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1. 发明专利

JP5007517B2 Radiation diffraction apparatus and radiation diffraction method 有权
$Radiation diffraction apparatus and radiation diffraction method$
公开(公告)号：JP5007517B2
公开(公告)日：2012-08-22
申请号：JP2006083834
申请日：2006-03-24
申请人：富士通株式会社
发明人：修一土井 , 直樹淡路
IPC分类号： G01N23/207
摘要： PROBLEM TO BE SOLVED: To provide a sample position adjusting device, capable of detecting the diffraction peaks of radiation, such as X rays, neutron beams, etc. with high accuracy in short time, a radiation diffraction device and a radiation diffraction method. SOLUTION: The diffraction peak of X rays is searched, while making the sample (crystal) 10 mounted on a goniometer vibrate by a piezoelectric element 34. When diffraction peaks are not detected, the amplitude of the AC voltage applied to the piezoelectric element 34 is increased. Furthermore, when diffraction peaks are detected, the amplitude of the AC voltage, applied to the piezoelectric element 34, is decreased and the center voltage is changed. COPYRIGHT: (C)2008,JPO&INPIT

2. 发明专利

JP5589578B2 X-ray analyzer 有权
公开(公告)号：JP5589578B2
公开(公告)日：2014-09-17
申请号：JP2010133376
申请日：2010-06-10
申请人：富士通株式会社
发明人：直樹淡路
IPC分类号： G01N23/04
摘要： PROBLEM TO BE SOLVED: To obtain a clear image which allows a sample part to be moved relatively to an X-ray absorption part.SOLUTION: An X-ray analyzer includes: an X-ray source emitting coherent X-rays; a collimator for collimating X-rays from the X-ray source; the X-ray absorption part which is formed of a material absorbing or reflecting X-rays and has a reference hole and a transmission window in positions of X-ray coherence and is irradiated with collimated X-rays; the sample part which has a sample installed on a support film in a position irradiated with X-rays transmitted through the transmission window; a detector which detects a hologram generated by interference between scattering X-rays generated by the sample and X-rays passing the reference hole; and a processing part which performs Fourier transform to obtain an image of an internal structure of the sample on the basis of the hologram obtained by the detector. The sample part can be moved relatively to the X-ray absorption part and is disposed so that the sample part and the X-ray absorption part are brought into contact with each other or are spaced from each other by 40 μm or shorter.

7. 发明专利

JP5527237B2 X-ray analysis method and x-ray analyzer 有权
公开(公告)号：JP5527237B2
公开(公告)日：2014-06-18
申请号：JP2011018208
申请日：2011-01-31
申请人：富士通株式会社
发明人：直樹淡路
IPC分类号： G01N23/04
摘要： PROBLEM TO BE SOLVED: To provide an X-ray analysis method and an X-ray analysis apparatus which can obtain a sample image having a high resolution in a state in which a reference hole is kept in such a size that the reference hole can be processed.SOLUTION: The X-ray analysis method includes the steps of: measuring an X-ray scattering intensity from a sample arranged in a window portion for measurement; estimating the amplitude of reference light from a reference hole; correcting the X-ray scattering intensity by the estimated amplitude of the reference light and obtaining a corrected X-ray scattering intensity; and reproducing an image of the sample by performing inverse Fourier transformation of the corrected X-ray scattering intensity.

8. 发明专利

JP5347461B2 How sample analyzer and sample analysis 有权
公开(公告)号：JP5347461B2
公开(公告)日：2013-11-20
申请号：JP2008307857
申请日：2008-12-02
申请人：富士通株式会社
发明人：直樹淡路
IPC分类号： G01N23/20
摘要： PROBLEM TO BE SOLVED: To provide a sample analyzer capable of evaluating local uniformity of a sample surface or an interface, by converting simply an X-ray intensity distribution into an actual image. SOLUTION: A sample 2 which is a measuring object and an X-ray reflecting mirror 3 are irradiated with an interfering X-ray, and a control part 7 controls an incident angle or an incident position to the X-ray of the sample 2 or the X-ray reflecting mirror 3 so that a first reflected X-ray from the sample and a second reflected X-ray from the X-ray reflecting mirror 3 are overlapped together. Then, the X-ray intensity distribution by interference between the overlapped first reflected X-ray and second reflected X-ray is detected by a detection part 8, and an operation processing part 9 converts the X-ray intensity distribution into actual space data. COPYRIGHT: (C)2010,JPO&INPIT

9. 发明专利

JP5332801B2 How sample analyzer and sample analysis 有权
公开(公告)号：JP5332801B2
公开(公告)日：2013-11-06
申请号：JP2009078286
申请日：2009-03-27
申请人：富士通株式会社
发明人：直樹淡路
IPC分类号： G01N23/02 , G21K5/00
摘要： PROBLEM TO BE SOLVED: To provide a sample analyzer allowing to align a coherent X-ray with a sample in a short time. SOLUTION: When an X-ray optical axis and a sample 1 are aligned, an X-ray with a wavelength longer than that during measuring the sample is extracted and irradiated from coherent X-rays or X-rays with an optical axis identical with that of coherent X-rays by a spectrometer 11, X-rays irradiated to outside of an irradiation position are absorbed by a sample support portion 14 which includes an aperture 14h at the irradiation position of X-rays for the sample of an analysis object and to which an X-ray absorption layer 14c for absorbing X-rays irradiated to outside of the irradiation position is formed, and a transmissive X-ray intensity of X-rays irradiated to the sample 1 supported by the sample support portion 14 is detected by the detector 15. COPYRIGHT: (C)2011,JPO&INPIT

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