专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JPH05150102A PRODUCTION OF MICROLENS ARRAY 失效
公开(公告)号：JPH05150102A
公开(公告)日：1993-06-18
申请号：JP33998191
申请日：1991-11-29
申请人： ASAHI GLASS CO LTD
发明人： ISEDA TORU , SHIMIZU TOMOYUKI , TAMAMURA AKIRA
IPC分类号： G02B3/00
摘要： PURPOSE:To obtain the microlens array having an aperture diameter sufficiently larger than an inter-lens spacing and having a small aberration. CONSTITUTION:The fine apertures of a circular shape of the same number as the number of the lenses to be formed on the mask layer formed on a flat plate surface are provided on the mask layer in correspondence to the positions of the lenses to be produced. The flat plate surface is partially chemically etched through the apertures and thereafter, the mask layer is removed. Further, the flat plate surface is chemically etched, by which a matrix is produced. A metallic mold for forming the microlens array is obtd. from the matrix.

2. 发明专利

JPH01279436A GLASS SUBSTRATE FOR OPTICAL MEMORY ELEMENT, OPTICAL MEMORY ELEMENT, AND RECORDING AND REPRODUCING SYSTEM FOR OPTICAL MEMORY ELEMENT 失效
公开(公告)号：JPH01279436A
公开(公告)日：1989-11-09
申请号：JP10915188
申请日：1988-05-06
申请人： ASAHI GLASS CO LTD
发明人： HATANO TAKASHI , SHIMIZU TOMOYUKI , ARISHIMA HIROSHI
IPC分类号： G11B7/24 , G11B11/10 , G11B11/105
摘要： PURPOSE:To obtain an excellent pre-pit reproducing signal by forming a pit string on a major plane of a transparent glass substrate and specifying the width and the depth of pits. CONSTITUTION:The pit string comprising a wobbled pit 2, a clock pit 3 and a pre-format pit 4 is formed on the major plane of the transparent glass base 1. The pit string is formed so that the width of pits is within a range of 0.4-0.7mum and the depth is within a range of 70-0.200nm. When the width of pits is less than 0.4mum, the address information might sometimes be difficult to be read and if the width of pits is in excess of 0.7mum, the reading of pit location is inaccurate. If the pit depth is less than 70nm or exceeds 200nm, the signal level is decreased to cause inaccurate reading of the address information.

3. 发明专利

JPS6476441A PRODUCTION OF GLASS SUBSTRATE FOR OPTICAL MEMORY DISK 失效
公开(公告)号：JPS6476441A
公开(公告)日：1989-03-22
申请号：JP23235987
申请日：1987-09-18
申请人： ASAHI GLASS CO LTD
发明人： ARISHIMA HIROSHI , HATANO TAKASHI , SHIMIZU TOMOYUKI
IPC分类号： G11B7/26
摘要： PURPOSE:To improve the accuracy of a titled substrate by specifying the thickness of a resist film, the material quality of a light shielding film and the atmosphere for etching. CONSTITUTION:The positive type photoresist film 2 is formed on the glass substrate 1 and is prebaked. A photomask 3 formed with the light shielding film 5 which is formed with patterns of desired guide grooves and/or prepits is brought into tight contact with the glass substrate 4 for photomask and UV rays are projected thereto. This resist film is then developed. The titled substrate is produced by subjecting this substrate to dry etching in succession thereto. The thickness of the film 2 is specified to 1000-5000Angstrom and a chromium film contg. nitrogen is used for the film 5. The dry etching is preferably executed in the atmosphere of CCl2F2, CHCl3 or CCl4, etc.

4. 发明专利

JPH05150103A PRODUCTION OF ASPHERICAL MICROLENS ARRAY 失效
公开(公告)号：JPH05150103A
公开(公告)日：1993-06-18
申请号：JP33998691
申请日：1991-11-29
申请人： ASAHI GLASS CO LTD
发明人： SHIMIZU TOMOYUKI , ISEDA TORU , TAMAMURA AKIRA
IPC分类号： G02B3/00 , G02B3/02
摘要： PURPOSE:To obtain the aspherical lens having excellent optical performance by adequately selecting the shape, preetching quantity and normal etching quantity of apertures. CONSTITUTION:A mask layer 1 which hinders chemical etching is formed on a flat plate surface to constitute a matrix. The fine circular apertures corresponding to the respective lenses to be produced and >=1 pieces of the apertures provided in the positions enclosing the circular apertures are provided on the mask layer 1. The flat plate surface is partially chemically etched (preetched) through these apertures and the mask layer 1 is removed. Further, the entire part of the flat plate surface is chemically etched (normal etched). A curved surface formed by the preetching is made into the compose shape of one ideal hemispherical surface and the hemispherical annular groove enclosing the circumference thereof. The depth of the central hemispherical surface is deeper than the depth of the annular groove around this surface. The aspherical lens having the radius of curvature which is smallest near the center of the lens and is gradually larger nearer the outer periphery is obtd. if the normal etching is executed in succession to the above-mentioned etching.

5. 发明专利

JPH01309989A STAMPER FOR MOLDING RESIN OR GLASS SUBSTRATE 失效
公开(公告)号：JPH01309989A
公开(公告)日：1989-12-14
申请号：JP14037088
申请日：1988-06-09
申请人： ASAHI GLASS CO LTD
发明人： HATANO TAKASHI , SHIMIZU TOMOYUKI , ARISHIMA HIROSHI
IPC分类号： C25D1/00 , G11B7/24 , G11B7/26
摘要： PURPOSE:To improve the accuracy and strength of a stamper by forming a vacuum-deposited thin film on a substrate through a pattern formed on the substrate by photoetching as a mask, removing the remaining resist and using the thin film as the stamping face. CONSTITUTION:A photoresist film 2 is formed on a substrate 1 of a metal or dielectric. This stamper substrate 26 having the formed photoresist film 2 is irradiated with laser light 21 and a photoresist pattern is formed by development. A thin film 5 is them formed on the surface of the substrate through the pattern as a mask by vacuum deposition, sputtering or other method and the remaining photoresist 2 is removed to obtain a substrate 6 having a desired molding pattern.

6. 发明专利

JPH01309988A STAMPER FOR MOLDING RESIN OR GLASS SUBSTRATE 失效
公开(公告)号：JPH01309988A
公开(公告)日：1989-12-14
申请号：JP14036988
申请日：1988-06-09
申请人： ASAHI GLASS CO LTD
发明人： HATANO TAKASHI , SHIMIZU TOMOYUKI , ARISHIMA HIROSHI
IPC分类号： C25D1/00 , G11B7/24 , G11B7/26
摘要： PURPOSE:To improve the accuracy and strength of a stamper and to make the surface properties uniform by patterning a substrate of optimum stock by photoetching and by using the resulting pattern as the stamping face. CONSTITUTION:A photoresist film 2 is formed on a substrate 1 of a metal or dielectric. This stamper substrate 26 having the formed photoresist film 2 is irradiated with laser light 21 and a photoresist pattern is formed by development. The part 4 of the substrate 1 not masked with the pattern is etched and the remaining photoresist is removed to obtain a substrate 6 having a desired molding pattern.

7. 发明专利

JPH0763904A COMPOUND SPHERICAL MICROLENS ARRAY AND ITS PRODUCTION 失效
公开(公告)号：JPH0763904A
公开(公告)日：1995-03-10
申请号：JP23251593
申请日：1993-08-25
申请人： ASAHI GLASS CO LTD
发明人： SHIMIZU TOMOYUKI , ISEDA TORU
IPC分类号： G02B3/00
摘要： PURPOSE:To provide a microlens array of a compound spherical shape having optical performance of small aberrations and large numerical aperture by forming the phapes of projecting parts or recessed parts into a compound shape consisting of plural kinds of spherical surfaces. CONSTITUTION:A metallic chromium film 2 is formed on the surface of a washed flat surface 3 and a positive type photoresist is applied thereon to form a resist film (mask layer) 1 thereon. The mask layer 1 is provided corresponding to the positions of the lenses to be formed with fine circular apertures of the same number as the number of lenses and the surface of the flat plate 3 is chemically etched through these apertures to form the hemispherical recessed parts. The mask layer 1 is completely removed and the mask layer 1 is again formed on the surface of the flat plate 3 on which the recessed parts are formed. The mask layer 1 is provided with the circular apertures larger than the bore in the apertures of the recessed part and the surface of the flat plate 3 is further etched through the apertures. This stage is repeated plural times. The second spherical surfaces varying in the radius of curvature disposed in the peripheral parts of the first spherical surfaces in the central parts decrease the aberrations generated at the time of condensing.

8. 发明专利

JPS6464146A PHOTOMASK FOR PRODUCTION OF OPTICAL MEMORY ELEMENT 失效
公开(公告)号：JPS6464146A
公开(公告)日：1989-03-10
申请号：JP22038387
申请日：1987-09-04
申请人： ASAHI GLASS CO LTD
发明人： HATANO TAKASHI , ARISHIMA HIROSHI , SHIMIZU TOMOYUKI
IPC分类号： G03F1/00 , G11B7/24 , G11B7/26
摘要： PURPOSE:To obtain a mask which is good in position accuracy and registration speed and has excellent durability by previously dropping out guide grooves, addresses and mark parts for registration in the mask at the time of etching the thin film of a metal compd. provided for forming optical memory elements to form element regions while covering the film with the photomask. CONSTITUTION:A transparent glass substrate is subjected to a sufficient cleaning treatment and thereafter, a chromium nitride film having excellent acid resistance is deposited by sputtering, etc., on this surface and a positive type photoresist is coated thereon and is dried. The guide grooves, addresses and prepit parts indicating information necessary for the optical memory elements are previously removed and dropped out by using a developing machine. The photomask formed in such a manner is then imposed on the transparent glass substrate on which the thin film of the metal compd. is deposited. The similar drop-out parts are generated in the thin film as well by executing etching, by which the desired memory elements consisting of the thin film are obtd. The exact position accuracy is thus assured and the mask is not damaged even after repeated uses. This photomask is thus adequate for mass production of the elements.

9. 发明专利

JPH01279438A METHOD FOR FORMING OPTICAL DISK SUBSTRATE AND PLOTTING DEVICE FOR FORMING OPTICAL DISK SUBSTRATE 失效
公开(公告)号：JPH01279438A
公开(公告)日：1989-11-09
申请号：JP10915088
申请日：1988-05-06
申请人： ASAHI GLASS CO LTD
发明人： HATANO TAKASHI , SHIMIZU TOMOYUKI
IPC分类号： G11B7/26
摘要： PURPOSE:To attain high speed plotting by splitting one light beam into 3 beams and controlling the 3 beams respectively independently to plot on a photo resist face on the substrate. CONSTITUTION:A light from an Ar laser 1 is split into 3 beams by using a polarized light beam splitter 2. Each beam is led to a power control A/O modulator 4 to apply power servo control independently. Then each laser beam subject to power control is led to an A/O modulator 6 for signal modulation to apply signal modulation of ON/OFF. The beam subject to signal modulation is corrected for its position by a beam position adjusting device 7, the beams are synthesized by a polarized beam synthesizer 8 and the 3 beams are respectively focused to the optical disk base simultaneously via an object focus lens 10. Then a turntable holding the optical disk base is driven at a high speed. Thus, a wobbled pit is plotted at high speed with high accuracy even at a high speed drive.

10. 发明专利

JPH07104106A PRODUCTION OF ASPHERICAL MICROLENS ARRAY 失效
公开(公告)号：JPH07104106A
公开(公告)日：1995-04-21
申请号：JP24827793
申请日：1993-10-04
申请人： ASAHI GLASS CO LTD
发明人： SHIMIZU TOMOYUKI , ISEDA TORU
IPC分类号： G02B3/00 , G02B3/02
摘要： PURPOSE:To provide the optical performance which is small in aberration and is large in numerical aperture (NA) by rounding a disk shaped resin by a heat treatment to a spherical shape and executing dry etching to transfer the shape approximate to the shape of a mask onto a substrate. CONSTITUTION:A photosensitive resin 1 is applied on a substrate 2. The photosensitive resin 1 is patterned to an array of a disk shape according to the number and spacings of the lenses produced by a photolithography method. The microlens array is produced from a matrix obtd. by rounding the disk-shaped resin 1 by a heat treatment to the spherical shape, then dry etching the substrate 2 with the resin 1 of a spherical shape as a mask under the conditions under which the etching rate of the substrate 2 is set to be higher than the etching rate of the mask and transferring the shape approximate to the mask onto the substrate 2. The shape of the mask shows a nearly ideal spherical shape if the conditions for the heat treatment are adequately selected. The curved surface of an elliptic shape in section is transferred onto the substrate 1 if the etching rates of the mask and the substrate vary when the substrate is subjected to dry etching.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式