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31. 发明专利

JP2002237481A METHOD OF CLEANING MICROSCOPIC STRUCTURE 失效
公开(公告)号：JP2002237481A
公开(公告)日：2002-08-23
申请号：JP2001034337
申请日：2001-02-09
申请人： KOBE STEEL LTD
发明人： MASUDA KAORU , IIJIMA KATSUYUKI , SUZUKI TETSUO , KAWAKAMI NOBUYUKI , YAMAGATA MASAHIRO
IPC分类号： B08B3/08 , B08B3/10 , B08B7/00 , C11D7/00 , C11D7/08 , C11D7/26 , C11D7/32 , C11D7/60 , C11D11/00 , C11D17/00 , F26B5/04 , G03F7/42 , H01L21/00 , H01L21/304 , H01L21/306 , H01L21/311
摘要： PROBLEM TO BE SOLVED: To establish a method of cleaning a microscopic structure, which finds cleaning components to display a high cleaning force by adding the cleaning components to a liquid carbon dioxide to show an excellent cleaning effect. SOLUTION: The method of cleaning the microscopic structure is the one that removes a material being adhered on the microscopic structure and this method of cleaning the microscopic structure is characterized in that a cleaning agent composition essentially containing a carbon dioxide, a cleaning component which is noncompatible to the carbon dioxide and a compatibilizing agent is turned into a fluid under a high pressure to bring the microscopic structure into contact with the fluid.

32. 发明专利

JPH08210586A COVERED COPPER PIPE 失效
公开(公告)号：JPH08210586A
公开(公告)日：1996-08-20
申请号：JP27578595
申请日：1995-10-24
申请人： KOBE STEEL LTD
发明人： OWAKI TAKESHI , MASUDA KAORU , TAKAHASHI TOMOJI , IWAMOTO HIDEKI
IPC分类号： F16L59/147 , F24D3/10
摘要： PURPOSE: To provide a covered copper pipe that has surpassing workability and adiabatic property at all times throughout the year by grasping such an extent of hardness, insomuch that a man is able to bend it by hand, definitely and reflecting it a molecular design of an adiabatic resin layer. CONSTITUTION: In this covered copper pipe provided with an adiabatic resin layer in and around a copper pipe, a real number part; storage elastic modulus (E') of a complex elastic modulus at a time when dynamic viscoelastic behavior in a bending mode is -10 deg.C at frequency 1Hz, and it utilizes the adiabatic resin layer consisting of a resin composition whose storage elastic modulus is less than 3×10 Pa at -10 deg.C, and more than 1×10 Pa at 40 deg.C.

33. 发明专利

JP2009057588A Method for recovering metal from metal-containing substance, and apparatus for recovering metal 审中-公开
标题翻译：从含金属物质中回收金属的方法，以及恢复金属的装置
公开(公告)号：JP2009057588A
公开(公告)日：2009-03-19
申请号：JP2007224188
申请日：2007-08-30
申请人： Kobe Steel Ltd , 株式会社神戸製鋼所
发明人： YAMAGATA MASAHIRO , MASUDA KAORU
IPC分类号： C22B7/00 , C22B11/02 , C22B15/00 , C22B23/02
CPC分类号： Y02P10/212
摘要： PROBLEM TO BE SOLVED: To provide a method for recovering a metal from a metal-containing substance, not in a form of a metal ion but in a form of metal itself; a method for recovering the metal from the metal-containing substance while recycling a complexation agent; and an apparatus for recovering the metal from the metal-containing substance. SOLUTION: The operation method for recovering the metal from the metal-containing substance includes the steps of: forming a metal complex by bringing the metal-containing substance in contact with a high-pressure fluid containing the complexation agent, and extracting the metal in the metal-containing substance into the high-pressure fluid in a form of the metal complex; and reducing the metal species contained in the metal complex by bringing the high-pressure fluid containing the metal complex in contact with a reducing agent which changes the metal species in the complex to the metal having the valency of 0 to precipitate the metal in the metallic form, separating the metal from the high-pressure fluid, and collecting the metal. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种从含金属物质中回收金属的方法，不是以金属离子的形式，而是以金属本身的形式; 在回收络合剂的同时从含金属物质中回收金属的方法; 以及用于从含金属物质中回收金属的装置。解决方案：用于从含金属物质中回收金属的操作方法包括以下步骤：通过使含金属物质与含有络合剂的高压流体接触形成金属络合物，并提取含金属物质中的金属以金属络合物的形式进入高压流体; 并且通过使包含金属络合物的高压流体与还原剂接触来还原金属络合物中的金属物质，所述还原剂将络合物中的金属物质改变为具有0价金属的金属，以将金属沉淀在金属形式，将金属与高压流体分离，并收集金属。版权所有（C）2009，JPO＆INPIT

34. 发明专利

JP2008019488A Pretreatment method for plating metal on plastic 有权
标题翻译：塑料金属镀层预处理方法
公开(公告)号：JP2008019488A
公开(公告)日：2008-01-31
申请号：JP2006193805
申请日：2006-07-14
申请人： Kobe Steel Ltd , 株式会社神戸製鋼所
发明人： MASUDA KAORU , IIJIMA KATSUYUKI
IPC分类号： C23C18/20 , H05K3/18
摘要： PROBLEM TO BE SOLVED: To provide a pretreatment method for plating a metal on plastic, which improves the adhesiveness of a plating metal to the plastic being a substrate and the uniformity of the plating metal.
SOLUTION: The pretreatment method for plating the metal on the plastic comprises: the step (a) of mixing two types of monomers consisting of a monomer 1 which has a hydrocarbon in a side chain and a monomer 2 which has a fluorinated alkyl group, with a polymerization initiator 3 and an organometallic chelate 4 in supercritical CO
2 , and impregnating the compounds into the surface of the plastic 5; and the step (b) of polymerizing the two types of the monomers (M) by heating the plastic 5 in which the two types of the monomers (M), the polymerization initiator 3 and the organometallic chelate 4 are impregnated or irradiating the plastic 5 with light to form a film 6 in which the organometallic chelate 4 is impregnated.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于在塑料上电镀金属的预处理方法，其改善了电镀金属对作为基底的塑料的粘附性和电镀金属的均匀性。解决方案：将金属镀在塑料上的预处理方法包括：将由侧链中具有烃的单体1和具有氟化烷基的单体2组成的两种类型的单体混合的步骤（a）在超临界CO 2 中用聚合引发剂3和有机金属螯合物4，并将化合物浸渍到塑料5的表面中; 和通过加热其中浸渍两种单体（M），聚合引发剂3和有机金属螯合物4的塑料5或照射塑料5来聚合两种类型的单体（M）的步骤（b）用光形成其中浸渍有机金属螯合物4的膜6。版权所有（C）2008，JPO＆INPIT

35. 发明专利

JP2006335992A Method for making hydrocarbon-based resin water-repellent 有权
标题翻译：制备基于油基树脂水的方法
公开(公告)号：JP2006335992A
公开(公告)日：2006-12-14
申请号：JP2005165825
申请日：2005-06-06
申请人： Kobe Steel Ltd , 株式会社神戸製鋼所
发明人： IIJIMA KATSUYUKI , MASUDA KAORU
IPC分类号： C08J7/16 , C08L79/08 , C09K3/18
CPC分类号： Y02P20/544
摘要： PROBLEM TO BE SOLVED: To provide a method for making a hydrocarbon-based resin water-repellent, capable of forming a coat layer which is difficult to be peeled and has water repellency on a surface of the hydrocarbon-based resin, so as to make the hydrocarbon-based resin water-repellent.
SOLUTION: This method for making the hydrocarbon-based resin water-repellent comprises exposing the hydrocarbon-based resin to a mixed fluid which is formed by dissolving an acrylate ester or a methacrylate ester of formula (1): CH
2 =C(R
1 )-COO-R
2 (R
1 is H or methyl; and R
2 is a hydrocarbon group having F), an acrylate ester or a methacrylate ester of formula (2): CH
2 =C(R
3 )-COO-R
4 (R
3 is H or methyl; and R
4 is a hydrocarbon group not having F), and an initiator in CO
2 in a supercritical state or in a subcritical state and contains the components therein, and then decomposing the initiator by applying light and/or heat to a surface of the resin, so as to cover the hydrocarbon-based resin with a copolymerized polymer of the esters.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：待解决的问题：为了提供一种能够形成难以剥离并且在烃类树脂的表面上具有防水性的涂层的烃类树脂防水剂的方法，因此以使烃类树脂防水。解决方案：制备烃类树脂防水剂的方法包括将烃类树脂暴露于通过将式（1）的丙烯酸酯或甲基丙烯酸酯：CH 溶解而形成的混合流体， 2 R 2 = C（R 1 SP 1）-COO-R 2，其中R 1是H或甲基; R“SP” 2 是具有F），式（2）的丙烯酸酯或甲基丙烯酸酯的烃基：CH 2 SB = C（R SP 3）-COO R 4 （R 3 是H或甲基; R 4 是不具有F）的烃基， SB> 2 处于超临界状态或亚临界状态，并含有其中的成分，然后通过对树脂的表面施加光和/或热来分解引发剂，以覆盖烃类树脂与酯的共聚聚合物。版权所有（C）2007，JPO＆INPIT

36. 发明专利

JP2005026338A Cleaning liquid for fine structure objects 审中-公开
标题翻译：清洁液用于精细结构物体
公开(公告)号：JP2005026338A
公开(公告)日：2005-01-27
申请号：JP2003188048
申请日：2003-06-30
申请人： Kobe Steel Ltd , 株式会社神戸製鋼所
发明人： IIJIMA KATSUYUKI , MASUDA KAORU , SUZUKI TETSUO
IPC分类号： G03F7/42 , C11D7/08 , C11D7/10 , C11D7/24 , C11D7/26 , C11D7/28 , C11D7/30 , C11D7/32 , C11D7/34 , C11D17/08 , H01L21/027 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide cleaning liquid for fine structure objects which can exfoliate and eliminate surely unnecessary material like resist residues without changing the behavior of a low-k film when the fine structure objects are cleaned, and to provide fine structure objects cleaned by using the cleaning liquid. SOLUTION: The cleaning liquid for fine structure objects is used when the unnecessary material adhering to fine structure objects is eliminated, and compound which contains fluorine of ionic bonding nature as a cleaning component exits in a solvent with permittivity of 10 and below at the cleaning temperature. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供精细结构物体的清洁液体，其可以在清洁精细结构物体时，不会改变低k膜的行为，从而可以去除和消除不必要的材料，如抗蚀剂残留物，并提供精细结构使用清洁液清洁物体。解决方案：当消除了附着在细微结构物体上的不需要的材料时，使用精细结构物体的清洗液，含有离子键性能的氟化合物作为清洁组分的化合物在介电常数为10以下的溶剂中离开清洁温度。版权所有（C）2005，JPO＆NCIPI

37. 发明专利

JP2004146457A High pressure processing method and apparatus 有权
标题翻译：高压加工方法和装置
公开(公告)号：JP2004146457A
公开(公告)日：2004-05-20
申请号：JP2002307349
申请日：2002-10-22
申请人： Dainippon Screen Mfg Co Ltd , Kobe Steel Ltd , 大日本スクリーン製造株式会社 , 株式会社神戸製鋼所
发明人： YOSHIKAWA TETSUYA , INOUE YOICHI , WATANABE KATSUMITSU , MASUDA KAORU , IIJIMA KATSUYUKI , IWATA TOMOMI , MURAOKA YUSUKE , SAITO KIMITSUGU , MIZOBATA IKUO
IPC分类号： B08B7/00 , C25F1/00 , G03F7/00 , H01L21/00 , H01L21/302 , H01L21/304
CPC分类号： H01L21/67017 , B08B7/0021
摘要： PROBLEM TO BE SOLVED: To provide a high-pressure processing method and an apparatus which are capable of carrying out a high-pressure process with high efficiency and uniformity when a semiconductor wafer or the like is subjected to high-pressure processing by the use of a critical fluid.
SOLUTION: In the method of performing high-pressure processing on a work 2 by the use of supercritical or subcritical fluid, the fluid is made to impinge on the surface 2a of the work 2 arranged in a high-pressure processing chamber 9 and then to flow outward from the work 2 along the surface 2a of the work 2.
COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：提供一种高压处理方法和装置，当半导体晶片等通过高压处理进行高压处理时，能够以高效率和均匀性进行高压处理使用临界液体。解决方案：在通过使用超临界或亚临界流体对工件2进行高压处理的方法中，流体被撞击在布置在高压处理室9中的工件2的表面2a上然后沿着工作2的表面2a从工件2向外流动。版权所有（C）2004年，JPO

38. 发明专利

JP2004047980A Method of cleaning microstructure and cleaning agent composition 有权
公开(公告)号：JP2004047980A
公开(公告)日：2004-02-12
申请号：JP2003146503
申请日：2003-05-23
申请人： Kobe Steel Ltd , 株式会社神戸製鋼所
发明人： MASUDA KAORU , IIJIMA KATSUYUKI , YOSHIKAWA TETSUYA , PETERS DARRYL W
IPC分类号： B08B7/00 , C11D7/26 , C11D7/30 , C11D7/32 , C11D7/50 , C11D7/60 , C11D11/00 , G03F7/42 , H01L21/027 , H01L21/304
CPC分类号： C11D7/3209 , B08B7/0021 , C11D7/32 , C11D7/5022 , C11D11/0047 , G03F7/422 , G03F7/425
摘要： PROBLEM TO BE SOLVED: To obtain a method of cleaning microstructure with an excellent cleaning effect by finding a cleaning component which exhibits high detergency when the component is added to a liquid carbon dioxide. SOLUTION: The method by which residues are removed from a microstructure includes a step of preparing a cleaning agent composition containing the carbon dioxide, a cleaning component for removing the residues, an inhibitor for suppressing the generation of liquid residues, and a compatibilizing agent for dissolving the cleaning component and the inhibitor in a fluid-like carbon dioxide under pressure. The method also includes a step of removing the residues from the microstructure by bringing the cleaning agent composition into contact with the microstructure. COPYRIGHT: (C)2004,JPO

39. 发明专利

JP2003073876A Electrode for electrochemical treatment, electrochemical treatment method and electrochemical treatment apparatus 有权
标题翻译：电化学处理电极，电化学处理方法及电化学处理装置
公开(公告)号：JP2003073876A
公开(公告)日：2003-03-12
申请号：JP2001262287
申请日：2001-08-30
申请人： Kobe Steel Ltd , 株式会社神戸製鋼所
发明人： TACHIBANA TAKESHI , INOUE KENICHI , MASUDA KAORU
IPC分类号： C07D319/24 , B01J19/08 , C02F1/461 , C07B35/06 , C25B11/04 , C25B11/12
CPC分类号： C02F2001/46138 , C02F2101/366
摘要： PROBLEM TO BE SOLVED: To provide an electrode for electrochemical treatment, which can decompose even a deleterious material requiring a high potential for decomposition, and provide an electrochemical treatment method and an electrochemical treatment apparatus. SOLUTION: The electrode includes a doped diamond layer 2 which covers the surface of a conductive substrate 1, and a non-doped diamond layer 3 which further covers the whole surface or a part of the surface of the layer 2. The doped diamond layer 2 has a diamond composition doped with impurity atoms having concentration of 5×10 cm or more. The non-doped diamond layer 3 has such an extremely low impurity content that the atom concentration of elements except carbon is 5×10 cm or less. Such a structure promotes a chemical reaction of a material to be treated on the surface of the electrode, because of transporting electric charges, which are injected from the surface of the doped diamond layer 2 into the non-doped diamond layer 3, to the surface of the non-doped diamond layer 3 while accelerating them in the non-doped diamond layer 3.
摘要翻译：要解决的问题：提供一种用于电化学处理的电极，其甚至可以分解需要高分解潜力的有害材料，并且提供电化学处理方法和电化学处理装置。解决方案：电极包括覆盖导电衬底1的表面的掺杂金刚石层2和进一步覆盖层2的整个表面或表面的一部分的未掺杂金刚石层3.掺杂金刚石层2 具有掺杂有浓度为5×10 19 cm -3以上的杂质原子的金刚石组合物。非掺杂金刚石层3具有非常低的杂质含量，除了碳以外的元素的原子浓度为5×10 17 cm -3以下。由于将从掺杂金刚石层2的表面注入非掺杂金刚石层3的电荷传输到表面，所以这种结构促进待处理材料在电极表面上的化学反应的非掺杂金刚石层3，同时在非掺杂金刚石层3中加速它们。

40. 发明专利

JPH11147195A WIRE FOR WELDING 失效
公开(公告)号：JPH11147195A
公开(公告)日：1999-06-02
申请号：JP30902397
申请日：1997-11-11
申请人： KOBE STEEL LTD
发明人： SHIMIZU HIROYUKI , NISHIDA MIYOSHI , MASUDA KAORU , ITO KAZUHIKO , MIYAZAKI KUNIAKI , SEIKE NORIO
IPC分类号： B23K9/12 , B23K35/36 , C10M105/24 , C10N40/32
摘要： PROBLEM TO BE SOLVED: To improve and stabilize the feedability of a wire by coating hydrocarbon component having ring structure on the surface of the wire. SOLUTION: The hydrocarbon component is carboxylic acid or carboxylic metallic salt and desirably, naphthenic acid having five membered ring or six membered ring and containing one of molibdenum disulfide, tungsten disulfide and tetrafluoro ethylene as lubricating oil an lubricative grain selected among animal and plant oil, mineral oil and synthetic oil. Suitably, one or more kinds of naphthenic acid and naphthenate metallic salt are contained and this metal is Li, Na, Mg, Al, K, Ca, Ti, Cr, Mn, Fe, Ce, Ni, Cu, Zn, Zr, Sn, Cs, Pb and Ce. The hydrocarbon compound and the lubricating oil are desirable to be stuck to 0.1-5 g/10 kg of the wire. The lubricative material is chemically combined on the surface of the wire for welding, and the detachment can be restrained, and such trouble as the clogging of the lubricative material is not developed even during the welding for long time.

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