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1. 发明专利

JP2009218588A Lithographic apparatus and method 有权
标题翻译： LITHOGRAPHIC设备和方法
公开(公告)号：JP2009218588A
公开(公告)日：2009-09-24
申请号：JP2009051499
申请日：2009-03-05
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： KEITH FRANK BEST , VAN BUEL HENRICUS WILHELMUS MA , GUI CHENG-QUN , ONVLEE JOHANNES , PELLENS RUDY JAN MARIA , EDART REMI DANIEL MARIE , VOZNYI OLEG VIACHESLAVOVICH , MAURY PASCAL ANNE
IPC分类号： H01L21/027
CPC分类号： G03F9/7084 , G03F7/70633 , G03F9/7076 , G03F9/708 , H01L23/544 , H01L2223/54453 , H01L2924/0002 , H01L2924/00
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus and method capable of removing, or relaxing increase of overlay errors of patterns. SOLUTION: The lithographic method for providing an alignment mark onto a layer provided on a substrate is disclosed. The method includes providing the alignment mark to a region aligned within a specific angle range to a surface of the substrate having the layer provided thereon. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供能够去除或放松图案重叠误差增加的光刻设备和方法。解决方案：公开了在设置在基板上的层上提供对准标记的光刻方法。该方法包括将对准标记提供到具有在其上设置有层的基板的表面的特定角度范围内的区域。版权所有（C）2009，JPO＆INPIT

2. 发明专利

JP2007129218A Lithographic apparatus and device manufacturing method 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：JP2007129218A
公开(公告)日：2007-05-24
申请号：JP2006291660
申请日：2006-10-26
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： ONVLEE JOHANNES , BIJVOET DIRK-JAN
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70775 , G03F7/70516 , G03F7/70716 , G03F9/7011
摘要： PROBLEM TO BE SOLVED: To correct position errors caused by slip between a reticle and a reticle stage. SOLUTION: A lithographic apparatus has a patterning support holding a patterning device. At least one position sensor measures the position of the patterning device relative to the patterning support, and generates a measuring signal. A positioning device controls the position of the patterning support on the basis of the measuring signal input into the positioning device. In a corresponding device manufacturing method, a patterning support is provided. A patterning device is held on the patterning support. The patterning support is moved along a line of movement. The position of the patterning device is measured relative to the patterning support, and the position of the patterning support is controlled on the basis of the measurement of the position of the patterning device relative to the patterning support. Thus, the position of the patterning support is controlled to compensate for slip of the patterning device relative to the patterning support. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：校正由于光罩和标线片台之间的滑动引起的位置误差。解决方案：光刻设备具有保持图案形成装置的图形化支撑件。至少一个位置传感器测量图案形成装置相对于图案形成支撑件的位置，并产生测量信号。定位装置基于输入到定位装置的测量信号来控制图案形成支撑件的位置。在相应的器件制造方法中，提供了图案形成支撑件。图案形成装置被保持在图案形成支撑件上。图形支撑沿着移动线移动。图案形成装置的位置相对于图案形成支撑件测量，并且基于图案形成装置相对于图案形成支撑件的位置的测量来控制图案形成支撑件的位置。因此，图案化支撑件的位置被控制以补偿图案形成装置相对于图案形成支撑件的滑动。版权所有（C）2007，JPO＆INPIT

3. 发明专利

JP2010153867A Lithographic apparatus and method of manufacturing device 审中-公开
标题翻译：光刻设备及其制造方法
公开(公告)号：JP2010153867A
公开(公告)日：2010-07-08
申请号：JP2009290308
申请日：2009-12-22
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： ONVLEE JOHANNES , KUIT JAN JAAP , KOS JOOST
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03B27/54 , G03F9/7065 , G03F9/7088
摘要： PROBLEM TO BE SOLVED: To alleviate the problem caused by the fact that a lighting source has to supply a beam having a large area for illuminating an alignment marker. SOLUTION: The lithographic apparatus includes a support section for supporting a patterning device for forming a radiation beam with a pattern, by giving a pattern to the section of the radiation beam and a substrate table for holding a substrate. The projection system projects the radiation beam with a pattern to the target part of the substrate. The patterning device includes one or a plurality of alignment patterns, and the lithographic apparatus includes a sub-lighting system for lighting each of the alignment patterns by another radiation using the radiation beam. The projection system projects an image of the respective alignment patterns to the substrate table. The substrate table includes one or a plurality of sensors for detecting the projected image of the alignment pattern. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了减轻由于照明源必须提供具有用于照射对准标记的大面积的光束的事实而引起的问题。解决方案：光刻设备包括支撑部分，用于通过向辐射束的部分提供图案和用于保持基板的基板台支撑用于形成具有图案的辐射束的图案形成装置。投影系统将辐射束以图案投射到基板的目标部分。图案形成装置包括一个或多个对准图案，并且光刻设备包括用于通过使用辐射束的另一个辐射来照亮每个对准图案的子照明系统。投影系统将各个对准图案的图像投影到基板台。衬底台包括用于检测对准图案的投影图像的一个或多个传感器。版权所有（C）2010，JPO＆INPIT

4. 发明专利

JP2009044131A Integrated post-exposure bake track 有权
标题翻译：综合后曝光保险丝
公开(公告)号：JP2009044131A
公开(公告)日：2009-02-26
申请号：JP2008148196
申请日：2008-06-05
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： AUER-JONGEPIER SUZAN LEONIE , ONVLEE JOHANNES , BARTRAY PETRUS R , LUTTIKHUIS BERNARDUS ANTONIUS , PLUG REINDER TEUN , SEGERS HUBERT MARIE
IPC分类号： H01L21/027
CPC分类号： H01L21/67178 , H01L21/67109
摘要： PROBLEM TO BE SOLVED: To disclose system and method for processing wafers, a combined post-exposure bake and chill unit, and an interface.
SOLUTION: An exemplary system includes a lithography tool 12, a local track 14, a transfer device 20, a transfer device handler 21, an interface unit 16, and a controller to schedule processing. An exemplary combined post-exposure bake and chill unit includes an enclosure having an opening in its side, and a bake unit and a chill unit in the enclosure. An exemplary interface includes a plurality of enclosures arranged around robots that transfer wafers among the enclosures, one of the plurality of enclosures being an integrated bake and chill unit.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：公开处理晶片的系统和方法，组合曝光后烘烤和冷却单元以及接口。解决方案：示例性系统包括光刻工具12，本地轨道14，传送装置20，传送装置处理器21，接口单元16和调度处理的控制器。一个示例性组合曝光后烘烤和冷却单元包括在其侧面具有开口的外壳，以及外壳中的烘烤单元和冷却单元。示例性界面包括围绕机器人布置的多个外壳，其在所述外壳之间传送晶片，所述多个外壳中的一个是整体烘烤和冷却单元。版权所有（C）2009，JPO＆INPIT

5. 发明专利

JP2009016870A Particle detection device, lithographic apparatus, and device manufacturing method 有权
标题翻译：颗粒检测装置，光刻装置和装置制造方法
公开(公告)号：JP2009016870A
公开(公告)日：2009-01-22
申请号：JP2008257384
申请日：2008-10-02
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： ONVLEE JOHANNES , GREVE PETER FERDINAND , FRANSSEN JOHANNES HENDRIKUS GE , VISSER RAYMOND , VERHAGEN ERWIN THEODORUS JACOB
IPC分类号： H01L21/027 , G01N21/956
CPC分类号： G03F7/70916 , G01N21/94 , G01N21/956 , G03F7/7085
摘要： PROBLEM TO BE SOLVED: To provide a detector system for resolving radiation from a ghost particle from radiation from an actual particle for discriminating between a particle and a ghost particle. SOLUTION: The detector system outputs a plurality of detector signals corresponding to intensities of radiation being incident on a part of the detector system or the detector system outputs detector signals corresponding to intensities of radiation incident on the detector system. In the plurality of detector signals, radiation received from a ghost particle does not have levels higher than a prescribed threshold level respectively and, when radiation is received from a particle, an approximately same level above the threshold level is displayed. The detector system includes a radiation detector device for generating a first detector signal in response to radiation incident on a prescribed part and a radiation blocking assembly for preventing radiation not originating from a particle from being incident on the prescribed part of the detector device. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于从用于鉴别颗粒和重影颗粒的实际颗粒的辐射中分离来自重影颗粒的辐射的检测器系统。解决方案：检测器系统输出对应于入射在检测器系统的一部分上的辐射强度的多个检测器信号，或者检测器系统输出对应于入射在检测器系统上的辐射强度的检测器信号。在多个检测器信号中，从重影粒子接收的辐射分别不具有高于规定阈值的电平，并且当从粒子接收到辐射时，显示出高于阈值电平的大致相同的电平。检测器系统包括用于响应于入射在规定部分上的辐射而产生第一检测器信号的辐射检测器装置和用于防止不是源自粒子的辐射入射到检测器装置的规定部分上的辐射阻挡组件。版权所有（C）2009，JPO＆INPIT

6. 发明专利

JP2008131041A Lithographic equipment and method for manufacturing device 有权
标题翻译：光刻设备和制造设备的方法
公开(公告)号：JP2008131041A
公开(公告)日：2008-06-05
申请号：JP2007291422
申请日：2007-11-09
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： ONVLEE JOHANNES , BIJVOET DIRK-JAN
IPC分类号： H01L21/027 , G03F7/20 , H01L21/683
CPC分类号： G03F7/707
摘要： PROBLEM TO BE SOLVED: To prevent a patterning device from sliding to a support. SOLUTION: A lithographic equipment includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. An applicator, such as a humidifier is provided to provide molecules, such as water molecules, to clamp area of the patterning device. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了防止图案形成装置滑动到支撑件。解决方案：光刻设备包括被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 构造成保持基板的基板台; 以及投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上。提供诸如加湿器的施加器以提供诸如水分子的分子来夹持图案形成装置的区域。版权所有（C）2008，JPO＆INPIT

7. 发明专利

JP2010045356A Lithographic apparatus and method 有权
标题翻译： LITHOGRAPHIC设备和方法
公开(公告)号：JP2010045356A
公开(公告)日：2010-02-25
申请号：JP2009183971
申请日：2009-08-07
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： ONVLEE JOHANNES , MARCEL MATHIJS THEODORE MARIE DIERICHS
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70391 , G03F7/70116
摘要： PROBLEM TO BE SOLVED: To control radiation features by a lithographic method and system. SOLUTION: A radiation beam from radiation received from a radiation source is provided by using a lighting system. The radiation source includes an array of elements which are individually controllable, and the individually controllable elements can emit radiation. A support structure supports a patterning device. The patterning device provides a pattern to the radiation beam. A substrate table holds a substrate. A projection system projects the radiation beam with a pattern to a target of the substrate. A radiation peak intensity detection device detects a peak of the intensity of one or a plurality of emission spectrums out of the individually controllable elements of the radiation source. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：通过光刻方法和系统来控制辐射特征。解决方案：通过使用照明系统提供从辐射源接收的辐射的辐射束。辐射源包括单独可控的元件阵列，并且单独的可控元件可以发射辐射。支撑结构支撑图案形成装置。图案形成装置向辐射束提供图案。衬底台保持衬底。投影系统将具有图案的辐射束投影到基板的目标。辐射峰值强度检测装置从辐射源的独立可控元件中检测一个或多个发射光谱的强度的峰值。版权所有（C）2010，JPO＆INPIT

8. 发明专利

JP2008098635A Lithographic equipment, combination of lithographic equipment and processing module, and device manufacturing method 审中-公开
标题翻译：光刻设备，光刻设备和处理模块的组合以及器件制造方法
公开(公告)号：JP2008098635A
公开(公告)日：2008-04-24
申请号：JP2007261442
申请日：2007-10-05
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： ONVLEE JOHANNES , PLUG REINDER TEUN , SEGERS HUBERT MARIE , OCKWELL DAVID CHRISTOPHER , VAN WIJNEN PAUL JACQUES , AUER-JONGEPIER SUZAN LEONIE , LOOPSTRA ERIK R
IPC分类号： H01L21/027
CPC分类号： H01L21/67745 , G03F7/70991 , H01L21/67225
摘要： PROBLEM TO BE SOLVED: To realize high efficiency of a substrate processing facility, while maintaining optimum performance regarding parameters, such as critical dimensions and overlays. SOLUTION: Lithographic equipment which transfers a pattern from a patterning device to a substrate comprises an integrated after-exposure baking device which is so constituted as to expose the substrate to a set temperature cycle. An after exposure baking process (temperature cycle) for a substrate is implemented within prescribed hours after pattern transfer. The lithographic equipment can be combined with a processing system, having one or more processing modules. By means of this combination, more efficient use becomes possible, and degree of response for a device manufacturing method can be secured. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了实现基板处理设备的高效率，同时保持关于诸如关键尺寸和重叠的参数的最佳性能。解决方案：将图案从图案形成装置传送到基板的平版印刷设备包括集成的曝光后烘烤装置，其被构造成使基板暴露于设定温度循环。在图案转印后的规定时间内进行基板的曝光后烘烤处理（温度循环）。光刻设备可以与具有一个或多个处理模块的处理系统组合。通过这种组合，可以更有效地使用，并且可以确保装置制造方法的响应程度。版权所有（C）2008，JPO＆INPIT

9. 发明专利

JP2007333729A Inspection method and device using it 有权
标题翻译：检查方法和使用它的设备
公开(公告)号：JP2007333729A
公开(公告)日：2007-12-27
申请号：JP2007113702
申请日：2007-04-24
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： BLEEKER ARNO J , BANINE VADIM YEVGENYEVICH , ONVLEE JOHANNES , VAN DER DONCK JACQUES COR JOHA , ODERWALD MICHIEL P
IPC分类号： G01N21/956 , G03F1/08 , G03F7/20 , H01L21/027
CPC分类号： G01N21/9501 , G01N21/4738 , G01N21/94 , G01N21/956 , G03F1/84 , G03F1/86
摘要： PROBLEM TO BE SOLVED: To provide a method and a device for inspecting contaminants on an object having a patterned structure. SOLUTION: The device includes a radiation system for directing a radiation beam to the object. The object is so configured as to scatter the beam. The device also includes an optical system so arranged as to receive scattered radiation from the object and a filter provided in the optical system. The filter is associated with the patterned structure so as to filter out radiation from the scattered radiation. The device also includes a detector so arranged as to detect a fraction of radiation that is transmitted by the filter. Accordingly, contaminants can be detected quickly and accurately. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于检查具有图案结构的物体上的污染物的方法和装置。解决方案：该装置包括用于将辐射束引导到物体的辐射系统。该物体被配置成散射光束。该装置还包括一个光学系统，其被布置成接收来自物体的散射辐射和设置在光学系统中的滤光器。滤波器与图案化结构相关联，以便滤出散射辐射的辐射。该装置还包括检测器，其被布置成检测由滤波器传输的辐射的一部分。因此，可以快速准确地检测污染物。版权所有（C）2008，JPO＆INPIT

10. 发明专利

JP2010067964A Lithography device and positioning method 有权
标题翻译：算术装置和定位方法
公开(公告)号：JP2010067964A
公开(公告)日：2010-03-25
申请号：JP2009201431
申请日：2009-09-01
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： VOZNYI OLEG VIACHESLAVOVICH , ONVLEE JOHANNES , BERGE PETER TEN
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03B27/42 , G03F9/7096
摘要： PROBLEM TO BE SOLVED: To improve the positioning and overlay of a pattern applied to a substrate by preventing a distortion in the pattern due to a thermal distortion generated in the substrate when the substrate is partially subjected to positioning and light exposure before the substrate is thermally stabilized.
SOLUTION: A positioning method includes a step of executing part of a positioning procedure on a part of a substrate or on a part of a patterning device by using part of a positioning mechanism in a lithography device until the substrate or part of a lithography device or a part in the lithography device is thermally stabilized within a certain limit.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了通过防止当基板在基板之前部分地经受定位和曝光之前由于基板中产生的热变形而导致图案中的变形，从而改善施加到基板的图案的定位和覆盖基板是热稳定的。解决方案：一种定位方法包括通过使用光刻设备中的定位机构的一部分来执行位于基板的一部分或图案形成装置的一部分上的定位过程的一部分的步骤，直到基板或部分光刻设备或光刻设备中的部件在一定限度内热稳定。版权所有（C）2010，JPO＆INPIT

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