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1. 发明专利

JP2010171452A Electron beam exposure system 有权
标题翻译：电子束曝光系统
公开(公告)号：JP2010171452A
公开(公告)日：2010-08-05
申请号：JP2010088024
申请日：2010-04-06
申请人： Mapper Lithography Ip Bv , マッパー・リソグラフィー・アイピー・ビー.ブイ.
发明人： WIELAND JAN-JACO MARCO , KAMPHERBEEK BERT JAN , KRUIT PIETER , ALEXANDER HENDRIK VINCENT VAN VEEN
IPC分类号： H01L21/027 , A61N5/00 , G01Q30/02 , G01Q30/08 , G03B1/00 , H01J37/08 , H01J37/30 , H01J37/304 , H01J37/317
CPC分类号： H01J3/02 , B82Y10/00 , B82Y40/00 , H01J37/06 , H01J37/3177 , H01J2237/0435 , H01J2237/06308 , H01J2237/06375 , H01J2237/3045
摘要： PROBLEM TO BE SOLVED: To provide an electron beam exposure system. SOLUTION: The electron beam exposure system transfers a pattern onto the surface of a target (14). The electron beam exposure system includes: a beamlet generator generating a plurality of electron beamlets (5a, 5b); a modulation array that includes a plurality of modulators modulating intensity of the electron beamlets and receives the plurality of electron beamlets; a controller connected to the modulation array for controlling the respective modulators independently; a regulator operatively connected to the respective modulators so that control signals of the respective modulators are adjusted individually; a convergent electron optical system including an array of electrostatic lenses (7), where each focuses a corresponding and individual beamlet transmitted by the modulation array on a section smaller than 300 nm; and a target holder for holding the target on an exposed surface of the pattern where the pattern is transferred in a first convergent surface of the convergent electron optical system. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供电子束曝光系统。解决方案：电子束曝光系统将图案传送到目标（14）的表面上。电子束曝光系统包括：产生多个电子束（5a，5b）的子束发生器; 调制阵列，其包括调制电子束强度的多个调制器并接收多个电子子束; 连接到调制阵列的控制器，用于独立控制各个调制器; 调节器，其可操作地连接到各个调制器，使得各个调制器的控制信号被单独地调节; 包括静电透镜阵列（7）的会聚电子光学系统，其中每个将由调制阵列传输的相应和单独的子束聚焦在小于300nm的部分上; 以及目标保持器，用于将目标物保持在会聚电子光学系统的第一会聚表面中的图案转印的图案的暴露表面上。版权所有（C）2010，JPO＆INPIT

2. 发明专利

JP2013140998A Small beam blanker structure 有权
标题翻译：小波纹坯布结构
公开(公告)号：JP2013140998A
公开(公告)日：2013-07-18
申请号：JP2013024809
申请日：2013-02-12
申请人： Mapper Lithography Ip Bv , マッパー・リソグラフィー・アイピー・ビー.ブイ.
发明人： JAN JACO WEILAND , ALEXANDER HENDRIK VINCENT VAN VEEN
IPC分类号： H01L21/027 , G03F7/20 , H01J37/305
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/3007 , H01J2237/0492 , H01J2237/10 , H01J2237/15
摘要： PROBLEM TO BE SOLVED: To provide a lithography system which allows for high data speed transmission of control signals to individual deflectors.SOLUTION: The charged particle multiple small beam lithography system for exposing a target by using a plurality of small beams includes a beam generator generating a plurality of small beams of charged particles, a small beam blanker for patterning the plurality of small beams, and a small beam projector for projecting the plurality of small beams thus patterned onto the surface of the target. The system is further provided with a deflection device having a plurality of memory cells. Each memory cell is provided with a memory element, and connected with the switching electrode of the deflector.
摘要翻译：要解决的问题：提供一种光刻系统，其允许将控制信号高速传输到各个偏转器。解决方案：用于通过使用多个小波束曝光目标的带电粒子多光束光刻系统包括产生多个小的带电粒子束，用于图形化多个小光束的小束消隐器，以及用于将如此构图的多个小光束投影到目标表面上的小射束投影仪。该系统还设置有具有多个存储单元的偏转装置。每个存储单元设置有存储元件，并与偏转器的开关电极连接。

3. 发明专利

JP2013140997A Projection lens structure 有权
标题翻译：投影镜头结构
公开(公告)号：JP2013140997A
公开(公告)日：2013-07-18
申请号：JP2013024799
申请日：2013-02-12
申请人： Mapper Lithography Ip Bv , マッパー・リソグラフィー・アイピー・ビー.ブイ.
发明人： MARCO JAN JACO WIELAND , ALEXANDER HENDRIK VINCENT VAN VEEN
IPC分类号： H01L21/027 , G03F7/20 , H01J37/147 , H01J37/305
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/3007 , H01J2237/0492 , H01J2237/10 , H01J2237/15
摘要： PROBLEM TO BE SOLVED: To provide a composite small beam charged particle lithography system in which a small limit dimensions are achieved, and a sufficient throughput of a wafer can be maintained.SOLUTION: The charged particle multiple small beam system for exposing a target by using a plurality of small beams includes at least one charged particle source 1 for generating a charged particle beam, an aperture array 4 defining individual small beams from a beam thus generated, a small beam manipulator for converging a group of small beams toward a common convergence point of each group, a small beam blanker 6 for blanking the small beam in the group of small beams controllably, and an array of a plurality of projection lens systems 10 for projecting a small beam not subjected to blanking in the group of small beams onto the surface of a target. The small beam manipulator converges each of the small beams in the group toward one corresponding point of these projection lens systems.
摘要翻译：要解决的问题：提供一种复合小束带电粒子光刻系统，其中实现了小的极限尺寸，并且可以保持足够的晶片生产能力。解决方案：用于通过使用暴露目标的带电粒子多小梁系统多个小光束包括至少一个用于产生带电粒子束的带电粒子源1，从这样产生的束限定各个小光束的孔径阵列4，用于将一组小束朝向公共会聚点会聚的小光束操纵器每个组中的一个小束消除器6，用于对可控小组的小束中的小束进行消隐;以及多个投影透镜系统10的阵列，用于将小波束组中未受到消隐的小光束投影到目标的表面。小束操纵器将组中的每个小束朝向这些投影透镜系统的一个对应点会聚。

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