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4. 发明专利

JP5261665B2 Proximity exposure apparatus 有权
公开(公告)号：JP5261665B2
公开(公告)日：2013-08-14
申请号：JP2008138030
申请日：2008-05-27
申请人：株式会社ブイ・テクノロジー
发明人：大助石井
IPC分类号： G03F9/02 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a proximity exposure apparatus capable of inexpensively aligning a substrate and an exposure mask with high accuracy. SOLUTION: The proximity exposure apparatus is equipped with a conveying means 4 that mounts and conveys a work W as an exposure object, an exposure mask 31 opposing and close to the work W, and an imaging means 5 that simultaneously images an alignment mark WB on the work W and an alignment mark 31d on the exposure mask 31, and exposes the work W while aligning the work W to the exposure mask 31 based on the respective images of the alignment mark WB and the alignment mark 31d. The apparatus is also equipped with an optical path length correcting means 52 having an optical member 52a that discontinuously varies the optical path length (L1 or L2) between the imaging means 5 and the work W or the exposure mask 31, the correcting means placed between the imaging means 5 and the work W or the exposure mask 31. COPYRIGHT: (C)2010,JPO&INPIT

9. 发明专利

JP5540280B2 Laser processing equipment 有权
公开(公告)号：JP5540280B2
公开(公告)日：2014-07-02
申请号：JP2009072447
申请日：2009-03-24
申请人：株式会社ブイ・テクノロジー
发明人：通伸水村 , 誠畑中 , 祐二棚田 , 大助石井
IPC分类号： B23K26/073 , B23K26/00 , B23K26/064
摘要： PROBLEM TO BE SOLVED: To shorten a takt time of laser beam machining and to reduce manufacturing cost of an apparatus. SOLUTION: The laser beam machining apparatus includes: a laser head 2 with a cylindrical lens 18 that forms laser beams shaped like fine wires in the cross section and parallel to the transporting direction of a substrate 5 and irradiates the substrate 5 with the formed laser beams; and a control means 4 that controls irradiation timing of a laser beam so as to make a part of the fine wire-like laser machined grooves 31 superimposed which are formed on the substrate 5 by the laser beams shaped like fine wires in the cross section. The laser head 2 is configured to form on the substrate 5 an irradiation pattern 33 in which the width W1 of one end in a longitudinal direction is wider than the width W2 of the other end, in such a manner that the edge of one laser machined groove 31 is bulged out sideways from the edge of the other laser machined groove 31, in the superimposed part of the two laser machined grooves 31 which are laser beam machined successively. COPYRIGHT: (C)2011,JPO&INPIT

10. 发明专利

JP5282941B2 Proximity exposure apparatus 有权
公开(公告)号：JP5282941B2
公开(公告)日：2013-09-04
申请号：JP2008189608
申请日：2008-07-23
申请人：株式会社ブイ・テクノロジー
发明人：大助石井
IPC分类号： G03F7/20 , G02B5/20 , G02F1/1335 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a proximity exposure apparatus capable of enhancing surface flatness of a color filter by suppressing the protuberance at a part where a black matrix and a picture element outer periphery are overlapped with each other. SOLUTION: The proximity exposure apparatus includes: a conveyance stage 4 conveying an exposure object W mounted thereon; an exposure mask 31 provided with an exposure pattern by which the exposure object W is exposed; a mask holder 30 provided above the conveyance stage 4 and holding at least one exposure mask 31; a mask holder driving device 32 holding the mask holder 30 slantingly in the conveyance direction of the exposure object W; and a light source 2a for exposure provided above a mask holder 32. COPYRIGHT: (C)2010,JPO&INPIT

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