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    • 1. 发明专利
    • Production of diamond thin film
    • 生产金刚石薄膜
    • JPS60195094A
    • 1985-10-03
    • JP4825184
    • 1984-03-15
    • Agency Of Ind Science & TechnolToshiba Tungaloy Co Ltd
    • SATOU MAMORUSADAHIRO TAKESHI
    • C01B31/06C30B23/02C30B29/04
    • C30B23/02C30B29/04
    • PURPOSE:To form a diamond thin film having excellent adhesivity to the substrate and high density and hardness, by evaporating carbon from a carbon- containing evaporation source to a substrate, and irradiating the substrate with accelerated ion seed simultaneously or alternately to the evaporation. CONSTITUTION:A substrate 7 made of ceramics, carbide alloy, thermet, various metals and alloys, etc. is attached to a holder 8 and placed in a reaction chamber 5 connected with a vacuum pump 6. An evaporation source such as amorphous carbon, graphite, diamond, etc. is heated with an evaporation apparatus 10 using an electron beam, etc. to evaporate the carbon to said substrate 7. On the other hand, N2 etc. is supplied through a leak valve 1, ionized to N ion by the ion source 2, passed through the accelerator 3, the analyzing magnet 4, and the ion accumulation lens 9, and radiated to the evaporation layer simultaneously or alternately to the evaporation process. A diamond carbon and/or a diamond thin film is formed on the substrate by this process. A thin film having the highest characteristics can be produced when the ratio of th atomic number of the evaporated atom to the charge number of the ion is 0.1-5 and the acceleration energy of the ion is 6-60keV per atom.
    • 目的:通过将碳从含碳蒸发源蒸发到基底,并且将加速离子种子同时或交替地照射到基底上,形成具有优异的与基材的粘附性和高密度和硬度的金刚石薄膜。 构成:由陶瓷,碳化物合金,热电偶,各种金属和合金等制成的基板7附着在保持架8上,放置在与真空泵6连接的反应室5内。蒸发源如无定形碳,石墨 ,金刚石等用蒸发装置10加热,使用电子束等将碳蒸发到所述基板7.另一方面,N2等通过泄漏阀1供给,电离成N + 离子源2通过加速器3,分析磁体4和离子聚积透镜9,同时或交替地向蒸发层辐射到蒸发过程。 通过该方法在基板上形成金刚石碳和/或金刚石薄膜。 当蒸发原子的原子数与离子的电荷数之比为0.1-5,离子的加速能为6-60keV /原子时,可以产生具有最高特性的薄膜。
    • 2. 发明专利
    • Formation of hard film
    • 形成硬膜
    • JPS60194067A
    • 1985-10-02
    • JP4926884
    • 1984-03-16
    • Agency Of Ind Science & TechnolShowa Denko KkToshiba Tungaloy Co Ltd
    • MINETA NOBUSHIGEYASUNAGA NOBUOTARUMI NOBORUOBARA AKIRAIKEDA MASAYUKISATOU JIYUNICHISADAHIRO TAKESHI
    • C23C14/24C23C14/28
    • C23C14/28
    • PURPOSE:To form easily various kinds of hard films on a substrate by using a laser vapor deposition installation by using graphite, carbon, metal, alloy, metallic compd., ceramics, etc. for forming a rotating body on which convergent laser light is irradiated. CONSTITUTION:Convergent laser light is irradiated on a rotating body under rotation in a vessel and the particles evaporating from the rotating body are deposited on a substrate, thereby forming a hard film thereon. The rotating body is made of a mixture composed of >=2 different materials selected from graphite, carbon, metal, alloy, metallic compd. and ceramics. The construction thereof is columnar, cylindrical body, conical body, disk body, and ring body. If such rotating body is formed of a powder mixture composed of, for example, metallic titanium and carbon, the hard film of titanium carbide can be formed on the substrate. The dense, strong and hard film is formed on the substrate with good adhesion at a high deposition rate by the above-mentioned method.
    • 目的:通过使用激光蒸镀装置,通过使用石墨,碳,金属,合金,金属组合物,陶瓷等在基板上容易地形成各种硬膜,形成会聚激光的旋转体 。 构成:在容器内转动的会聚激光照射在旋转体上,从旋转体蒸发的粒子沉积在基板上,由此在其上形成硬膜。 旋转体由选自石墨,碳,金属,合金,金属组合物的≥2种不同材料组成的混合物制成。 和陶瓷。 其结构为圆柱体,圆柱体,圆锥体,圆盘体和环体。 如果这样的旋转体由例如金属钛和碳构成的粉末混合物形成,则可以在基板上形成碳化钛的硬膜。 通过上述方法,以高沉积速率在基材上形成具有良好粘合性的致密,强硬和硬膜。
    • 3. 发明专利
    • Film forming method
    • 电影制作方法
    • JPS6196721A
    • 1986-05-15
    • JP21638884
    • 1984-10-17
    • Agency Of Ind Science & TechnolToshiba Tungaloy Co Ltd
    • SATO MAMORUSADAHIRO TAKESHI
    • C23C14/22H01L21/203
    • H01L21/02631
    • PURPOSE:To form a hard film having strong adhesive force with the surface of a substrate at a high deposition speed by a method wherein an ion plating method and an ion mixing method are conjointly used. CONSTITUTION:A film forming substance is coated on the surface of a substrate using an ion plating method, and non-metallic ions are implanted simultaneously or alternately on the above-mentioned film. To be more precise, when non-metallic ions are made to irradiate on the surface of the film while the formation of said film on the substrate surface is started using an ion-plating method and the film is grown in the range of thickness with which the effect of ion mixing can be obtained, the adhesive strength between the substrate and the film is strengthened and the film is firmly adhered to the substrate. Subsequently, when the desired film forming substance is deposited on the film by performing an ion plating method, the desired film can be formed on said film at a high deposition speed.
    • 目的:通过结合使用离子镀法和离子混合法的方法,以高沉积速度形成具有与基板表面的强粘合力的硬膜。 构成:使用离子镀法将成膜物质涂布在基板的表面上,并将非金属离子同时或交替地注入到上述膜上。 更准确地说,当使用离子镀法开始在衬底表面上形成所述膜时使非金属离子照射在膜的表面上,并且该膜在厚度范围内生长 可以获得离子混合的效果,增强基材和膜之间的粘合强度,并且将膜牢固地粘合到基材上。 随后,当通过进行离子镀法将期望的成膜物质沉积在膜上时,可以以高沉积速度在所述膜上形成所需的膜。
    • 8. 发明专利
    • High hardness sintered body
    • 高硬度烧结体
    • JPS6191344A
    • 1986-05-09
    • JP21316884
    • 1984-10-11
    • Toshiba Tungaloy Co Ltd
    • SADAHIRO TAKESHI
    • C22C26/00C22C29/02C22C29/12C22C29/14C22C29/16C22C32/00
    • PURPOSE: To provide a sintered body for a tool or the like having superior hardness, wear resistance and toughness by combining a binding phase of a metal, an alloy or a metallic compound with a specified volume percentage of a hard phase of polycrystalline diamond or cubic boron nitride.
      CONSTITUTION: This sintered body consists of 20W70vol% continuous hard phase of polycrystalline diamond and/or cubic boron nitride and a binding phase of one or more kinds of components selected among metals, alloys and metallic compounds. Powder or granules of one or more kinds of components for the binding phase are coated with layers of diamond and/or cubic boron nitride by plasma chemical vapor deposition, and the resulting composite powder or granules are sintered to obtain the sintered body. Since the hard phase in the sintered body is continuous and envelops the binding phase as the core material, the hardness of the sintered body is high as a whole, and at the same time, the toughness of the core material is effectively developed.
      COPYRIGHT: (C)1986,JPO&Japio
    • 目的:通过将金属,合金或金属化合物的结合相与特定体积百分比的多晶金刚石或立方体的硬相结合来提供具有优异的硬度,耐磨性和韧性的工具等的烧结体 氮化硼。 构成:该烧结体由多晶金刚石和/或立方氮化硼的20-70vol%连续硬相和一种或多种选自金属,合金和金属化合物的组分的结合相组成。 通过等离子体化学气相沉积用金刚石和/或立方氮化硼层涂覆粘合相的一种或多种组分的粉末或颗粒,并将所得的复合粉末或颗粒烧结以获得烧结体。 由于烧结体中的硬相是连续的并且包裹作为芯材的结合相,烧结体的硬度整体高,同时芯材的韧性得到有效发展。