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1. 发明专利

JP2013038426A Charged particle beam lithography system and target positioning device 有权
标题翻译：充电颗粒光束光刻系统和目标定位装置
公开(公告)号：JP2013038426A
公开(公告)日：2013-02-21
申请号：JP2012181421
申请日：2012-08-20
申请人： Mapper Lithography Ip Bv , マッパー・リソグラフィー・アイピー・ビー.ブイ.
发明人： JERRY PEIJSTER , GUIDO DE BOER
IPC分类号： H01L21/027 , G03F7/20 , H01J37/20 , H01J37/305 , H01L21/68
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/20 , H01J37/26 , H01J2237/026 , H01J2237/202 , H01J2237/304
摘要： PROBLEM TO BE SOLVED: To provide a charged particle beam lithography system, and an operation method using a target positioning device optimized for charged particle beam exposure of a target.SOLUTION: A charged particle beam lithography system includes: a charged particle optical column 4 disposed in a vacuum chamber 50 for projecting a charged particle beam 2 on a target 3, and having deflection means for deflecting the charged particle beam 2 in a deflecting direction; and a target positioning device 5 having a carrier for holding a target 3, and a stage 52 for holding and moving the carrier along a first direction different from the deflecting direction. The target positioning device 5 has a first actuator 53 for moving the stage 52 in the first direction relative to the charged particle optical column 4. The carrier is disposed in the stage 52 in a movable manner. The target positioning device 5 has holding means for holding the carrier at a first relative position with respect to the stage 52.
摘要翻译：要解决的问题：提供带电粒子束光刻系统，以及使用针对目标的带电粒子束曝光优化的目标定位装置的操作方法。带电粒子束光刻系统包括：带电粒子光学柱4，设置在真空室50中，用于将带电粒子束2投射在目标3上，并具有偏转装置，用于使带电粒子束2偏转在靶偏转方向以及具有用于保持目标3的载体的目标定位装置5和用于沿着与偏转方向不同的第一方向保持和移动载体的台52。目标定位装置5具有第一致动器53，用于相对于带电粒子光学柱4在第一方向上移动平台52.载体以可移动的方式设置在平台52中。目标定位装置5具有用于将载体保持在相对于载物台52的第一相对位置的保持装置。版权所有（C）2013，JPO＆INPIT

2. 发明专利

JP2012238899A Lithography system 有权
公开(公告)号：JP2012238899A
公开(公告)日：2012-12-06
申请号：JP2012178875
申请日：2012-08-10
申请人： Mapper Lithography Ip Bv , マッパー・リソグラフィー・アイピー・ビー.ブイ.
发明人： MARCO JAN-JACO WIELAND , KRUIT PIETER , JOHANNES CHRISTIAAN VAN'T SPIJKER , REMCO JAGER
IPC分类号： H01L21/027 , G03F7/20 , H01J37/317
CPC分类号： G03F7/70383 , B82Y10/00 , B82Y40/00 , G03B27/52 , G03F7/70291 , G03F7/70508 , G03F7/70825 , G03F7/70991 , H01J37/045 , H01J37/3174 , H01J37/3177 , H01J2237/0432 , H01J2237/0435 , H01J2237/0437 , H01J2237/2482
摘要： PROBLEM TO BE SOLVED: To provide a lithography system.SOLUTION: A maskless lithography system for transferring a pattern onto a surface of a target, comprises: at least one beam generator for generating a plurality of small beams; modulation means comprising a plurality of modulators for modulating magnitude of the small beam; and a control unit for controlling each of the modulators. The control unit generates pattern data and transmits the pattern data to the modulation means for controlling the magnitude of each small beam. The control unit comprises: at least one data storage for storing the pattern data; at least one readout unit for reading out the pattern data from the data storage; at least one data converter for converting the pattern data that is read out from the data storage into at least one modulated light beam; and at least one optical transmitter for transmitting at least one modulated light beam to the modulation means.

3. 发明专利

JP2017085118A リソグラフィ装置のためのデータパス有权
公开(公告)号：JP2017085118A
公开(公告)日：2017-05-18
申请号：JP2016230457
申请日：2016-11-28
申请人：マッパー・リソグラフィー・アイピー・ビー.ブイ. , Mapper Lithography Ip Bv
发明人： MARCO JAN-JACO WIELAND , TEUNIS VAN DE PEUT , FLORIS PEPIJN VAN DER WILT , ERNST HABEKOTTE
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J2237/31762 , H01J2237/31774
摘要：【課題】データパスのコスト増大を防ぎ、機能しない伝送チャネルの使用を回避しつつ高い信頼性でデータを伝送できるマルチビーム型マスクレスリソグラフィシステムを提供する。【解決手段】電子光学カラムがビームレットを変調するためのビームレットブランカアレイ117を含み、ビームレットブランカアレイがビームレットデータ信号を受信するための複数の受信器150およびデータ信号に従ってビームレットを変調するための複数のビームレットブランカ素子152を含む。データパス101はパターンデータを記憶して処理する前処理システム140と、処理されたパターンデータを前処理システムからビームレットブランカ素子へと伝送する複数の伝送チャネルとを備える。このデータパスは、パターンデータを受信すると共に、ビームレットデータ信号を生成するパターンストリーミングシステム230を含む。【選択図】図6A

4. 发明专利

JP2014030038A Lithography system, clamping method, and wafer table 有权
标题翻译： LITHOGRAPHY系统，夹紧方法和WAFER TABLE
公开(公告)号：JP2014030038A
公开(公告)日：2014-02-13
申请号：JP2013193588
申请日：2013-09-18
申请人： Mapper Lithography Ip Bv , マッパー・リソグラフィー・アイピー・ビー.ブイ.
发明人： GUIDO DE BOER , DANSBERG MICHEL PIETER , KRUIT PIETER
IPC分类号： H01L21/027 , H01L21/683
CPC分类号： G03F7/707 , H01J37/20 , H01J37/3174 , H01L21/6875
摘要： PROBLEM TO BE SOLVED: To provide means to clamp a target in a lithography system for projecting an image or an image pattern on a target such as a wafer.SOLUTION: Clamp means has a layer of fixing liquid 3 which is included in a predetermined thickness h between a target 1 and a target table 2 so that pressure drop (ΔPcap) may occur by material of liquid and materials of respective contact surfaces A, B of the target 1 and the target table 2 between the target 1 and the target table 2.
摘要翻译：要解决的问题：提供在光刻系统中夹持目标的装置，用于将图像或图像图案投影在诸如晶片的靶上。解决方案：夹持装置具有固定液体层3，其被包括在预定厚度目标1和目标工作台2之间的高压（h），从而可以通过液体材料和目标1的相应接触表面A，B和靶材1与目标表2之间的目标工作台2的材料发生压降（＆Dgr; Pcap）表2。

5. 发明专利

JP2010171446A Lithography system 有权
标题翻译： LITHOGRAPHY系统
公开(公告)号：JP2010171446A
公开(公告)日：2010-08-05
申请号：JP2010076170
申请日：2010-03-29
申请人： Mapper Lithography Ip Bv , マッパー・リソグラフィー・アイピー・ビー.ブイ.
发明人： WIELAND JAN-JACO MARCO , KRUIT PIETER , JOHANNES CHRISTIAAN VAN T SPIJKER , REMCO JAGER
IPC分类号： H01L21/027 , G03F7/20 , H01J37/317
CPC分类号： G03F7/70383 , B82Y10/00 , B82Y40/00 , G03B27/52 , G03F7/70291 , G03F7/70508 , G03F7/70825 , G03F7/70991 , H01J37/045 , H01J37/3174 , H01J37/3177 , H01J2237/0432 , H01J2237/0435 , H01J2237/0437 , H01J2237/2482
摘要： PROBLEM TO BE SOLVED: To provide a lithography system. SOLUTION: A maskless lithography system transfers a pattern onto the surface of a target. The maskless lithography system includes: at least one beam generator generating a plurality of small beams; a modulation means including a plurality of modulators modulating the size of the small beams; and a control unit controlling the respective modulators. The control unit generates pattern data to control the size of the respective small beams, and transmits the pattern data to the modulators. The control unit includes: at least one data storage device storing pattern data; at least one read unit reading the pattern data from the data storage device; at least one data conversion device converting the pattern data read from the data storage device to at least one light beam to be modulated; and at least one light transmission system transmitting at least one light beam to be modulated to the modulation means. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供光刻系统。解决方案：无掩模光刻系统将图案传输到目标表面上。无掩模光刻系统包括：产生多个小光束的至少一个光束发生器; 调制装置，包括调制小波束尺寸的多个调制器; 以及控制各个调制器的控制单元。控制单元产生模式数据以控制各个小波束的大小，并将模式数据发送到调制器。控制单元包括：存储图案数据的至少一个数据存储装置; 至少一个读取单元，从数据存储装置读取模式数据; 至少一个数据转换装置将从数据存储装置读取的图案数据转换成至少一个要调制的光束; 以及至少一个光传输系统，其将要调制的至少一个光束传输到所述调制装置。版权所有（C）2010，JPO＆INPIT

6. 发明专利

JP2013140997A Projection lens structure 有权
标题翻译：投影镜头结构
公开(公告)号：JP2013140997A
公开(公告)日：2013-07-18
申请号：JP2013024799
申请日：2013-02-12
申请人： Mapper Lithography Ip Bv , マッパー・リソグラフィー・アイピー・ビー.ブイ.
发明人： MARCO JAN JACO WIELAND , ALEXANDER HENDRIK VINCENT VAN VEEN
IPC分类号： H01L21/027 , G03F7/20 , H01J37/147 , H01J37/305
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/3007 , H01J2237/0492 , H01J2237/10 , H01J2237/15
摘要： PROBLEM TO BE SOLVED: To provide a composite small beam charged particle lithography system in which a small limit dimensions are achieved, and a sufficient throughput of a wafer can be maintained.SOLUTION: The charged particle multiple small beam system for exposing a target by using a plurality of small beams includes at least one charged particle source 1 for generating a charged particle beam, an aperture array 4 defining individual small beams from a beam thus generated, a small beam manipulator for converging a group of small beams toward a common convergence point of each group, a small beam blanker 6 for blanking the small beam in the group of small beams controllably, and an array of a plurality of projection lens systems 10 for projecting a small beam not subjected to blanking in the group of small beams onto the surface of a target. The small beam manipulator converges each of the small beams in the group toward one corresponding point of these projection lens systems.
摘要翻译：要解决的问题：提供一种复合小束带电粒子光刻系统，其中实现了小的极限尺寸，并且可以保持足够的晶片生产能力。解决方案：用于通过使用暴露目标的带电粒子多小梁系统多个小光束包括至少一个用于产生带电粒子束的带电粒子源1，从这样产生的束限定各个小光束的孔径阵列4，用于将一组小束朝向公共会聚点会聚的小光束操纵器每个组中的一个小束消除器6，用于对可控小组的小束中的小束进行消隐;以及多个投影透镜系统10的阵列，用于将小波束组中未受到消隐的小光束投影到目标的表面。小束操纵器将组中的每个小束朝向这些投影透镜系统的一个对应点会聚。

7. 发明专利

JP2012238902A Lithography system 有权
公开(公告)号：JP2012238902A
公开(公告)日：2012-12-06
申请号：JP2012178878
申请日：2012-08-10
申请人： Mapper Lithography Ip Bv , マッパー・リソグラフィー・アイピー・ビー.ブイ.
发明人： MARCO JAN-JACO WIELAND , KRUIT PIETER , JOHANNES CHRISTIAAN VAN'T SPIJKER , REMCO JAGER
IPC分类号： H01L21/027 , G03F7/20 , H01J37/317
CPC分类号： G03F7/70383 , B82Y10/00 , B82Y40/00 , G03B27/52 , G03F7/70291 , G03F7/70508 , G03F7/70825 , G03F7/70991 , H01J37/045 , H01J37/3174 , H01J37/3177 , H01J2237/0432 , H01J2237/0435 , H01J2237/0437 , H01J2237/2482
摘要： PROBLEM TO BE SOLVED: To provide a lithography system.SOLUTION: A maskless lithography system for transferring a pattern onto a surface of a target, comprises: at least one beam generator for generating a plurality of small beams; modulation means comprising a plurality of modulators for modulating magnitude of the small beam; and a control unit for controlling each of the modulators. The control unit generates pattern data and transmits the pattern data to the modulation means for controlling the magnitude of each small beam. The control unit comprises: at least one data storage for storing the pattern data; at least one readout unit for reading out the pattern data from the data storage; at least one data converter for converting the pattern data that is read out from the data storage into at least one modulated light beam; and at least one optical transmitter for transmitting at least one modulated light beam to the modulation means.

8. 发明专利

JP2012129532A Lithography system and projection method 有权
标题翻译： LITHOGRAPHY系统和投影方法
公开(公告)号：JP2012129532A
公开(公告)日：2012-07-05
申请号：JP2012008107
申请日：2012-01-18
申请人： Mapper Lithography Ip Bv , マッパー・リソグラフィー・アイピー・ビー.ブイ.
发明人： MARCO JAN JACO WIELAND , STIJN WILLEM KAREL HERMAN STEENBRINK , GUIDO DE BOER , REMCO JAGER , AUKJE ARIANNE ANNETTE KASTELIJN
IPC分类号： H01L21/027
CPC分类号： G03F7/70291 , B82Y10/00 , B82Y40/00 , G03F7/70525 , H01J37/3177 , H01J2237/31774
摘要： PROBLEM TO BE SOLVED: To provide a maskless multi-beam lithography system capable of reducing aberration of an optical system that detects a focal point.SOLUTION: An electronic image pattern is transferred to a lithography system for projecting an image to a target surface. The lithography system includes a control unit for controlling exposure projection. The control unit is, at least partially, contained in the projection space of an exposure tool. Control data is supplied by an optical signal. The optical signal is coupled to the control unit by using optical mutual connection of free space. A modulated optical beam to be released is contained in a photosensitive part of the control unit. The optical beam modulated here is coupled with the photosensitive part by using a mirror 104 having a hole 105 for on-axis incidence of the optical beam on the photosensitive part. One or more mirror holes are provided for passage of exposure projection.
摘要翻译：要解决的问题：提供能够减少检测焦点的光学系统的像差的无掩模多光束光刻系统。解决方案：将电子图像图案转印到用于将图像投影到目标表面的光刻系统。光刻系统包括用于控制曝光投射的控制单元。控制单元至少部分地包含在曝光工具的投影空间中。控制数据由光信号提供。光信号通过使用自由空间的光学相互连接耦合到控制单元。要释放的调制光束被包含在控制单元的感光部分中。这里调制的光束通过使用具有孔105的反射镜104与感光部分耦合，用于光束在光敏部分上的轴上入射。提供一个或多个镜孔用于通过曝光投射。版权所有（C）2012，JPO＆INPIT

9. 发明专利

JP2012238900A Lithography system 审中-公开
标题翻译： LITHOGRAPHY系统
公开(公告)号：JP2012238900A
公开(公告)日：2012-12-06
申请号：JP2012178876
申请日：2012-08-10
申请人： Mapper Lithography Ip Bv , マッパー・リソグラフィー・アイピー・ビー.ブイ.
发明人： MARCO JAN-JACO WIELAND , KRUIT PIETER , JOHANNES CHRISTIAAN VAN'T SPIJKER , REMCO JAGER
IPC分类号： H01L21/027 , G02B19/00 , G03F7/20 , H01J37/317
CPC分类号： G03F7/70383 , B82Y10/00 , B82Y40/00 , G03B27/52 , G03F7/70291 , G03F7/70508 , G03F7/70825 , G03F7/70991 , H01J37/045 , H01J37/3174 , H01J37/3177 , H01J2237/0432 , H01J2237/0435 , H01J2237/0437 , H01J2237/2482
摘要： PROBLEM TO BE SOLVED: To provide a lithography system.SOLUTION: A maskless lithography system for transferring a pattern onto a surface of a target, comprises: at least one beam generator for generating a plurality of small beams; modulation means comprising a plurality of modulators for modulating magnitude of the small beam; and a control unit for controlling each of the modulators. The control unit generates pattern data and transmits the pattern data to the modulation means for controlling the magnitude of each small beam. The control unit comprises: at least one data storage for storing the pattern data; at least one readout unit for reading out the pattern data from the data storage; at least one data converter for converting the pattern data that is read out from the data storage into at least one modulated light beam; and at least one optical transmitter for transmitting at least one modulated light beam to the modulation means.
摘要翻译：要解决的问题：提供光刻系统。解决方案：用于将图案转印到目标表面上的无掩模光刻系统包括：用于产生多个小光束的至少一个光束发生器; 调制装置包括用于调制小波束幅度的多个调制器; 以及用于控制每个调制器的控制单元。控制单元产生模式数据，并将模式数据发送到用于控制每个小波束的大小的调制装置。控制单元包括：用于存储图案数据的至少一个数据存储器; 至少一个读出单元，用于从数据存储器中读出模式数据; 至少一个数据转换器，用于将从数据存储器读出的图案数据转换成至少一个调制光束; 以及用于将至少一个调制光束发送到所述调制装置的至少一个光发射器。版权所有（C）2013，JPO＆INPIT

10. 发明专利

JP2011040398A Dispenser cathode 审中-公开
标题翻译：分配器CATHODE
公开(公告)号：JP2011040398A
公开(公告)日：2011-02-24
申请号：JP2010196655
申请日：2010-09-02
申请人： Mapper Lithography Ip Bv , マッパー・リソグラフィー・アイピー・ビー.ブイ.
发明人： KRUIT PIETER , STEENBRINK STIJN WILLEM HERMAN KAREL
IPC分类号： H01J1/28 , H01J37/06 , H01J37/305 , H01L21/027
CPC分类号： H01J37/065 , B82Y10/00 , B82Y40/00 , H01J1/28 , H01J37/3177 , H01J2237/3175 , H01J2237/31754 , H01J2237/31774
摘要： PROBLEM TO BE SOLVED: To provide an electron source supplying a temporally and spatially uniform electron beam, and to provide an electron source having a small injection area. SOLUTION: The dispenser cathode has an injection surface 4; a reservoir 2 for a material emitting particles with a low work function, when heated; and at least one passage 7 for enabling diffusion of the particles with a low work function to the injection face 4 from the reservoir 2. The injection face 4 has at least one injection area 9, and at least one non-injection area 8 covered by a material suppressing injection and surrounding the injection area 9. The non-injection area 8 has the at least one passage 7, with the passage 7 connecting the reservoir 2 and the non-injection area 8, and it is extended away from the injection area 9 by a distance of the diffusion length for enabling diffusion of the particles with a low work function to the injection area 9 from the reservoir 2. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供提供时间和空间上均匀的电子束的电子源，并提供具有小注入面积的电子源。
解决方案：分配器阴极具有注入表面4; 用于当加热时用于发射具有低功函数的颗粒的材料的储存器2; 以及至少一个通道7，用于使得能够将低功函数的颗粒从储存器2扩散到注射面4.注射面4具有至少一个注射区域9和至少一个非注射区域8，抑制注入并围绕注射区域9的材料。非注射区域8具有至少一个通道7，通道7连接储存器2和非注射区域8，并且其延伸远离注射区域 9扩散长度的距离，使得能够将低功函数的颗粒扩散到来自储存器2的注入区域9.版权所有（C）2011，JPO＆INPIT

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