithographic exposure apparatus to receive in time. The use of buffer in the track can be avoided significantly or even completely obviated, by adjusting the track speed so that the substrate becomes ready, just in time when the lithographic exposure apparatus needs the substrate.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种用于使轨道单元同步的改进模型的制造方法和用于使光刻处理单元配置中的吞吐量最大化的光刻设备。解决方案：平版印刷处理单元包括被配置为暴露基板的光刻曝光装置，并且配置的轨道单元在曝光之前准备基板，并且在曝光之后显影基板。该方法包括预测光刻曝光装置准备好接收由用于曝光的轨道单元制备的基板所需的时间，以及调整轨道单元准备基板的速度，使得基板准备好用于光刻曝光装置及时接收。通过调整轨道速度使得基板准备就绪，恰好在平版印刷曝光装置需要基板的时候，可以明显地或甚至完全地避免轨道中的缓冲区的使用。版权所有（C）2005，JPO＆NCIPI

3. 发明专利

JP2005191571A Method of actuating lithographic device or lithographic processing cell, lithographic device and lithographic processing cell 有权
标题翻译：激光光刻设备或光刻处理单元，光刻设备和光刻处理单元的方法
公开(公告)号：JP2005191571A
公开(公告)日：2005-07-14
申请号：JP2004371509
申请日：2004-12-22
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： NIEUWELAAR NORBERTUS JOSEPHUS , ONVLEE JOHANNES , VAN LIEROP HENRICUS PETRUS JOH , BRASPENNING NIELS CORNELIS WIL , ROODA JACOBUS E
IPC分类号： G03F7/20 , G05B19/418 , G06F19/00 , H01L21/027
CPC分类号： G05B19/41865 , G05B2219/32301 , Y02P90/20 , Y02P90/22 , Y02P90/26
摘要： PROBLEM TO BE SOLVED: To provide the preparing method of a schedule that operates a machine forming at least a part of a lithographic device or a lithographic processing cell. SOLUTION: In the method, a plurality of weighting factors on each of a plurality of qualities that affect the results of a lithographic process are received. The optimal schedule of a task that should be executed is prepared to complete the lithographic process, the optimal schedule is a schedule that brings about the results having the maximum total quality value, and the total quality is the total of each value of the qualities and each of the weighting factors. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供操作形成光刻设备或光刻处理单元的至少一部分的机器的调度的准备方法。解决方案：在该方法中，接收影响光刻处理结果的多个质量中的每一个上的多个加权因子。准备执行的任务的最佳时间表准备完成光刻过程，最佳时间表是带来最大总质量值的结果的时间表，总质量是每个品质值的总和，每个加权因子。版权所有（C）2005，JPO＆NCIPI

4. 发明专利

JP2005340848A Method of planning task in machine, method of controlling machine, supervisory machine control system, lithographic apparatus, lithographic processing cell and computer program 审中-公开
标题翻译：计算机中的任务方法，控制机器的方法，监控机器控制系统，平面设备，光刻处理单元和计算机程序
公开(公告)号：JP2005340848A
公开(公告)日：2005-12-08
申请号：JP2005181179
申请日：2005-05-25
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： NORBERTUS JOSEPHUS MARTINUS VA , ONVLEE JOHANNES , BOUMEN ROEL , HENRICUS PETRUS JOHANNUS VAN L , ROBERT DUMONT , ROODA JACOBUS E
IPC分类号： H01L21/027 , G03F7/20 , G05B19/418 , G06F19/00
CPC分类号： G05B19/41865 , G03F7/70533 , G05B2219/32298 , G05B2219/32423 , G05B2219/45028 , Y02P90/20 , Y02P90/86
摘要： PROBLEM TO BE SOLVED: To provide a method for planning a task to be performed in a machine. SOLUTION: In the method, a scheduling problem that can be solved by an automated scheduler is created by deriving a precedence graph by linking subsidiary tasks to a sequence of key tasks. In the event of a trigger such as an order for new work or a machine exception, work can be retimed, rescheduled or replanned. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种用于规划在机器中执行的任务的方法。解决方案：在该方法中，可以通过自动调度器解决的调度问题通过将辅助任务链接到一系列关键任务来导出优先级图来创建。在诸如订单新工作或机器异常等触发事件的情况下，工作可以重新定时，重新安排或重新安装。版权所有（C）2006，JPO＆NCIPI

5. 发明专利

JP2005010786A Spatial light modulator, method of spatially modulating radiation beam, lithographic apparatus and device manufacturing method 有权
标题翻译：空间光调制器，空间调制辐射光束的方法，光刻设备和器件制造方法
公开(公告)号：JP2005010786A
公开(公告)日：2005-01-13
申请号：JP2004180810
申请日：2004-06-18
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： ONVLEE JOHANNES
IPC分类号： G02B26/08 , G03F7/20 , H01L21/027
CPC分类号： G02B26/0841
摘要： PROBLEM TO BE SOLVED: To provide a spatial light modulator which is usable as a patterning means in a lithographic projection apparatus, is contained in a small space, accomplishes a throughput and a resolution comparable to a mask, uploads necessary pattern data for setting pixels without a complicated addressing circuit device and with a minimum thermal radiation.
SOLUTION: Each pixel of the spatial light modulator comprises: a movable mirror arranged on a substrate; a light sensitive element; and a control circuitry for so driving an actuator that the movable mirror is set to a state which is determined by a programming beam having a wavelength different from that of a projection beam received by the light sensitive element. The pixel forms a desired pattern by reflecting the projection beam according to the state of the movable mirror. Since the pattern data are uploaded not electronically but optically, the control circuit is simple and releases less amount of heat, and necessary data transfer rate is obtained.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：为了提供在光刻投影设备中可用作图案化装置的空间光调制器，被包含在小空间中，实现了与掩模相当的吞吐量和分辨率，上传必需的图案数据以供设置像素，而不需要复杂的寻址电路器件并具有最小的热辐射。解决方案：空间光调制器的每个像素包括：布置在基板上的可移动反射镜; 光敏元件; 以及用于驱动致动器的控制电路，使得可动镜被设置为由具有与由光敏元件接收的投影光束的波长不同的波长的编程光束确定的状态。像素通过根据可移动镜的状态反射投影光束而形成期望的图案。由于图形数据不是以电子方式上传，而是通过光学方式上传，所以控制电路简单并且释放较少的热量，并且获得必要的数据传送速率。版权所有（C）2005，JPO＆NCIPI

6. 发明专利

JP2004343063A Lithographic projection assembly, handling apparatus for handling substrate, and method of handling substrate 有权
公开(公告)号：JP2004343063A
公开(公告)日：2004-12-02
申请号：JP2004066539
申请日：2004-03-10
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： VAN GROOS PIETER JOHANNES MARI , MARIA HENNUS PIETER RENAAT , HOOGKAMP JAN FREDERIK , HENDRIK KLOMP ALBERT JAN , ONVLEE JOHANNES , VISSER RAIMOND
IPC分类号： G03F7/20 , H01L21/00 , H01L21/027 , H01L21/677 , H01L21/68
CPC分类号： H01L21/67225 , G03F7/70733 , G03F7/7075 , G03F7/70808 , G03F7/70841 , G03F7/70858 , G03F7/70875 , G03F7/70991 , H01L21/67201
摘要： PROBLEM TO BE SOLVED: To provide a lithographic projection assembly comprising: a substrate handler provided with a handler chamber in which at least two load locks for transferring a substrate between a first environment and a second environment are provided, the second environment has a lower pressure than the first environment, and further the second environment is superior; and a lithographic projection apparatus comprising a projection chamber. SOLUTION: The handler chamber and the projection chamber connect with each other through, on one hand, a loading position so that the substrate enters from the handler chamber the projection chamber, and on the other hand, an unloading position for taking out the substrate from the projection chamber to the handler chamber. The handler chamber is provided with a pretreatment means for pretreating the substrate, and a transporting means having a constitution in which the substrate is transferred from the load lock to the pretreatment means, and transferred from the pretreatment means to the loading position, and further transferred from the unloading position to the load lock. COPYRIGHT: (C)2005,JPO&NCIPI

7. 发明专利

JP2005123608A Operation method of lithography system or lithography treatment cell, lithography system, and lithography treatment cell 有权
标题翻译：光刻系统或者LITHOGRAPHY治疗细胞，LITHOGRAPHY系统和LITHOGRAPHY治疗细胞的操作方法
公开(公告)号：JP2005123608A
公开(公告)日：2005-05-12
申请号：JP2004286595
申请日：2004-09-30
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： VAN DEN NIEUWELAAR NORBERTUS J , KOENEN WILLEM HERMAN GERTRUDA , ONVLEE JOHANNES , VAN LIEROP HENRICUS PETRUS JOH , ROODA JACOBUS E , STOETS MICHIEL A R , DUMONT ROBERT J
IPC分类号： G03F7/20 , G05B15/00 , G05B19/418 , H01L21/027
CPC分类号： G05B19/41865 , G03F7/70525 , G05B2219/32248 , G05B2219/32291 , G05B2219/45028 , G05B2219/45031 , Y02P90/20
摘要： PROBLEM TO BE SOLVED: To provide an operation method in which scheduling for determining an order of many tasks that are performed using various functions in a machine involving lithography is corrected in a restorable manner when an expected situation occurs during operation. SOLUTION: In the operation method of the machine, a state resistor SR indicating a state of the machine and a database TDB of tasks executable in the machine are maintained, possible task orders are created based on conditions before and after the tasks on the state of the system (rather than a priority relation), an order confirming given start and end states of the machine is selected from the created orders. According to the method, the order of the tasks executable in the machine can be quickly created, and an optimum order can be quickly found, in addition, automatic restoration from an exception is possible. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种操作方法，其中当在操作期间发生预期情况时，以可恢复的方式校正在涉及光刻的机器中使用各种功能执行的许多任务的顺序的调度。解决方案：在机器的操作方法中，保持指示机器状态的状态电阻器SR和机器中可执行的任务的数据库TDB，根据任务之前和之后的条件创建可能的任务命令系统的状态（而不是优先级关系），从创建的订单中选择确定机器的起始和结束状态的顺序。根据该方法，可以快速地创建在机器中可执行的任务的顺序，并且可以快速找到最佳顺序，此外，可以从异常自动恢复。版权所有（C）2005，JPO＆NCIPI

8. 发明专利

JP2009218588A Lithographic apparatus and method 有权
标题翻译： LITHOGRAPHIC设备和方法
公开(公告)号：JP2009218588A
公开(公告)日：2009-09-24
申请号：JP2009051499
申请日：2009-03-05
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： KEITH FRANK BEST , VAN BUEL HENRICUS WILHELMUS MA , GUI CHENG-QUN , ONVLEE JOHANNES , PELLENS RUDY JAN MARIA , EDART REMI DANIEL MARIE , VOZNYI OLEG VIACHESLAVOVICH , MAURY PASCAL ANNE
IPC分类号： H01L21/027
CPC分类号： G03F9/7084 , G03F7/70633 , G03F9/7076 , G03F9/708 , H01L23/544 , H01L2223/54453 , H01L2924/0002 , H01L2924/00
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus and method capable of removing, or relaxing increase of overlay errors of patterns. SOLUTION: The lithographic method for providing an alignment mark onto a layer provided on a substrate is disclosed. The method includes providing the alignment mark to a region aligned within a specific angle range to a surface of the substrate having the layer provided thereon. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供能够去除或放松图案重叠误差增加的光刻设备和方法。解决方案：公开了在设置在基板上的层上提供对准标记的光刻方法。该方法包括将对准标记提供到具有在其上设置有层的基板的表面的特定角度范围内的区域。版权所有（C）2009，JPO＆INPIT

9. 发明专利

JP2007129218A Lithographic apparatus and device manufacturing method 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：JP2007129218A
公开(公告)日：2007-05-24
申请号：JP2006291660
申请日：2006-10-26
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： ONVLEE JOHANNES , BIJVOET DIRK-JAN
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70775 , G03F7/70516 , G03F7/70716 , G03F9/7011
摘要： PROBLEM TO BE SOLVED: To correct position errors caused by slip between a reticle and a reticle stage. SOLUTION: A lithographic apparatus has a patterning support holding a patterning device. At least one position sensor measures the position of the patterning device relative to the patterning support, and generates a measuring signal. A positioning device controls the position of the patterning support on the basis of the measuring signal input into the positioning device. In a corresponding device manufacturing method, a patterning support is provided. A patterning device is held on the patterning support. The patterning support is moved along a line of movement. The position of the patterning device is measured relative to the patterning support, and the position of the patterning support is controlled on the basis of the measurement of the position of the patterning device relative to the patterning support. Thus, the position of the patterning support is controlled to compensate for slip of the patterning device relative to the patterning support. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：校正由于光罩和标线片台之间的滑动引起的位置误差。解决方案：光刻设备具有保持图案形成装置的图形化支撑件。至少一个位置传感器测量图案形成装置相对于图案形成支撑件的位置，并产生测量信号。定位装置基于输入到定位装置的测量信号来控制图案形成支撑件的位置。在相应的器件制造方法中，提供了图案形成支撑件。图案形成装置被保持在图案形成支撑件上。图形支撑沿着移动线移动。图案形成装置的位置相对于图案形成支撑件测量，并且基于图案形成装置相对于图案形成支撑件的位置的测量来控制图案形成支撑件的位置。因此，图案化支撑件的位置被控制以补偿图案形成装置相对于图案形成支撑件的滑动。版权所有（C）2007，JPO＆INPIT

10. 发明专利

JP2010153867A Lithographic apparatus and method of manufacturing device 审中-公开
标题翻译：光刻设备及其制造方法
公开(公告)号：JP2010153867A
公开(公告)日：2010-07-08
申请号：JP2009290308
申请日：2009-12-22
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： ONVLEE JOHANNES , KUIT JAN JAAP , KOS JOOST
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03B27/54 , G03F9/7065 , G03F9/7088
摘要： PROBLEM TO BE SOLVED: To alleviate the problem caused by the fact that a lighting source has to supply a beam having a large area for illuminating an alignment marker. SOLUTION: The lithographic apparatus includes a support section for supporting a patterning device for forming a radiation beam with a pattern, by giving a pattern to the section of the radiation beam and a substrate table for holding a substrate. The projection system projects the radiation beam with a pattern to the target part of the substrate. The patterning device includes one or a plurality of alignment patterns, and the lithographic apparatus includes a sub-lighting system for lighting each of the alignment patterns by another radiation using the radiation beam. The projection system projects an image of the respective alignment patterns to the substrate table. The substrate table includes one or a plurality of sensors for detecting the projected image of the alignment pattern. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了减轻由于照明源必须提供具有用于照射对准标记的大面积的光束的事实而引起的问题。解决方案：光刻设备包括支撑部分，用于通过向辐射束的部分提供图案和用于保持基板的基板台支撑用于形成具有图案的辐射束的图案形成装置。投影系统将辐射束以图案投射到基板的目标部分。图案形成装置包括一个或多个对准图案，并且光刻设备包括用于通过使用辐射束的另一个辐射来照亮每个对准图案的子照明系统。投影系统将各个对准图案的图像投影到基板台。衬底台包括用于检测对准图案的投影图像的一个或多个传感器。版权所有（C）2010，JPO＆INPIT

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