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1. 发明专利

JPH0249231A PRODUCTION OF GLASS SUBSTRATE FOR OPTICAL MEMORY DISK 失效
公开(公告)号：JPH0249231A
公开(公告)日：1990-02-19
申请号：JP13430688
申请日：1988-06-02
申请人： ASAHI GLASS CO LTD
发明人： ARISHIMA HIROSHI , HATANO TAKASHI
IPC分类号： G11B7/26
摘要： PURPOSE:To improve accuracy and productivity by applying a silane coupling agent on the glass substrate, applying a photoresist to a specific thickness thereon, forming patterns of guide grooves for tracking/prebits and etching the glass substrate by an aq. acidic soln. with the patterns as a mask. CONSTITUTION:The photoresist 2 is coated to 1.0mum thickness on the glass substrate 1 coated with the silane coupling agent and the patterns of the guides for tracking and/or prebits are exposed and developed. The glass substrate 1 is etched by the aq. acidic soln. contg. hydrofluoric acid with the photoresist patterns as a mask 3, by which the substrate having the guide grooves and/or prebits is obtd. The sufficient etching rate is obtd. in this way and the productivity is improved.

2. 发明专利

JPH01279436A GLASS SUBSTRATE FOR OPTICAL MEMORY ELEMENT, OPTICAL MEMORY ELEMENT, AND RECORDING AND REPRODUCING SYSTEM FOR OPTICAL MEMORY ELEMENT 失效
公开(公告)号：JPH01279436A
公开(公告)日：1989-11-09
申请号：JP10915188
申请日：1988-05-06
申请人： ASAHI GLASS CO LTD
发明人： HATANO TAKASHI , SHIMIZU TOMOYUKI , ARISHIMA HIROSHI
IPC分类号： G11B7/24 , G11B11/10 , G11B11/105
摘要： PURPOSE:To obtain an excellent pre-pit reproducing signal by forming a pit string on a major plane of a transparent glass substrate and specifying the width and the depth of pits. CONSTITUTION:The pit string comprising a wobbled pit 2, a clock pit 3 and a pre-format pit 4 is formed on the major plane of the transparent glass base 1. The pit string is formed so that the width of pits is within a range of 0.4-0.7mum and the depth is within a range of 70-0.200nm. When the width of pits is less than 0.4mum, the address information might sometimes be difficult to be read and if the width of pits is in excess of 0.7mum, the reading of pit location is inaccurate. If the pit depth is less than 70nm or exceeds 200nm, the signal level is decreased to cause inaccurate reading of the address information.

3. 发明专利

JPS6476441A PRODUCTION OF GLASS SUBSTRATE FOR OPTICAL MEMORY DISK 失效
公开(公告)号：JPS6476441A
公开(公告)日：1989-03-22
申请号：JP23235987
申请日：1987-09-18
申请人： ASAHI GLASS CO LTD
发明人： ARISHIMA HIROSHI , HATANO TAKASHI , SHIMIZU TOMOYUKI
IPC分类号： G11B7/26
摘要： PURPOSE:To improve the accuracy of a titled substrate by specifying the thickness of a resist film, the material quality of a light shielding film and the atmosphere for etching. CONSTITUTION:The positive type photoresist film 2 is formed on the glass substrate 1 and is prebaked. A photomask 3 formed with the light shielding film 5 which is formed with patterns of desired guide grooves and/or prepits is brought into tight contact with the glass substrate 4 for photomask and UV rays are projected thereto. This resist film is then developed. The titled substrate is produced by subjecting this substrate to dry etching in succession thereto. The thickness of the film 2 is specified to 1000-5000Angstrom and a chromium film contg. nitrogen is used for the film 5. The dry etching is preferably executed in the atmosphere of CCl2F2, CHCl3 or CCl4, etc.

4. 发明专利

JPH04269647A GLASS SURFACE INSPECTION METHOD 失效
公开(公告)号：JPH04269647A
公开(公告)日：1992-09-25
申请号：JP5335791
申请日：1991-02-25
申请人： ASAHI GLASS CO LTD
发明人： HATANO TAKASHI , YAMAUCHI HIDEO , MATSUI ATSUSHI
IPC分类号： G01B21/30 , G01N21/88 , G01N21/958
摘要： PURPOSE:To highly reliably detect a part on which a laser beam is projected and irregularities are not formed without any dependence on the ability of a worker by comparing a scattered light quantity at that part with that at other part. CONSTITUTION:A laser beam is projected on a glass surface having a part B on which irregularities are not formed in a part A on which micro irregularities are formed. When reflected and scattered light from a glass surface is detected at this time, the laser light projected on the part B is almost transmitted through the glass and the scattered light output thereof is low, but the scattered light output at the part A is high. Accordingly, its comparison can be comparison by the use of a device without any dependence on visual observation and thereby time reduction, reliability improvement and cost reduction of the inspection can be achieved.

5. 发明专利

JPS6464146A PHOTOMASK FOR PRODUCTION OF OPTICAL MEMORY ELEMENT 失效
公开(公告)号：JPS6464146A
公开(公告)日：1989-03-10
申请号：JP22038387
申请日：1987-09-04
申请人： ASAHI GLASS CO LTD
发明人： HATANO TAKASHI , ARISHIMA HIROSHI , SHIMIZU TOMOYUKI
IPC分类号： G03F1/00 , G11B7/24 , G11B7/26
摘要： PURPOSE:To obtain a mask which is good in position accuracy and registration speed and has excellent durability by previously dropping out guide grooves, addresses and mark parts for registration in the mask at the time of etching the thin film of a metal compd. provided for forming optical memory elements to form element regions while covering the film with the photomask. CONSTITUTION:A transparent glass substrate is subjected to a sufficient cleaning treatment and thereafter, a chromium nitride film having excellent acid resistance is deposited by sputtering, etc., on this surface and a positive type photoresist is coated thereon and is dried. The guide grooves, addresses and prepit parts indicating information necessary for the optical memory elements are previously removed and dropped out by using a developing machine. The photomask formed in such a manner is then imposed on the transparent glass substrate on which the thin film of the metal compd. is deposited. The similar drop-out parts are generated in the thin film as well by executing etching, by which the desired memory elements consisting of the thin film are obtd. The exact position accuracy is thus assured and the mask is not damaged even after repeated uses. This photomask is thus adequate for mass production of the elements.

6. 发明专利

JPS6437432A FORMATION OF ASPERITIES ON GLASS SURFACE 失效
公开(公告)号：JPS6437432A
公开(公告)日：1989-02-08
申请号：JP19372987
申请日：1987-08-04
申请人： ASAHI GLASS CO LTD
发明人： HATANO TAKASHI , ARISHIMA HIROSHI
IPC分类号： C03C15/00 , G11B7/26
摘要： PURPOSE:To form uniform etched glass surface in high etching rate, by etching the metal components containing in the glass substrate using a chlorine-contg. gas through the reactive ion etching process. CONSTITUTION:A glass surface is etched through the reactive ion etching process, using at least one kind of chlorine-contg. etching gas selected from CCl2F2, CHClF2, CCl4 and CFCl3 to form asperities on the glass surface.

7. 发明专利

JPS63209769A METHOD AND DEVICE FOR SPINNER COATING 失效
公开(公告)号：JPS63209769A
公开(公告)日：1988-08-31
申请号：JP4144487
申请日：1987-02-26
申请人： ASAHI GLASS CO LTD
发明人： HATANO TAKASHI , ARISHIMA HIROSHI
IPC分类号： B05C11/08 , B05D1/40 , G03F7/16 , H01L21/027
摘要： PURPOSE:To form a uniform coated film by placing a circular substrate having a round hole at the center on a spinner, rotating the substrate at low speed, dripping a coating soln. onto the substrate surface in the vicinity of the round hole while sending air from the round hole toward the outer periphery, and then rotating the substrate at a high speed. CONSTITUTION:The circular substrate 2 having a round hole 3 at the center is placed on the spinner 1, and rotated at a low speed. The coating soln. is then dripped from a nozzle 7 onto the substrate surface in the vicinity of the round hole 3 while sending air in the horizontal direction from the round hole 3 toward the outer periphery by an air blowing mechanism 4 consisting of a blowing impeller 6, then the substrate 2 is rotated at a high speed, and the coating soln. is centrifugally coated on the substrate surface. As a result, the infiltration of the coating soln. onto the rear of the circular substrate through the round hole is prevented, and even and uniform coated film can be formed.

8. 发明专利

JPS62187143A METHOD FOR PROCESSING GLASS 失效
公开(公告)号：JPS62187143A
公开(公告)日：1987-08-15
申请号：JP2781886
申请日：1986-02-13
申请人： ASAHI GLASS CO LTD
发明人： HATANO TAKASHI , ISEDA TORU
IPC分类号： C03C15/00 , G11B7/26 , G11B11/10 , G11B11/105
摘要： PURPOSE:To form a pattern having high dimensional precision on the glass surface with high productivity by forming a two-dimensional pattern on a photosensitive film provided on the glass surface, removing the photosensitive film on the pattern part, and then etching the film. CONSTITUTION:One or plural two-dimensional patterns are compositely formed on the photosensitive film provided on the glass surface, and exposed by a photomagnetic method to form the desired two-dimensional pattern. As the photomagnetic method, a photomask is arranged by a contact or proximity method, and UV light or Deep UV light is irradiated. An amorphous chalcogenide vapor-deposited film having 0.01-0.3mum thickness is appropriately used as the photosensitive film. Subsequently, when the photosensitive film is of positive type, the pattern forming part is removed by etching, etc., or the non-photosensitized part is removed when the film is of negative type. Then the obtained exposed part of glass is etched by RIE, plasma etching, etc. Consequently, a pattern of micron order or below is formed on the glass surface.

9. 发明专利

JPS61240243A PHOTOMASK BLANK AND PHOTOMASK 失效
公开(公告)号：JPS61240243A
公开(公告)日：1986-10-25
申请号：JP8126985
申请日：1985-04-18
申请人： ASAHI GLASS CO LTD
发明人： SHINKAI NORIHIKO , HARANO TAKESHI , KANAZAWA SUMIYOSHI , HATANO TAKASHI
IPC分类号： G03F1/00 , G03F1/50 , G03F1/54 , H01L21/027
摘要： PURPOSE:To obtain sufficient acid resistance without deterioration of light interruption performance as a photomask by incorporating an N component in a thin Cr film formed on a transparent base in an amt. of 25-50atom% to form a photomask blank. CONSTITUTION:The Cr light interruption film contg. N is formed by the sputtering process using a target prepared by sintering a powder mixture of metallic Cr and Cr nitride, or by the reactive sputtering process using a metallic Cr and a gas mixture of N2 and Ar, and N is incorporated in an amt. of 25-50atom% in the Cr film 2, and this N content can be adjusted by changing the N proportion of the target or the gas mixture. The film 2 of the photomask bland 6 is coated with a photosensitive photoresist, and this photoresist layer is exposed to a light in a prescribed pattern with an exposure device, and developed, and the disclosed Cr film is etched to obtain a desired pattern.

10. 发明专利

JPH0231323A MEMORY DISK FOR MAGNETIC RECORDING 失效
公开(公告)号：JPH0231323A
公开(公告)日：1990-02-01
申请号：JP17913388
申请日：1988-07-20
申请人： ASAHI GLASS CO LTD
发明人： HATANO TAKASHI , YAMAUCHI HIDEO , ISEDA TORU
IPC分类号： G11B5/82 , G11B5/73
摘要： PURPOSE:To prevent crosstalks and to allow the formation of tracks to a smaller pitch by providing recesses or projecting parts having the pitch, width and depth of specific ranges spirally or concentrically to the surface of a substrate. CONSTITUTION:The pitch of the recesses 2 or projecting parts on the substrate 1 is specified to 1-100mum, more preferably 1-20mum. The width of the recesses 2 or the projecting parts is specified to 0.2-50mum, more preferably 0.2-10mum. The depth thereof is specified to 0.01-10mum, more preferably 0.02-2.0mum. While a well shape, inverted trapezoidal shape, tray shape, etc., can be adopted for the inclination from the recesses 2 toward the projecting parts, the magnetic crosstalks from the adjacent tracks are prevented by making use of the fact that the magnetic field intensity in the recesses 2 is different from the magnetic intensity in the projecting parts. The track pitch is reduced to a min. 1mum in this way without being affected by the crosstalks.

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