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1. 发明专利

KR20210029292A KR20210029292A - Device and method for processing a radiation beam with coherence 审中-公开
公开(公告)号：KR20210029292A
公开(公告)日：2021-03-15
申请号：KR1020217006621A
申请日：2017-07-17
申请人： 에이에스엠엘 네델란즈 비.브이.
发明人： 세바스티아누스 아드리아누스 고르덴 , 니테쉬 팬데이 , 두이구 아크불루트 , 테우니스 빌렘 투커 , 요하네스 마테우스 마리에 데 비트
IPC分类号： G03F7/20 , G01N21/88 , G01N21/95 , G02B6/42
CPC分类号： G03F7/70075 , G01N21/8806 , G01N21/9501 , G02B6/262 , G02B6/4204 , G03F7/7015 , G03F7/70583 , G03F7/70616 , G03F7/70625 , G03F7/70633 , G01N2021/8822 , G01N2201/0631 , G02B6/4296
摘要： 간섭성을 갖는 방사선 빔을 처리하기 위한 장치 및 방법이 개시되어 있다. 한 배열에서, 광학 시스템은 간섭성을 갖는 방사선 빔을 받는다. 방사선 빔은 하나 이상의 방사선 빔 공간 모드에 걸쳐 분포된 성분들을 포함하고 있다. 도파관은 다수의 도파 공간 모드를 지원하고 있다. 광학 시스템은, 하나 이상의 도파 공간 모드를 각각 포함하는 상이한 세트의 도파 공간 모드들에 다수의 성분들 각각이 커플링되는 방식으로 공통 방사선 빔 공간 모드에 속하면서 상이한 주파수를 갖는 방사선 빔의 다수의 성분을 도파관 상으로 향하게 한다.

2. 发明专利

JP2014504006A Chris Cross writing strategy 有权
公开(公告)号：JP2014504006A
公开(公告)日：2014-02-13
申请号：JP2013542535
申请日：2011-12-07
申请人：マイクロニックマイデータアーベーMicronic Mydata Ab
发明人：サンドストレム，トルビョエン
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70583 , G03F7/70291 , G03F7/70358 , G03F7/70383 , G03F7/704 , G03F7/70425 , G03F7/70466
摘要：一般に、説明される技術の一態様は、スイープ方向及びクロススイープ方向における異なる度合いのコヒーレンス相互作用から生じる非等方的書き込み特性を有する書き込み機構を適用する動作と、第１の書き込みと第２の書き込みとの間で加工片上に書き込まれるイメージパターンに対して回転される書き込み機構を用いてイメージパターンを加工片上に２回書き込む動作とを含み、回転された書き込み機構での書き込みが非等方的特性を平均する方法において具体化することができる。加工片と書き込み機構との間の第１及び第２の相対移動方向を分離するより小さい夾角は、本明細書に記載の条件下で２０度以上、又は若干これ以下であってもよい。
【選択図】図１Ａ

3. 发明专利

JP5218049B2 Exposure apparatus and exposure method 有权
公开(公告)号：JP5218049B2
公开(公告)日：2013-06-26
申请号：JP2008517815
申请日：2007-05-11
申请人：株式会社ニコン
发明人：晋一沖田
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70258 , G02B26/125 , G03F7/70075 , G03F7/70308 , G03F7/70583

4. 发明专利

JP2012114358A Exposure device 有权
标题翻译：曝光装置
公开(公告)号：JP2012114358A
公开(公告)日：2012-06-14
申请号：JP2010263906
申请日：2010-11-26
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： ISHIDA KAZUTOSHI , KURASHIGE MAKIO , TAKANOKURA TOMOE , OYAGI YASUYUKI
IPC分类号： H01L21/027 , G02B19/00 , G02B26/10
CPC分类号： G03F7/70191 , G02B26/0816 , G02B27/48 , G03F7/70291 , G03F7/70583
摘要： PROBLEM TO BE SOLVED: To provide an exposure device in which speckles of an optical image formed on a photosensitive medium can be made obscure, and occurrence of unevenness of brightness can be minimized effectively in an illuminated region.SOLUTION: An exposure device 10 comprises an optical element 50, an irradiation device 60, and a spatial light modulator 30. A hologram recording medium 55 is scanned with coherent light by using a scanning device 65, and coherent light irradiated from the hologram recording medium 55 impinges on the spatial light modulator 30 which overlaps an illuminated region LZ. Since a photosensitive medium 15 is arranged closely to the spatial light modulator 30, the coherent light can be guided onto the photosensitive medium 15 with an extremely simple configuration without highlighting the speckles.
摘要翻译：要解决的问题：提供一种曝光装置，其中可以使形成在感光介质上的光学图像的斑点变得模糊，并且在照明区域中可以有效地最小化亮度的不均匀性。解决方案：曝光装置10包括光学元件50，照射装置60和空间光调制器30.通过使用扫描装置65用相干光扫描全息记录介质55，并且从全息图记录介质55照射在与照明区域LZ重叠的空间光调制器30上。由于光敏介质15靠近空间光调制器30设置，所以可以以非常简单的配置将相干光引导到感光介质15上，而不会突出显示斑点。版权所有（C）2012，JPO＆INPIT

5. 发明专利

JP4658127B2 Laser projection system 有权
公开(公告)号：JP4658127B2
公开(公告)日：2011-03-23
申请号：JP2007529095
申请日：2005-08-25
申请人：コーニンクレッカフィリップスエレクトロニクスエヌヴィ
发明人：ヨハヌスダブリュウェーカムプ , レナトゥスエイチエムサンデルス
IPC分类号： G02B27/48 , G02B3/14 , G02B26/06 , G02F1/17 , G03F7/20 , H01L21/027 , H01S3/00
CPC分类号： H04N5/74 , G02B3/14 , G02B26/005 , G02B26/06 , G02B27/48 , G03F7/70583 , H04N9/3129

6. 发明专利

JP2011507293A Microlithography projection exposure apparatus 有权
公开(公告)号：JP2011507293A
公开(公告)日：2011-03-03
申请号：JP2010538457
申请日：2008-12-18
申请人：カール・ツァイス・エスエムティー・ゲーエムベーハー
发明人：グンデュラヴァイス , ヨハネスヴァンクラー , マルクスデギュンター , ミハエルパトラ , ダミアンフィオルカ , マンフレートマウル , ミハエルライ
IPC分类号： H01L21/027
CPC分类号： G03F7/702 , G02B5/09 , G02B26/105 , G03F7/70116 , G03F7/7055 , G03F7/70583
摘要： A projection exposure apparatus for microlithography comprises illumination optics for illuminating object field points of an object field in an object plane is disclosed. The illumination optics have, for each object field point of the object field, an exit pupil associated with the object point, where sin(γ) is a greatest marginal angle value of the exit pupil. The illumination optics include a multi-mirror array that includes a plurality of mirrors to adjust an intensity distribution in exit pupils associated to the object field points. The illumination optics further contain at least one optical system to temporally stabilize the illumination of the multi-mirror array so that, for each object field point, the intensity distribution in the associated exit pupil deviates from a desired intensity distribution in the associated exit pupil in the case of a centroid angle value sin(&bgr;) by less than 2% expressed in terms of the greatest marginal angle value sin(γ) of the associated exit pupil and/or, in the case of ellipticity by less than 2%, and/or in the case of a pole balance by less than 2%.

7. 发明专利

JP2008004930A Reflective loop system producing incoherent radiation 有权
标题翻译：反射环系统产生不可避免的辐射
公开(公告)号：JP2008004930A
公开(公告)日：2008-01-10
申请号：JP2007150014
申请日：2007-06-06
申请人： Asml Netherlands Bv , Dainippon Screen Mfg Co Ltd , エーエスエムエルネザーランズビー.ブイ. , 大日本スクリーン製造株式会社
发明人： BASELMANS JOHANNES JACOBUS MAT , UEYAMA KENJI
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70583 , G02B27/48
摘要： PROBLEM TO BE SOLVED: To provide a system and method producing incoherent radiation having uniform illuminance. SOLUTION: The system and method are used to form incoherent beams from a coherent beam. This system comprises a source of radiation and a reflective loop system. The source of radiation produces a coherent or partially coherent beam. The reflective loop system receives the partially coherent beam and reflects the partially coherent beam through a loop, or alternatively through non-overlapping loops, to form an incoherent beam. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供产生具有均匀照度的不相干辐射的系统和方法。解决方案：系统和方法用于从相干光束形成非相干光束。该系统包括辐射源和反射回路系统。辐射源产生相干或部分相干的光束。反射回路系统接收部分相干光束并通过环路反射部分相干光束，或者通过非重叠环路反射，形成非相干光束。版权所有（C）2008，JPO＆INPIT

9. 发明专利

JP3969871B2 Exposure apparatus and device manufacturing method 有权
公开(公告)号：JP3969871B2
公开(公告)日：2007-09-05
申请号：JP35898698
申请日：1998-12-17
申请人：キヤノン株式会社
发明人：良則三輪 , 幸男山根 , 友晴長谷
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： F16C32/06 , F16C32/0603 , G03F7/70358 , G03F7/70583 , G03F7/70716 , G03F7/70775 , G03F7/70816
摘要： An exposure apparatus for transferring a pattern onto an object. The apparatus includes an optical member constituting part of an optical system arranged between a light source and the object, a rotor having a hole extending in an axial direction thereof, the optical member being mounted in the hole, a stator, the rotor and the stator constituting a motor for rotating the optical member, and a non-contact bearing for supporting the rotor.

10. 发明专利

JP2007179039A Illumination system 有权
标题翻译：照明系统
公开(公告)号：JP2007179039A
公开(公告)日：2007-07-12
申请号：JP2006325363
申请日：2006-12-01
申请人： Asml Holding Nv , Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ. , エーエスエムエルホールデイングエヌ.ブイ.
发明人： VISSER HUIBERT , KLINKHAMER JACOB FREDRIK FRISO , RYZHIKOV LEV , COSTON SCOTT , JOOBEUR ADEL , VINK HENRI JOHANNES P , SHMAREV YEVGENIY KONSTANTINOVICH
IPC分类号： G03F7/20 , H01L21/027
CPC分类号： G03F7/70583 , G02B27/0905 , G03F7/70075
摘要： PROBLEM TO BE SOLVED: To provide an optical apparatus that gives uniform intensity and other characteristics over the all beams when a plurality of radiation beams are projected onto a substrate. SOLUTION: The optical apparatus is provided comprising a homogenizer and a coherence remover so as to substantially homogenize and remove at least some coherence from a beam of radiation. The homogenizer is configured to convert a beam of radiation into a plurality of beams of radiation, and the coherence remover is configured such that each of the beams of radiation passes through a different channel of the coherence remover. Otherwise, the coherence remover converts a beam of radiation into a plurality of beams, and the plurality of beams of radiation are transferred to the homogenizer. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供当多个辐射束投影到基板上时，在所有光束上均匀强度和其它特性的光学装置。解决方案：提供光学装置，其包括均化器和相干去除器，以便基本均匀化并从辐射束中去除至少一些相干性。均化器被配置为将辐射束转换成多个辐射束，并且相干去除器被配置为使得每个辐射束通过相干去除器的不同通道。否则，相干去除器将辐射束转换成多个光束，并且将多个辐射束转移到均化器。版权所有（C）2007，JPO＆INPIT

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